JPS6314409A - Laminated magnetic material film - Google Patents
Laminated magnetic material filmInfo
- Publication number
- JPS6314409A JPS6314409A JP15781686A JP15781686A JPS6314409A JP S6314409 A JPS6314409 A JP S6314409A JP 15781686 A JP15781686 A JP 15781686A JP 15781686 A JP15781686 A JP 15781686A JP S6314409 A JPS6314409 A JP S6314409A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- magnetic material
- film
- intermediate layer
- laminated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000696 magnetic material Substances 0.000 title claims abstract description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 24
- 230000004907 flux Effects 0.000 claims abstract description 22
- 229910052742 iron Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 8
- 238000010884 ion-beam technique Methods 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 229920006395 saturated elastomer Polymers 0.000 abstract 3
- 239000010408 film Substances 0.000 description 49
- 239000010410 layer Substances 0.000 description 27
- 239000000463 material Substances 0.000 description 10
- 230000035699 permeability Effects 0.000 description 6
- 239000011162 core material Substances 0.000 description 5
- 230000005415 magnetization Effects 0.000 description 5
- 238000001659 ion-beam spectroscopy Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 101000723938 Homo sapiens Transcription factor HIVEP3 Proteins 0.000 description 2
- 102100028336 Transcription factor HIVEP3 Human genes 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 238000002128 reflection high energy electron diffraction Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気ヘッド用コア材に係り、更に詳しくは高密
度磁気記録に好適な性能を発揮する磁気ヘッドのコア用
積Ｍ磁性体膵に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a core material for a magnetic head, and more particularly, to a magnetic material with a product M for the core of a magnetic head that exhibits performance suitable for high-density magnetic recording. .
磁気記録の高密度化の進歩は目覚ましく、メタルテープ
の出現によって従来の酸化物テープの保磁力６００〜７
００ｏｅに対して１５００〜２００００ｅのものが得ら
れるようになったにのような高保磁力の磁気記録媒体に
十分記録させるためには高飽和磁束密度を有する磁気へ
ラドコア用磁性体が必要とされる。この磁性体としては
Ｆｃ、Ｃｏ。Progress in increasing the density of magnetic recording has been remarkable, and with the advent of metal tapes, the coercive force of conventional oxide tapes has increased from 600 to 7.
In order to sufficiently record on high coercive force magnetic recording media such as those of 1500 to 20000e compared to 00oe, a magnetic material for magnetic helad cores having a high saturation magnetic flux density is required. . This magnetic material includes Fc and Co.
Ｎｉを主成分とする合金があり、飽和磁束密度１０００
０Ｇ以上、またＦｅ−３ｉ系合金は１８０００Ｇの飽和
磁束密度を持ち、高密度の磁気ヘッド材料として開発が
進められている（特開昭５９−１８２０３８）。There is an alloy whose main component is Ni, and the saturation magnetic flux density is 1000.
Fe-3i alloys have a saturation magnetic flux density of 0G or more, and Fe-3i alloys have a saturation magnetic flux density of 18,000G, and are being developed as high-density magnetic head materials (Japanese Patent Application Laid-Open No. 182038/1983).
従来の磁気記録方法を第１図に示す。磁気記録媒体１は
非磁性基板２の上にパーマロイ等め下地膜３を介して膜
面に垂直方向に磁化容易軸を有するＣ ｏ −Ｃｒ等の
垂直磁化膜４が形成されたものである。磁気ヘッドは主
磁極５および補助磁極９からなり、励磁用コイル１０に
流れる信号電流により主磁極５を磁化し、その先端にの
びる磁極に発生する垂直磁界によって、磁気記録媒体１
の垂直磁化ＷＡ４に信号を記録する。したがって、急峻
な分布をなす垂直成分磁界を得るためには主磁極５の先
端部の厚さは０．５μｍ以下にする必要がある。この部
分では磁束密度が高くなるので、高飽和磁束密度でかつ
高透磁率の磁性薄膜が必要になる。しかし、主磁極膜が
薄いために磁気飽和が生じるので、０．５μｍ以下の膜
厚に対して１５０００Ｇ以上の高飽和磁束密度が必要と
されている。A conventional magnetic recording method is shown in FIG. The magnetic recording medium 1 has a perpendicularly magnetized film 4 made of Co--Cr or the like having an axis of easy magnetization perpendicular to the film surface, formed on a non-magnetic substrate 2 with an underlayer 3 made of Permalloy or the like interposed therebetween. The magnetic head consists of a main magnetic pole 5 and an auxiliary magnetic pole 9. The main magnetic pole 5 is magnetized by a signal current flowing through an exciting coil 10, and the magnetic recording medium 1 is magnetized by a perpendicular magnetic field generated in a magnetic pole extending from the tip.
