JPS63172420A - 光cvd装置における光源の設置構造 - Google Patents
光cvd装置における光源の設置構造Info
- Publication number
- JPS63172420A JPS63172420A JP311787A JP311787A JPS63172420A JP S63172420 A JPS63172420 A JP S63172420A JP 311787 A JP311787 A JP 311787A JP 311787 A JP311787 A JP 311787A JP S63172420 A JPS63172420 A JP S63172420A
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- lamp house
- quartz window
- light source
- purge gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP311787A JPS63172420A (ja) | 1987-01-12 | 1987-01-12 | 光cvd装置における光源の設置構造 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP311787A JPS63172420A (ja) | 1987-01-12 | 1987-01-12 | 光cvd装置における光源の設置構造 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63172420A true JPS63172420A (ja) | 1988-07-16 |
| JPH0530298B2 JPH0530298B2 (enExample) | 1993-05-07 |
Family
ID=11548410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP311787A Granted JPS63172420A (ja) | 1987-01-12 | 1987-01-12 | 光cvd装置における光源の設置構造 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63172420A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0237744A (ja) * | 1988-07-27 | 1990-02-07 | Tokyo Electron Ltd | 搬送装置 |
-
1987
- 1987-01-12 JP JP311787A patent/JPS63172420A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0237744A (ja) * | 1988-07-27 | 1990-02-07 | Tokyo Electron Ltd | 搬送装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0530298B2 (enExample) | 1993-05-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7456109B2 (en) | Method for cleaning substrate processing chamber | |
| US5650013A (en) | Layer member forming method | |
| US4811684A (en) | Photo CVD apparatus, with deposition prevention in light source chamber | |
| KR100491128B1 (ko) | 기판 처리장치 및 반도체 장치의 제조방법 | |
| JP2002100571A (ja) | 処理装置及び処理方法 | |
| JPH03230522A (ja) | タングステンの選択的付着方法 | |
| KR102360038B1 (ko) | 낙하 입자 결함들을 감소시키기 위한 바닥부 펌프 및 퍼지 및 바닥부 오존 세정 하드웨어 | |
| JP2005064018A (ja) | 熱処理装置 | |
| KR950007966B1 (ko) | 진공막 형성장치 | |
| JP2752235B2 (ja) | 半導体基板の製造方法 | |
| JPS63172420A (ja) | 光cvd装置における光源の設置構造 | |
| JP3174787B2 (ja) | 光cvd装置 | |
| JP2983084B2 (ja) | 薄膜形成方法および、この方法を用いた真空成膜装置 | |
| JP2006009073A (ja) | 熱cvd装置 | |
| JPH0689455B2 (ja) | 薄膜形成方法 | |
| JPH03104867A (ja) | Cvd装置 | |
| JPS63938B2 (enExample) | ||
| JPH0610673Y2 (ja) | 光cvd装置 | |
| JPH04254489A (ja) | 減圧cvd装置 | |
| TW202505660A (zh) | 組合式減壓高真空處理腔室 | |
| JPH03268320A (ja) | 光cvd装置 | |
| JPH08262251A (ja) | 光導波路成膜装置 | |
| JPH03291381A (ja) | 縦型cvd装置 | |
| JPS63299115A (ja) | 気相成長装置 | |
| JPH06140335A (ja) | 成膜装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |