JPS63159063A - Thermal printing head - Google Patents
Thermal printing headInfo
- Publication number
- JPS63159063A JPS63159063A JP61306525A JP30652586A JPS63159063A JP S63159063 A JPS63159063 A JP S63159063A JP 61306525 A JP61306525 A JP 61306525A JP 30652586 A JP30652586 A JP 30652586A JP S63159063 A JPS63159063 A JP S63159063A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- irradiated
- transparent electrode
- abrasion
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007651 thermal printing Methods 0.000 title claims abstract description 7
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 abstract description 5
- 238000005299 abrasion Methods 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 3
- 238000000926 separation method Methods 0.000 abstract description 3
- 238000007639 printing Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 238000010276 construction Methods 0.000 abstract 3
- 238000010030 laminating Methods 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- HWEYZGSCHQNNEH-UHFFFAOYSA-N silicon tantalum Chemical compound [Si].[Ta] HWEYZGSCHQNNEH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Landscapes
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
【発明の目的〕
(産業上の利用分野)
本発明はプリンタ、ファクシミリ等の各種感熱記録方式
に使用される熱印刷ヘッドに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a thermal printing head used in various thermal recording systems such as printers and facsimiles.
(従来の技術)
従来の熱印刷ヘッドは微小な発熱抵抗体素子を一列また
はマトリクス状に配置し、その中から特定の発熱抵抗体
を選択して電気信号の情報を文字、記号等に視覚化する
ものである。(Prior art) A conventional thermal printing head arranges minute heating resistor elements in a line or matrix, selects a specific heating resistor from among them, and visualizes electrical signal information in characters, symbols, etc. It is something to do.
発熱素子の代表的な構成は第2図に示すようにグレーズ
ドアルミナ基板6上にシリコン・タンタル系や酸化ルテ
ニウム系等の発熱抵抗体7を形成し、その上に対向電極
8と耐摩耗層9を形成したものである。この構成では素
子分離のため大面積にわたる電極のバターニングが必要
となり、エツチングの歩留りが悪いという欠点があった
。A typical configuration of a heating element is as shown in FIG. 2, in which a heating resistor 7 made of silicon tantalum or ruthenium oxide is formed on a glazed alumina substrate 6, and a counter electrode 8 and a wear-resistant layer 9 are formed on the heating resistor 7. was formed. This configuration requires patterning of electrodes over a large area for element isolation, and has the drawback of poor etching yield.
(発明が解決しようとする問題点)
よって本発明の目的は、素子分離の工程を含まず構成が
比較的簡単で、従って歩留りの良好な熱印刷ヘッドを提
供することにある。(Problems to be Solved by the Invention) Therefore, an object of the present invention is to provide a thermal printing head that does not include the step of element separation, has a relatively simple structure, and therefore has a good yield.
(問題点を解決するための手段)
本発明は、光照射により抵抗値の低下する発熱抵抗体と
、該抵抗体をはさみ、少なくとも一方は透明電極とする
一対の電極と耐摩耗層とを積層型に構成したものである
。(Means for Solving the Problems) The present invention comprises a heating resistor whose resistance value decreases when irradiated with light, a pair of electrodes sandwiching the resistor, at least one of which is a transparent electrode, and a wear-resistant layer. It is constructed in a mold.
前記電極間に電圧を印加した状態において透明電極側か
ら所望の位置に光を照射し、発熱抵抗体の被照射部の通
電による発熱で、耐摩耗層側において、感熱紙に情報を
記録する。With a voltage applied between the electrodes, light is irradiated from the transparent electrode side to a desired position, and information is recorded on the thermal paper on the abrasion-resistant layer side by heat generated by energization of the irradiated portion of the heating resistor.
(作 用)
本発明の構成によれば、素子分離が不要で駆動用電源が
1つとなり、製造工程が簡単になるとともに、任意場所
に記録できるため解像度を向上する。(Function) According to the configuration of the present invention, there is no need to separate elements and only one power source is required for driving, which simplifies the manufacturing process and improves resolution because recording can be performed at any location.
(実 施 例) 以下に本発明の実施例を第1図を参照にして説明する。(Example) Embodiments of the present invention will be described below with reference to FIG.
ガラス基板1に透明電極としてx’rog2をスパッタ
リング等で成膜する。その上にオーミック接触がとりや
すいようにn+a−Si/i−a−Si/n◆a−5L
の構成でCVD等により光導電層3を形成する。li光
導電層は光照射により抵抗値は101Ω・儂から10’
Ω・■に低下する。さらに、この上に金属電極4とSI
C等の耐摩耗層5を設ける。A film of x'log2 is formed as a transparent electrode on the glass substrate 1 by sputtering or the like. On top of that, n+a-Si/ia-a-Si/n◆a-5L
A photoconductive layer 3 is formed by CVD or the like with the following structure. The resistance value of the li photoconductive layer decreases from 101Ω to 10' by light irradiation.
It decreases to Ω・■. Furthermore, metal electrode 4 and SI
A wear-resistant layer 5 made of C or the like is provided.
前記金属電極上に、感熱紙を接触させ、波長7801I
醜のGaAJ!As半導体レーザを、透明電極側から照
射し、感熱紙上に所望の画像を記録した。この時の印加
電圧は20Vで、レーザの出力は5mV、印字速度は1
0””sac/脂議であった−〔発明の効果〕
本発明の構成によれば素子分離が不要で駆動用電源が1
つとなり製造工程が簡単になるとともに。A thermal paper is brought into contact with the metal electrode, and a wavelength of 7801I is applied.
Ugly GaAJ! An As semiconductor laser was irradiated from the transparent electrode side to record a desired image on the thermal paper. The applied voltage at this time was 20V, the laser output was 5mV, and the printing speed was 1
[Effects of the Invention] According to the configuration of the present invention, element isolation is unnecessary and the drive power supply is reduced to one.
This also simplifies the manufacturing process.
任意場所に記録できるため、解像度が向上する。The resolution is improved because it can be recorded in any location.
第1図はこの発明の実施例を示す断面図、第2図は従来
例の断面図である。
1・・・ガラス基板 2・・・透明電極3・・・
光照射により低抵抗化する発熱抵抗体4・・・金属電極
5・・・グレーズドアルミナ基板
6・・・電極 7・・・発熱抵抗体代理人
弁理士 則 近 憲 佑
同 竹 花 喜久男FIG. 1 is a sectional view showing an embodiment of the present invention, and FIG. 2 is a sectional view of a conventional example. 1...Glass substrate 2...Transparent electrode 3...
Heat generating resistor whose resistance decreases when irradiated with light 4...Metal electrode 5...Glazed alumina substrate 6...Electrode 7...Heating resistor representative Patent attorney Noriyuki Chika Yudo Kikuo Takehana
Claims (2)
報記録部に配置して構成したことを特徴とする熱印刷ヘ
ッド。(1) A thermal printing head comprising an inventive resistor whose resistance value changes when irradiated with light and arranged in an information recording section.
^+a−Siの構成の光導電層としたことを特徴とする
特許請求の範囲第1項記載の熱印刷ヘッド。(2) The heating resistor is n^+a-Si/ia-a-Si/n
The thermal printing head according to claim 1, characterized in that the photoconductive layer has a structure of ^+a-Si.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61306525A JPS63159063A (en) | 1986-12-24 | 1986-12-24 | Thermal printing head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61306525A JPS63159063A (en) | 1986-12-24 | 1986-12-24 | Thermal printing head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63159063A true JPS63159063A (en) | 1988-07-01 |
Family
ID=17958074
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61306525A Pending JPS63159063A (en) | 1986-12-24 | 1986-12-24 | Thermal printing head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63159063A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0435284A2 (en) * | 1989-12-27 | 1991-07-03 | Mitsubishi Denki Kabushiki Kaisha | Image recording system |
US5262800A (en) * | 1989-08-15 | 1993-11-16 | Minnesota Mining And Manufacturing Company | Thermal imaging system |
US5486857A (en) * | 1989-08-15 | 1996-01-23 | Minnesota Mining And Manufacturing Company | Thermal imaging system |
-
1986
- 1986-12-24 JP JP61306525A patent/JPS63159063A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5262800A (en) * | 1989-08-15 | 1993-11-16 | Minnesota Mining And Manufacturing Company | Thermal imaging system |
US5486857A (en) * | 1989-08-15 | 1996-01-23 | Minnesota Mining And Manufacturing Company | Thermal imaging system |
EP0435284A2 (en) * | 1989-12-27 | 1991-07-03 | Mitsubishi Denki Kabushiki Kaisha | Image recording system |
EP0435284A3 (en) * | 1989-12-27 | 1993-03-17 | Mitsubishi Denki Kabushiki Kaisha | Image recording system and image signal processing system |
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