JPS63139673A - 研磨シ−トの製造方法 - Google Patents
研磨シ−トの製造方法Info
- Publication number
- JPS63139673A JPS63139673A JP28260986A JP28260986A JPS63139673A JP S63139673 A JPS63139673 A JP S63139673A JP 28260986 A JP28260986 A JP 28260986A JP 28260986 A JP28260986 A JP 28260986A JP S63139673 A JPS63139673 A JP S63139673A
- Authority
- JP
- Japan
- Prior art keywords
- metal foil
- pattern
- film base
- abrasive grains
- polishing sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000005498 polishing Methods 0.000 title abstract description 25
- 239000011888 foil Substances 0.000 claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 239000006061 abrasive grain Substances 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 29
- 238000007747 plating Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 230000000873 masking effect Effects 0.000 claims description 6
- 230000000694 effects Effects 0.000 abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- 238000000227 grinding Methods 0.000 abstract description 3
- 238000009825 accumulation Methods 0.000 abstract description 2
- 239000002245 particle Substances 0.000 abstract 4
- 230000005496 eutectics Effects 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 241000854711 Shinkai Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000005001 laminate film Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000011536 re-plating Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28260986A JPS63139673A (ja) | 1986-11-27 | 1986-11-27 | 研磨シ−トの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28260986A JPS63139673A (ja) | 1986-11-27 | 1986-11-27 | 研磨シ−トの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63139673A true JPS63139673A (ja) | 1988-06-11 |
JPH046499B2 JPH046499B2 (enrdf_load_stackoverflow) | 1992-02-06 |
Family
ID=17654738
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28260986A Granted JPS63139673A (ja) | 1986-11-27 | 1986-11-27 | 研磨シ−トの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63139673A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63229271A (ja) * | 1987-01-24 | 1988-09-26 | ミネソタ マイニング アンド マニュファクチャリング カンパニー | 研磨剤の製法 |
CN113664739A (zh) * | 2021-08-24 | 2021-11-19 | 永康市舒适科技有限公司 | 一种透出图案的砂纸及其制备装置和制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60186163U (ja) * | 1984-05-18 | 1985-12-10 | 株式会社 エフエスケ− | 可撓性研摩シ−ト |
JPS61265276A (ja) * | 1985-05-20 | 1986-11-25 | Goei Seisakusho:Kk | 切断研磨共用ダイヤモンドシ−トとその製造方法 |
-
1986
- 1986-11-27 JP JP28260986A patent/JPS63139673A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60186163U (ja) * | 1984-05-18 | 1985-12-10 | 株式会社 エフエスケ− | 可撓性研摩シ−ト |
JPS61265276A (ja) * | 1985-05-20 | 1986-11-25 | Goei Seisakusho:Kk | 切断研磨共用ダイヤモンドシ−トとその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63229271A (ja) * | 1987-01-24 | 1988-09-26 | ミネソタ マイニング アンド マニュファクチャリング カンパニー | 研磨剤の製法 |
CN113664739A (zh) * | 2021-08-24 | 2021-11-19 | 永康市舒适科技有限公司 | 一种透出图案的砂纸及其制备装置和制备方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH046499B2 (enrdf_load_stackoverflow) | 1992-02-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |