JPH07111925B2 - Laminated magnetic film - Google Patents

Laminated magnetic film

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Publication number
JPH07111925B2
JPH07111925B2 JP61157816A JP15781686A JPH07111925B2 JP H07111925 B2 JPH07111925 B2 JP H07111925B2 JP 61157816 A JP61157816 A JP 61157816A JP 15781686 A JP15781686 A JP 15781686A JP H07111925 B2 JPH07111925 B2 JP H07111925B2
Authority
JP
Japan
Prior art keywords
magnetic
film
intermediate layer
laminated
magnetic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61157816A
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Japanese (ja)
Other versions
JPS6314409A (en
Inventor
俊雄 小林
茂一 大友
登行 熊坂
亮一 中谷
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Hitachi Ltd
Original Assignee
Hitachi Ltd
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Publication date
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Priority to JP61157816A priority Critical patent/JPH07111925B2/en
Publication of JPS6314409A publication Critical patent/JPS6314409A/en
Publication of JPH07111925B2 publication Critical patent/JPH07111925B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気ヘツド用コア材に係り、更に詳しくは高密
度磁気記録に好適な性能を発揮する磁気ヘツドのコア用
積層磁性体膜に関する。
Description: TECHNICAL FIELD The present invention relates to a magnetic head core material, and more particularly to a magnetic head core laminated magnetic film that exhibits suitable performance for high density magnetic recording.

〔従来の技術〕[Conventional technology]

磁気記録の高密度化の進歩は目覚ましく、メタルテープ
の出現によつて従来の酸化物テープの保磁力600〜700Oe
に対して1500〜2000Oeのものが得られるようになつた。
このような高保磁力の磁気記録媒体に十分記録させるた
めには高飽和磁束密度を有する磁気ヘツドコア用磁性体
が必要とされる。この磁性体としてはFe,Co,Niを主成分
とする合金があり、飽和磁束密度10000G以上、またFe−
Si系合金は18000Gの飽和磁束密度を持ち、高密度の磁気
ヘツド材料として開発が進められている(特開昭59−18
2938)。
The progress in high density magnetic recording is remarkable, and the coercive force of the conventional oxide tape is 600-700 Oe due to the advent of metal tape.
For 1500 to 2000 Oe has been obtained.
In order to sufficiently record on such a high coercive force magnetic recording medium, a magnetic material for a magnetic head core having a high saturation magnetic flux density is required. As this magnetic material, there is an alloy containing Fe, Co, and Ni as the main components, and the saturation magnetic flux density is 10,000 G or more.
The Si-based alloy has a saturation magnetic flux density of 18000 G and is under development as a high-density magnetic head material (Japanese Patent Laid-Open No. 59-18).
2938).

従来の磁気記録方法を第1図に示す。磁気記録媒体1は
非磁性基板2の上にパーマロイ等の下地膜3を介して膜
面に垂直方向に磁化容易軸を有するCo−Cr等の垂直磁化
膜4が形成されたものである。磁気ヘツドは主磁極5お
よび補助磁極9からなり、励磁コイル10に流れる信号電
流により主磁極5を磁化し、その先端にのびる磁極に発
生する垂直磁界によつて、磁気記録媒体1の垂直磁化膜
4に信号を記録する。したがつて、急峻な分布をなす垂
直成分磁界を得るためには主磁極5の先端部の厚さは0.
5μm以下にする必要がある。この部分では磁束密度が
高くなるので、高飽和磁束密度でかつ高透磁率の磁性薄
膜が必要になる。しかし、主磁極膜が薄いために磁気飽
和が生じるので、0.5μm以下の膜厚に対して15000G以
上の高飽和磁束密度が必要とされている。
A conventional magnetic recording method is shown in FIG. The magnetic recording medium 1 comprises a non-magnetic substrate 2 on which a perpendicularly magnetized film 4 of Co--Cr or the like having an easy axis of magnetization in the direction perpendicular to the film surface is formed via a base film 3 of permalloy or the like. The magnetic head is composed of a main magnetic pole 5 and an auxiliary magnetic pole 9, and the main magnetic pole 5 is magnetized by a signal current flowing in the exciting coil 10. The perpendicular magnetic field generated in the magnetic pole extending to the tip of the magnetic head causes the perpendicular magnetic film of the magnetic recording medium 1 to be magnetized. Record the signal at 4. Therefore, in order to obtain a vertical component magnetic field having a steep distribution, the thickness of the tip of the main pole 5 is 0.
It must be 5 μm or less. Since the magnetic flux density is high in this portion, a magnetic thin film having high saturation magnetic flux density and high magnetic permeability is required. However, since the main magnetic pole film is thin and magnetic saturation occurs, a high saturation magnetic flux density of 15000 G or more is required for a film thickness of 0.5 μm or less.

このような高飽和磁束密度、高透磁率を目的とした磁性
体膜として近年磁性体膜を中間層を介して積層した多層
磁性体膜が研究されるようになつた(特開昭59−990
5)。この多層磁性体膜では主磁性体の間に挿入する中
間層として、一般的には高透磁率の磁性材料を用いるこ
とが好ましいとされている。したがつて、中間層として
はパーマロイ等がしばしば用いられてきたが、その磁化
機構等が明らかになつていない。
As a magnetic material film aiming at such a high saturation magnetic flux density and a high magnetic permeability, a multilayer magnetic material film in which magnetic material films are laminated via an intermediate layer has been recently studied (Japanese Patent Laid-Open No. 59-990).
Five). In this multilayer magnetic film, it is generally said that it is preferable to use a magnetic material having a high magnetic permeability as the intermediate layer inserted between the main magnetic bodies. Therefore, although Permalloy or the like has been often used as the intermediate layer, its magnetization mechanism or the like has not been clarified.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

上述した多層磁性体膜を形成する際はRFスパツタリング
装置等を用い、この中に設備した回転式ターゲツトホル
ダー主磁性体用のターゲツトと中間層用のターゲツトの
すくなくとも2種を載置し、回転ターゲツトホルダーの
回転によつてこれらの1方を選び膜形成を行なう。この
方法により順次、主磁性体と中間層を積層し、多層磁性
体膜を形成する。このように、上記従来技術はターゲツ
トの交換機構を必要としており、装置の簡単化の点で問
題があつた。また、得られる多層磁性体膜の飽和磁束密
度も中間層の体積が増加するにしたがつて減少する傾向
を示し、好ましくなかつた。
When forming the above-mentioned multilayer magnetic film, an RF sputtering device is used, and at least two types of rotary target holder main magnetic target and intermediate layer target are placed in the rotary target holder. One of these is selected by the rotation of the holder to form a film. By this method, the main magnetic material and the intermediate layer are sequentially laminated to form a multilayer magnetic material film. As described above, the above-mentioned conventional technique requires a target exchanging mechanism, which causes a problem in simplifying the apparatus. Further, the saturation magnetic flux density of the obtained multilayer magnetic film also tends to decrease as the volume of the intermediate layer increases, which is not preferable.

したがつて、本発明の目的は高飽和磁束密度をもち、容
易に、簡便な方法で形成できる積層磁性体膜を提供する
ことにある。また、低保磁力で高透磁率を有し、高保磁
力記録媒体に対して優れた記録再生特性を示す垂直磁気
記録用磁気ヘツドに好適な磁性体膜を提供することにあ
る。
Therefore, an object of the present invention is to provide a laminated magnetic film having a high saturation magnetic flux density and which can be easily formed by a simple method. Another object of the present invention is to provide a magnetic film suitable for a magnetic head for perpendicular magnetic recording, which has a low coercive force and a high magnetic permeability and exhibits excellent recording / reproducing characteristics for a high coercive force recording medium.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は高飽和磁束密度を有し、磁歪が小さい金属磁
性体を主磁性体膜とし、これを主磁性体膜と同種の成分
からなる非晶質膜を中間層として積層することにより達
成される。また、中間層の膜厚は1〜10nmが望ましく、
主磁性体膜および中間層が鉄もしくは鉄を主成分として
なることが好ましい。
The above object is achieved by stacking a metal magnetic material having a high saturation magnetic flux density and a small magnetostriction as a main magnetic material film, and laminating an amorphous film composed of the same kind of component as the main magnetic material film as an intermediate layer. It The thickness of the intermediate layer is preferably 1 to 10 nm,
It is preferable that the main magnetic film and the intermediate layer contain iron or iron as a main component.

〔作用〕[Action]

本発明者らは積層磁性体膜を詳細に検討した結果、中間
層の役割が柱状結晶構造を分断し、膜面内に容易に磁化
を向かせられることにあることを明らかにした。この
時、中間層が非晶質である場合に主磁性体膜の結晶粒径
を小さく保つことができ、この結果保磁力が減少するこ
とがわかつた。さらに、中間層の材料は非磁性材料より
高透磁率の磁性材料の方が望ましいことも明らかになつ
た。
As a result of detailed examination of the laminated magnetic film, the present inventors have revealed that the role of the intermediate layer is to divide the columnar crystal structure so that the magnetization can be easily oriented in the film plane. At this time, it has been found that the crystal grain size of the main magnetic film can be kept small when the intermediate layer is amorphous, and as a result the coercive force is reduced. Furthermore, it has been clarified that a magnetic material having a high magnetic permeability is more preferable than a non-magnetic material for the intermediate layer.

