JPS63175219A - Magnetic recording medium and its production - Google Patents

Magnetic recording medium and its production

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Publication number
JPS63175219A
JPS63175219A JP609387A JP609387A JPS63175219A JP S63175219 A JPS63175219 A JP S63175219A JP 609387 A JP609387 A JP 609387A JP 609387 A JP609387 A JP 609387A JP S63175219 A JPS63175219 A JP S63175219A
Authority
JP
Japan
Prior art keywords
magnetic
rmax
thin film
substrate
surface roughness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP609387A
Other languages
Japanese (ja)
Other versions
JPH0833984B2 (en
Inventor
Jiyouichirou Ezaki
江崎 城一朗
Haruyuki Morita
治幸 森田
Yasushi Uno
宇野 泰史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP62006093A priority Critical patent/JPH0833984B2/en
Publication of JPS63175219A publication Critical patent/JPS63175219A/en
Publication of JPH0833984B2 publication Critical patent/JPH0833984B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To prevent adsorption of a magnetic head by forming a magnetic thin film having 40-100Angstrom surface roughness on a nonmagnetic substrate of <=40Angstrom surface roughness. CONSTITUTION:A magnetic thin film having 40-100Angstrom surface roughness Rmax is formed on a substrate having a super-position surface of <=40Angstrom Rmax. The 40-100Angstrom Rmax is controlled by an effective heat treatment. The Rmax of the magnetic thin film is increased with increase of the heat treatment temperature and the heat treatment time. In such a case, the increase of the treatment temperature is more effective than the increase the treatment time. The heat treatment is carried out at about 300 deg.C. In such a way, the adsorption can be avoided between a magnetic head and the surface of a magnetic thin film.

Description

【発明の詳細な説明】 発明の分野 り装置で使用される表面性の良好な磁気記録媒体に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a magnetic recording medium with good surface properties used in an apparatus.

従来技術 磁気ディスク記憶装置の大容量化に伴って、磁気特性、
記録密度の点で塗布型磁気ディスクより有利なスパッタ
型磁気ディスクが注目されている。
Prior Art As the capacity of magnetic disk storage devices increases, magnetic properties,
Sputter-type magnetic disks, which are more advantageous than coating-type magnetic disks in terms of recording density, are attracting attention.

塗布型磁気ディスクでは磁性層厚が1〜2μ浴程度と比
較的厚いため、ディスク媒体の表面性は基板の表面性に
著しく影響されるということはない〇これに対して、ス
パッタ型磁気ディスクでは磁性層厚がα5μ慣以下と薄
いため、基板の表面性がディスク媒体の表面性に著しく
影響を及ぼす。従って、表面精度の優れた基板を用いる
ことにより、薄膜型磁気ディスク媒体の表面性を向上さ
せることができる。その結果、磁気ヘッドの浮上量を減
少させることができ、記録密度の向上が可能となるO スパッタ型磁気ディスクにおいては、アルミ合金上に5
0μ倶程度のN1−Pめつき層を形成し、この表面を研
磨したもの、あるいは、アルミ合金表面を陽極酸化して
厚さ2μ毒程度のアルマイト硬化層を形成し、さらにア
ルマイト表面を新暦したものを基板としている。これら
の基板では表面粗さく Rxnhx )が115pW’
L程度の表面が得られる。
In coating type magnetic disks, the magnetic layer thickness is relatively thick, about 1 to 2 μm, so the surface properties of the disk medium are not significantly affected by the surface properties of the substrate. In contrast, in sputter type magnetic disks, Since the magnetic layer thickness is as thin as α5μ or less, the surface properties of the substrate significantly affect the surface properties of the disk medium. Therefore, by using a substrate with excellent surface precision, it is possible to improve the surface properties of a thin film magnetic disk medium. As a result, the flying height of the magnetic head can be reduced and the recording density can be improved.
A N1-P plated layer with a thickness of about 0μ is formed and this surface is polished, or an aluminum alloy surface is anodized to form a hardened alumite layer with a thickness of about 2μ, and the alumite surface is polished. The substrate is something. These substrates have a surface roughness (Rxnhx) of 115 pW'.
A surface of about L is obtained.

