JPS63131584A - 切り込み型絶縁ゲ−ト静電誘導トランジスタの製造方法 - Google Patents
切り込み型絶縁ゲ−ト静電誘導トランジスタの製造方法Info
- Publication number
- JPS63131584A JPS63131584A JP27675586A JP27675586A JPS63131584A JP S63131584 A JPS63131584 A JP S63131584A JP 27675586 A JP27675586 A JP 27675586A JP 27675586 A JP27675586 A JP 27675586A JP S63131584 A JPS63131584 A JP S63131584A
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- static induction
- notched
- insulated gate
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27675586A JPS63131584A (ja) | 1986-11-21 | 1986-11-21 | 切り込み型絶縁ゲ−ト静電誘導トランジスタの製造方法 |
EP95114168A EP0690513B1 (en) | 1986-11-19 | 1987-11-10 | Step-cut insulated gate static induction transistors and method of manufacturing the same |
DE3752273T DE3752273T2 (de) | 1986-11-19 | 1987-11-10 | Statische Induktionstransistoren mit isoliertem Gatter in einer eingeschnittenen Stufe und Verfahren zu deren Herstellung |
DE3752255T DE3752255T2 (de) | 1986-11-19 | 1987-11-18 | Statische Induktiontransistoren mit isoliertem Gatter in einer eingeschnittenen Stufe und Verfahren zu deren Herstellung |
DE3752215T DE3752215T2 (de) | 1986-11-19 | 1987-11-18 | Verfahren zur Herstellung der Statischen Induktionstransistoren mit isoliertem Gatter in einer eingeschnitteten Stufe |
DE87310185T DE3789003T2 (de) | 1986-11-19 | 1987-11-18 | Statische Induktionstransistoren mit isoliertem Gatter in einer eingeschnittenen Stufe und Verfahren zu deren Herstellung. |
EP93101675A EP0547030B1 (en) | 1986-11-19 | 1987-11-18 | Step-cut insulated gate static induction transistors and method of manufacturing the same |
EP87310185A EP0268472B1 (en) | 1986-11-19 | 1987-11-18 | Step-cut insulated gate static induction transistors and method of manufacturing the same |
EP92101661A EP0481965B1 (en) | 1986-11-19 | 1987-11-18 | Method of manufacturing step-cut insulated gate static induction transistors |
US07/752,934 US5115287A (en) | 1986-11-19 | 1991-08-30 | Step-cut insulated gate static induction transistors and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27675586A JPS63131584A (ja) | 1986-11-21 | 1986-11-21 | 切り込み型絶縁ゲ−ト静電誘導トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63131584A true JPS63131584A (ja) | 1988-06-03 |
JPH03793B2 JPH03793B2 (enrdf_load_stackoverflow) | 1991-01-08 |
Family
ID=17573890
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27675586A Granted JPS63131584A (ja) | 1986-11-19 | 1986-11-21 | 切り込み型絶縁ゲ−ト静電誘導トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63131584A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02226772A (ja) * | 1989-02-28 | 1990-09-10 | Shiyoudenriyoku Kosoku Tsushin Kenkyusho:Kk | 切り込み型絶縁ゲート静電誘導トランジスタ及びその製造方法 |
JPH02226773A (ja) * | 1989-02-28 | 1990-09-10 | Shiyoudenriyoku Kosoku Tsushin Kenkyusho:Kk | 切り込み型絶縁ゲート静電誘導トランジスタ及びその製造方法 |
JPH0492473A (ja) * | 1990-08-07 | 1992-03-25 | Semiconductor Energy Lab Co Ltd | 縦チャネル型絶縁ゲイト型電界効果半導体装置の作製方法 |
-
1986
- 1986-11-21 JP JP27675586A patent/JPS63131584A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02226772A (ja) * | 1989-02-28 | 1990-09-10 | Shiyoudenriyoku Kosoku Tsushin Kenkyusho:Kk | 切り込み型絶縁ゲート静電誘導トランジスタ及びその製造方法 |
JPH02226773A (ja) * | 1989-02-28 | 1990-09-10 | Shiyoudenriyoku Kosoku Tsushin Kenkyusho:Kk | 切り込み型絶縁ゲート静電誘導トランジスタ及びその製造方法 |
JPH0492473A (ja) * | 1990-08-07 | 1992-03-25 | Semiconductor Energy Lab Co Ltd | 縦チャネル型絶縁ゲイト型電界効果半導体装置の作製方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH03793B2 (enrdf_load_stackoverflow) | 1991-01-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3082671B2 (ja) | トランジスタ素子及びその製造方法 | |
US5270257A (en) | Method of making metal oxide semiconductor field effect transistors with a lightly doped drain structure having a recess type gate | |
JP3462301B2 (ja) | 半導体装置及びその製造方法 | |
US4951102A (en) | Trench gate VCMOS | |
US20020036290A1 (en) | Semiconductor device having MIS field effect transistors or three-dimensional structure | |
US5654561A (en) | Insulated gate bipolar transistor with multiple buffer layers | |
JP3455452B2 (ja) | 半導体デバイス及びその製造方法 | |
JPH0734475B2 (ja) | 半導体装置 | |
JP3282375B2 (ja) | 相補型絶縁ゲート電界効果トランジスタ | |
JPH0237777A (ja) | 縦型電界効果トランジスタ | |
KR100518506B1 (ko) | 트랜치 게이트형 전력용 모스 소자 및 그 제조방법 | |
JPH05343686A (ja) | 半導体装置およびその製造方法 | |
JP3402548B2 (ja) | 半導体装置の製造方法 | |
US5115287A (en) | Step-cut insulated gate static induction transistors and method of manufacturing the same | |
JPS63131584A (ja) | 切り込み型絶縁ゲ−ト静電誘導トランジスタの製造方法 | |
JP2000068372A (ja) | 半導体デバイス及びその製造方法 | |
JPS6159543B2 (enrdf_load_stackoverflow) | ||
US7105421B1 (en) | Silicon on insulator field effect transistor with heterojunction gate | |
JPS63131583A (ja) | 切り込み型絶縁ゲ−ト静電誘導トランジスタの製造方法 | |
JP3017838B2 (ja) | 半導体装置およびその製造方法 | |
JPH04115538A (ja) | 半導体装置 | |
KR100405450B1 (ko) | 포켓형 접합층 구조를 가지는 dmos 트랜지스터 및그 제조 방법 | |
JPH06181312A (ja) | 半導体装置及びその製造方法 | |
KR100303356B1 (ko) | 더블 게이트 구조를 갖는 에스오아이 소자 및 그 제조방법 | |
JPS62286281A (ja) | 半導体装置とその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |