JPS6318646A - Element part for printed board - Google Patents
Element part for printed boardInfo
- Publication number
- JPS6318646A JPS6318646A JP16344086A JP16344086A JPS6318646A JP S6318646 A JPS6318646 A JP S6318646A JP 16344086 A JP16344086 A JP 16344086A JP 16344086 A JP16344086 A JP 16344086A JP S6318646 A JPS6318646 A JP S6318646A
- Authority
- JP
- Japan
- Prior art keywords
- glass cloth
- substrate
- recess
- layer
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims abstract description 47
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000011152 fibreglass Substances 0.000 claims abstract description 6
- 239000004744 fabric Substances 0.000 claims description 40
- 229920003023 plastic Polymers 0.000 claims description 15
- 239000004033 plastic Substances 0.000 claims description 15
- 238000007747 plating Methods 0.000 abstract description 43
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 27
- 229910052802 copper Inorganic materials 0.000 abstract description 27
- 239000010949 copper Substances 0.000 abstract description 27
- 239000003822 epoxy resin Substances 0.000 abstract description 8
- 229920000647 polyepoxide Polymers 0.000 abstract description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052737 gold Inorganic materials 0.000 abstract description 7
- 239000010931 gold Substances 0.000 abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 abstract description 3
- 229910052759 nickel Inorganic materials 0.000 abstract description 3
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 230000007423 decrease Effects 0.000 abstract description 2
- 239000003365 glass fiber Substances 0.000 abstract description 2
- 238000010030 laminating Methods 0.000 abstract description 2
- 230000008961 swelling Effects 0.000 abstract description 2
- 239000004753 textile Substances 0.000 abstract 2
- 238000005868 electrolysis reaction Methods 0.000 abstract 1
- 239000002759 woven fabric Substances 0.000 abstract 1
- 229920000954 Polyglycolide Polymers 0.000 description 16
- 235000010409 propane-1,2-diol alginate Nutrition 0.000 description 16
- 208000002352 blister Diseases 0.000 description 11
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000012779 reinforcing material Substances 0.000 description 3
- 239000002990 reinforced plastic Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011151 fibre-reinforced plastic Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 235000011888 snacks Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
Landscapes
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明はプリント基板用素子部品、特にガラス繊維補強
プラスチックを基材とする素子部品に関する。DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to an element part for a printed circuit board, and particularly to an element part whose base material is glass fiber reinforced plastic.
「従来の技術」
従来ICやLSI等のパッケージとしてのプリント基板
用素子部品(以下PGAと称す)にはアルミナから作ら
れるアルミナPGAが主流をなしていたが、最近ガラス
1fiIlt補強プラスチックから作られるプラスチッ
クPG△が盛んに使用されるようになっている。これは
アルミナPGAに比べてプラスチックPGAGまコスト
を 1/3〜1/4に低減できる上、機械的衝撃、g1
m回路の形成、回路パターンの精度、外形寸法の精度、
パッケージの設計変更性等に優れているからである。"Conventional Technology" Conventionally, alumina PGA made from alumina was the mainstream for printed circuit board element parts (hereinafter referred to as PGA) used as packages for ICs, LSIs, etc., but recently plastics made from glass 1filt reinforced plastic have been used. PG△ is now being widely used. This reduces the cost of plastic PGA by 1/3 to 1/4 compared to alumina PGA, and also reduces mechanical impact and g1
m circuit formation, circuit pattern accuracy, external dimension accuracy,
This is because the package design can be changed easily.
従来プラスチックPGAはガラス繊維補強プラスチック
基板の上面中央部に底面および側面全体に金メッキの施
された凹部と、該凹部の周囲に前記凹部の金メッキと接
触しないように金メッキの施された多数の微細回路と、
基板を1:1通し一端を前記微細回路の各々に接続し他
ζさが基板の下面に突出する多数のリードピンとを有し
、前記凹部にIC又はしSl等の素子を搭載して素子の
リード線の各々を各微細回路の内端に接続して使用され
ている。Conventional plastic PGAs have a recess in the center of the upper surface of a glass fiber-reinforced plastic substrate, the entire bottom and side surfaces of which are plated with gold, and a large number of microcircuits that are plated with gold around the recess so as not to come into contact with the gold plating of the recess. and,
The board is passed through 1:1 and one end is connected to each of the microcircuits, and the other end has a large number of lead pins protruding from the bottom surface of the board, and an element such as an IC or an SI is mounted in the recessed part to form the element. Each of the lead wires is connected to the inner end of each microcircuit.
