JPS63162525U - - Google Patents
Info
- Publication number
- JPS63162525U JPS63162525U JP5336487U JP5336487U JPS63162525U JP S63162525 U JPS63162525 U JP S63162525U JP 5336487 U JP5336487 U JP 5336487U JP 5336487 U JP5336487 U JP 5336487U JP S63162525 U JPS63162525 U JP S63162525U
- Authority
- JP
- Japan
- Prior art keywords
- processing table
- plate
- utility
- manner
- model registration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 1
Description
第1図はこの考案の一実施例であるレジスト処
理装置の主要部における概略構成を示す断面図、
第2図は従来のレジスト処理装置の主要部の概略
を示す断面図である。
図中、4:被処理物、5:灯体、6:ランプ、
7:集光ミラー、8:板状加熱部材、10:上板
、11:下板、12:ネジ、13:冷却管、20
:処理台。
FIG. 1 is a sectional view showing a schematic configuration of the main parts of a resist processing apparatus which is an embodiment of the invention;
FIG. 2 is a sectional view schematically showing the main parts of a conventional resist processing apparatus. In the figure, 4: object to be treated, 5: lamp body, 6: lamp,
7: Concentrating mirror, 8: Plate heating member, 10: Upper plate, 11: Lower plate, 12: Screw, 13: Cooling pipe, 20
: Processing table.
Claims (1)
により処理するレジスト処理装置において、前記
処理台は板状加熱部材をサンドイツチ状に挾持す
る状態で内蔵することを特徴とするレジスト処理
装置。 (2) 前記処理台は上板及び下板とよりなり、該
上板に冷却管及び被処理物の真空吸着孔が穿設さ
れてなることを特徴とする実用新案登録請求の範
囲第(1)項記載のレジスト処理装置。[Claims for Utility Model Registration] (1) In a resist processing apparatus that is equipped with a processing table and processes by light irradiation and/or heating, the processing table is built in such a manner that it holds a plate-shaped heating member in a sandwich-like manner. A resist processing device characterized by: (2) Utility model registration claim No. 1, characterized in that the processing table consists of an upper plate and a lower plate, and the upper plate is provided with cooling pipes and vacuum suction holes for the processed material. ) The resist processing apparatus described in item 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5336487U JPS63162525U (en) | 1987-04-10 | 1987-04-10 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5336487U JPS63162525U (en) | 1987-04-10 | 1987-04-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63162525U true JPS63162525U (en) | 1988-10-24 |
Family
ID=30879359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5336487U Pending JPS63162525U (en) | 1987-04-10 | 1987-04-10 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63162525U (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5729316A (en) * | 1980-07-29 | 1982-02-17 | Kyushu Nippon Electric | Post-bake oven |
JPS6113590A (en) * | 1984-06-29 | 1986-01-21 | 坂口電熱株式会社 | Mica heater |
JPS6123321A (en) * | 1984-07-11 | 1986-01-31 | Toshiba Corp | Semiconductor wafer baking apparatus |
JPS6269616A (en) * | 1985-09-24 | 1987-03-30 | Nec Corp | Semiconductor manufacturing equipment |
-
1987
- 1987-04-10 JP JP5336487U patent/JPS63162525U/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5729316A (en) * | 1980-07-29 | 1982-02-17 | Kyushu Nippon Electric | Post-bake oven |
JPS6113590A (en) * | 1984-06-29 | 1986-01-21 | 坂口電熱株式会社 | Mica heater |
JPS6123321A (en) * | 1984-07-11 | 1986-01-31 | Toshiba Corp | Semiconductor wafer baking apparatus |
JPS6269616A (en) * | 1985-09-24 | 1987-03-30 | Nec Corp | Semiconductor manufacturing equipment |
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