JPS63177518A - パタ−ン形成方法 - Google Patents
パタ−ン形成方法Info
- Publication number
- JPS63177518A JPS63177518A JP957987A JP957987A JPS63177518A JP S63177518 A JPS63177518 A JP S63177518A JP 957987 A JP957987 A JP 957987A JP 957987 A JP957987 A JP 957987A JP S63177518 A JPS63177518 A JP S63177518A
- Authority
- JP
- Japan
- Prior art keywords
- film
- semiconductor substrate
- resist pattern
- resin
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000011347 resin Substances 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 22
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 12
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 230000007261 regionalization Effects 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 5
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 abstract description 3
- 229920001665 Poly-4-vinylphenol Polymers 0.000 abstract description 2
- 239000000908 ammonium hydroxide Substances 0.000 abstract description 2
- 230000007423 decrease Effects 0.000 abstract description 2
- 238000011161 development Methods 0.000 abstract description 2
- 239000012670 alkaline solution Substances 0.000 abstract 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP957987A JPS63177518A (ja) | 1987-01-19 | 1987-01-19 | パタ−ン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP957987A JPS63177518A (ja) | 1987-01-19 | 1987-01-19 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63177518A true JPS63177518A (ja) | 1988-07-21 |
| JPH0511652B2 JPH0511652B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-02-16 |
Family
ID=11724220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP957987A Granted JPS63177518A (ja) | 1987-01-19 | 1987-01-19 | パタ−ン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63177518A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01219740A (ja) * | 1988-02-26 | 1989-09-01 | Mitsubishi Electric Corp | パターン形成方法 |
| JPH0299959A (ja) * | 1988-10-06 | 1990-04-11 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
| JPH0384920A (ja) * | 1989-08-28 | 1991-04-10 | Nec Corp | レジストパターンの現像方法 |
| JPH08211630A (ja) * | 1995-02-06 | 1996-08-20 | Sanken Electric Co Ltd | レジストパタ−ンの形成方法 |
-
1987
- 1987-01-19 JP JP957987A patent/JPS63177518A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01219740A (ja) * | 1988-02-26 | 1989-09-01 | Mitsubishi Electric Corp | パターン形成方法 |
| JPH0299959A (ja) * | 1988-10-06 | 1990-04-11 | Matsushita Electric Ind Co Ltd | パターン形成方法 |
| JPH0384920A (ja) * | 1989-08-28 | 1991-04-10 | Nec Corp | レジストパターンの現像方法 |
| JPH08211630A (ja) * | 1995-02-06 | 1996-08-20 | Sanken Electric Co Ltd | レジストパタ−ンの形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0511652B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |