JPS62145263U - - Google Patents
Info
- Publication number
- JPS62145263U JPS62145263U JP3372286U JP3372286U JPS62145263U JP S62145263 U JPS62145263 U JP S62145263U JP 3372286 U JP3372286 U JP 3372286U JP 3372286 U JP3372286 U JP 3372286U JP S62145263 U JPS62145263 U JP S62145263U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- holder
- rotating shaft
- attached
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は、この考案の一実施例に係るイオン処
理装置を部分的に示す横断面図である。第２図は
、第１図のホルダーおよびキヤツチプレート部分
のみを示す側面図である。第３図は、従来のイオ
ン処理装置の一例を部分的に示す横断面図である
。第４図は、第３図のホルダーおよびキヤツチプ
レート部分のみを示す側面図である。
２……ウエハ、４……処理室、１４……回転軸
、１６……ホルダー、４８……フアラデーカツプ
、５０……イオンビーム、５２……キヤツチプレ
ート。
FIG. 1 is a cross-sectional view partially showing an ion processing apparatus according to an embodiment of the invention. FIG. 2 is a side view showing only the holder and catch plate portions of FIG. 1. FIG. 3 is a cross-sectional view partially showing an example of a conventional ion processing apparatus. FIG. 4 is a side view showing only the holder and catch plate portions of FIG. 3. 2... Wafer, 4... Processing chamber, 14... Rotating shaft, 16... Holder, 48... Faraday cup, 50... Ion beam, 52... Catch plate.
Claims (1)
当該ウエハを処理するものであつて、真空容器内
に挿入された回転軸に、ウエハを着脱可能なホル
ダーを取り付け、当該回転軸によつてホルダーを
ウエハ着脱位置とウエハ処理位置とに回転させる
ようにしている装置において、前記回転軸に、フ
アラデーカツプが取り付けられていてイオンビー
ム計測のためにイオンビームを受け止めるキヤツ
チプレートを、ホルダーとは所定の角度を持たせ
て取り付けていることを特徴とするイオン処理装
置。 The wafer is processed by irradiating the wafer with an ion beam in a vacuum chamber, and a holder to which the wafer can be detached is attached to a rotating shaft inserted into the vacuum chamber, and the holder is held by the rotating shaft. In an apparatus that rotates between a wafer loading/unloading position and a wafer processing position, a Faraday cup is attached to the rotating shaft and a catch plate that receives the ion beam for ion beam measurement is held at a predetermined angle with respect to the holder. An ion processing device characterized in that it is attached with a.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3372286U JPS62145263U (en) | 1986-03-08 | 1986-03-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3372286U JPS62145263U (en) | 1986-03-08 | 1986-03-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62145263U true JPS62145263U (en) | 1987-09-12 |
Family
ID=30841595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3372286U Pending JPS62145263U (en) | 1986-03-08 | 1986-03-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62145263U (en) |
-
1986
- 1986-03-08 JP JP3372286U patent/JPS62145263U/ja active Pending