このプラスチックPGAのガラスtaII!補強プラス
チック基板には一般的にガラス−エポキシ積層板、ガラ
ス−高耐熱エポキシ樹脂層板、ガラス−ビスマレイミド
トリアジン積層板等を使用することができるが後に素子
を取付ける工程等で150℃〜180℃の高温を受レノ
るため通常ガラス−高耐熱エポキシ積層板が最も良く使
用されている。基板の厚さは、1.0〜2.0mのもの
が多く1.6閾の厚さのものが最も良く使用される。素
子を搭載する凹部は基板の表面をザグリ加工することに
よって形成されその深さは搭載する素子の形状やPGA
の構造等により異なるが、一般的に0.30m”−0,
70mの範囲内にあり、最も多い深さは0.50Ill
1m±0.10INAである。この凹n1はザグリ加工
されたままの状態では凹部の底面や周囲から基板中に含
まれる微量の水分や不純物が浸出し塔載された素子に対
し有害な影響を与えるので四部の全面をメッキにより被
覆して微量水分の影響を遮断するようになされている。This plastic PGA glass taII! Generally, glass-epoxy laminates, glass-high heat-resistant epoxy resin laminates, glass-bismaleimide triazine laminates, etc. can be used for the reinforced plastic substrate, but the temperature is 150°C to 180°C during the process of attaching elements later. Glass-high heat resistant epoxy laminates are most commonly used to withstand high temperatures. The thickness of the substrate is often 1.0 to 2.0 m, and a thickness of 1.6 threshold is most often used. The recess for mounting the element is formed by counterbore the surface of the board, and its depth depends on the shape of the element to be mounted and the PGA.
Although it varies depending on the structure etc., generally 0.30m"-0,
Within a range of 70m, the most common depth is 0.50Ill
1m±0.10INA. If this recess n1 is left counterbored, trace amounts of moisture and impurities contained in the substrate will leach out from the bottom and surrounding areas of the recess and have a harmful effect on the elements mounted on the tower, so the entire surface of the four parts is plated. It is coated to block the influence of trace amounts of moisture.
この凹部のメッキは最初に無電解銅メッキにより0.2
μm厚程度の極くうすい不地層を形成し、その上に20
μm程度の厚さに電解銅メッキを施し、最後に十分な耐
蝕性を与えるために電解銅メッキの上に5μm程度のニ
ッケルメッキおにび0.5μm程度の金メッキを電解法
により施す。The plating of this recess was first done by electroless copper plating with 0.2
An extremely thin ground layer of approximately μm thickness is formed, and 20
Electrolytic copper plating is applied to a thickness of about .mu.m, and finally, in order to provide sufficient corrosion resistance, nickel plating of about 5 .mu.m and gold plating of about 0.5 .mu.m is applied electrolytically on the electrolytic copper plating.
「発明が解決しようとする問題点」
上記従来のプラスチックPGAは四部に施されるメッキ
層が最下層の無電解銅メッキの剥離が原因となって凹部
の底面からふくれ上るという欠陥をちっている。又この
ようなメッキ層のふくれが生ずると底面に凹凸ができて
素子を凹部に対し安定した状態に塔載できないのみなら
ず、後工程、例えば素子を底面に樹脂で接着する工程、
ワイヤボンディング工程、素子を樹脂で封止する工程等
で150℃〜180℃の?3温に灘さらされるためふく
れの部分からメッキがはがれてしまうという問題が発生
する。更に凹部の底面からメッキがはがれてしまうと、
素子の固定が不完全になりワイヤボンディングにより接
続された金線が切断したり底面からの水分の浸入を許す
等のトラブルが発生する。"Problems to be Solved by the Invention" The conventional plastic PGA mentioned above has a defect in that the plating layer applied to the four parts bulges up from the bottom of the recess due to peeling of the bottom layer electroless copper plating. . In addition, when such blistering of the plating layer occurs, unevenness occurs on the bottom surface, which not only makes it impossible to stably mount the device in the recess, but also prevents post-processing, such as the step of bonding the device to the bottom surface with resin.
Temperatures of 150℃ to 180℃ are used in the wire bonding process, the process of sealing elements with resin, etc. The problem is that the plating peels off from the swollen parts because it is exposed to 3 degrees of temperature. Furthermore, if the plating peels off from the bottom of the recess,
Troubles such as incomplete fixation of the element and breakage of gold wires connected by wire bonding and moisture infiltration from the bottom surface occur.
[問題点を解決するための手段]
本発明は上記従来のプラスチックPGAの問題点を解決
するためにメッキの施される凹部をガラス繊維強化プラ
スチツク基板の表面にザグリ加工するに際して、該凹部
の底面が基板中のガラス布層に位置するように加工する
ことを特徴とする。[Means for Solving the Problems] In order to solve the above-mentioned problems of the conventional plastic PGA, the present invention provides that when a recess to be plated is counterbored on the surface of a glass fiber reinforced plastic substrate, the bottom surface of the recess is It is characterized in that it is processed so that it is located on the glass cloth layer in the substrate.
「作用」
プラスチックPGAの凹部に施されるメッキ層にJ3け
る最下層の無電解銅メッキは化学的に析出した金属結晶
の凹部底面に対する橢械的なひっかかり効果(アンカー
効果)によって接着しているので凹部底面が平滑なプラ
スナックとなっている場合は接着力が弱く剥離し易いが
、本発明は四部の底面がガラス布層に位置するようにザ
グリ加工するため底面は露出したガラス布によって粗面
となっており、従って礪械的接着力が′@強されるため
、底面のメッキのふくれの発生を大巾に減少させること
ができる。"Function" The bottom layer of electroless copper plating in J3 on the plating layer applied to the recess of the plastic PGA is bonded by the mechanical hooking effect (anchor effect) of chemically deposited metal crystals to the bottom of the recess. Therefore, if the bottom of the concave part is a smooth plastic snack, the adhesive strength is weak and it is easy to peel off, but in the present invention, the bottom of the four parts is counterboreed so that it is located on the glass cloth layer, so the bottom is rough due to the exposed glass cloth. Since the mechanical adhesion is strengthened, the occurrence of blistering of the plating on the bottom can be greatly reduced.
「実施例」
第1図は本発明によるプラスチックPGAの要部の概要
を示す断面図で、ガラスIJ&維補強プラスチック基板
1はエポキシ樹脂層6とガラスtagの織物から成るガ
ラス布層5を交互に積層したもので構成され、基板1の
上面から方形の凹部2がその底面3がガラス布層5のほ
ぼ中心線に合致するようにザグリ加工され、その上に銅
メッキ4が施される。銅メッキ4は最初に無電解銅メッ
キにより厚さ約0.2μmの化学銅層を析出させた後こ
れを下地として厚さ約20μmの電気銅メッキを施した
ものである。そして図示されていないが耐蝕性を与える
ために通常銅メッキ4の上に電解法によりニッケルメッ
キおよび金メッキが施される。"Example" FIG. 1 is a cross-sectional view showing the outline of the main parts of the plastic PGA according to the present invention, in which the glass IJ & fiber-reinforced plastic substrate 1 has an epoxy resin layer 6 and a glass cloth layer 5 made of glass tag fabric alternately. A rectangular recess 2 is counterbored from the top surface of the substrate 1 so that its bottom surface 3 substantially coincides with the center line of the glass cloth layer 5, and copper plating 4 is applied thereon. The copper plating 4 is obtained by first depositing a chemical copper layer with a thickness of about 0.2 μm by electroless copper plating, and then applying electrolytic copper plating with a thickness of about 20 μm using this as a base. Although not shown, nickel plating and gold plating are usually applied on the copper plating 4 by an electrolytic method in order to provide corrosion resistance.
第2図は第1図の凹部底面のメッキを施す前の平面図で
ガラス布の経糸と緯糸の結節部が十字形の模様となって
底面に浮出し川面を形成していることを示す。第3図は
第1図の凹部底面付近のメッキ層の状態を拡大して示す
もので、ザグリ加工により露出したガラス布層5により
粗面となっている底面に化学銅Fm4aが沈着しその上
に電気銅層4bがメッキされているのが分る。化学銅層
4aは凹凸を有する粗面に被覆されているためアンカー
効果により剥れ難くなっている。Figure 2 is a plan view of the bottom of the recess shown in Figure 1 before plating, and shows that the knots of the warp and weft of the glass cloth form a cross-shaped pattern and stand out on the bottom, forming a river surface. . Fig. 3 shows an enlarged view of the state of the plating layer near the bottom of the recess shown in Fig. 1. Chemical copper Fm4a is deposited on the bottom surface, which is roughened by the glass cloth layer 5 exposed by counterbore processing, and It can be seen that the electrolytic copper layer 4b is plated on. Since the chemical copper layer 4a is coated on a rough surface having irregularities, it is difficult to peel off due to the anchor effect.
第4図は凹部2′の底面3′がガラス布層5の間のエポ
キシ樹脂のみの層6にある場合を示し、7は底面3′に
おける銅メッキ層4のふくれにより生じた空間をポリ。FIG. 4 shows a case where the bottom surface 3' of the recess 2' is located in a layer 6 made of only epoxy resin between the glass cloth layers 5, and 7 is a polygonal filler for the space created by the swelling of the copper plating layer 4 on the bottom surface 3'.
この場合底面3′には第5図に示す如く全面的に平滑な
エポキシ樹脂の層が現われる。第6図は第4図の凹部底
面付近のメッキ層の状態を拡大して示すもので、化学銅
層4aは平滑なエポキシ樹脂6の面に沈着するので電気
メツキ層4bを施す際の熱的又は改械的な衝撃により剥
離を起し空間7を生じ易い。In this case, a completely smooth layer of epoxy resin appears on the bottom surface 3' as shown in FIG. FIG. 6 shows an enlarged view of the state of the plating layer near the bottom of the recess in FIG. 4. Since the chemical copper layer 4a is deposited on the smooth surface of the epoxy resin 6, the thermal Or, it is easy to cause peeling due to mechanical impact and create a space 7.
従って本発明は第1図に示す如く凹部2の底面3がガラ
ス布層5に位置する如くザグリ加工することによって底
面3を粗面としてアンカー効果を増し銅メッキ4の剥離
に基づくふくれの発生を防止するようにしたものである
が、ふくれの発生率は底面3のガラス布層5に対する位
置によって大きく変化する。即ち底面3において粗面を
形成するガラス繊維の占める割合は底面がガラス布層の
中心に位置するとき最大であり、それより上下方向にず
れるに従って減少し、ガラス布層から完全にずれたとき
Oとなり、これに応じてアンカー効果が変化するからで
ある。実験の結果によれば、基板の補強材として使用さ
れるガラス布の原厚さ0.1mの場合、凹部底面の位置
がガラス布層の中心線から±0.03mmの範囲にある
どきふくれの発生率はOであり、その範囲から外れるに
従い発生率は急激に増大し、ガラス布層から完全に外れ
たときふくれの発生率は50%以上となった。Therefore, the present invention counterbores the bottom surface 3 of the recess 2 so that it is located on the glass cloth layer 5 as shown in FIG. However, the rate of occurrence of blisters varies greatly depending on the position of the bottom surface 3 with respect to the glass cloth layer 5. That is, the proportion of glass fibers forming the rough surface on the bottom surface 3 is maximum when the bottom surface is located at the center of the glass cloth layer, decreases as the bottom surface deviates vertically from there, and reaches O when the bottom surface 3 completely deviates from the glass cloth layer. This is because the anchor effect changes accordingly. According to the experimental results, when the original thickness of the glass cloth used as a reinforcing material for the substrate is 0.1 m, the bottom of the recess is within ±0.03 mm from the center line of the glass cloth layer. The incidence of blistering was 0, and the rate of blistering increased rapidly as the glass cloth layer was removed from the range, and the rate of blistering was 50% or more when the glass cloth layer was completely removed.
