JPS63129086A - Ceramic structure - Google Patents
Ceramic structureInfo
- Publication number
- JPS63129086A JPS63129086A JP27629986A JP27629986A JPS63129086A JP S63129086 A JPS63129086 A JP S63129086A JP 27629986 A JP27629986 A JP 27629986A JP 27629986 A JP27629986 A JP 27629986A JP S63129086 A JPS63129086 A JP S63129086A
- Authority
- JP
- Japan
- Prior art keywords
- calcium
- ceramic structure
- weight
- metal
- aln
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 17
- 229910052727 yttrium Inorganic materials 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 14
- 229910052715 tantalum Inorganic materials 0.000 claims description 9
- 229910052748 manganese Inorganic materials 0.000 claims description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052721 tungsten Inorganic materials 0.000 claims description 8
- -1 Al_4C_3 Inorganic materials 0.000 claims description 3
- 238000001465 metallisation Methods 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000011575 calcium Substances 0.000 description 22
- 229910052751 metal Inorganic materials 0.000 description 22
- 239000002184 metal Substances 0.000 description 22
- 239000011230 binding agent Substances 0.000 description 14
- 239000004020 conductor Substances 0.000 description 14
- 229910052791 calcium Inorganic materials 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 11
- 229960005069 calcium Drugs 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 238000010304 firing Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 4
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 3
- 239000001856 Ethyl cellulose Substances 0.000 description 3
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 3
- 229940088601 alpha-terpineol Drugs 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 3
- 229920001249 ethyl cellulose Polymers 0.000 description 3
- 235000019325 ethyl cellulose Nutrition 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 3
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 3
- 229910016384 Al4C3 Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910014813 CaC2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- FMBVHKPWDJQLNO-UHFFFAOYSA-N 1-[(3-fluorophenyl)methyl]-5-nitroindazole Chemical compound N1=CC2=CC([N+](=O)[O-])=CC=C2N1CC1=CC=CC(F)=C1 FMBVHKPWDJQLNO-UHFFFAOYSA-N 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- 101100004202 Arabidopsis thaliana BBM gene Proteins 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OIANTAZTGQWWNQ-UHFFFAOYSA-N C12=CC=C(N1)C=C1C=CC(=N1)C=C1C=CC(N1)=CC=1C=CC(N1)=C2.[Y] Chemical compound C12=CC=C(N1)C=C1C=CC(=N1)C=C1C=CC(N1)=CC=1C=CC(N1)=C2.[Y] OIANTAZTGQWWNQ-UHFFFAOYSA-N 0.000 description 1
- 101100083507 Caenorhabditis elegans acl-2 gene Proteins 0.000 description 1
- 101100219382 Caenorhabditis elegans cah-2 gene Proteins 0.000 description 1
- CBOCVOKPQGJKKJ-UHFFFAOYSA-L Calcium formate Chemical compound [Ca+2].[O-]C=O.[O-]C=O CBOCVOKPQGJKKJ-UHFFFAOYSA-L 0.000 description 1
- BCZXFFBUYPCTSJ-UHFFFAOYSA-L Calcium propionate Chemical compound [Ca+2].CCC([O-])=O.CCC([O-])=O BCZXFFBUYPCTSJ-UHFFFAOYSA-L 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 101100497514 Monascus purpureus ctnR gene Proteins 0.000 description 1
- 101100060080 Monascus purpureus mpl2 gene Proteins 0.000 description 1
- 229910021601 Yttrium(III) bromide Inorganic materials 0.000 description 1
- JXOOCQBAIRXOGG-UHFFFAOYSA-N [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] Chemical compound [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] JXOOCQBAIRXOGG-UHFFFAOYSA-N 0.000 description 1
- DBNPLCUZNLSUCT-UHFFFAOYSA-N [B].[B].[B].[B].[B].[B].[Ba] Chemical compound [B].[B].[B].[B].[B].[B].[Ba] DBNPLCUZNLSUCT-UHFFFAOYSA-N 0.000 description 1
- PZKRHHZKOQZHIO-UHFFFAOYSA-N [B].[B].[Mg] Chemical compound [B].[B].[Mg] PZKRHHZKOQZHIO-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 1
- 239000001639 calcium acetate Substances 0.000 description 1
- 235000011092 calcium acetate Nutrition 0.000 description 1
- 229960005147 calcium acetate Drugs 0.000 description 1
- 235000010376 calcium ascorbate Nutrition 0.000 description 1
- 229940047036 calcium ascorbate Drugs 0.000 description 1
- 239000011692 calcium ascorbate Substances 0.000 description 1
