JPS63259072A - Method for controlling uniaxial magnetic anisotropy of amorphous soft magnetic material - Google Patents
Method for controlling uniaxial magnetic anisotropy of amorphous soft magnetic materialInfo
- Publication number
- JPS63259072A JPS63259072A JP62092062A JP9206287A JPS63259072A JP S63259072 A JPS63259072 A JP S63259072A JP 62092062 A JP62092062 A JP 62092062A JP 9206287 A JP9206287 A JP 9206287A JP S63259072 A JPS63259072 A JP S63259072A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- amorphous soft
- temp
- magnetic field
- uniaxial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 21
- 230000035699 permeability Effects 0.000 claims abstract description 15
- 238000002425 crystallisation Methods 0.000 claims abstract description 7
- 230000008025 crystallization Effects 0.000 claims abstract description 7
- 230000003068 static effect Effects 0.000 claims abstract description 5
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 abstract description 18
- 239000000463 material Substances 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 11
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 239000011162 core material Substances 0.000 description 5
- 230000005415 magnetization Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 230000004907 flux Effects 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000002178 crystalline material Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/147—Alloys characterised by their composition
- H01F1/153—Amorphous metallic alloys, e.g. glassy metals
- H01F1/15341—Preparation processes therefor
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Heads (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は非晶質軟磁性材料の一軸磁気異方性の制御方法
に関し、特に広い周波数範囲で高透磁率が得られて薄膜
磁気ヘッドの磁気コアなどの各種磁気応用部品に好適な
非晶質軟磁性材料の一軸磁気異方性の制御方法に関する
。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method for controlling the uniaxial magnetic anisotropy of an amorphous soft magnetic material, and in particular to a method for controlling the uniaxial magnetic anisotropy of an amorphous soft magnetic material, and in particular to a method for controlling the uniaxial magnetic anisotropy of an amorphous soft magnetic material. The present invention relates to a method for controlling uniaxial magnetic anisotropy of an amorphous soft magnetic material suitable for various magnetic application parts such as magnetic cores.
（従来技術）
金属は、通常、固体状態において原子配列が規則性を有
した結晶構造を持って存在しているものであるが、例え
ば、ある種の合金溶液を溶融状態から急冷凝固させたり
、あるいは、ある糧のターゲット材料をイオンによりス
パッタリングし、その散乱された原子を基板上に急冷付
着させたりすることにより、固体状態でも液体状態に類
似した原子配列を持つ非晶質状態の軟磁性材料が得られ
ることは周知のとおりである。(Prior Art) Metals usually exist in a solid state with a crystalline structure in which the atomic arrangement is regular. Alternatively, by sputtering a certain target material with ions and rapidly cooling and depositing the scattered atoms on a substrate, it is possible to create an amorphous soft magnetic material with an atomic arrangement similar to that in the liquid state even in the solid state. It is well known that the following can be obtained.
このようにして得られた非晶質軟磁性材料は、原子配列
が結晶質材料のような長範囲規則性を有せず、ランダム
に配列しているために元来、結晶質のような結晶磁気異
方性を有していない。The amorphous soft magnetic material obtained in this way does not have the long-range regularity of atomic arrangement like crystalline materials, but is arranged randomly, so it is originally like a crystalline material. It does not have magnetic anisotropy.
しかし、非晶質軟磁性材料は、その製造時に何らかの理
由で材料中に磁気異方性が誘起されることが多い。とこ
ろが、このように年越された誘導磁気異方性は、その大
きさや方向の分布が不均一であり、製造直後の材料の磁
気特性が一般的に余り良くなく、シかも熱的にも不安定
である。また非晶質状態を作り出す際に、その製造方法
に起因する種々の歪が生じており、これが材料内部に残
留してしまい、この点からも磁気特性を悪くし、熱的に
不安定である。However, magnetic anisotropy is often induced in the amorphous soft magnetic material for some reason during its manufacture. However, the induced magnetic anisotropy that has been aged for many years is uneven in its distribution in size and direction, and the magnetic properties of the material immediately after manufacture are generally not very good, and it may be unstable or thermally unstable. It is stable. In addition, when creating an amorphous state, various strains occur due to the manufacturing method, and this remains inside the material, which also impairs magnetic properties and makes it thermally unstable. .