A signal is recorded on the perpendicular magnetization WA4. Therefore, in order to obtain a vertical component magnetic field with a steep distribution, the thickness of the tip of the main pole 5 needs to be 0.5 μm or less. Since the magnetic flux density is high in this part, a magnetic thin film with high saturation magnetic flux density and high magnetic permeability is required. However, since magnetic saturation occurs because the main pole film is thin, a high saturation magnetic flux density of 15,000 G or more is required for a film thickness of 0.5 μm or less.
このような高飽和磁束密度、高透磁率を目的とした磁性
体膜として近年磁性体膜を中間層を介して積層した多層
磁性体膜が研究されるようになった（特開昭５９−９９
０５）。この多層磁性体膜では主磁性体の間に挿入する
中間層として、一般的には高透磁率の磁性材料を用いる
ことが好ましいとされている。したがって、中間層とし
てはパーマロイ等がしばしば用いられてきたが、その磁
化機構等は明らかになっていない。In recent years, multilayer magnetic films in which magnetic films are laminated via intermediate layers have been studied as magnetic films aiming at high saturation magnetic flux density and high magnetic permeability (Japanese Patent Application Laid-Open No. 59-99
05). In this multilayer magnetic film, it is generally considered preferable to use a magnetic material with high magnetic permeability as an intermediate layer inserted between the main magnetic bodies. Therefore, permalloy or the like has often been used as the intermediate layer, but its magnetization mechanism has not been clarified.
上述した多層磁性体膜を形成する際はＲＦスパッタリン
グ装置等を用い、この中に設備した回転式ターゲットホ
ルダー主磁性体用のターゲットと中間層用のターゲット
のすくなくとも２種をａＦｔし、回転ターゲットホルダ
ーの回転によってこれらの１方を選び膜形成を行なう。When forming the above-mentioned multilayer magnetic film, an RF sputtering device or the like is used, and at least two types of targets, a target for the main magnetic material and a target for the intermediate layer, are subjected to aFt using a rotating target holder installed therein. One of these is selected by rotation and film formation is performed.
この方法により順次、主磁性体と中間層を積層し、多層
磁性体膜を形成する。このように、上記従来技術はター
ゲットの交換機構を必要としており、装置の簡単化の点
で問題があった。また、得られる多層磁性体膜の飽和磁
束密度も中間層の体積が増加するにしたがって減少する
傾向を示し、好ましくなかった。By this method, the main magnetic material and the intermediate layer are sequentially laminated to form a multilayer magnetic material film. As described above, the above-mentioned conventional technology requires a target exchange mechanism, which poses a problem in terms of simplifying the apparatus. Further, the saturation magnetic flux density of the obtained multilayer magnetic film also showed a tendency to decrease as the volume of the intermediate layer increased, which was not preferable.
したがって、本発明の目的は高飽和磁束密度をもち、容
易に、簡便な方法で形成できる積層磁性体膜を提供する
ことにある。また、低保磁力で高透磁率を有し、高保磁
力記録媒体に対して優れた記録再生特性を示す垂直磁気
記録用磁気ヘッドに好適な磁性体膜を提供することにあ
る。Therefore, an object of the present invention is to provide a laminated magnetic film that has a high saturation magnetic flux density and can be formed easily and by a simple method. Another object of the present invention is to provide a magnetic film suitable for a magnetic head for perpendicular magnetic recording, which has low coercive force and high magnetic permeability, and exhibits excellent recording and reproducing characteristics for high coercive force recording media.
上記目的は高飽和磁束密度を有し、磁歪が小さい金属磁
性体を主磁性体膜とし、これを主磁性体膜と同種の成分
からなる非晶質膜を中間層として積層することにより達
成される。また、中間層の膜厚は１〜１０ｎｍが望まし
く、主磁性体膜および中間層が鉄もしくは鉄を主成分と
してなることが好ましい。The above objective is achieved by laminating a metal magnetic material with high saturation magnetic flux density and low magnetostriction as the main magnetic material film, and an amorphous film made of the same type of components as the main magnetic material film as an intermediate layer. Ru. Further, the thickness of the intermediate layer is preferably 1 to 10 nm, and the main magnetic film and the intermediate layer are preferably made of iron or iron as a main component.
本発明者らは積層磁性体膜を詳細に検討し、た結果、中
間層の役割が柱状結晶構造を分断し、膜面内に容易に磁
化を向かせられることにあることを明らかにした。この
時、中間層が非晶質である場合に主磁性体膜の結晶粒径
を小さく保つことができ、この結果保磁力が減少するこ
とがわかった。The present inventors have studied laminated magnetic films in detail and have found that the role of the intermediate layer is to divide the columnar crystal structure and easily direct magnetization within the film plane. At this time, it was found that when the intermediate layer is amorphous, the crystal grain size of the main magnetic film can be kept small, and as a result, the coercive force is reduced.
さらに、中間層の材料は非磁性材料より高透磁率の磁性
材料の方が望ましいことも明らかになった。Furthermore, it has become clear that a magnetic material with high magnetic permeability is more desirable than a non-magnetic material for the material of the intermediate layer.
本発明者らは上述した検討結果に基づき、非晶質の高透
磁率材料を中間層に用いる積層磁性体膜の検討を続けた
結果、鉄もしくは鉄を主成分とした主磁性体膜を用い、
中間層として主磁性体膜と同じまたは同種の成分からな
る材料を用い、これを非晶質化することにより望ましい
低保磁力の積層磁性体膜が得られることを［認した。ま
た、この結果、従来の積層磁性体膜で１ｉｉＩ！測され
た飽和磁束密度の減少、すなわち、中間層の体積分だけ
主磁性体膜のもつ飽和磁束密度が減少し、本来の値の８
〜９割になる現象、を解決できることも明らかになった
。さらに、本発明の積層磁性体膜を形成する装置上の観
点からは主磁性体膜と中間層が同種の材料からなるため
に、同一ターゲットを用いることが可能になり、従来の
積層磁性体膜を形成する場合のようなターゲット交換機
構（回転式ターゲットホルダー等）を設ける必要がなく
なり、簡便になった。Based on the above-mentioned study results, the present inventors continued to study a laminated magnetic film using an amorphous high permeability material as an intermediate layer. ,
It has been found that a laminated magnetic film with a desirable low coercive force can be obtained by using a material consisting of the same or similar components as the main magnetic film as the intermediate layer and making it amorphous. Moreover, as a result, the conventional laminated magnetic film can achieve 1iiiI! The measured saturation magnetic flux density decreases, that is, the saturation magnetic flux density of the main magnetic film decreases by the volume of the intermediate layer, and the original value of 8.
It has also become clear that it can solve ~90% of the problems. Furthermore, from the viewpoint of the apparatus for forming the laminated magnetic film of the present invention, since the main magnetic film and the intermediate layer are made of the same kind of material, it is possible to use the same target, making it possible to There is no need to provide a target exchange mechanism (rotary target holder, etc.), which is required when forming a target, making it easier.
以下、本発明を実施例により詳しく説明する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
実施例１
磁性体膜の形成はイオンビームスパッタリング法によっ
て行なった。積層磁性体膜の主磁性体膜および中間層と
しては純鉄を用いた。純鉄膜の非品質化は第２図に示す
ように基板照射用イオンガン１２から放射したイオンビ
ームを基板ステージ１４に照射することにより行なった
。好ましいイオンビームスパッタリング条件は次のとお
りであった。Example 1 A magnetic film was formed by ion beam sputtering. Pure iron was used as the main magnetic film and the intermediate layer of the laminated magnetic film. The quality of the pure iron film was degraded by irradiating the substrate stage 14 with an ion beam emitted from the substrate irradiation ion gun 12, as shown in FIG. Preferred ion beam sputtering conditions were as follows.
ターゲット −Ｆ ｅ （９９，９％純ｆ
Ｌ）蒸着用イオンガン加速電圧・・・１２００ Ｖ蒸着
用イオンガンイオン電流ｖＩ３度・・・１ 、４ ｍ
Ａ ／ ｃｌ基板照射用イオンガン加速電圧・・・８０
０Ｖ基板照射用イオンガン電流密度・・・０．１５ｍＡ
／ｃＪＡｒガス圧 −１、４Ｘ １０−’
Ｔｏｒｒ基板温度 ・・・４０℃このス
パッタリング条件を用い、主磁性体膜を形成する際は基
板照射用イオンガン１２のイオン電流密度を０ 、０２
ｍ Ａ ／ ｃｉ以下にしぼり、中間層を形成する際
は基板照射用イオンガン１２のイオン電流密度を０．１
５ｍＡ／ｃＪに戻して膜形成を行なった。主磁性体膜の
膜厚は５０〜２００ｎｍ、中間層の膜厚は１〜１０層ｍ
とし、各々３〜１０層を順次積層し、積層磁性体膜を形
成した。Target −F e (99.9% pure f
L) Acceleration voltage of ion gun for evaporation...1200 V Ion current of ion gun for evaporation vI3 degrees...1,4 m
A/Cl Ion gun acceleration voltage for substrate irradiation...80
Ion gun current density for 0V substrate irradiation...0.15mA
/cJAr gas pressure -1, 4X 10-'
Torr substrate temperature...40°C When forming the main magnetic film using these sputtering conditions, the ion current density of the ion gun 12 for substrate irradiation was set to 0.02.
mA/ci or less, and when forming an intermediate layer, the ion current density of the ion gun 12 for substrate irradiation is set to 0.1.
Film formation was performed by returning the voltage to 5 mA/cJ. The thickness of the main magnetic film is 50 to 200 nm, and the thickness of the intermediate layer is 1 to 10 m.
3 to 10 layers of each were sequentially laminated to form a laminated magnetic film.
得られた純鉄の積層磁性体膜の飽和磁束密度は純鉄単層
膜の飽和磁束密度２１〜２２．ＫＯと同様の２０〜２２
ＫＧの値を示した。保磁力は単層膜の２〜５０ｅに対し
て大幅に減少し、０．３〜１０ｅの値を示し、磁気へラ
ドコア材料として好適な膜になった。The saturation magnetic flux density of the obtained pure iron laminated magnetic film was 21 to 22. 20-22 similar to KO
The value of KG is shown. The coercive force was significantly decreased from 2 to 50e for a single layer film, and showed a value of 0.3 to 10e, making the film suitable as a magnetic herad core material.
なお、中間層をＲ）ＩＥＥＤ（反射高速電子線回折）法
および透過電子線回折法によって分析した結果、非晶質
であることが確認された。In addition, as a result of analyzing the intermediate layer by R)IEED (reflection high energy electron diffraction) method and transmission electron beam diffraction method, it was confirmed that it was amorphous.
実施例２
実施例１において、ターゲットを純鉄から第１表に示す
材料に変え、実施例１と同様にイオンビームスパッタリ
ング法による多層磁性体膜を形成した。この結果、第１
表に示すように、鉄を主成分とする材料からなるＭ層磁
性体膜の磁気特性は中間層の膜厚によって変化し、中間
層の膜厚が１ｎｍより薄い場合は保磁力が１００以上に
増大する傾向を示し、中間層の膜厚が１０ｎｍより厚く
なると飽和磁束密度の減少が顕著になり、２０ＫＧ以下
の値を示すようになった。Example 2 In Example 1, the target was changed from pure iron to the material shown in Table 1, and a multilayer magnetic film was formed by the ion beam sputtering method in the same manner as in Example 1. As a result, the first
As shown in the table, the magnetic properties of the M-layer magnetic film made of material whose main component is iron vary depending on the thickness of the intermediate layer, and when the thickness of the intermediate layer is less than 1 nm, the coercive force increases to 100 or more. The saturation magnetic flux density showed a tendency to increase, and when the thickness of the intermediate layer became thicker than 10 nm, the saturation magnetic flux density decreased significantly, and came to show a value of 20 KG or less.
以上の結果は中間層の膜厚として１〜１０層ｍが高磁気
特性の点から好ましいことを示すものである。また、上
述したように、イオンビームを照射する方法によって極
めて容易に非晶質磁性体膜を得ることができ、積層磁性
体膜が形成できることが明らかになった。The above results indicate that the thickness of the intermediate layer is preferably 1 to 10 m from the viewpoint of high magnetic properties. Furthermore, as described above, it has been revealed that an amorphous magnetic film can be obtained extremely easily by the ion beam irradiation method, and that a laminated magnetic film can be formed.
上述の積層磁性体１摸を垂直もしくは面内記録用磁気ヘ
ッドの主磁極に用いた磁気記録ヘッドは従来の磁気記録
ヘッドの記録密度７０ＫＢＰ１ （キロピッ１−７イ
ンチ）を上まわる１ ００ Ｋ Ｂ ｌ−’ Ｉ以上の
記録密度を与えた。A magnetic recording head using the above laminated magnetic material 1 as the main pole of a magnetic head for perpendicular or in-plane recording has a recording density of 100 KBP1 (1-7 inches), which is higher than the 70 KBP1 (1-7 inch) of conventional magnetic recording heads. -' Provided a recording density of I or higher.
第１表
〔発明の効果〕
以上説明したごとく、本発明による積層磁性体膜は高飽
和磁束密度（２０ＫＧ以上）、低保磁力（１００以下）
を示す優れた磁気ヘッドのコア材として適用できる。し
たがって、本発明を垂直もしくは面内磁気記録の磁気ヘ
ッドの主磁極膜として用いた場合、０．２μｍ程度の薄
膜にしても磁気飽和を起こすことなく、磁極の先端に強
い磁束を発生させることができ、超高密度磁気記録を達
成することができる。さらに、本発明のｆ＆ Ｘ１磁性
体膜は主磁性体膜と中間層が同種の成分からなるため、
必要なターゲットの個数は減少し、ターゲット交換機構
のような複雑な装置を必要としない。Table 1 [Effects of the Invention] As explained above, the laminated magnetic film according to the present invention has a high saturation magnetic flux density (20 KG or more) and a low coercive force (100 KG or less).
It can be used as a core material for magnetic heads with excellent properties. Therefore, when the present invention is used as the main pole film of a magnetic head for perpendicular or in-plane magnetic recording, it is possible to generate strong magnetic flux at the tip of the magnetic pole without causing magnetic saturation even with a thin film of about 0.2 μm. It is possible to achieve ultra-high density magnetic recording. Furthermore, in the f&X1 magnetic film of the present invention, since the main magnetic film and the intermediate layer are made of the same kind of components,
The number of targets required is reduced and complex equipment such as a target exchange mechanism is not required.
第１図は垂直磁気記録用磁気ヘッドおよび磁気記録媒体
の構成を示す説明図、第２図は本実施例で用いたイオン
ビームスパッタリング装置の断面を示す図である。
１・・・磁気記録媒体、２・・・非磁性基板、３・・・
下地膜、４・・・垂直磁化膜、５・・・主磁極、６・・
・基板、７・・・ギャップ規制材、８・・・充填材、９
・・・補助磁極、１０・・・保護材、１１・・・蒸着用
イオンガン、１２・・・基板照射用イオンガン、１３・
・・ターゲラ１〜．１４・・・基板ステージ、１５・・
・排気口。
第 ２ 図
７３′７−ゲット
７４羞」ξステージ
ノＳ 耕促（口′FIG. 1 is an explanatory diagram showing the configuration of a magnetic head for perpendicular magnetic recording and a magnetic recording medium, and FIG. 2 is a diagram showing a cross section of the ion beam sputtering apparatus used in this example. 1... Magnetic recording medium, 2... Non-magnetic substrate, 3...
Base film, 4... Perpendicular magnetization film, 5... Main magnetic pole, 6...
・Substrate, 7... Gap regulating material, 8... Filling material, 9
... Auxiliary magnetic pole, 10... Protective material, 11... Ion gun for vapor deposition, 12... Ion gun for substrate irradiation, 13.
...Tagera 1~. 14... Substrate stage, 15...
·exhaust port. 2nd Figure 73'7-Get 74'
Claims (1)
らなる所定厚さ、所定枚数の主磁性体膜が主磁性体膜と
同種の成分からなる非晶質膜を中間層として積層されて
いることを特徴とする積層磁性体膜。 ２、特許請求の範囲第１項記載の中間層の膜厚が１〜１
０ｎｍであることを特徴とする積層磁性体膜。 ３、特許請求の範囲第１項記載の主磁性体膜および中間
層が鉄もしくは鉄を主成分とするものであることを特徴
とする積層磁性体膜。 ４、特許請求の範囲第１項、第２項又は第３項記載の中
間層がイオン照射法によつて形成されてなることを特徴
とする積層磁性体膜。[Claims] 1. An amorphous film in which a predetermined thickness and a predetermined number of main magnetic films made of a metal magnetic material having high saturation magnetic flux density and low magnetostriction are made of the same type of component as the main magnetic film. A laminated magnetic material film characterized in that it is laminated as an intermediate layer. 2. The thickness of the intermediate layer described in claim 1 is 1 to 1.
A laminated magnetic film characterized by having a thickness of 0 nm. 3. A laminated magnetic film characterized in that the main magnetic film and the intermediate layer according to claim 1 are made of iron or iron as a main component. 4. A laminated magnetic film characterized in that the intermediate layer according to claim 1, 2, or 3 is formed by ion irradiation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61157816A JPH07111925B2 (en) | 1986-07-07 | 1986-07-07 | Laminated magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61157816A JPH07111925B2 (en) | 1986-07-07 | 1986-07-07 | Laminated magnetic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6314409A true JPS6314409A (en) | 1988-01-21 |
| JPH07111925B2 JPH07111925B2 (en) | 1995-11-29 |
Family
ID=15657925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61157816A Expired - Lifetime JPH07111925B2 (en) | 1986-07-07 | 1986-07-07 | Laminated magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07111925B2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5917222A (en) * | 1982-07-21 | 1984-01-28 | Hitachi Ltd | Manufacture of multilayer magnetic thin-film |
| JPS5918625A (en) * | 1982-07-23 | 1984-01-31 | Hitachi Ltd | Manufacture of thin film |
| JPS59130408A (en) * | 1983-01-17 | 1984-07-27 | Hitachi Ltd | Magnetic film |
-
1986
- 1986-07-07 JP JP61157816A patent/JPH07111925B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5917222A (en) * | 1982-07-21 | 1984-01-28 | Hitachi Ltd | Manufacture of multilayer magnetic thin-film |
| JPS5918625A (en) * | 1982-07-23 | 1984-01-31 | Hitachi Ltd | Manufacture of thin film |
| JPS59130408A (en) * | 1983-01-17 | 1984-07-27 | Hitachi Ltd | Magnetic film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07111925B2 (en) | 1995-11-29 |
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