本発明者らは上述した検討結果に基づき、非晶質の高透
磁率材料を中間層に用いる積層磁性体膜の検討を続けた
結果、鉄もしくは鉄を主成分とした主磁性体膜を用い、
中間層として主磁性体膜と同じまたは同種の成分からな
る材料を用い、これを非晶質化することにより望ましい
低保磁力の積層磁性体膜が得られることを確認した。ま
た、この結果、従来の積層磁性体膜で観測された飽和磁
束密度の減少、すなわち、中間層の体積分だけ主磁性体
膜のもつ飽和磁束密度が減少し、本来の値の8〜9割に
なる現象、を解決できることも明らかになつた。さら
に、本発明の積層磁性体膜を形成する装置上の観点から
は主磁性体膜と中間層が同種の材料からなるために、同
一ターゲツトを用いることが可能になり、従来の積層磁
性体膜を形成する場合のようなターゲツト交換機構(回
転式ターゲツトホルダー等)を設ける必要がなくなり、
簡便になつた。
The inventors of the present invention continued to study a laminated magnetic film using an amorphous high-permeability material for the intermediate layer based on the above-mentioned examination results. As a result, iron or an iron-based main magnetic film was used. ,
It was confirmed that a desired magnetic layer having a low coercive force can be obtained by using a material having the same or the same kind of component as the main magnetic film as the intermediate layer and making it amorphous. Further, as a result, the saturation magnetic flux density observed in the conventional laminated magnetic film decreases, that is, the saturation magnetic flux density of the main magnetic film decreases by the volume of the intermediate layer, which is 80 to 90% of the original value. It became clear that the phenomenon of becoming. Further, from the viewpoint of the apparatus for forming the laminated magnetic film of the present invention, since the main magnetic film and the intermediate layer are made of the same kind of material, the same target can be used, and the conventional laminated magnetic film can be used. There is no need to provide a target exchange mechanism (rotary target holder, etc.) like in the case of forming
It became easy.

〔実施例〕〔Example〕

以下、本発明を実施例により詳しく説明する。 Hereinafter, the present invention will be described in detail with reference to Examples.

実施例1 磁性体膜の形成はイオンビームスパツタリング法によつ
て行なつた。積層磁性体膜の主磁性体膜および中間層と
しては純鉄を用いた。純鉄膜の非晶質は第2図に示すよ
うに基板照射用イオンガン12から放射したイオンビーム
を基板ステージ14に照射することにより行なつた。好ま
しいイオンビームスパツタリング条件は次のとおりであ
つた。
Example 1 The magnetic film was formed by the ion beam sputtering method. Pure iron was used for the main magnetic film and the intermediate layer of the laminated magnetic film. The pure iron film was made amorphous by irradiating the substrate stage 14 with the ion beam emitted from the substrate irradiation ion gun 12, as shown in FIG. The preferable ion beam sputtering conditions were as follows.

ターゲツト …Fe(99.9%純度) 蒸着用イオンガン加速電圧 …1200V 蒸着用イオンガンイオン電流密度 …1.4mA/cm2 基板照射用イオンガン加速電圧 …800V 基板照射用イオンガン電流密度 …0.15mA/cm2 Arガス圧 …1.4×10-4Torr 基板温度 …40℃ このスパツタリング条件を用い、主磁性体膜を形成する
際は基板照射用イオンガン12のイオン電流密度を0.02mA
/cm2以下にしぼり、中間層を形成する際は基板照射用イ
オンガン12のイオン電流密度を0.15mA/cm2戻して膜形成
を行なつた。主磁性体膜の膜厚は50〜200nm、中間層の
膜厚は1〜10nmとし、各々3〜10層を順次積層し、積層
磁性体膜を形成した。
Target… Fe (99.9% purity) Ion gun acceleration voltage for vapor deposition… 1200V Ion gun ion current density for vapor deposition… 1.4mA / cm 2 Ion gun acceleration voltage for substrate irradiation… 800V Ion gun current density for substrate… 0.15mA / cm 2 Ar gas pressure … 1.4 × 10 -4 Torr Substrate temperature… 40 ℃ Under this sputtering condition, when forming the main magnetic film, the ion current density of the substrate irradiation ion gun 12 is 0.02mA.
/ cm 2 aperture below, line film formation by an ion current density of the substrate irradiated for ion gun 12 0.15 mA / cm 2 the return time of forming the intermediate layer Natsuta. The main magnetic film had a film thickness of 50 to 200 nm and the intermediate layer had a film thickness of 1 to 10 nm, and 3 to 10 layers were sequentially laminated to form a laminated magnetic film.

得られた純鉄の積層磁性体膜の飽和磁束密度は純鉄単層
膜の飽和磁束密度21〜22KGと同様の20〜22KGの値を示し
た。保磁力は単層膜の2〜5Oeに対して大幅に減少し、
0.3〜1Oeの値を示し、磁気ヘツドコア材料として好適な
膜になつた。
The saturated magnetic flux density of the obtained pure iron laminated magnetic film was 20 to 22 KG, which was similar to the saturated magnetic flux density of pure iron single layer film of 21 to 22 KG. The coercive force is greatly reduced compared to 2-5 Oe of a single layer film
It showed a value of 0.3 to 1 Oe, and became a film suitable as a magnetic head core material.

なお、中間層をRHEED(反射高速電子線回折)法および
透過電子線回折法によつて分析した結果、非晶質である
ことが確認された。
The intermediate layer was analyzed by the RHEED (reflection high energy electron diffraction) method and the transmission electron beam diffraction method, and as a result, it was confirmed to be amorphous.

実施例2 実施例1において、ターゲツトを純鉄から第1表に示す
材料に変え、実施例1と同様にイオンビームスパツタリ
ング法による多層磁性体膜を形成した。この結果、第1
表に示すように、鉄を主成分とする材料からなる積層磁
性体膜の磁気特性は中間層の膜厚によつて変化し、中間
層の膜厚が1nmより薄い場合は保磁力が1Oe以上に増大す
る傾向を示し、中間層の膜厚が10nmより厚くなると飽和
磁束密度の減少が顕著になり、20KG以下の値を示すよう
になつた。
Example 2 In Example 1, the target was changed from pure iron to the material shown in Table 1, and a multilayer magnetic film was formed by the ion beam sputtering method as in Example 1. As a result, the first
As shown in the table, the magnetic characteristics of the laminated magnetic film made of a material whose main component is iron changes depending on the thickness of the intermediate layer. The saturation magnetic flux density decreased remarkably when the thickness of the intermediate layer became thicker than 10 nm, and the value became less than 20 KG.

以上の結果は中間層の膜厚として1〜10nmが高磁気特性
の点から好ましいことを示すものである。また、上述し
たように、イオンビームを照射する方法によつて極めて
容易に非晶質磁性体膜を得ることができ、積層磁性体膜
が形成できることが明らかになつた。
The above results show that the thickness of the intermediate layer is preferably 1 to 10 nm from the viewpoint of high magnetic characteristics. Further, as described above, it was revealed that an amorphous magnetic film can be extremely easily obtained by the method of irradiating with an ion beam, and a laminated magnetic film can be formed.

上述の積層磁性体膜を垂直もしくは面内記録用磁気ヘツ
ドの主磁極に用いた磁極記録ヘツドは従来の磁気記録ヘ
ツドの記録密度70KBPI(キロビツト/インチ)を上まわ
る100KBPI以上の記録密度を与えた。
The magnetic pole recording head using the above-mentioned laminated magnetic film as the main pole of the magnetic head for perpendicular or in-plane recording has a recording density of 100 KBPI or more, which exceeds the recording density of 70 KBPI (kilobits / inch) of the conventional magnetic recording head. .

〔発明の効果〕 以上説明したごとく、本発明による積層磁性体膜は高飽
和磁束密度(20KG以上)、低保磁力(1Oe以下)を示す
優れた磁気ヘツドのコア材として適用できる。したがつ
て、本発明を垂直もしくは面内磁気記録の磁気ヘツドの
主磁極膜として用いた場合、0.2μm程度の薄膜にして
も磁気飽和を起こすことなく、磁極の先端に強い磁束を
発生させることができ、超高密度磁気記録を達成するこ
とができる。さらに、本発明の積層磁性体膜は主磁性体
膜と中間層が同種の成分からなるため、必要なターゲツ
トの個数は減少し、ターゲツト交換機構のような複雑な
装置を必要としない。
[Effects of the Invention] As described above, the laminated magnetic film according to the present invention can be applied as an excellent magnetic head core material exhibiting a high saturation magnetic flux density (20 KG or more) and a low coercive force (1 Oe or less). Therefore, when the present invention is used as a main magnetic pole film of a magnetic head for perpendicular or in-plane magnetic recording, a magnetic flux is generated at the tip of the magnetic pole without causing magnetic saturation even with a thin film of about 0.2 μm. Therefore, it is possible to achieve ultra high density magnetic recording. Further, in the laminated magnetic film of the present invention, the main magnetic film and the intermediate layer are composed of the same kind of components, so that the number of required targets is reduced and a complicated device such as a target exchange mechanism is not required.