- FNAQSUUGMSOBHW-UHFFFAOYSA-H calcium citrate Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O FNAQSUUGMSOBHW-UHFFFAOYSA-H 0.000 description 1
- 239000001354 calcium citrate Substances 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 235000019255 calcium formate Nutrition 0.000 description 1
- 229940044172 calcium formate Drugs 0.000 description 1
- 239000004281 calcium formate Substances 0.000 description 1
- 239000004227 calcium gluconate Substances 0.000 description 1
- 229960004494 calcium gluconate Drugs 0.000 description 1
- 235000013927 calcium gluconate Nutrition 0.000 description 1
- MKJXYGKVIBWPFZ-UHFFFAOYSA-L calcium lactate Chemical compound [Ca+2].CC(O)C([O-])=O.CC(O)C([O-])=O MKJXYGKVIBWPFZ-UHFFFAOYSA-L 0.000 description 1
- 239000001527 calcium lactate Substances 0.000 description 1
- 229960002401 calcium lactate Drugs 0.000 description 1
- 235000011086 calcium lactate Nutrition 0.000 description 1
- 229940078480 calcium levulinate Drugs 0.000 description 1
- QXDMQSPYEZFLGF-UHFFFAOYSA-L calcium oxalate Chemical compound [Ca+2].[O-]C(=O)C([O-])=O QXDMQSPYEZFLGF-UHFFFAOYSA-L 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 235000010331 calcium propionate Nutrition 0.000 description 1
- 239000004330 calcium propionate Substances 0.000 description 1
- BLORRZQTHNGFTI-ZZMNMWMASA-L calcium-L-ascorbate Chemical compound [Ca+2].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] BLORRZQTHNGFTI-ZZMNMWMASA-L 0.000 description 1
- NEEHYRZPVYRGPP-UHFFFAOYSA-L calcium;2,3,4,5,6-pentahydroxyhexanoate Chemical compound [Ca+2].OCC(O)C(O)C(O)C(O)C([O-])=O.OCC(O)C(O)C(O)C(O)C([O-])=O NEEHYRZPVYRGPP-UHFFFAOYSA-L 0.000 description 1
- SXDNHUFAYSNOHZ-UHFFFAOYSA-L calcium;2-ethylbutanoate Chemical compound [Ca+2].CCC(CC)C([O-])=O.CCC(CC)C([O-])=O SXDNHUFAYSNOHZ-UHFFFAOYSA-L 0.000 description 1
- JHLCADGWXYCDQA-UHFFFAOYSA-N calcium;ethanolate Chemical compound [Ca+2].CC[O-].CC[O-] JHLCADGWXYCDQA-UHFFFAOYSA-N 0.000 description 1
- HRBZRZSCMANEHQ-UHFFFAOYSA-L calcium;hexadecanoate Chemical compound [Ca+2].CCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCC([O-])=O HRBZRZSCMANEHQ-UHFFFAOYSA-L 0.000 description 1
- AMJQWGIYCROUQF-UHFFFAOYSA-N calcium;methanolate Chemical compound [Ca+2].[O-]C.[O-]C AMJQWGIYCROUQF-UHFFFAOYSA-N 0.000 description 1
- OEPJXTZQPRTGCX-UHFFFAOYSA-N calcium;propan-1-olate Chemical compound [Ca+2].CCC[O-].CCC[O-] OEPJXTZQPRTGCX-UHFFFAOYSA-N 0.000 description 1
- MMLSWLZTJDJYJH-UHFFFAOYSA-N calcium;propan-2-olate Chemical compound [Ca+2].CC(C)[O-].CC(C)[O-] MMLSWLZTJDJYJH-UHFFFAOYSA-N 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 101150102285 ctnA gene Proteins 0.000 description 1
- HCAJEUSONLESMK-UHFFFAOYSA-N cyclohexylsulfamic acid Chemical compound OS(=O)(=O)NC1CCCCC1 HCAJEUSONLESMK-UHFFFAOYSA-N 0.000 description 1
- 238000005261 decarburization Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- KEQVPIDOPAGWCP-UHFFFAOYSA-N ethanolate;yttrium(3+) Chemical compound [Y+3].CC[O-].CC[O-].CC[O-] KEQVPIDOPAGWCP-UHFFFAOYSA-N 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- WVLGTKBIJRAYME-UHFFFAOYSA-N methanolate;yttrium(3+) Chemical compound [Y+3].[O-]C.[O-]C.[O-]C WVLGTKBIJRAYME-UHFFFAOYSA-N 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NFSAPTWLWWYADB-UHFFFAOYSA-N n,n-dimethyl-1-phenylethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=CC=C1 NFSAPTWLWWYADB-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- IBSDADOZMZEYKD-UHFFFAOYSA-H oxalate;yttrium(3+) Chemical compound [Y+3].[Y+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O IBSDADOZMZEYKD-UHFFFAOYSA-H 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- WUBJXWWQGDPUCE-UHFFFAOYSA-N propan-1-olate yttrium(3+) Chemical compound [Y+3].CCC[O-].CCC[O-].CCC[O-] WUBJXWWQGDPUCE-UHFFFAOYSA-N 0.000 description 1
- NREVZTYRXVBFAQ-UHFFFAOYSA-N propan-2-ol;yttrium Chemical compound [Y].CC(C)O.CC(C)O.CC(C)O NREVZTYRXVBFAQ-UHFFFAOYSA-N 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 235000013337 tricalcium citrate Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 ■ 発明の背方E 技術分野 本発明は、セラミック構造体に関する。[Detailed description of the invention] ■ Behind the invention E Technical field The present invention relates to ceramic structures.