これらの基板上に磁性薄膜を形成する場合、例えばCo
−Niを主成分とする磁性薄膜を形成する場合には、基
板上にCrをスパッタ成膜し、この上にCo−Niを主
成分とする磁性薄膜を1000A程度スパッタし、更に
C等の保論潤滑膜を200A程度形成する。このように
して得られた媒体の表面は、基板の表面性が反映されて
、表面粗さく Rxnhx )がα15μ惰程度である
。酸化鉄を主成分とする磁性薄膜を形成する場合には、
F・を主成分とするターゲットをA r + Ox雰囲
気中でスパッタし、α−F@203を主成分とするスパ
ッタ膜を基板上に2000A程度成膜する。これを還元
性雰囲気中で500℃程度に加熱し、g−F@!Osを
主成分とする膜をF@304を主成分とする膜とし、更
に酸化性雰囲気中で300℃程度に加熱して、r−F・
gosを主成分とする膜とする。
When forming magnetic thin films on these substrates, for example, Co
- When forming a magnetic thin film mainly composed of Ni, Cr is sputtered on the substrate, a magnetic thin film mainly composed of Co-Ni is sputtered on top of this at about 1000A, and then C etc. A theoretical lubricating film of about 200A is formed. The surface of the medium thus obtained has a surface roughness (Rxnhx) of approximately α15μ, reflecting the surface properties of the substrate. When forming a magnetic thin film whose main component is iron oxide,
A target containing F as a main component is sputtered in an Ar + Ox atmosphere, and a sputtered film containing α-F@203 as a main component is formed on a substrate to a thickness of about 2000 Å. This was heated to about 500°C in a reducing atmosphere and g-F@! A film containing Os as a main component is changed to a film containing F@304 as a main component, and further heated to about 300°C in an oxidizing atmosphere to form r-F.
The film is mainly composed of gos.

この上に更に保W1潤滑膜を形成し媒体としている。A retaining W1 lubricating film is further formed on this to serve as a medium.

このようにして得られた媒体の表面も、基板の表面性が
反映されて、表面粗さく Rmax )がα15pm程
度である。
The surface of the medium thus obtained also has a surface roughness (Rmax) of approximately α15 pm, reflecting the surface properties of the substrate.

アルミ合金上にNt−Pめつき層を形成し、この表面を
研磨した基板においては、N1−Pめつきを行なう前に
アルミ合金表面を活性化処理する必要があり、基板形成
の工程がvI雑となる。また、活性化処理以降の工程が
基板価格の50%以上を占め、基板が割高になる。更に
N1−Pめつき層は150℃以上に加熱すると結晶化し
て磁性を持つようになるため、磁性酸化鉄膜を形成する
時のように加熱工程が必要な場合はこの基板を使用する
ことができない。
For substrates in which an Nt-P plating layer is formed on an aluminum alloy and the surface is polished, it is necessary to activate the aluminum alloy surface before performing N1-P plating, and the process of forming the substrate is It becomes sloppy. Further, the steps after the activation process account for more than 50% of the substrate price, making the substrate relatively expensive. Furthermore, when the N1-P plating layer is heated above 150°C, it crystallizes and becomes magnetic, so this substrate can be used when a heating process is required, such as when forming a magnetic iron oxide film. Can not.

アルミ合金上にアルマイト皮膜を形成した基板は、熱処
理を行なった場合、アルミ合金とアルマイト皮膜との熱
膨張係数の差により発生する応力のためにアなマイト皮
膜にクラックが生じゃすいLl、^kp上↓て七ヱ エ
バ各店m糾功Iし級猫九必虚する際の加熱温度は300
℃程度以下に限定されてしまう。更に、アルマイト皮膜
には多数の通電孔が存在し、多孔質構造となっている。
When a substrate with an alumite film formed on an aluminum alloy is subjected to heat treatment, cracks are likely to occur in the alumite film due to the stress generated due to the difference in thermal expansion coefficient between the aluminum alloy and the alumite film. kp upper ↓ te 7 ヱ The heating temperature for each Eva store m hard work I and class cat 9 is 300
It is limited to temperatures below about ℃. Furthermore, the alumite film has a large number of current-carrying holes and has a porous structure.

