JPS63198341A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS63198341A JPS63198341A JP3101087A JP3101087A JPS63198341A JP S63198341 A JPS63198341 A JP S63198341A JP 3101087 A JP3101087 A JP 3101087A JP 3101087 A JP3101087 A JP 3101087A JP S63198341 A JPS63198341 A JP S63198341A
- Authority
- JP
- Japan
- Prior art keywords
- side electrode
- metallized layer
- semiconductor element
- wiring
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 45
- 239000002184 metal Substances 0.000 claims abstract description 23
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 229910001111 Fine metal Inorganic materials 0.000 abstract 2
- 239000000919 ceramic Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000002788 crimping Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は金属細線の接合構造を改良した半導体装置に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor device with an improved bonding structure of thin metal wires.
一般に、半導体素子用の容器は高周波化が進むにつれ容
器を構成する基体の小形化及び配線用の金属配線の短縮
化が進むが、組立の作業性についての問題を生じている
。In general, as the frequency of containers for semiconductor devices increases, the size of the substrate constituting the container and the length of the metal wiring for wiring become shorter, but this poses a problem regarding the workability of assembly.
従来の半導体装置の一例として、第5図(a)。FIG. 5(a) shows an example of a conventional semiconductor device.
(b)を参照して説明する。This will be explained with reference to (b).
第5図(a)、(b)はローノイズGaAs FET
の一例の縦断面およびその平面図である。絶縁性の容器
基体1、出力側および入力側電極リード2.2’ 、出
力側電極および入力側電極の外部導出用メタライズ層3
.3’、絶縁性壁部材4、キャップ封止用のメタライズ
層5、接地側電極リード7、半導体素子固着用及び接地
側電極の外部導出用メタライズ層9とを含む半導体素子
用容器と、この容器内のメタライズ層9上に固着された
半導体素子8が表面の電極からそれぞれ接地電極配線用
の金属細線6により各メタライズ層3゜3′、9にそれ
ぞれ電気的に接続されている。Figure 5 (a) and (b) are low noise GaAs FETs.
FIG. 2 is a vertical section and a plan view of an example. Insulating container base 1, output side and input side electrode leads 2.2', metallized layer 3 for leading the output side electrode and input side electrode to the outside.
.. 3', a semiconductor device container including an insulating wall member 4, a metallized layer 5 for cap sealing, a ground side electrode lead 7, a metallized layer 9 for fixing the semiconductor device and for leading the ground side electrode to the outside; and this container. A semiconductor element 8 fixed on the inner metallized layer 9 is electrically connected from the electrode on the surface to each metallized layer 3, 3', 9 by a thin metal wire 6 for ground electrode wiring.
上述した従来の半導体装置では、例えば半導体素子8の
厚さが150μm、容器の絶縁性壁部材4の厚さが40
0μmあるとすると、金属細線6を圧着するウェッジの
太さがあるために、半導体素子8の側面と容器壁部材4
の内側面との間が少なくとも700μm程度以上の間隔
をもっていなければならず、またウェッジでやっと圧着
できたとしても金属細線6が半導体素子8の上面角に接
触したり、配線作業中に壁部材の上面角に当って細線が
切れたりして非常に作業性が悪く、又金属細線の長さも
半導体素子の厚さにより限定され配線によるインダクタ
ンスの最小化にも限界があった。In the conventional semiconductor device described above, for example, the thickness of the semiconductor element 8 is 150 μm, and the thickness of the insulating wall member 4 of the container is 40 μm.
If it is 0 μm, the thickness of the wedge for crimping the thin metal wire 6 is such that the side surface of the semiconductor element 8 and the container wall member 4
There must be a gap of at least 700 μm or more between the inner surface of the semiconductor element 8 and the inner surface of the semiconductor element 8, and even if the wedge can be used to crimp the thin metal wire 6, the metal wire 6 may come into contact with the top corner of the semiconductor element 8, or the wall member may be damaged during wiring work. Workability is very poor because the thin wires break when they hit the top corner, and the length of the thin metal wires is also limited by the thickness of the semiconductor element, so there is a limit to the minimization of inductance due to the wiring.