先行技術とその問題点
近年、電T−機器の小型化やt導体部品の高出力化に伴
って、基板等として用いる各種絶縁材料には、高熱伝導
性および高密度化が要求されている。 このようなこと
から、窒化アルミニウム焼結体が注目されてきている。Prior Art and its Problems In recent years, with the miniaturization of electrical T-equipment and the increase in the output of T-conductor parts, various insulating materials used as substrates and the like are required to have high thermal conductivity and high density. For these reasons, aluminum nitride sintered bodies have been attracting attention.
窒化アルミニウム焼結体は、窒化アルミニウムの熱伝
導率がアルミナの5倍と大きいため熱伝導性が良好で、
しかも熱膨張率が小さいという利点を有するからである
。Aluminum nitride sintered bodies have good thermal conductivity because the thermal conductivity of aluminum nitride is five times higher than that of alumina.
Moreover, it has the advantage of having a small coefficient of thermal expansion.
ところで、1枚の基板上に実装できる回路密度は限定さ
れ、より実装密度を向上させるために多層基板とするこ
とが有効とされている。By the way, the density of circuits that can be mounted on a single board is limited, and it is considered effective to use a multilayer board in order to further improve the mounting density.
なかでも、セラミックスのグリーンシート上にMOlW
などのペーストで配線を印刷し、位置を合わせて必要層
数重ね、焼成することによって得られる多層セラミック
基板は、放熱性の良さからも実用化が期待されている。Among them, MOLW on a ceramic green sheet
Multilayer ceramic substrates, which can be obtained by printing wiring with a paste such as silica, aligning the positions, stacking the required number of layers, and firing, are expected to be put into practical use due to their excellent heat dissipation properties.
実際、高純度AI!N粉末とCaC2粉末の混合粉末に
バインダを加えて作製したグリーンシートに、スルーホ
ールを形成し、AuNを添加したWのペーストを導体印
刷し、植層して焼成して得られるAlN多層配線基板が
報告されている(窯業協会誌1986年305〜306
頁2HO2)。In fact, high purity AI! AlN multilayer wiring board obtained by forming through holes in a green sheet made by adding a binder to a mixed powder of N powder and CaC2 powder, printing a conductor with a paste of W added with AuN, planting a layer, and firing it. It has been reported (Ceramic Industry Association Magazine 1986, 305-306)
Page 2HO2).
しかし、このものでは電気抵抗、熱伝導性、接着強度等
の特性が十分でなく、AINをシートとした場合の導体
材料の改良が望まれている。However, this material does not have sufficient properties such as electrical resistance, thermal conductivity, and adhesive strength, and it is desired to improve the conductive material when AIN is used as a sheet.
■ 発明の目的
本発明の目的は、AlNグリーンシートを用いる場合に
おいて、基板と金属との接着強度が大であり、緻密で放
熱性が良く、金属の導電性が良好で、かつ基板そのもの
の熱伝導性および電気抵抗性が高くメタライズド基板と
して好適な性能を有し、しかも多層配線基板としてもき
わめて特性の良好なセラミック構造体を提供することに
ある。■ Purpose of the Invention The purpose of the present invention is that when using an AlN green sheet, the adhesive strength between the substrate and the metal is high, it is dense and has good heat dissipation, the metal has good conductivity, and the heat of the substrate itself is high. The object of the present invention is to provide a ceramic structure that has high conductivity and electrical resistance and has suitable performance as a metallized substrate, and also has extremely good characteristics as a multilayer wiring board.