そのためこの基体上に薄膜磁性層を形成した場合には通
電孔の部分に磁気的欠陥が生じやすく、また表面精度も
RmaxがQ、15pm程度と充分なものではない。
Therefore, when a thin film magnetic layer is formed on this substrate, magnetic defects are likely to occur in the portions of the conductive holes, and the surface precision is not sufficient as Rmax is Q, about 15 pm.

上記欠点に錯み、本発明イらは表ml粗さく Rmax
 )ように超精密表面加工されたガラス基板上に磁気記
録用磁性薄膜を形成した磁気記録媒体、及び、表面の少
なくとも一部分を強化し、又は表面粗さく Rmax 
)が100A以下(望ましくは50A以下)となるよう
に超精密表面加工されたガラス基板上に磁気記録用磁性
薄膜を形成した磁気記録媒体を冊発し、特許出願を行な
った。(特願昭6O−185022)L、かじ、上記発
明に係わる磁気記録媒体を更に検討したところ、ガラス
基板の表面粗さく Rmax )を40A未満さらには
20A以下として、その上に磁気記録用磁性薄膜を形成
した場合には、磁気ヘッドスライダ−面と磁性薄膜表面
との間で吸着現象が生じることが明らかとなった。
Despite the above drawbacks, the present invention has a rough surface Rmax
), and a magnetic recording medium in which a magnetic thin film for magnetic recording is formed on a glass substrate with an ultra-precision surface processing, and at least a portion of the surface is strengthened or the surface is roughened.
) has been published and a patent application has been filed for a magnetic recording medium in which a magnetic thin film for magnetic recording is formed on a glass substrate whose surface has been processed with ultra-precision so that the current is 100 A or less (preferably 50 A or less). (Patent Application No. 6O-185022) L, Kaji, Further study of the magnetic recording medium according to the above invention revealed that the surface roughness (Rmax) of the glass substrate was set to less than 40A, and even less than 20A, and a magnetic thin film for magnetic recording was formed on the surface roughness (Rmax) of the glass substrate. It has become clear that when a magnetic head slider surface is formed, an adsorption phenomenon occurs between the magnetic head slider surface and the magnetic thin film surface.

すなわち、吸着現象によって磁気ディスクの回転開始時
に磁気ヘッドが短時間に浮上せず、磁気ヘッドスライダ
−面が磁性薄膜表面に接触したままディスクが回転する
ことになり、磁性薄膜表面および磁気ヘッドスライダ−
面が破損されたり、またti着の著しい場合には磁気ヘ
ッドスライダ−面が磁性薄膜表面に吸着したまま動かず
、磁気ディスクの回転起動が不能となるなどの問題が生
じる。
In other words, due to the attraction phenomenon, the magnetic head does not float for a short time when the magnetic disk starts rotating, and the disk rotates while the magnetic head slider surface is in contact with the magnetic thin film surface.
If the surface is damaged or there is significant Ti adhesion, the magnetic head slider surface remains stuck to the magnetic thin film surface and does not move, causing problems such as the inability to start rotation of the magnetic disk.

発明の目的 本発明の目的は、表面精度が高く、かつ磁気ヘッドが吸
着する心配のない磁気記録媒体およびその製造方法を提
供することにある。
OBJECTS OF THE INVENTION An object of the present invention is to provide a magnetic recording medium that has high surface precision and does not have to worry about being attracted by a magnetic head, and a method for manufacturing the same.

発明の構成 磁気ディスクにおいて、記録密度を向上させるには磁気
ヘッドの浮上量を減少させることが有効であり、近年の
ディスク装置においては浮上量を(L2μ偽以下にしよ
うという動きがある。しかし。
Structure of the Invention In magnetic disks, it is effective to reduce the flying height of the magnetic head in order to improve the recording density, and in recent disk drives there is a movement to reduce the flying height to less than (L2μ false).

