JPS6323652B2 - - Google Patents

Info

Publication number
JPS6323652B2
JPS6323652B2 JP18796983A JP18796983A JPS6323652B2 JP S6323652 B2 JPS6323652 B2 JP S6323652B2 JP 18796983 A JP18796983 A JP 18796983A JP 18796983 A JP18796983 A JP 18796983A JP S6323652 B2 JPS6323652 B2 JP S6323652B2
Authority
JP
Japan
Prior art keywords
pattern
inspection
defect
circuit
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18796983A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6080224A (ja
Inventor
Joji Serizawa
Katsumi Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58187969A priority Critical patent/JPS6080224A/ja
Publication of JPS6080224A publication Critical patent/JPS6080224A/ja
Publication of JPS6323652B2 publication Critical patent/JPS6323652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP58187969A 1983-10-07 1983-10-07 パタ−ン検査装置 Granted JPS6080224A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58187969A JPS6080224A (ja) 1983-10-07 1983-10-07 パタ−ン検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58187969A JPS6080224A (ja) 1983-10-07 1983-10-07 パタ−ン検査装置

Publications (2)

Publication Number Publication Date
JPS6080224A JPS6080224A (ja) 1985-05-08
JPS6323652B2 true JPS6323652B2 (enrdf_load_html_response) 1988-05-17

Family

ID=16215313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58187969A Granted JPS6080224A (ja) 1983-10-07 1983-10-07 パタ−ン検査装置

Country Status (1)

Country Link
JP (1) JPS6080224A (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPS6080224A (ja) 1985-05-08

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