■ 発明の開示 このような目的は下記の本発明によって達成される。■Disclosure of invention These objects are achieved by the invention described below.
すなわち、本発明における第1の発明は、W、Moおよ
びTaのうちの少なくとも1[以トを80〜99.5重
量%、ならびに残部Ca、Ca化合物、YおよびY化合
物のうちの少なくとも1種以上を含む組成物をAuN系
基材に金属化したことを同時焼成するセラミック構造体
である。That is, the first aspect of the present invention is that at least one of W, Mo, and Ta is 80 to 99.5% by weight, and the balance is at least one of Ca, a Ca compound, Y, and a Y compound. This is a ceramic structure in which a composition containing the above is metallized onto an AuN base material and is co-fired.
また、第2の発明は、W、MoおよびTaのうちの少な
くとも1種以上を80〜99.5ffi■%、ならびに
残部Ca、Ca化合物、YおよびY化合物のうちの少な
くとも1種以上を含む混合物100重量部に対して、A
N□03゜Al1N、A14 C3、MnおよびNiの
うちの少なくとも1種以上を30重量%以下含有する組
成物をAl2N系基材に金属化したことを同時焼成する
セラミック構造体である。Further, the second invention provides a mixture containing 80 to 99.5ffi% of at least one of W, Mo, and Ta, and the balance containing at least one of Ca, a Ca compound, Y, and a Y compound. For 100 parts by weight, A
N□03° This is a ceramic structure in which an Al2N base material is metallized with a composition containing 30% by weight or less of at least one of Al1N, A14 C3, Mn, and Ni and then co-fired.
■ 発明の具体的構成 以丁、本発明の具体的構成について詳細に説明する。■Specific structure of the invention Hereinafter, the specific configuration of the present invention will be explained in detail.
本発明のセラミック構造体は、導体材料として、W、M
oおよびTaのうちの少なくとも1種以上を80〜99
.5重量%、好ましくは80〜90爪量%、ならびに残
部Ca、Ca化合物、YおよびY化合物のうちの少なく
とも1種以上を含むものを用い、絶縁材料としてAIL
Nグリーンシートを用いて、同時焼結により金属化した
AlNを得るものである。The ceramic structure of the present invention uses W, M as the conductor material.
80-99 at least one of o and Ta
.. 5% by weight, preferably 80 to 90% by weight, and the remainder contains at least one of Ca, Ca compounds, Y, and Y compounds, and the insulating material is AIL.
Metalized AlN is obtained by simultaneous sintering using N green sheets.
そして、導体材料として、上記のW、MoおよびTaの
うちの少なくとも1稲以ト、ならびにCa、Ca化合物
、YおよびY化合物のうちの少なくとも1種以上を含む
混合物100重量部に対して、Al2 o3 、AlN
。Then, as a conductor material, Al2 o3, AlN
.
Al4C3、MnおよびNiのうちの少なくとも1種以
上を30市量%以下、好ましくは5〜lO重叶%含有す
るものを用いると、さらに望ましい。It is more desirable to use a material containing at least one of Al4C3, Mn and Ni in an amount of 30% by weight or less, preferably 5 to 10% by weight.
導体材料の金属成分をW、MoおよびTaのうちの少な
くとも1種以上とするのは、後述する同時焼成の焼成温
度が1800℃程度であるため融点が1800℃以トの
金属を主に用いる必要があるからである。The reason why the metal component of the conductor material is at least one of W, Mo, and Ta is because the firing temperature in the simultaneous firing described later is about 1800°C, so it is necessary to mainly use a metal with a melting point of 1800°C or higher. This is because there is.
また、金属成分を80〜99.5重量%とするのは、8
0重晴%未満では、導体材料から形成される導体部の抵
抗増加の原因となり、99.5重量%をこえると、基板
と4体部との接着強度が低下するからである。In addition, the metal component is 80 to 99.5% by weight.
If it is less than 0% by weight, it will cause an increase in the resistance of the conductor part formed from the conductive material, and if it exceeds 99.5% by weight, the adhesive strength between the substrate and the four-part part will decrease.