表面性の良くない磁気ディスクを使用してヘッド浮上量
を減少させると媒体表面の突起に磁気ヘッドが接触して
磁性薄膜が削りとられたり、磁気ヘッドが破壊されてし
まったりする。すなわち媒体の超精密表面性は、磁気ヘ
ッドを安定に浮上させ、この浮上量をどの程度まで小さ
くできるかを決める重要なポイントとなる。
If a magnetic disk with poor surface properties is used and the flying height of the head is reduced, the magnetic head will come into contact with protrusions on the surface of the medium, resulting in the magnetic thin film being scraped off or the magnetic head being destroyed. In other words, the ultra-precise surface properties of the medium are an important point for stably flying the magnetic head and determining how small the flying height can be.

ところが、表面粗さ(Rmax )4 QA以下の超精
密表面を持つ基板上に磁性薄膜を形成した場合には、磁
性薄膜表面も基板の表面性を反訣して超精密表面(表面
粗さ(Rmax)40A以下)となり、前述したように
磁性薄膜と磁気ヘッドの吸着現象が現われる。
However, when a magnetic thin film is formed on a substrate having an ultra-precision surface with a surface roughness (Rmax) of 4 QA or less, the surface of the magnetic thin film also rebels against the surface properties of the substrate, resulting in an ultra-precision surface (surface roughness (Rmax)). (Rmax) 40 A or less), and as described above, the attraction phenomenon between the magnetic thin film and the magnetic head appears.

本発明における磁気記録媒体は、表面粗さ(Rmax)
40λ以下という超精密表面を持った基板を使用してい
るにもかかわらず、磁性薄膜の表面粗さく Rmax 
)は40〜100人であるため磁性薄膜と磁気ヘッドの
吸着が生じず、なおかつ12μ常以下の磁気ヘッド浮上
量を実現できるものである。
The magnetic recording medium in the present invention has a surface roughness (Rmax)
Despite using a substrate with an ultra-precise surface of 40λ or less, the surface roughness of the magnetic thin film is
) is 40 to 100 people, so that the magnetic thin film and the magnetic head do not attract each other, and the flying height of the magnetic head of 12 μm or less can be realized.

磁性薄膜の表面粗さく Rmax )を40〜1ooX
にsixするには、熱処理によって有効に行なうことが
できる。熱処理温度と熱処理時間を増大させることによ
り、磁性薄膜の表面粗さく Rmax )を大きくする
ことができるが、熱処理温度の方がより有効的であり、
300℃前後の温度が使用される。
The surface roughness (Rmax) of the magnetic thin film is 40 to 1ooX
This can be effectively achieved by heat treatment. The surface roughness (Rmax) of the magnetic thin film can be increased by increasing the heat treatment temperature and heat treatment time, but the heat treatment temperature is more effective.
Temperatures around 300°C are used.

本発明で使用されるガラス基板の材料は、硼珪酸ガラス
、アルミノ珪酸ガラス、石英ガラス、チタン珪酸ガラス
等はとんどのガラスが使用可能である。ただし結晶質成
分を含まないガラスが値ましい。これは、結晶粒界の強
度が比較的弱いためメカノケミカル〆リシングを行なっ
た場合結晶粒界が早く研磨されて超精密表面が達成でき
ないためである。
As the material of the glass substrate used in the present invention, almost any glass can be used, such as borosilicate glass, aluminosilicate glass, quartz glass, titanium silicate glass, etc. However, glass that does not contain crystalline components is preferable. This is because the strength of the grain boundaries is relatively weak, so when mechanochemical finishing is performed, the grain boundaries are polished quickly and an ultra-precise surface cannot be achieved.

アルミ合金上にN1−Pめつき層を設けた基板あるいは
アルマイト層を設けた基板では加熱温度に制約があるが
、本発明に係わるガラス基板では400℃程度までは充
分に使用可能なため磁性酸化鉄膜を形成する場合のよう
に加熱工程が必要な場合は特に有効に使用することがで
きる。
For substrates with N1-P plating layer or alumite layer on aluminum alloy, there are restrictions on heating temperature, but the glass substrate according to the present invention can be used up to about 400℃, so magnetic oxidation is possible. It can be used particularly effectively when a heating process is required, such as when forming an iron film.

磁気ディスク装置においては磁気ディスクがt   e
   fj   l’l   ++++  s+=+ 
 t+l#  11%  1i’dl  !’;J  
1二 −w  hq  L  J、、  sh    
 ’Q>  1ぜ sdイスクがそれに耐えるに充分な
強度が要求される。
In a magnetic disk device, the magnetic disk is
fj l'l +++++ s+=+
t+l# 11% 1i'dl! ';J
12 -w hq L J,, sh
'Q>1ze The SD disk must have sufficient strength to withstand it.

このような用途に対してはガラス基板を使用するため強
度の点で心配されるが、本発明者らが鋭意検討した結果
ガラス基板表面の少なくとも一部分を強化することによ
り磁気ディスクとし、て充分な強度を持たせることがで
きることが明らかとなったO 表面強化は一般的にガラス表面のイオンをガラス転移点
以下の温度でより大きなイオンに置換することにより行
なわれる。イオン置換方法としては450℃程度に加熱
した硝酸カリウム溶液塩中にガラスを浸しておくことに
より行なわれる。この置換により第1図に示したように
、表面に急峻な分布を持つ圧縮応力層が形成されJ:9
ス基板表面の強化がなされる。この応力層の゛厚みはイ
オン置換時の温度、時間を制御することにより10〜2
00P偽にする。
For such applications, there are concerns about strength since a glass substrate is used, but as a result of intensive study by the present inventors, it is possible to make a magnetic disk by strengthening at least a portion of the surface of the glass substrate. O 2 surface strengthening, which has been shown to be able to impart strength, is generally carried out by replacing ions on the glass surface with larger ions at a temperature below the glass transition point. The ion replacement method is carried out by immersing the glass in a potassium nitrate solution heated to about 450°C. As a result of this substitution, a compressive stress layer with a steep distribution is formed on the surface as shown in Figure 1.
The surface of the substrate is strengthened. The thickness of this stress layer can be adjusted from 10 to 2 by controlling the temperature and time during ion replacement.
Make 00P false.

表面強化する部分としては、磁気ディスクで考えると、
内径縁部、内径縁部周辺、外径縁部、外径kl!寵固切
−これちの摘出か釦を廿−仝而かνh工考えられる。
When considering magnetic disks, the areas where the surface should be strengthened are:
Inner diameter edge, inner diameter edge periphery, outer diameter edge, outer diameter kl! I can think of cutting off the button or removing the button.

以下、本発明を実施例によりさらに詳細に説明する。Hereinafter, the present invention will be explained in more detail with reference to Examples.

〔実施例1〕 アルミノ珪酸ガラスを基板として使用した。形状は、外
形15Qwm、内径4Qsss、厚さt911mの円板
状である。このガラス基板をコロイダルシリカを含む研
磨液を使用してメカノケミカルボリジングを20分間行
なった。表面粗さく Rmax )は55λであった。
[Example 1] Aluminosilicate glass was used as a substrate. The shape is a disc with an outer diameter of 15Qwm, an inner diameter of 4Qsss, and a thickness of t911m. This glass substrate was subjected to mechanochemical boring for 20 minutes using a polishing liquid containing colloidal silica. The surface roughness (Rmax) was 55λ.

この基板上にCr薄膜をスパッタ法により2000X形
成し、更にCo−20vt%N1磁性薄膜を形成した。
A 2000X Cr thin film was formed on this substrate by sputtering, and a Co-20vt%N1 magnetic thin film was further formed.

゛この磁性uPA表面の粗さく Rmay )は基板と
同じで55人であり、磁性薄膜とヘッドの吸着現象が認
められた。
The roughness (Rmay) of this magnetic UPA surface was 55, the same as that of the substrate, and an adsorption phenomenon between the magnetic thin film and the head was observed.

