JPS631355U - - Google Patents

Info

Publication number
JPS631355U
JPS631355U JP9481386U JP9481386U JPS631355U JP S631355 U JPS631355 U JP S631355U JP 9481386 U JP9481386 U JP 9481386U JP 9481386 U JP9481386 U JP 9481386U JP S631355 U JPS631355 U JP S631355U
Authority
JP
Japan
Prior art keywords
film
light
light shielding
insulating film
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9481386U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9481386U priority Critical patent/JPS631355U/ja
Publication of JPS631355U publication Critical patent/JPS631355U/ja
Pending legal-status Critical Current

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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本考案の薄膜トランジスタを示す断
面図、第2図は、従来構造の薄膜トランジスタを
示す断面図である。 1,1′…ガラス基板、2,2′…ゲート電極
、3,3′…ゲート絶縁膜、4,4′…半導体膜
、5,5′…ドレイン電極、6,6′…ソース電
極、7,7′…チヤネル保護用絶縁膜、8,8′
…遮光膜。
FIG. 1 is a sectional view showing a thin film transistor of the present invention, and FIG. 2 is a sectional view showing a thin film transistor having a conventional structure. 1, 1'... Glass substrate, 2, 2'... Gate electrode, 3, 3'... Gate insulating film, 4, 4'... Semiconductor film, 5, 5'... Drain electrode, 6, 6'... Source electrode, 7 , 7'... Insulating film for channel protection, 8, 8'
...Light-shielding film.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板上にゲート電極、ゲート絶縁膜、半導体膜
、ドレイン電極並びにソース電極、チヤンネル保
護用絶縁膜、及び遮光膜を順次積層してなり、上
記遮光膜を2.0eVの光に対して1.0×10
cm−1以上の光吸収係数を有する非晶質半導体
膜にて構成した事を特徴とする薄膜トランジスタ
A gate electrode, a gate insulating film, a semiconductor film, a drain electrode, a source electrode, a channel protection insulating film, and a light shielding film are sequentially laminated on a substrate, and the light shielding film has a resistance of 1.0 to 2.0 eV light. ×10
A thin film transistor comprising an amorphous semiconductor film having a light absorption coefficient of 5 cm -1 or more.
JP9481386U 1986-06-20 1986-06-20 Pending JPS631355U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9481386U JPS631355U (en) 1986-06-20 1986-06-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9481386U JPS631355U (en) 1986-06-20 1986-06-20

Publications (1)

Publication Number Publication Date
JPS631355U true JPS631355U (en) 1988-01-07

Family

ID=30958651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9481386U Pending JPS631355U (en) 1986-06-20 1986-06-20

Country Status (1)

Country Link
JP (1) JPS631355U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0943632A (en) * 1995-05-19 1997-02-14 Nec Corp Thin film transistor array

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0943632A (en) * 1995-05-19 1997-02-14 Nec Corp Thin film transistor array

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