【図面の簡単な説明】[Brief description of drawings]

第1図は垂直磁気記録用磁気ヘツドおよび磁気記録媒体
の構成を示す説明図、第2図は本実施例で用いたイオン
ビームスパツタリング装置の断面を示す図である。 1……磁気記録媒体、2……非磁性基板、3……下地
膜、4……垂直磁化膜、5……主磁極、6……基板、7
……ギヤツプ規制材、8……充填材、9……補助磁極、
10……保護材、11……蒸着用イオンガン、12……基板照
射用イオンガン、13……ターゲツト、14……基板ステー
ジ、15……排気口。
FIG. 1 is an explanatory diagram showing the structure of a magnetic head for perpendicular magnetic recording and a magnetic recording medium, and FIG. 2 is a sectional view of an ion beam sputtering device used in this embodiment. 1 ... Magnetic recording medium, 2 ... Non-magnetic substrate, 3 ... Underlayer film, 4 ... Perpendicular magnetization film, 5 ... Main pole, 6 ... Substrate, 7
...... Gear regulating material, 8 …… Filling material, 9 …… Auxiliary magnetic pole,
10 …… Protective material, 11 …… Vapor deposition ion gun, 12 …… Substrate irradiation ion gun, 13 …… Target, 14 …… Substrate stage, 15 …… Exhaust port.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 中谷 亮一 東京都国分寺市東恋ヶ窪1丁目280番地 株式会社日立製作所中央研究所内 (56)参考文献 特開 昭59−130408(JP,A) 特開 昭59−18625(JP,A) 特開 昭59−17222(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Ryoichi Nakatani 1-280, Higashi Koigakubo, Kokubunji City, Tokyo Inside Central Research Laboratory, Hitachi, Ltd. (56) References JP-A-59-130408 (JP, A) JP-A-59 -18625 (JP, A) JP-A-59-17222 (JP, A)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】鉄もしくは鉄を主成分とし、高飽和磁束密
度を有し、金属磁性体からなる所定厚さ、所定枚数の主
磁性体膜が、主磁性体膜と実質的に同一または同種の成
分からなる非晶質膜を中間層として積層されていること
を特徴とする積層磁性体膜。
1. A main magnetic film of iron or iron, which has a high saturation magnetic flux density and has a predetermined thickness and a predetermined number of metal magnetic substances, is substantially the same as or the same as the main magnetic film. A laminated magnetic film, wherein an amorphous film composed of the component (1) is laminated as an intermediate layer.
【請求項2】特許請求の範囲第1項記載の中間層の膜厚
が1〜10nmであることを特徴とする積層磁性体膜。
2. A laminated magnetic film, wherein the film thickness of the intermediate layer according to claim 1 is 1 to 10 nm.
JP61157816A 1986-07-07 1986-07-07 Laminated magnetic film Expired - Lifetime JPH07111925B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61157816A JPH07111925B2 (en) 1986-07-07 1986-07-07 Laminated magnetic film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61157816A JPH07111925B2 (en) 1986-07-07 1986-07-07 Laminated magnetic film

Publications (2)

Publication Number Publication Date
JPS6314409A JPS6314409A (en) 1988-01-21
JPH07111925B2 true JPH07111925B2 (en) 1995-11-29

Family

ID=15657925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61157816A Expired - Lifetime JPH07111925B2 (en) 1986-07-07 1986-07-07 Laminated magnetic film

Country Status (1)

Country Link
JP (1) JPH07111925B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5917222A (en) * 1982-07-21 1984-01-28 Hitachi Ltd Manufacture of multilayer magnetic thin-film
JPS5918625A (en) * 1982-07-23 1984-01-31 Hitachi Ltd Manufacture of thin film
JPH061729B2 (en) * 1983-01-17 1994-01-05 株式会社日立製作所 Magnetic film and magnetic head using the same

Also Published As

Publication number Publication date
JPS6314409A (en) 1988-01-21

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