この磁気ディスクについて、磁性薄膜の表面粗さく R
max )を調整する目的で、窒素雰凹気中、各温度で
1時間熱処理した。このときの磁性*iの表面粗さく 
Rmax )の変化を第1図に示した。また、熱処理後
のディスクに関し、磁気ヘッドの浮上安定性を調べ、浮
上量を減少させてゆき安定に浮上する限界浮上量も第1
図に示しである。同図かられかるように、磁性薄膜の表
面粗さく Rrn*x )を40〜100Aに調核する
ことにより、Q、2μm以下の浮上量で安定に磁気ヘッ
ドを浮上させることができ、しかも、磁気ヘッドと磁性
薄膜表面との吸着現象を生じない磁気ディスクを得るこ
とができる。
Regarding this magnetic disk, the surface roughness of the magnetic thin film R
max), heat treatment was performed at each temperature for 1 hour in a nitrogen atmosphere. The surface roughness of magnetic *i at this time
Figure 1 shows the changes in Rmax). In addition, we investigated the flying stability of the magnetic head for the disk after heat treatment, and as the flying height was reduced, the critical flying height for stable flying was determined to be the first.
It is shown in the figure. As can be seen from the figure, by tuning the surface roughness (Rrn*x) of the magnetic thin film to 40 to 100 A, it is possible to stably levitate the magnetic head with a flying height of Q, 2 μm or less. It is possible to obtain a magnetic disk that does not cause the phenomenon of attraction between the magnetic head and the surface of the magnetic thin film.

〔実施例2〕 実施例1と同じガラス基板を30分間メカノケミカルボ
リジングを行なったところ、表面粗さく Rxn*x 
)が171となった。
[Example 2] When the same glass substrate as in Example 1 was subjected to mechanochemical boring for 30 minutes, the surface roughness was found to be Rxn*x
) became 171.

この基板上に実施例1と同様にCr薄膜、Co−20v
t%N1磁性薄膜を順次形成し、更に熱処理し、磁性薄
膜の表面粗さく Rmax )の変化、および磁気ヘッ
ドの浮上安定性について調べ、結果を第2図に示した。
On this substrate, as in Example 1, a Cr thin film and a Co-20v
t%N1 magnetic thin films were sequentially formed and further heat treated, and changes in surface roughness (Rmax) of the magnetic thin films and flying stability of the magnetic head were investigated. The results are shown in FIG.

第6図には表面粗さの測定例を示した。第3図(a)は
C・−20vt%N1磁性傳瞑の成膜後、熱処理する前
の表面粗さ測定結果であり、第3図(b)はこれを30
0℃1時間熱処理した後の表面粗さ測定結果である。図
2の結果から、実施例1と同様に、磁性薄膜の表面粗さ
(Rmax)を40〜100Aに調整することにより、
α2ptn以下の浮上量で安定に吸着なしに磁気ヘッド
を浮上させることができる。
FIG. 6 shows an example of surface roughness measurement. Figure 3 (a) shows the surface roughness measurement results after the film formation of C.
This is the surface roughness measurement result after heat treatment at 0° C. for 1 hour. From the results in FIG. 2, as in Example 1, by adjusting the surface roughness (Rmax) of the magnetic thin film to 40 to 100A,
The magnetic head can be stably floated with a flying height of α2ptn or less without being attracted.

また、基板の表面粗さく Rmax )が20Å以下で
ある実施例では、基板の表面粗さく Rmax )が4
0Å以下である実施例1に比べて浮上量を小さくするこ
とができ、より有利であることもわかる。
In addition, in an example in which the surface roughness (Rmax) of the substrate is 20 Å or less, the surface roughness (Rmax) of the substrate is 4
It can also be seen that the flying height can be made smaller than in Example 1, which is 0 Å or less, which is more advantageous.

また、磁性N膜の表面粗さく Rmax )を50〜8
0人に調整するには、500℃前後の手ごろな温度で熱
処理すればよく、また、磁気ヘッドの浮上量もこの領域
では比較的小さくすることができ、より有効に使用され
る。
In addition, the surface roughness (Rmax) of the magnetic N film is 50 to 8
In order to adjust the magnetic head to zero, it is sufficient to perform heat treatment at a reasonable temperature of around 500° C., and the flying height of the magnetic head can also be made relatively small in this region, so that it can be used more effectively.