Ca、Ca化合物、YおよびY化合物のうちの少なくと
も1種以上を添加するのは、Al1Nの金属化を容易に
するためである。 すなわち、AINの焼結は、Al2
N表面の酸化層Al1203と−F記のCa、Ca化合
物、Y、Y化合物で形成する液相焼結であるため、液相
形成成分であるこれらの化合物を金属成分に添加し、金
属の緻密化をはかり、またAl2N表血と金属との接着
を強固にするためである。The reason why at least one of Ca, a Ca compound, Y, and a Y compound is added is to facilitate metallization of Al1N. That is, the sintering of AIN is
Since this is a liquid phase sintering process in which the oxide layer Al1203 on the N surface is formed with Ca, Ca compounds, Y, and Y compounds listed in -F, these compounds, which are liquid phase forming components, are added to the metal component to increase the density of the metal. This is to improve the bond between the Al2N surface blood and the metal.
添加叶を金属の残部20〜0.05重量%とするのは、
この範囲外では、4体抵抗が上がり、導体として不具合
となりまた、基板への接着力が弱くなるからである。The reason why the remaining amount of metal is 20 to 0.05% by weight is as follows.
This is because, outside this range, the four-body resistance increases, resulting in defects as a conductor, and the adhesive force to the substrate becomes weak.
この場合のCa化合物としては■(体的にはCaO1C
aB6 、CaF2 、CaH2、Ca3 N2 、C
aCl2 、Ca (CN)2、CaC2、CaSiF
6 、CaS、(a3P2 、CaS i、CaS i
2 、カルシウムホルメート、カルシウムアセテート、
カルシウムオキサレート、カルシウムアセチルサリシレ
ート、カルシウムアスコルベート、カルシウムブロモラ
クトバイオレート、カルシウムN−カルバモイルアスパ
ラデート、クエン酸カルシウム、カルシウム2−エチル
ブタノエート、カルシウムグルコネート、カルシウムラ
クテート、カルシウムレブリネート、カルシウムメソオ
キサレート、カルシウムパルミテート、カルシウムパン
トチネート、カルシウムフェノキシト、カルシウムプロ
ピオネート、カルシウムメトキシド、カルシウムエトキ
シド、カルシウムプロポキシド、カルシウムイソプロポ
キシド、カルシウムビスアセチルアセトナト錯体等、ま
たY化合物としては、Y2 o3.YF3、YB6 、
Y2 N3 、YCffi3 、YBr3、YI3.
Y)12〜3.YN% Y(CN)、YC2、Y2 N
3 、YP、YSi、YAj22、YSb、YAs、Y
Bi、Y2 Se3 、Y2Te3.イツトリウムアセ
テート、イツトリウムオキサレート、イツトリウムメト
キシド、イツトリウムエトキシド、イツトリウムプロポ
キシド、イツトリウムイソプロポキシド、イツトリウム
フタロシアニン錯体、イツトリウムポリフィリン錯体等
が挙げられ、なかでもCaO1Y203が好ましい。In this case, the Ca compound is ■ (physically CaO1C
aB6, CaF2, CaH2, Ca3N2, C
aCl2, Ca(CN)2, CaC2, CaSiF
6, CaS, (a3P2, CaS i, CaS i
2. Calcium formate, calcium acetate,
Calcium oxalate, calcium acetyl salicylate, calcium ascorbate, calcium bromolactobiolate, calcium N-carbamoyl asparadate, calcium citrate, calcium 2-ethyl butanoate, calcium gluconate, calcium lactate, calcium levulinate, calcium Mesooxalate, calcium palmitate, calcium pantothinate, calcium phenoxyto, calcium propionate, calcium methoxide, calcium ethoxide, calcium propoxide, calcium isopropoxide, calcium bisacetylacetonate complex, etc., and Y compounds As Y2 o3. YF3, YB6,
Y2 N3, YCffi3, YBr3, YI3.
Y) 12-3. YN% Y(CN), YC2, Y2 N
3, YP, YSi, YAj22, YSb, YAs, Y
Bi, Y2Se3, Y2Te3. Examples thereof include yttrium acetate, yttrium oxalate, yttrium methoxide, yttrium ethoxide, yttrium propoxide, yttrium isopropoxide, yttrium phthalocyanine complex, and yttrium porphyrin complex, among which CaO1Y203 is preferred.
これらの添加物は、通常Al2N焼結体を作成する際焼
結助剤としても用いられる。These additives are also normally used as sintering aids when producing Al2N sintered bodies.
本発明においては、前述のように、E記の金属をt成分
とする混合物に、ざらにAl2O3、Al1N、Al4
C3、MnおよびNiのうちの少なくとも1神具Fを
添加してもよい。In the present invention, as mentioned above, roughly Al2O3, Al1N, Al4
At least one of C3, Mn and Ni may be added.