又ガラス布の原厚さが0.2Mの場合には、凹部底面の
位置がガラス布層の中心線から±0.06閣の範囲にあ
るときふくれの発生率は○であった。Further, when the original thickness of the glass cloth was 0.2M, the occurrence rate of blistering was ○ when the position of the bottom of the recess was within the range of ±0.06 mm from the center line of the glass cloth layer.
従って凹部底面の位置がガラス布層の中心線から使用さ
れるガラス15のもとの厚さの±30%の範囲になるよ
うにザグリ加工すれば銅メッキ層のふくれの発生を殆ど
抑えることができる。基板に使用されるガラス布の種類
や積層枚数、及び基板の厚さ方向におけるガラス布層の
占める位置は、基板の種類によって殆ど一定しており、
その状態は基板のカット断面を検査することにより知る
ことができるので、この検査結果に基づき自動ザグリ加
工すべき凹部底面の位置を予め設定することができる。Therefore, if the counterbore is processed so that the bottom of the recess is within ±30% of the original thickness of the glass 15 used from the center line of the glass cloth layer, the occurrence of blistering in the copper plating layer can be almost suppressed. can. The type of glass cloth used for the substrate, the number of laminated sheets, and the position occupied by the glass cloth layer in the thickness direction of the substrate are almost constant depending on the type of substrate.
Since the condition can be known by inspecting the cut cross section of the substrate, the position of the bottom surface of the recess to be automatically counterbored can be set in advance based on the inspection result.
実験例1
補強材として厚さ0.1mmのガラスクロスを使用した
ガラスエポキシ両面プリント配線基板(厚さ1.6順、
積層クロス枚数10枚)の断面をカットしてガラス布層
の位置を測定したところ、基板上面から4層目のガラス
布層の中心線は基板上面から約0.56mの位置にあり
、その層厚は前記中心線に対しほぼ±0.07rnmで
あった。更に該ガラス布層の上下には約0.02mの厚
さのエポキシ樹脂のみの層があった。上記構造の1枚の
基板に一定深さの50個の方形凹部をザグリ加工し、更
に同じ構造の別の1枚の基板に深さを変えて一定深さの
50個の方形四部をザグリ加工し、こうして1枚毎に深
さを変えて50個の方形凹部をザグリ加工した数枚の基
板を用意した。前記各基板の凹部の底面の位置は4層目
のガラス布層の中心線(基板上面から0.56mの深さ
)の上、同中心線から±0.03M、±0.04am、
±0.06馴、±0.08m1.:設定された。上記凹
部をザグリ加工された各基板に無電解銅メッキ、電解銅
メッキを施し、更に所定の工程を経た後口部底面での銅
メッキのふくれの発生状況を検査したところ第1表に示
す結果を得た。Experimental Example 1 Glass epoxy double-sided printed wiring board using glass cloth with a thickness of 0.1 mm as a reinforcing material (in order of thickness 1.6,
When we measured the position of the glass cloth layer by cutting a cross section of a laminated cloth (10 sheets), we found that the center line of the fourth glass cloth layer from the top of the board was approximately 0.56 m from the top of the board. The thickness was approximately ±0.07 rnm with respect to the center line. Additionally, above and below the glass cloth layer was a layer of epoxy resin only, approximately 0.02 m thick. 50 rectangular recesses of a constant depth are counterbored on one substrate with the above structure, and 50 rectangular recesses of a constant depth are counterbored with different depths on another substrate with the same structure. In this way, several substrates were prepared in which 50 rectangular concave portions were counterbored at different depths for each substrate. The position of the bottom surface of the concave portion of each substrate is above the center line of the fourth glass cloth layer (depth of 0.56 m from the top surface of the substrate), ±0.03 M, ±0.04 am from the same center line,
±0.06mm, ±0.08m1. : Set. Electroless copper plating and electrolytic copper plating were applied to each board with the above-mentioned recesses counter-bored, and the occurrence of blistering in the copper plating on the bottom of the back end after the specified process was inspected. The results are shown in Table 1. I got it.