〔実施例3〕 ガラス基板材料としてアルミノ珪酸ガラスを使用した。[Example 3] Aluminosilicate glass was used as the glass substrate material.

形状は実施例1と同じの円板状である。The shape is the same as in Example 1, which is a disk shape.

このガラス基板の表面強化した。強化しない部分にはマ
スクを施し、硝酸カリウム溶融塩を450℃にし、その
中に10時間浸すことにより行なつf=、旬!?、’M
TJjLは160μ鴨である。この基板をコロイダルシ
リカを含む研磨液を使用してメカノケミカルボリジング
を30分間行なった。基板の表面粗さく Rmax )
はほぼ同一で17人であった。
The surface of this glass substrate was strengthened. This is done by applying a mask to the areas that are not to be strengthened, and soaking them in molten potassium nitrate salt at 450℃ for 10 hours. ? ,'M
TJjL is 160μ duck. This substrate was subjected to mechanochemical boring for 30 minutes using a polishing liquid containing colloidal silica. Substrate surface roughness Rmax)
There were 17 people, almost the same.

この上に、実施例1と同様にCr薄膜、次いでCo −
20w*%−N 1磁性薄膜を順次形成し、更に熱処理
し、磁性薄膜の表面粗さく Rmax )の変化、およ
び浮上安定性を調べたところ、熱処理の前後で実施例2
の第2図と実質的に変わらな5い結果を得た。なお、本
例の基板の強度については先きに引用した先願で立証済
みである。
On top of this, a Cr thin film was applied as in Example 1, and then a Co-
20w*%-N1 magnetic thin films were sequentially formed and further heat treated, and changes in the surface roughness (Rmax) of the magnetic thin films and flying stability were investigated. Example 2 was found before and after heat treatment.
We obtained results that were substantially the same as those shown in Figure 2. The strength of the substrate in this example has been proven in the earlier application cited above.

4図面の簡単な説明 第1図は本発明の実施例1に於る記録媒体の熱処理温度
と磁性面の表面粗さ及び浮上量の関係を示すグラフ、第
2図は本発明の実施例2に於る同様な関係を示すグラフ
、第5図は表面粗さを示し、(1)は熱処理前及び(b
)は熱処理後の磁性面の表面粗さを示す。
4 Brief Description of the Drawings FIG. 1 is a graph showing the relationship between the heat treatment temperature of the recording medium, the surface roughness of the magnetic surface, and the flying height in Example 1 of the present invention, and FIG. 2 is a graph showing the relationship between Example 2 of the present invention. A graph showing a similar relationship in Figure 5 shows surface roughness, (1) before heat treatment and (b)
) indicates the surface roughness of the magnetic surface after heat treatment.

第1図 賓刃妃スユ土1五ハj(’C) 第2図Figure 1 Binbahi Suyu earth 15 haj ('C) Figure 2

Claims (8)

