JPS6320013B2 - - Google Patents

Info

Publication number
JPS6320013B2
JPS6320013B2 JP7677283A JP7677283A JPS6320013B2 JP S6320013 B2 JPS6320013 B2 JP S6320013B2 JP 7677283 A JP7677283 A JP 7677283A JP 7677283 A JP7677283 A JP 7677283A JP S6320013 B2 JPS6320013 B2 JP S6320013B2
Authority
JP
Japan
Prior art keywords
mark
pattern
photomask
substrate
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7677283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59202632A (ja
Inventor
Takayuki Konuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP58076772A priority Critical patent/JPS59202632A/ja
Publication of JPS59202632A publication Critical patent/JPS59202632A/ja
Publication of JPS6320013B2 publication Critical patent/JPS6320013B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58076772A 1983-04-30 1983-04-30 フオトマスク Granted JPS59202632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58076772A JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58076772A JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Publications (2)

Publication Number Publication Date
JPS59202632A JPS59202632A (ja) 1984-11-16
JPS6320013B2 true JPS6320013B2 (enrdf_load_stackoverflow) 1988-04-26

Family

ID=13614872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58076772A Granted JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Country Status (1)

Country Link
JP (1) JPS59202632A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
JP2855868B2 (ja) * 1990-03-12 1999-02-10 富士通株式会社 レーザトリミング用位置合わせマーク、半導体装置及び半導体装置の製造方法

Also Published As

Publication number Publication date
JPS59202632A (ja) 1984-11-16

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