JPS63200327U - - Google Patents
Info
- Publication number
- JPS63200327U JPS63200327U JP8971487U JP8971487U JPS63200327U JP S63200327 U JPS63200327 U JP S63200327U JP 8971487 U JP8971487 U JP 8971487U JP 8971487 U JP8971487 U JP 8971487U JP S63200327 U JPS63200327 U JP S63200327U
- Authority
- JP
- Japan
- Prior art keywords
- wafer boat
- substrate
- substrates
- supports
- circumference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 4
- 238000010438 heat treatment Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
第１図は本考案にかかるウエハボートがウエハ
を支持したところを示す要部斜視図、第２図はそ
の支持部の位置を示す模式図、第３図は本考案の
ウエハボートの他の一例の支持部の位置を示す模
式図、第４図は本考案のウエハボートのさらに他
の一例の支持部の位置を示す模式図である。また
、第５図は本考案の実施例に説明する実験のウエ
ハ面の膜厚測定位置を示す模式図であり、第６図
および第７図はそれぞれ従来のウエハボートの支
持位置を示すためのそれぞれ模式図である。
Ｐ１〜Ｐ６……支持部、Ｗ１〜Ｗ３……ウエハ
。
FIG. 1 is a perspective view of the main parts of the wafer boat according to the present invention that supports wafers, FIG. 2 is a schematic diagram showing the position of the supporting part, and FIG. 3 is another example of the wafer boat of the present invention. FIG. 4 is a schematic diagram showing the position of the support part of still another example of the wafer boat of the present invention. Moreover, FIG. 5 is a schematic diagram showing the film thickness measurement position on the wafer surface in the experiment described in the embodiment of the present invention, and FIGS. 6 and 7 are schematic diagrams showing the supporting position of the conventional wafer boat. Each is a schematic diagram. P1 to P6 ...Supporting part, W1 to W3 ...Wafer.
Claims (1)
エハボートにおいて、上記基体の周縁上の複数筒
所で接する支持部が上記基体の円周の回転対称位
置で当該基体を支持することを特徴とするウエハ
ボート。 A wafer boat that supports a plurality of substantially disk-shaped substrates during heat treatment, characterized in that support portions that touch at a plurality of cylindrical positions on the periphery of the substrate support the substrates at rotationally symmetrical positions around the circumference of the substrate. wafer boat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8971487U JPS63200327U (en) | 1987-06-12 | 1987-06-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8971487U JPS63200327U (en) | 1987-06-12 | 1987-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63200327U true JPS63200327U (en) | 1988-12-23 |
Family
ID=30948940
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8971487U Pending JPS63200327U (en) | 1987-06-12 | 1987-06-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63200327U (en) |
-
1987
- 1987-06-12 JP JP8971487U patent/JPS63200327U/ja active Pending
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