JPS63183263U - - Google Patents

Info

Publication number
JPS63183263U
JPS63183263U JP6967187U JP6967187U JPS63183263U JP S63183263 U JPS63183263 U JP S63183263U JP 6967187 U JP6967187 U JP 6967187U JP 6967187 U JP6967187 U JP 6967187U JP S63183263 U JPS63183263 U JP S63183263U
Authority
JP
Japan
Prior art keywords
magnetron sputtering
disposed
sputtering device
target
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6967187U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6967187U priority Critical patent/JPS63183263U/ja
Publication of JPS63183263U publication Critical patent/JPS63183263U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP6967187U 1987-05-12 1987-05-12 Pending JPS63183263U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6967187U JPS63183263U (enrdf_load_stackoverflow) 1987-05-12 1987-05-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6967187U JPS63183263U (enrdf_load_stackoverflow) 1987-05-12 1987-05-12

Publications (1)

Publication Number Publication Date
JPS63183263U true JPS63183263U (enrdf_load_stackoverflow) 1988-11-25

Family

ID=30910619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6967187U Pending JPS63183263U (enrdf_load_stackoverflow) 1987-05-12 1987-05-12

Country Status (1)

Country Link
JP (1) JPS63183263U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105908147A (zh) * 2016-07-07 2016-08-31 重庆科技学院 非平衡磁控溅射电极及系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60200956A (ja) * 1984-03-23 1985-10-11 Anelva Corp 放電反応装置
JPS6056762B2 (ja) * 1977-01-12 1985-12-11 大同特殊鋼株式会社 耐高温摩耗性および耐酸化性の優れた多孔質複合焼結材の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6056762B2 (ja) * 1977-01-12 1985-12-11 大同特殊鋼株式会社 耐高温摩耗性および耐酸化性の優れた多孔質複合焼結材の製造方法
JPS60200956A (ja) * 1984-03-23 1985-10-11 Anelva Corp 放電反応装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105908147A (zh) * 2016-07-07 2016-08-31 重庆科技学院 非平衡磁控溅射电极及系统

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