本発明の目的は、このような組立の作業性を大幅に改善
し、又配線によるインダクタンスもより小さくすること
が可能な半導体装置を提供することにある。An object of the present invention is to provide a semiconductor device that can greatly improve the workability of such assembly and further reduce the inductance due to wiring.
本発明の構成は、表面に複数の電極をもった半導体素子
と、この半導体素子を一つの内部メタライズ層上に接合
して収納した容器とを含む半導体装置において、前記容
器内部のメタライズ層上に接合され、表面にワイヤボン
ディングのできるメタライズ層を、裏面にグイボンディ
ングのできるメタライズ層をそれぞれ有しこれら表面と
裏面とが電気的に接合され前記半導体素子と同等の高さ
をもった導通チップを備え、この導通チップのメタライ
ズ層と前記半導体素子上の電極とが金属細線で接続され
ていることを特徴とする。The structure of the present invention is a semiconductor device including a semiconductor element having a plurality of electrodes on its surface, and a container in which the semiconductor element is bonded and housed on one internal metallized layer. A conductive chip having a metallized layer on the front surface that can be wire-bonded and a metallized layer that can be wire-bonded on the back surface and electrically bonded between the front and back surfaces and having the same height as the semiconductor element is formed. The metallized layer of the conductive chip and the electrode on the semiconductor element are connected by a thin metal wire.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図(a>、(b)は本発明の第1の実施例を示す縦
断面図およびその平面図であり、第2図(a)、(b)
は本実施例の半導体装置に使用する導通チップ10の2
つの例を示す斜視図である。本実施例で用いられる導通
チップ10として、第2図(a)のように銅のようなメ
タル20の上表面にワイヤボンディングが可能なメタラ
イズ層21を施し、その裏面にはグイボンディングが可
能なメタライズ層22を施したものや、第2図(b)の
ように、アルミナのようなセラミック24の全表面にメ
タライズJ’!23を施し、その上表面にはボンディン
グが可能なように裏面はグイボンディングが可能なよう
に平坦としたものがある。FIGS. 1(a) and (b) are a longitudinal sectional view and a plan view thereof showing a first embodiment of the present invention, and FIGS. 2(a) and (b) are
is 2 of the conductive chip 10 used in the semiconductor device of this embodiment.
FIG. 3 is a perspective view showing two examples. As shown in FIG. 2(a), as the conductive chip 10 used in this embodiment, a metallized layer 21 capable of wire bonding is applied to the upper surface of a metal 20 such as copper, and a metallized layer 21 capable of wire bonding is applied to the back surface thereof. As shown in FIG. 2(b), metallization J'! is applied to the entire surface of ceramic 24 such as alumina. 23, and the upper surface is flat so that bonding can be performed, and the back surface is flat so that smooth bonding can be performed.
本実施例の半導体素子用容器は、容器基体1゜壁部材4
.電極導出用リード2.2’ 、7で構成される。容器
基体1は入力側電極導出用メタライズM3′、出力側電
極導出用メタライズ層3、素子固着用及び接地電極導出
用メタライズ層7を有し、メタライズ層9上に半導体素
子8を固着し、メタライズ層3′上素子8に近接した個
所、メタライズ層3上素子8に近接した個所、メタライ
ズN9上素子8に近接した個所に、それぞれ導通チップ
10を固着する。次いで、入力側電極配線用金属細線6
により半導体素子表面の入力側電極と導通チップ10の
表面と、出力側電極配線用金属細線6により半導体素子
表面の出力側電極と導通チップ10の表面と、接地側電
極配線用金属細線6により半導体素子表面の接地側電極
と導通チップ10の表面とを接続配線する。The semiconductor device container of this embodiment has a container base 1°, a wall member 4
.. It is composed of electrode leads 2.2' and 7. The container base 1 has a metallized layer M3' for leading out the input side electrode, a metalized layer 3 for leading out the output side electrode, and a metalized layer 7 for element fixing and ground electrode leading, and the semiconductor element 8 is fixed on the metallized layer 9 and metalized. A conductive chip 10 is fixed to a location on layer 3' close to element 8, a location on metallized layer 3 close to element 8, and a location on metallized N9 close to element 8, respectively. Next, thin metal wire 6 for input side electrode wiring
The input side electrode on the surface of the semiconductor element and the surface of the conductive chip 10 are connected by the thin metal wire 6 for the output side electrode wiring, the output side electrode on the surface of the semiconductor element and the surface of the conductive chip 10 are connected by the thin metal wire 6 for the ground side electrode wiring. The ground side electrode on the surface of the element and the surface of the conductive chip 10 are connected and wired.
なお、導通チップ10は本実施例の全ての電極ではなく
、一部の電極にのみ実施することもあり得る。Note that the conductive chip 10 may be applied to only some of the electrodes, not all the electrodes in this embodiment.
第3図(a)、(b)は本発明の第2の実施例の平面図
およびこの実施例に使用する導通チップ11の斜視図で
ある。この導通チップ11は、アルミナのようなL型セ
ラミック26から成り、L字形の各長辺のほぼ中央部の
上表面と裏面及びそれぞれが導通されるようにその側面
にもメタライズ層25が施されている。FIGS. 3(a) and 3(b) are a plan view of a second embodiment of the present invention and a perspective view of the conductive chip 11 used in this embodiment. The conductive chip 11 is made of an L-shaped ceramic 26 such as alumina, and a metallized layer 25 is applied to the top and back surfaces of the approximately central portion of each long side of the L-shape, and also to the side surfaces thereof so that conduction is established between each long side. ing.
この導通チップ11を用いた本実施例は、第1の実施例
と同じところの説明は省略する。導通チップ11は入力
側電極と一方の接地側電極を、導通チップ11は出力側
電極と他方の接地側電極を接続させるように、半導体素
子8を囲んで固着され、この素子8の表面の電極からそ
れぞれの電極導出のために導通チップ11上に金属細線
6で配線される。In this embodiment using this conductive chip 11, explanations of the same parts as in the first embodiment will be omitted. The conductive chip 11 is fixed around the semiconductor element 8 so as to connect the input side electrode and one ground side electrode, and the conductive chip 11 connects the output side electrode and the other ground side electrode. Wiring is performed using thin metal wires 6 on the conductive chip 11 to lead out the respective electrodes.
第4図(a)、(b)は本発明の第3の実施例の平面図
およびこの実施例に使用する導通チップ12の斜視図で
ある。この導体チップ12は、アルミナのような口型セ
ラミック28からなり、この口字の4辺のほぼ中央部の
上表面と裏及びそれぞれが導通されるようにその側面に
もメタライズ層27が施されている。FIGS. 4(a) and 4(b) are a plan view of a third embodiment of the present invention and a perspective view of the conductive chip 12 used in this embodiment. This conductor chip 12 is made of a mouth-shaped ceramic 28 such as alumina, and a metallized layer 27 is applied to the upper surface and the back of the approximately central part of the four sides of the mouth, and also to the side surfaces thereof so that conduction is established between each side. ing.
本実施例は、導通チップ12が半導体素子8を囲むよう
に固着され、素子8の表面の電極からそれぞれの電極導
出のために導通チップ12上に金属細線6により配線さ
れる。In this embodiment, a conductive chip 12 is fixed so as to surround a semiconductor element 8, and wires are wired on the conductive chip 12 by thin metal wires 6 to lead out the respective electrodes from the electrodes on the surface of the element 8.
以上説明したように本発明は、半導体素子用容器内部の
電極導出用メタライズ層上に、半導体素子に近接して、
あるいは囲むように導通チップを固着することにより、
半導体素子の厚さに関係なく、金属細線による配線作業
が非常に簡単に実施でき、しかも半導体素子の厚さ及び
金属細線圧着用のウェッジの太さに関係なく作業でき、
また配線する金属細線も短くできるため、配線によるイ
ンダクタンスも最小にすることができ、高性能の半導体
装置が得られるという効果がある。As explained above, the present invention provides a method in which, on the metallized layer for leading out an electrode inside the semiconductor device container, in the vicinity of the semiconductor device,
Alternatively, by fixing the conductive chip in a surrounding manner,
Wiring work using thin metal wires can be carried out very easily regardless of the thickness of the semiconductor element, and the work can be performed regardless of the thickness of the semiconductor element and the thickness of the wedge for crimping the thin metal wire.