AJ2203はAIN表面のAffi203層が少ない
場合、または金属中の酸化物が少ない場合に供給するこ
とが好ましい。 AlNと金属との接着強度が増すか
らである。It is preferable to supply AJ2203 when there is little Affi203 layer on the AIN surface or when there are few oxides in the metal. This is because the adhesive strength between AlN and metal increases.
AINは、金属とAl2Nの熱膨張率に差がある場合に
添加することが好ましい(ただし、MoとAl1Nの熱
膨張率はほぼ等しい)。 熱膨張率のf+制御を行うた
めである。AIN is preferably added when there is a difference in the coefficient of thermal expansion between the metal and Al2N (however, the coefficients of thermal expansion of Mo and Al1N are approximately equal). This is to perform f+ control of the coefficient of thermal expansion.
Al4C3は、酸化物成分と1800℃では容易に反応
し活性なAl2Nを生成するため好ましい。 またAf
fi203もAfLNに転化する。Al4C3 is preferable because it easily reacts with the oxide component at 1800° C. to generate active Al2N. Also Af
fi203 is also converted to AfLN.
このようにして生成した活性なAl2Nは、基体のAI
Nとも一体化して接着強度の改善に寄!j、するからで
ある。 AR,Nを生成する様r−を模式的に示すと、
以下のようになる。The active Al2N generated in this way is
Integrates with N to improve adhesive strength! j, because it does. When r- is schematically shown to generate AR,N,
It will look like this:
Al24 c3 +Aj22 o3 +3N2−+6A
It N+3CO
Mn、NiはAQN表面のAl2O3層と金属との接着
性を改Rするために好ましい。Al24 c3 +Aj22 o3 +3N2-+6A
It N+3CO Mn, Ni is preferable in order to improve the adhesion between the Al2O3 layer on the AQN surface and the metal.
またこれらの化合物を添加する場合の添加頃を30 H
fHQ%以下とするのは、30重量%をこえると、導体
抵抗が上昇するからである。Also, when adding these compounds, the time of addition is 30 H.
The reason why fHQ% is set below is that if it exceeds 30% by weight, the conductor resistance increases.
このような成分を含む導体材料は通常ペーストにして用
いるが、この場合使用する結合剤(バインダ)としては
、後に塩バインダが可能であればよく、例えば、エチル
セルロース等が挙げられ、また溶剤としては、例えば、
α−テルピネオール等が挙げられる。Conductor materials containing such components are usually used in the form of a paste, but the binder used in this case may be any salt binder that can be used later, such as ethyl cellulose. ,for example,
Examples include α-terpineol.
なお、ペーストにする場合、各添加物の平均粒径は、W
、Mo、Taではo、i〜54、Ca、Y化合物等では
0.1〜10−、AJ2化合物、Mn、Ni等では0.
1〜10−程度とする。In addition, when making a paste, the average particle size of each additive is W
, o, i~54 for Mo, Ta, 0.1~10- for Ca, Y compounds, etc., 0. for AJ2 compounds, Mn, Ni, etc.
It should be about 1 to 10-.
本発明におけるセラミック構造体は、絶縁材料としてA
RNグリーンシートを用いる。The ceramic structure in the present invention uses A as an insulating material.
Use RN green sheets.
AlNグリーンシートは、ARNにAlN焼結体を作成
する場合に焼結助剤として用いる粉末を添加混合して室
温で加圧成形したものである。The AlN green sheet is obtained by adding and mixing powder to be used as a sintering aid when creating an AlN sintered body to ARN, and press-molding the mixture at room temperature.
このような粉末としては、カルシウム、バリウム、スト
ロンチウム、または希土類金属の水素化物、′や化物、
フッ化物、塩化物、シアン化物、チオシアン化物、炭化
物、ケイフッ化物、硫化物、ゲイ化物または金属間化合
物;ホウ化カルシウム、ホウ化ストロンチウム、ホウ化
バリウム、希に類金属のホウ化物、ホウ化マグネシウム
、ホウ化アルミニウム;希土類元素、カルシウム、バリ
ウム、ストロンチウム;酸化アルミニウム、酸化カルシ
ウム、酸化マグネシウム、酸化ベリリウム、酸化ホウ素
;窒化ホウ素;炭化ケイ素;カルシウムまたはイツトリ
ウムの有機化合物または4r機錯体;などが挙げられる
。Such powders include calcium, barium, strontium, or rare earth metal hydrides, oxides,
Fluorides, chlorides, cyanides, thiocyanides, carbides, silicofluorides, sulfides, gayrides or intermetallic compounds; calcium boride, strontium boride, barium boride, rare metal borides, magnesium boride , aluminum boride; rare earth elements, calcium, barium, strontium; aluminum oxide, calcium oxide, magnesium oxide, beryllium oxide, boron oxide; boron nitride; silicon carbide; organic compounds or 4r organ complexes of calcium or yttrium; etc. .