非晶質軟磁性材料製造時のこれら誘導磁気異方性や内部
歪を除去するために、従来より行われている熱処理方法
、例えば、キュリー温度および結晶化温度以下の温度で
非酸化性雰囲気中において回転磁界中で熱処理する方法
は有効な方法であり、直流や低周波領域での透磁率を向
上させることができる。In order to remove these induced magnetic anisotropy and internal strain during the production of amorphous soft magnetic materials, conventional heat treatment methods are used, for example, in a non-oxidizing atmosphere at a temperature below the Curie temperature and the crystallization temperature. The method of heat treatment in a rotating magnetic field is an effective method and can improve the magnetic permeability in the direct current and low frequency regions.
（発明が解決しようとする問題点〕
しかし、反面、誘導磁気異方性が除去されて磁気異方性
が小さくなると、磁区構造が不安定で粗大になり、磁壁
の移動が生じ易くなるため、高周波領域（Ｉ Ｍｋｌｓ
以上）での透磁率は逆に低下してくるという問題が生じ
る。(Problems to be Solved by the Invention) However, on the other hand, if the induced magnetic anisotropy is removed and the magnetic anisotropy becomes smaller, the magnetic domain structure becomes unstable and coarse, and domain walls tend to move. High frequency region (I Mkls
(above), the problem arises that the magnetic permeability conversely decreases.
高周波領域での透磁率を向上させるためには、磁化過程
として、磁壁移動よりもそのスイッチング速度が速い磁
化回転を用いる必要があり、そのためには、磁気材料に
ある適切な大きさの一軸磁気異方性を付与し、その困難
軸方向に駆動する必要がある。In order to improve magnetic permeability in the high frequency region, it is necessary to use magnetization rotation, which has a faster switching speed than domain wall movement, as a magnetization process. It is necessary to provide directionality and drive in the direction of the difficult axis.
本発明の目的は、上記事情に基づいて行われたもので、
非晶質軟磁性材料の高周波特性が改善される熱処理方法
が提供することにある。つまり、高周波領域で使用する
非晶質軟磁性材料の特性を向上させるためには、製造時
に誘起される誘導磁気異方性や内部歪を除去するだけで
なく、所望の方向に目的に応じたある適切な大きさの一
軸磁気異方性を付与することが必要である。The purpose of the present invention was achieved based on the above circumstances, and
An object of the present invention is to provide a heat treatment method that improves the high frequency characteristics of an amorphous soft magnetic material. In other words, in order to improve the properties of amorphous soft magnetic materials used in the high frequency range, it is necessary not only to remove the induced magnetic anisotropy and internal strain induced during manufacturing, but also to It is necessary to provide a certain appropriate amount of uniaxial magnetic anisotropy.
（問題点を解決するための手段）
本発明の上記目的は、非晶質軟磁性材料を、最終的に高
い高周波透磁率が得たい方向と略直交する方向に印加さ
れた靜磁界中に配置して作製し、最終的に高い高周波透
磁率を得たい方向と略直交する方向を容易軸とする一軸
磁気異方性を付与した後、該非晶質軟磁性材料を真空中
または非酸化性雰囲気中でかつ前記容易軸方向および最
終的に高い高周波透磁率を得たい方向とを含む平面内で
相対的に回転する磁界中に配置して該非晶質軟磁性材料
の結晶化温度およびキュリー温度よりも低い温度で熱処
理し、その温度により一軸磁気異方性の大きさを制御す
ることを特徴とする非晶質軟磁性材料の一軸磁気異方性
の制御方法により達成される。(Means for Solving the Problems) The above object of the present invention is to place an amorphous soft magnetic material in a quiet magnetic field applied in a direction substantially perpendicular to the direction in which a high high frequency magnetic permeability is desired to be obtained. After imparting uniaxial magnetic anisotropy with the easy axis in a direction substantially orthogonal to the direction in which high-frequency magnetic permeability is desired to be obtained, the amorphous soft magnetic material is placed in vacuum or in a non-oxidizing atmosphere. The crystallization temperature and the Curie temperature of the amorphous soft magnetic material are placed in a magnetic field that rotates relatively within a plane that includes the easy axis direction and the direction in which high frequency magnetic permeability is desired to be obtained. This is achieved by a method for controlling uniaxial magnetic anisotropy of an amorphous soft magnetic material, which is characterized by heat-treating at a low temperature and controlling the magnitude of uniaxial magnetic anisotropy depending on the temperature.
上述のように熱処理された非晶質軟磁性材料は広い周波
数範囲で高透磁率が得られ、特に薄膜磁気ヘッドの磁気
コアに好適なものになる。The amorphous soft magnetic material heat-treated as described above has high magnetic permeability over a wide frequency range, making it particularly suitable for the magnetic core of a thin-film magnetic head.