ふくれ発生率は倍率10倍の拡大鏡により肉眼で判定し
た。凹部底面の銅メッキ層にふくれが1ケあってもふく
れありとみなし、50個の四部の中でふくれ発生とみな
された凹部の個数から発生率を品出した。The blistering rate was determined visually using a 10x magnifying glass. Even if there was one blister in the copper plating layer on the bottom of the recess, it was considered that there was a blister, and the occurrence rate was determined from the number of recesses that were considered to have blisters among the 50 four parts.
実験例2
補強材として厚さ0.1Mのガラスクロス2枚の間に厚
さ0.2rMRのガラスクロス1枚を積層して構成され
たガラスエポキシプリント配線基板(板厚0.4M)の
断面をカッ]−シてガラス布層位置を測定したところ、
基板上面から2層目の厚さ0.2mmのガラス布層の中
心線は基板上面から0.2mの位置にあり、その層厚は
中心線に対しほぼ±0.1#であった。上記構造の1枚
の基板に一定深さの50個の方形四部をザグリ加工し、
更に同じ構造の別の1枚の基板に深さを変えて一定深さ
の50個の方形凹部をザグリ加工し、こうして1枚毎に
深さを変えて50個の方形凹部をザグリ加工した数枚の
基板を用意した。前記各基板の凹部の底面の位置は2層
目のガラス布層の中心線(基板上目から0.2mの深さ
)の上、同中心線から±0.03am、±0.06馴、
±0.07酬、±0.09mに設定された。上記凹部を
ザグリ加工された各基板に無電解銅メッキ、電解銅メッ
キを施し、更に所定の工程を経た後凹部底面での銅メッ
キのふくれの発生状況を検査したところ第2表に示す結
果を得た。Experimental Example 2 Cross section of a glass epoxy printed wiring board (board thickness 0.4M) constructed by laminating one glass cloth with a thickness of 0.2rMR between two sheets of glass cloth with a thickness of 0.1M as a reinforcing material. When I measured the position of the glass cloth layer,
The center line of the second 0.2 mm thick glass cloth layer from the top surface of the substrate was located 0.2 m from the top surface of the substrate, and the layer thickness was approximately ±0.1# with respect to the center line. Counterbore 50 rectangular parts of a certain depth on one board with the above structure,
Furthermore, 50 rectangular recesses of a constant depth were counterbored on another board with the same structure, and in this way, the depth was changed for each board and 50 rectangular recesses were counterbored. A number of boards were prepared. The position of the bottom of the concave portion of each board is above the center line of the second glass cloth layer (0.2 m depth from the top of the board), ±0.03 am, ±0.06 mm from the same center line,
It was set at ±0.07m and ±0.09m. Electroless copper plating and electrolytic copper plating were applied to each board with the above-mentioned recesses counterbore processed, and after passing through the prescribed process, the occurrence of blistering of the copper plating on the bottom of the recesses was inspected, and the results are shown in Table 2. Obtained.
「発明の効果」
本発明はプラスチックPGAにおいて基板の上面に形成
される凹部をザグリ加工するに際してその底面を上述の
如く基板中のガラス布層に位置せしめるようにしたので
四部底面に施されるメッキ層のアンカー効果を増しメッ
キ層のふくれの発生を大幅に減少することができた。特
に凹部の底面をガラス布層の中心線から該ガラス布層の
原厚さの±30%の範囲内に位置せしめたときにはふく
れの発生をほぼ皆無になすことができる。``Effects of the Invention'' The present invention is characterized in that when counterboring the recesses formed on the upper surface of the substrate in a plastic PGA, the bottom surface is positioned on the glass cloth layer in the substrate as described above, so that the plating is applied to the bottom surface of the four parts. It was possible to increase the anchoring effect of the layer and significantly reduce the occurrence of blistering in the plating layer. In particular, when the bottom surface of the recess is located within the range of ±30% of the original thickness of the glass cloth layer from the center line of the glass cloth layer, the occurrence of blisters can be almost completely eliminated.
第1図は本発明によるプラスチックPGAの要部の概要
を示す断面図である。
第2図は本発明によるプラスチックPGAのメッキを施
す前の凹部底面の模様を示ず平面図である。
第3図は第1図の凹部底面付近のメッキ層の状態を拡大
して示す断面図である。
第4図は従来の一般的なプラスチックPGAの要部のR
要を示す断面図である。
第5図は第4図のプラスチックPGAのメッキを施す前
の凹部底面の模様を示す平面図である。
第6図は第4図の凹部底面付近のメッキ層の状態を拡大
して示す断面図である。
1・・・ガラス繊維補強プラスチック基板、2・・・凹
部、3・・・底面、4・・・銅メッキ層、5・・・ガラ
ス布層、6・・・エポキシ樹脂層。FIG. 1 is a sectional view schematically showing the main parts of a plastic PGA according to the present invention. FIG. 2 is a plan view without showing the pattern of the bottom surface of the recess before plating of the plastic PGA according to the present invention. FIG. 3 is an enlarged cross-sectional view showing the state of the plating layer near the bottom of the recess shown in FIG. Figure 4 shows the R of the main part of a conventional general plastic PGA.
It is a sectional view showing the main points. FIG. 5 is a plan view showing the pattern of the bottom surface of the recess before plating of the plastic PGA shown in FIG. 4. FIG. 6 is an enlarged cross-sectional view showing the state of the plating layer near the bottom of the recess shown in FIG. 4. FIG. DESCRIPTION OF SYMBOLS 1... Glass fiber reinforced plastic board, 2... Recessed part, 3... Bottom surface, 4... Copper plating layer, 5... Glass cloth layer, 6... Epoxy resin layer.
Claims (2)
メッキの施される凹部を有するプリント基板用素子部品
において、前記凹部はその底面が前記プラスチック基板
中のガラス布層に位置するようにザグリ加工されたこと
を特徴とするプリント基板用素子部品。(1) In a printed circuit board element component having a recessed portion to be plated in the center of the upper surface of a glass fiber-reinforced plastic substrate, the recessed portion is counterbored so that its bottom surface is located on the glass cloth layer in the plastic substrate. Element parts for printed circuit boards characterized by:
ガラス布層の原厚さの±30%の範囲内にあることを特
徴とする特許請求第(1)項記載のプリント基板用素子
部品。(2) The printed circuit board according to claim (1), wherein the bottom surface of the recess is within a range of ±30% of the original thickness of the glass cloth layer from the center line of the glass cloth layer. Element parts.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16344086A JPS6318646A (en) | 1986-07-11 | 1986-07-11 | Element part for printed board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16344086A JPS6318646A (en) | 1986-07-11 | 1986-07-11 | Element part for printed board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6318646A true JPS6318646A (en) | 1988-01-26 |
Family
ID=15773930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16344086A Pending JPS6318646A (en) | 1986-07-11 | 1986-07-11 | Element part for printed board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6318646A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5228902A (en) * | 1992-09-03 | 1993-07-20 | Usx Corporation | Method of desulfurization in vacuum processing of steel |
JP2007042992A (en) * | 2005-08-05 | 2007-02-15 | Daisho Denshi:Kk | Substrate and its manufacturing method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6239029A (en) * | 1985-08-14 | 1987-02-20 | Matsushita Electric Works Ltd | Semiconductor chip carrier |
JPS62163349A (en) * | 1986-01-13 | 1987-07-20 | Matsushita Electric Works Ltd | Chip carrier for electronic element |
JPS62163348A (en) * | 1986-01-13 | 1987-07-20 | Matsushita Electric Works Ltd | Chip carrier for electronic element |
-
1986
- 1986-07-11 JP JP16344086A patent/JPS6318646A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6239029A (en) * | 1985-08-14 | 1987-02-20 | Matsushita Electric Works Ltd | Semiconductor chip carrier |
JPS62163349A (en) * | 1986-01-13 | 1987-07-20 | Matsushita Electric Works Ltd | Chip carrier for electronic element |
JPS62163348A (en) * | 1986-01-13 | 1987-07-20 | Matsushita Electric Works Ltd | Chip carrier for electronic element |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5228902A (en) * | 1992-09-03 | 1993-07-20 | Usx Corporation | Method of desulfurization in vacuum processing of steel |
JP2007042992A (en) * | 2005-08-05 | 2007-02-15 | Daisho Denshi:Kk | Substrate and its manufacturing method |
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