なかでも、カルシウム、イツトリウムまたはこれらの化
合物を用いることが好ましい。Among them, it is preferable to use calcium, yttrium, or a compound thereof.
具体的に、AINグリーンシートを作成する方法につい
ては、特願昭59−215971号、同59−2658
52号、同59−265853号、同59−26585
4号、同59−265855号、同59−265856
号、同60−55094号、同60−55095号、同
60−55096号、同60−57164号、同61−
19870号、同61−125362号、同61−14
4183号などに記載されたAlN焼結体の製造方法に
おける成形体を得る段階までの方法を参照することがで
きる。Specifically, regarding the method of creating an AIN green sheet, see Japanese Patent Application Nos. 59-215971 and 59-2658.
No. 52, No. 59-265853, No. 59-26585
No. 4, No. 59-265855, No. 59-265856
No. 60-55094, No. 60-55095, No. 60-55096, No. 60-57164, No. 61-
No. 19870, No. 61-125362, No. 61-14
The method up to the step of obtaining a molded body in the method for manufacturing an AlN sintered body described in No. 4183 and the like can be referred to.
次に本発明のセラミック構造体の製造方法について述べ
る。Next, a method for manufacturing the ceramic structure of the present invention will be described.
導体材料は、W、MoおよびTaのうちの少なくとも1
種以上、Ca、Ca化合物、YおよびY化合物のうちの
少なくとも1種以上、ならびに適宜AJ22 o3.A
l2N%Aj24C3、MnおよびNiのうちの少なく
とも1種以上を所定の割合で混合し、この混合物に後に
脱バインダが可能な結合剤およびこの結合剤を溶解して
スラリー化する溶剤を加え、十分に混練してペーストを
作成して得られる。The conductor material is at least one of W, Mo, and Ta.
species, at least one or more of Ca, Ca compounds, Y and Y compounds, and optionally AJ22 o3. A
At least one of l2N%Aj24C3, Mn, and Ni is mixed in a predetermined ratio, and a binder that can be debound later and a solvent that dissolves this binder to form a slurry are added to the mixture, and the mixture is thoroughly mixed. Obtained by kneading to make a paste.
このペーストを面述のようにして得られたARNグリー
ンシートに印刷し、必要に応じて所定の枚数を41層し
て熱圧着する。This paste is printed on the ARN green sheet obtained as described above, and if necessary, a predetermined number of 41 sheets are bonded by thermocompression.
その後、このものを、N2およびN2の混合ガス中で室
温〜700℃の範囲の温度で徐々に温度を上昇させ脱バ
インダする。 脱バインダの際の雰囲気を上記のように
するのは、脱炭ちlを少なくするためであるからであり
、上記のような温度範囲とするのは、室温未満の温度で
はバインダか分解されず脱バインダが不モ分となるから
であり、700℃をこえると、バインダの分解温度をは
るかにこえるため無駐となるからである。Thereafter, the binder is removed from this product by gradually raising the temperature in a mixed gas of N2 and N2 at a temperature in the range of room temperature to 700°C. The reason for setting the atmosphere during binder removal as above is to reduce decarburization, and the reason for setting the above temperature range is to ensure that the binder does not decompose at temperatures below room temperature. This is because removal of the binder results in non-resistance, and if the temperature exceeds 700°C, the decomposition temperature of the binder is far exceeded, so the binder becomes non-resident.
その後、さらに、N2およびN2の混合ガス中で175
0〜1850℃の温度で0.5〜3時間程度焼成する。Thereafter, further 175
It is baked at a temperature of 0 to 1850°C for about 0.5 to 3 hours.
焼成は、具体的には常圧焼成によればよい。Specifically, the firing may be performed by normal pressure firing.
なお、通常Al1Nは、厚さ5〜50−程度、金属は厚
さ2〜20−程度とする。Note that Al1N usually has a thickness of about 5 to 50 mm, and metal has a thickness of about 2 to 20 mm.
また、多層化は10層程度までiiJ能である。Further, multi-layering is possible up to about 10 layers.