【特許請求の範囲】[Claims] (1)非磁性基板上に磁性薄膜を形成してなる磁気記録
媒体において、非磁性基板の表面粗さ(Rmax)が4
0Å未満であり、磁性薄膜の表面粗さ(Rmax)が4
0〜100Åであることを特徴とする磁気記録媒体。
(1) In a magnetic recording medium formed by forming a magnetic thin film on a non-magnetic substrate, the surface roughness (Rmax) of the non-magnetic substrate is 4
less than 0 Å, and the surface roughness (Rmax) of the magnetic thin film is 4
A magnetic recording medium characterized in that it has a thickness of 0 to 100 Å.
(2)非磁性基板の表面粗さ(Rmax)が20Å以下
であることを特徴とする特許請求の範囲第1項記載の磁
気記録媒体。
(2) The magnetic recording medium according to claim 1, wherein the nonmagnetic substrate has a surface roughness (Rmax) of 20 Å or less.
(3)非磁性基板がその表面の少なくとも1部分が強化
されたガラス基板であることを特徴とする特許請求の範
囲第1項および第2項記載の磁気記録媒体。
(3) The magnetic recording medium according to claims 1 and 2, wherein the nonmagnetic substrate is a glass substrate with at least a portion of its surface reinforced.
(4)磁性薄膜の表面粗さ(Rmax)が50〜80Å
であることを特徴とする特許請求の範囲第1項ないし第
3項に記載の磁気記録媒体。
(4) Surface roughness (Rmax) of magnetic thin film is 50 to 80 Å
A magnetic recording medium according to any one of claims 1 to 3, characterized in that:
(5)表面粗さ(Rmax)が40Å以下の非磁性基板
上に磁性薄膜を形成した後、熱処理することにより磁性
薄膜の表面粗さ(Rmax)を40〜100Åに調整す
ることを特徴とする磁気記録媒体の製造方法。
(5) After forming a magnetic thin film on a non-magnetic substrate with a surface roughness (Rmax) of 40 Å or less, the surface roughness (Rmax) of the magnetic thin film is adjusted to 40 to 100 Å by heat treatment. A method for manufacturing a magnetic recording medium.
(6)非磁性基板の表面粗さ(Rmax)が20Å以下
であることを特徴とする特許請求の範囲第5項記載の磁
気記録媒体の製造方法。
(6) The method for manufacturing a magnetic recording medium according to claim 5, wherein the surface roughness (Rmax) of the nonmagnetic substrate is 20 Å or less.
(7)非磁性基板がその表面の少なくとも1部分が強化
されたガラス基板であることを特徴とする特許請求の範
囲第5項および第6項記載の磁気記録媒体の製造方法。
(7) The method of manufacturing a magnetic recording medium according to claims 5 and 6, wherein the nonmagnetic substrate is a glass substrate having at least a portion of its surface reinforced.
(8)磁性薄膜の表面粗さ(Rmax)が50〜80Å
となるように熱処理条件を選ぶことを特徴とする特許請
求の範囲第5項ないし第7項に記載の磁気記録媒体の製
造方法。
(8) Surface roughness (Rmax) of magnetic thin film is 50 to 80 Å
8. The method of manufacturing a magnetic recording medium according to claim 5, wherein the heat treatment conditions are selected so that the following results are obtained.
JP62006093A 1987-01-16 1987-01-16 Magnetic recording medium and method of manufacturing the same Expired - Lifetime JPH0833984B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62006093A JPH0833984B2 (en) 1987-01-16 1987-01-16 Magnetic recording medium and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62006093A JPH0833984B2 (en) 1987-01-16 1987-01-16 Magnetic recording medium and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPS63175219A true JPS63175219A (en) 1988-07-19
JPH0833984B2 JPH0833984B2 (en) 1996-03-29

Family

ID=11628902

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH0833984B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094896A (en) * 1989-11-08 1992-03-10 Tdk Corporation Magnetic recording medium comprising a glass substrate having a magnetic thin film of γ Fe2 O3 which layer has a resistivity of from 0.03 to 3 Ω-cm

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61240429A (en) * 1985-04-17 1986-10-25 Sony Corp Magnetic recording medium
JPS61246380A (en) * 1985-04-23 1986-11-01 Nec Corp Production of magnetic disk substrate
JPS62256216A (en) * 1986-04-28 1987-11-07 Hoya Corp Magnetic recording medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61240429A (en) * 1985-04-17 1986-10-25 Sony Corp Magnetic recording medium
JPS61246380A (en) * 1985-04-23 1986-11-01 Nec Corp Production of magnetic disk substrate
JPS62256216A (en) * 1986-04-28 1987-11-07 Hoya Corp Magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5094896A (en) * 1989-11-08 1992-03-10 Tdk Corporation Magnetic recording medium comprising a glass substrate having a magnetic thin film of γ Fe2 O3 which layer has a resistivity of from 0.03 to 3 Ω-cm

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Publication number Publication date
JPH0833984B2 (en) 1996-03-29

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