Furthermore, since the thin metal wires used for wiring can be shortened, the inductance caused by the wiring can also be minimized, and a high-performance semiconductor device can be obtained.
第1図(a)、(b)は本発明の第1の実施例の断面図
およびその平面図、第2図(a)。
(b)は本実施例に使用する導通チップ10の二側を示
す断面図、第3図(a)、(b)は本発明の第2の実施
例を示す平面図およびこの実施例に使用する導通チップ
の斜視図、第4図(a)。
(b)は本発明の第3の実施例を示す平面図およびこの
実施例に使用する導通チップの斜視図、第5図(a)、
(b)は従来の半導体素子の断面図およびその平面図で
ある。
1・・・半導体素子用容器基体、2.2’、7・・・リ
ード、3.3’、9・・・電極庫内用メタライズ層、4
・・・絶縁性壁部材、5・・・封止用メタライズ層、6
・・・配線用金属細線、8・・・半導体素子、10゜1
1.12・・・導通チップ、20・・・メタル、21゜
22.23,25.27・・・メタライズ層、24゜2
6.28・・・セラミック。
代理人 弁理士 内 原 音
第 2 M
<−a)
第4面FIGS. 1(a) and 1(b) are a sectional view and a plan view of a first embodiment of the present invention, and FIG. 2(a) is a sectional view thereof. 3(b) is a sectional view showing two sides of the conductive chip 10 used in this embodiment, and FIGS. 3(a) and 3(b) are plan views showing a second embodiment of the present invention and used in this embodiment. FIG. 4(a) is a perspective view of the conductive chip. (b) is a plan view showing a third embodiment of the present invention and a perspective view of a conductive chip used in this embodiment;
(b) is a sectional view and a plan view of a conventional semiconductor element. DESCRIPTION OF SYMBOLS 1... Semiconductor element container base, 2.2', 7... Lead, 3.3', 9... Metallized layer for electrode chamber interior, 4
... Insulating wall member, 5 ... Sealing metallized layer, 6
...Thin metal wire for wiring, 8...Semiconductor element, 10゜1
1.12... Conductive chip, 20... Metal, 21°22.23, 25.27... Metallized layer, 24°2
6.28...Ceramic. Agent Patent Attorney Uchihara Sound No. 2 M <-a) Page 4
Claims (1)
子を一つの内部メタライズ層上に接合して収納した容器
とを含む半導体装置において、前記容器内部のメタライ
ズ層上に接合され、表面にワイヤボンディングのできる
メタライズ層を、裏面にダイボンディングのできるメタ
ライズ層をそれぞれ有しこれら表面と裏面とが電気的に
接合され前記半導体素子と同等の高さをもった導通チッ
プを備え、この導通チップのメタライズ層と前記半導体
素子上の電極とが金属細線で接続されていることを特徴
とする半導体装置。In a semiconductor device including a semiconductor element having a plurality of electrodes on its surface and a container in which the semiconductor element is bonded to one internal metallized layer and housed, the semiconductor element is bonded to the metallized layer inside the container and has wires on the surface. The conductive chip has a metallized layer that can be bonded and a metallized layer that can be die-bonded on the back surface, and the front and back surfaces are electrically connected and have the same height as the semiconductor element. A semiconductor device characterized in that a metallized layer and an electrode on the semiconductor element are connected by a thin metal wire.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3101087A JPS63198341A (en) | 1987-02-13 | 1987-02-13 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3101087A JPS63198341A (en) | 1987-02-13 | 1987-02-13 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63198341A true JPS63198341A (en) | 1988-08-17 |
Family
ID=12319588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3101087A Pending JPS63198341A (en) | 1987-02-13 | 1987-02-13 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63198341A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0434741U (en) * | 1990-07-18 | 1992-03-23 |
-
1987
- 1987-02-13 JP JP3101087A patent/JPS63198341A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0434741U (en) * | 1990-07-18 | 1992-03-23 |
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