JPS6319758U - - Google Patents
Info
- Publication number
- JPS6319758U JPS6319758U JP11074786U JP11074786U JPS6319758U JP S6319758 U JPS6319758 U JP S6319758U JP 11074786 U JP11074786 U JP 11074786U JP 11074786 U JP11074786 U JP 11074786U JP S6319758 U JPS6319758 U JP S6319758U
- Authority
- JP
- Japan
- Prior art keywords
- disk
- mounting surface
- periphery
- rotation axis
- predetermined angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- 239000007943 implant Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
Description
第１図は、この考案の一実施例に係るイオン注
入装置を部分的に示す概略断面図である。第２図
は、この考案の他の実施例に係るイオン注入装置
を部分的に示す概略断面図である。第３図は、従
来のイオン注入装置の一例を部分的に示す概略断
面図である。
６……ウエハ、８……イオンビーム、１２……
真空容器、１４……デイスク、１５……ウエハ装
着面、１６……回転軸。
FIG. 1 is a schematic sectional view partially showing an ion implantation apparatus according to an embodiment of the invention. FIG. 2 is a schematic sectional view partially showing an ion implantation apparatus according to another embodiment of the invention. FIG. 3 is a schematic cross-sectional view partially showing an example of a conventional ion implantation device. 6...Wafer, 8...Ion beam, 12...
Vacuum container, 14... disk, 15... wafer mounting surface, 16... rotating shaft.
Claims (1)
クの周辺部に装着されたウエハにイオンビームを
照射してイオン注入する装置において、デイスク
の周辺部のウエハ装着面を、デイスクの回転軸に
垂直な面から所定角度傾け、かつデイスクの回転
軸を、ウエハ装着面の一部分がほぼ水平になるよ
うに垂直から所定角度傾けていることを特徴とす
るイオン注入装置。 In a device that implants ions by irradiating an ion beam onto a wafer mounted on the periphery of a disk that is rotated at least in a vacuum chamber, the wafer mounting surface on the periphery of the disk is set at a predetermined angle from a plane perpendicular to the rotation axis of the disk. An ion implantation apparatus characterized in that the rotation axis of the disk is tilted at a predetermined angle from the vertical so that a part of the wafer mounting surface is substantially horizontal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11074786U JPS6319758U (en) | 1986-07-19 | 1986-07-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11074786U JPS6319758U (en) | 1986-07-19 | 1986-07-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6319758U true JPS6319758U (en) | 1988-02-09 |
Family
ID=30990039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11074786U Pending JPS6319758U (en) | 1986-07-19 | 1986-07-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6319758U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0221496U (en) * | 1988-07-21 | 1990-02-13 |
-
1986
- 1986-07-19 JP JP11074786U patent/JPS6319758U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0221496U (en) * | 1988-07-21 | 1990-02-13 |
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