JPS63164316A - アライメントマ−クの形成方法 - Google Patents

アライメントマ−クの形成方法

Info

Publication number
JPS63164316A
JPS63164316A JP61308704A JP30870486A JPS63164316A JP S63164316 A JPS63164316 A JP S63164316A JP 61308704 A JP61308704 A JP 61308704A JP 30870486 A JP30870486 A JP 30870486A JP S63164316 A JPS63164316 A JP S63164316A
Authority
JP
Japan
Prior art keywords
alignment mark
patterns
alignment
alignment marks
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61308704A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0567050B2 (enrdf_load_html_response
Inventor
Hiroyuki Funatsu
舟津　博幸
Miyoshi Aizawa
相澤　美由
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP61308704A priority Critical patent/JPS63164316A/ja
Publication of JPS63164316A publication Critical patent/JPS63164316A/ja
Publication of JPH0567050B2 publication Critical patent/JPH0567050B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61308704A 1986-12-26 1986-12-26 アライメントマ−クの形成方法 Granted JPS63164316A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61308704A JPS63164316A (ja) 1986-12-26 1986-12-26 アライメントマ−クの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61308704A JPS63164316A (ja) 1986-12-26 1986-12-26 アライメントマ−クの形成方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP21085494A Division JP2614418B2 (ja) 1994-09-05 1994-09-05 アライメントマーク

Publications (2)

Publication Number Publication Date
JPS63164316A true JPS63164316A (ja) 1988-07-07
JPH0567050B2 JPH0567050B2 (enrdf_load_html_response) 1993-09-24

Family

ID=17984275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61308704A Granted JPS63164316A (ja) 1986-12-26 1986-12-26 アライメントマ−クの形成方法

Country Status (1)

Country Link
JP (1) JPS63164316A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188404A (ja) * 2008-02-01 2009-08-20 Asml Netherlands Bv アラインメントマーク及びこのようなアラインメントマークを備える基板の位置合わせ方法
JP2009200489A (ja) * 2008-02-21 2009-09-03 Asml Netherlands Bv 粗ウェーハ位置合わせ用マーク構造及びこのようなマーク構造の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5617017A (en) * 1979-07-20 1981-02-18 Nippon Kogaku Kk <Nikon> Positioning device using bidirectional diffraction grating

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5617017A (en) * 1979-07-20 1981-02-18 Nippon Kogaku Kk <Nikon> Positioning device using bidirectional diffraction grating

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188404A (ja) * 2008-02-01 2009-08-20 Asml Netherlands Bv アラインメントマーク及びこのようなアラインメントマークを備える基板の位置合わせ方法
US8208121B2 (en) 2008-02-01 2012-06-26 Asml Netherlands B.V. Alignment mark and a method of aligning a substrate comprising such an alignment mark
JP2009200489A (ja) * 2008-02-21 2009-09-03 Asml Netherlands Bv 粗ウェーハ位置合わせ用マーク構造及びこのようなマーク構造の製造方法
US8080462B2 (en) 2008-02-21 2011-12-20 Asml Netherlands B.V. Mark structure for coarse wafer alignment and method for manufacturing such a mark structure

Also Published As

Publication number Publication date
JPH0567050B2 (enrdf_load_html_response) 1993-09-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term