また、本発明を達成する熱処理方法は、非晶質軟磁性膜
を形成後、固定および／または回転磁場中で熱処理をし
て一軸磁気異方性を付与する方法に比べ、低い熱処理温
度で異方性が付与できる。Furthermore, the heat treatment method for achieving the present invention has a lower heat treatment temperature than a method in which after forming an amorphous soft magnetic film, heat treatment is performed in a fixed and/or rotating magnetic field to impart uniaxial magnetic anisotropy. Direction can be given.
従って、下地層に高温に弱い層が配置されている場合な
どに、この熱処理方法は好都合である。Therefore, this heat treatment method is convenient when a layer that is sensitive to high temperatures is disposed in the base layer.
以下、本発明の方法を詳細に説明−する。The method of the present invention will be explained in detail below.
非晶質軟磁性材料を作製するスパッタ装置は略従来と同
じ構成から成っており、また、作製される非晶質軟磁性
材料の膜面と平行かつこの軟磁性材料が最終的に高い高
周波透磁率を得たい方向と略直交する方向に配置された
静磁界が、スパッタリング中に印加できる構造を併せ有
している。The sputtering equipment for producing the amorphous soft magnetic material has almost the same configuration as the conventional one. It also has a structure that allows a static magnetic field placed in a direction substantially perpendicular to the direction in which magnetic flux is desired to be applied during sputtering.
第１図は本発明の磁励中熱処理に用いる装置の好ましい
１例を示している。FIG. 1 shows a preferred example of an apparatus used for heat treatment during magnetic excitation according to the present invention.
第１図において、基板上に非晶質膜が形成された試料ｌ
は、架台２の上に載置される。架台２は石英管で囲われ
た炉３内に収納されており、ヒータ４により架台２上の
試料ｌは所定温度に加熱保持される。更に試料１は加熱
されながら外部磁場により面内方向に磁化される。外部
磁場は炉３の外面に配置されかつヨーク５に取り付けら
れた磁石６により形成される。ヨーク５はモータ８によ
り所定速度で回転可能なように設けられており、磁石６
は試料面内に回転磁界な印加できる。In Figure 1, sample l has an amorphous film formed on a substrate.
is placed on the pedestal 2. The pedestal 2 is housed in a furnace 3 surrounded by a quartz tube, and the sample 1 on the pedestal 2 is heated and maintained at a predetermined temperature by a heater 4. Furthermore, the sample 1 is magnetized in the in-plane direction by an external magnetic field while being heated. The external magnetic field is formed by magnets 6 arranged on the outer surface of the furnace 3 and attached to the yoke 5. The yoke 5 is provided so that it can be rotated at a predetermined speed by a motor 8, and a magnet 6
can apply a rotating magnetic field within the sample plane.
（実施例） 以下、本発明の実施例を挙げて本発明を説明する。(Example) Hereinafter, the present invention will be explained by giving examples of the present invention.
スパッター法によりアルミナ基板上に１０μｍ膜厚のＣ
０８１Ｚｒ７ Ｎｂ１２ （ωｔ％）なる組成の非晶質
合金膜（飽和磁束密度Ｂ８＝ １０．５ ＫＧ、飽和磁
歪λＳ共＋３ ｘ １０−７．結晶化温度Ｔｘ ＝ ４
８０℃）を形成した。また、スパッタリングにより非晶
質合金膜が形成される際、非晶質合金膜面内でかつ非晶
質合金膜が最終的に高い高周波透磁率を得たい方向と略
直交する方向に５０ｅの静磁界を印加し、磁界印加方向
を容易軸とする一軸磁気異方性を付与しな。A 10 μm thick C film was deposited on an alumina substrate by sputtering.
Amorphous alloy film with a composition of 081Zr7Nb12 (ωt%) (saturation magnetic flux density B8 = 10.5 KG, saturation magnetostriction λS both +3 x 10-7. Crystallization temperature Tx = 4
80°C). In addition, when an amorphous alloy film is formed by sputtering, a 50e static current is applied in the plane of the amorphous alloy film and in a direction approximately perpendicular to the direction in which the amorphous alloy film ultimately wants to obtain high high-frequency magnetic permeability. Apply a magnetic field, and do not impart uniaxial magnetic anisotropy with the easy axis in the direction of magnetic field application.
次に、このようにして作製された試料を、第１図に示し
た装置内に配置して熱処理を施した。すなわち、３０
ｒｐｍで回転する回転磁界の磁束回転面と平行になるよ
うに試料面を配置すると共に、この試料を、第２図に図
示するように、１０ 〜１Ｏ−５Ｔｏｒｒの真空中でそ
れぞれ１６０℃、２００℃、２５０℃の温度で３０分間
熱処理し、第３図に示すＢＨ特性を得た。第３図から明
らかなとおり、各温度下において、最終的に高い高周波
透磁率を得たい方向が困難軸方向となっており、その−
軸異方性磁界Ｈ１（が熱処理温度とともに小さくなるよ
うに制御されていることが解る。特に、本発明では非晶
質合金膜の結晶化温度（上述の実施例ではＴｘ＝４８０
℃）に対して低い温度（例えば１６０℃ンでも一軸磁気
異方性が好適に付与できる。Next, the sample thus prepared was placed in the apparatus shown in FIG. 1 and subjected to heat treatment. That is, 30
The sample surface was arranged so as to be parallel to the magnetic flux rotation plane of the rotating magnetic field rotating at rpm, and the sample was heated at 160°C and 200°C in a vacuum of 10 to 1 O-5 Torr, respectively, as shown in Fig. 2. A heat treatment was performed for 30 minutes at a temperature of 250°C, and the BH characteristics shown in FIG. 3 were obtained. As is clear from Figure 3, under each temperature, the direction in which high frequency permeability is ultimately desired is the difficult axis direction;
It can be seen that the axial anisotropic magnetic field H1 is controlled to decrease with the heat treatment temperature. In particular, in the present invention, the crystallization temperature of the amorphous alloy film (Tx = 480 in the above example)
Uniaxial magnetic anisotropy can be suitably imparted even at a low temperature (for example, 160°C).
第４図は、上述の実施例に基づいて、回転磁界中熱処理
温度による一軸異方性磁界Ｈｋの変化を示している。ま
た、図では、他の材料（Ｃｏ８１ Ｆｅ４Ｎｂ１ｓ）に
ついても前記実施例と同じ処理を施して異方性磁界を測
定したものがプロットしである。FIG. 4 shows the change in the uniaxial anisotropy magnetic field Hk depending on the heat treatment temperature in the rotating magnetic field, based on the above-mentioned example. In addition, in the figure, the anisotropic magnetic field was measured for another material (Co81Fe4Nb1s), which was subjected to the same treatment as in the above example, and is plotted.
第５図は、本発明の方法が適用される薄膜磁気ヘッドに
ついて示す。FIG. 5 shows a thin film magnetic head to which the method of the present invention is applied.
すなわち、この薄膜磁気ヘッドは、最終的に形成される
磁気コアの磁化方向と略直交する方向が容易軸となるよ
うに靜磁界を、非晶質合金膜のスパッタ時に印加し、更
に、このようにして形成される非晶質合金膜の膜面を回
転磁場中に配置して熱処理することにより、最終的にヘ
ッドの磁化方向の一軸磁気異方性が制御されて透磁率を
高くできる。That is, in this thin-film magnetic head, a quiet magnetic field is applied during sputtering of an amorphous alloy film so that the easy axis is approximately perpendicular to the magnetization direction of the magnetic core that is finally formed. By placing the film surface of the amorphous alloy film formed in this manner in a rotating magnetic field and heat-treating it, the uniaxial magnetic anisotropy in the magnetization direction of the head is finally controlled and the magnetic permeability can be increased.
なお、磁気コア材料の一軸異方性磁界Ｈｋは、磁壁が不
安定にならない範囲でかつなるべ（小さい方が良（、こ
れはコア寸法にもよるが略２・−６０ｅ程度である。従
って、第３図および第４図に示した先の測定結果より、
ＣｏＥｌＩ Ｚｒ７ Ｎｂ１２では熱処理が略１６０℃
〜２００℃で３０分の範囲で行われることが望ましい。The uniaxial anisotropy magnetic field Hk of the magnetic core material should be within a range that does not make the domain wall unstable (smaller is better (this depends on the core dimensions, but is about 2.-60e). , From the previous measurement results shown in Figures 3 and 4,
For CoElI Zr7 Nb12, heat treatment is approximately 160℃
It is desirable to carry out the treatment at a temperature of ~200°C for 30 minutes.
第１図は本発明の方法を実施するための磁界中熱処理装
置の構造の一例を示す図、第２図は非晶質軟磁性材料Ｃ
０８１Ｚｒ７ Ｎｂ１２ （ωｔ％）熱処理温度と時間
の関係を示す図、第３図は実施例により得られた回転磁
界中熱処理温度とＢＨ凸曲線示す図、第４図はＣｏＮｂ
系非晶質軟磁性材料の回転磁界中熱処理温度と異方性磁
界の関係を示す図、第５図は本発明が適用される薄膜磁
気ヘッドにおける磁化方向とスパッタリング時の印加磁
界方向を示す図である。
１・・・試料、２・・・架台、３・・・炉、４・・・ヒ
ータ、５・・・ヨーク、６・・・磁石、７・・・モータ
第３図
Ｃｏｓ＋ ’ｌｒｙ Ｎｂ＋ｚ ｗｔ’／ａ第５図Figure 1 is a diagram showing an example of the structure of a heat treatment apparatus in a magnetic field for carrying out the method of the present invention, and Figure 2 is a diagram showing an example of the structure of an amorphous soft magnetic material C.
081Zr7 Nb12 (ωt%) A diagram showing the relationship between heat treatment temperature and time, Figure 3 is a diagram showing the heat treatment temperature in a rotating magnetic field and a BH convex curve obtained in the example, and Figure 4 is a diagram showing the relationship between CoNb
Figure 5 is a diagram showing the relationship between heat treatment temperature in a rotating magnetic field and anisotropic magnetic field for amorphous soft magnetic material, and Figure 5 is a diagram showing the direction of magnetization in a thin film magnetic head to which the present invention is applied and the direction of the magnetic field applied during sputtering. It is. 1... Sample, 2... Frame, 3... Furnace, 4... Heater, 5... Yoke, 6... Magnet, 7... Motor Figure 3 Cos+ 'lry Nb+z wt' /a Figure 5
Claims (1)
得たい方向と略直交する方向に印加された静磁界中に配
置して作製し、最終的に高い高周波透磁率を得たい方向
と略直交する方向を容易軸とする一軸磁気異方性を付与
した後、該非晶質軟磁性材料を真空中または非酸化性雰
囲気中でかつ前記容易軸方向および最終的に高い高周波
透磁率を得たい方向とを含む平面内で相対的に回転する
磁界中に配置して該非晶質軟磁性材料の結晶化温度およ
びキュリー温度よりも低い温度で熱処理し、その温度に
より一軸磁気異方性の大きさを制御することを特徴とす
る非晶質軟磁性材料の一軸磁気異方性の制御方法。 ２）スパッタリング法により作製されホ非晶質軟磁性材
料を用いることを特徴とする特許請求の範囲第１項に記
載の制御方法。[Claims] 1) An amorphous soft magnetic material is produced by placing it in a static magnetic field applied in a direction substantially perpendicular to the direction in which high frequency magnetic permeability is desired to be obtained, and After imparting uniaxial magnetic anisotropy with the easy axis in a direction substantially orthogonal to the direction in which high-frequency magnetic permeability is desired, the amorphous soft magnetic material is prepared in vacuum or in a non-oxidizing atmosphere and The amorphous soft magnetic material is placed in a relatively rotating magnetic field in a plane including the direction in which high frequency magnetic permeability is desired to be obtained, and is heat-treated at a temperature lower than the crystallization temperature and Curie temperature of the amorphous soft magnetic material. A method for controlling uniaxial magnetic anisotropy of an amorphous soft magnetic material, the method comprising controlling the magnitude of uniaxial magnetic anisotropy by. 2) The control method according to claim 1, characterized in that an amorphous soft magnetic material manufactured by a sputtering method is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092062A JPS63259072A (en) | 1987-04-16 | 1987-04-16 | Method for controlling uniaxial magnetic anisotropy of amorphous soft magnetic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092062A JPS63259072A (en) | 1987-04-16 | 1987-04-16 | Method for controlling uniaxial magnetic anisotropy of amorphous soft magnetic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63259072A true JPS63259072A (en) | 1988-10-26 |
Family
ID=14043991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62092062A Pending JPS63259072A (en) | 1987-04-16 | 1987-04-16 | Method for controlling uniaxial magnetic anisotropy of amorphous soft magnetic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63259072A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5707691A (en) * | 1996-08-27 | 1998-01-13 | The Coca-Cola Company | Coating hollow containers by in-situ polymerization of monomers in bi-axially orientated form |
| CN113690043B (en) * | 2021-10-25 | 2022-02-01 | 天津三环乐喜新材料有限公司 | Neodymium iron boron heavy rare earth infiltration method and device thereof |
-
1987
- 1987-04-16 JP JP62092062A patent/JPS63259072A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5707691A (en) * | 1996-08-27 | 1998-01-13 | The Coca-Cola Company | Coating hollow containers by in-situ polymerization of monomers in bi-axially orientated form |
| CN113690043B (en) * | 2021-10-25 | 2022-02-01 | 天津三环乐喜新材料有限公司 | Neodymium iron boron heavy rare earth infiltration method and device thereof |
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