このようにして作成した本発明のセラミック構造体は、
A42Nと金属との接着強度が2 Kg/−以上であり
、AuNに金属化したものの熱伝導率は室温で180
W/mK以−Lである。The ceramic structure of the present invention created in this way is
The adhesive strength between A42N and metal is 2 Kg/- or more, and the thermal conductivity of metallized AuN is 180 at room temperature.
W/mK or more -L.
また、Al2Nの電気抵抗は1014Ωcm以上、金属
の電気抵抗は20mΩ/口以下である。Further, the electrical resistance of Al2N is 1014 Ωcm or more, and the electrical resistance of metal is 20 mΩ/mouth or less.
また、多層化することにより、ICやLSIチップの搭
載数が増加し、ICパッケージ等にきわめて有利な多層
配線基板が実現する。Moreover, by increasing the number of layers, the number of IC and LSI chips mounted can be increased, and a multilayer wiring board that is extremely advantageous for IC packages and the like can be realized.
■ 発明の具体的作用効果
本発明によれば、W、MoおよびTaのうちの少なくと
も1種以上を80〜99.5爪付%、ならびに残部Ca
、Ca化合物、YおよびY化合物のうちの少なくとも1
種晶−トを含むもの、あるいは好ましくはこの混合物1
00重川部用対して、さらにAIL2 o3 、Al2
N、Al14C3,MnおよびNiのうちの少なくとも
1種以上を30j71]%以下含有するものをAl1N
に金属化しているため、基、板と金属との接着強度が大
であり、緻密で放熱性が良く、金属の導電性が良好で、
かつ基板そのものσ熱伝導性および電気抵抗性が高く、
メタライズド」^板として好適な性能を有するセラミッ
ク構造体か1:Iらねる。■Specific effects of the invention According to the invention, at least one of W, Mo, and Ta is added to a nailing percentage of 80 to 99.5%, and the balance is Ca.
, a Ca compound, Y, and at least one of a Y compound
containing seed crystals, or preferably a mixture thereof1
For 00 Shigekawabe, AIL2 o3, Al2
Al1N contains at least 30j71]% or more of at least one of N, Al14C3, Mn and Ni.
Because it is metallized, the adhesive strength between the substrate, plate and metal is high, it is dense and has good heat dissipation, and the metal has good conductivity.
In addition, the substrate itself has high thermal conductivity and electrical resistance.
A ceramic structure with suitable performance as a metallized plate is used.
このため、特性のきわめて良好な多層配線基板を1iP
ることができる。For this reason, a multilayer wiring board with extremely good characteristics can be
can be done.
■ 発明の几体的実施例
以上、本発明の基体的実施例を示し、本発明をさらに詳
細に説明する。(2) Exemplary Embodiments of the Invention The present invention will be explained in more detail by showing exemplary embodiments of the present invention.
実施例1
(1)AI2Nグリーンシートの作成
・ト均粒子−径3−のAlN粉末に、゛[均粒子−径1
0−のYC2粉末を2重j1」%添加し混合した。Example 1 (1) Creation of AI2N green sheet - AlN powder with uniform particle size of 3-
0-YC2 powder was added in an amount of 2 times 1'' and mixed.
次に、この混合物を室温で約1000にg/Cゴの圧
力を加えて厚さ100−の成形体とした。Next, a pressure of about 1,000 g/C was applied to this mixture at room temperature to form a molded product with a thickness of 100-100 g/C.
このようにしてAlNff−ンシート(縦2cm、横2
cffI、ノゾさ1m+n)を作成した。In this way, the AlNff-n sheet (length 2cm, width 2cm)
cffI, length 1m+n) was created.
(2)導体材料(ペースト)の作成
表1に示すように、金属と添加剤Tと添加剤IIとを混
合したものに結合剤(バインダ)としてエチルセルロー
スを用い、さらに結合剤を溶解しスラリー化する溶剤と
してα−テルピネオールを用い、α−テルピネオールと
エチルセルロースの混合割合を重量比で88:12とし
たものを加え、このものを[−分に混練してベーストを
作成した。(2) Creation of conductor material (paste) As shown in Table 1, ethyl cellulose is used as a binder in a mixture of metal, Additive T, and Additive II, and the binder is further dissolved to form a slurry. Using α-terpineol as a solvent, a mixture of α-terpineol and ethyl cellulose in a weight ratio of 88:12 was added, and this mixture was kneaded to [- minutes] to prepare a base.
なお、金属成分とバインダ成分との割合は重−[比で8
0 : 20とした。Note that the ratio of the metal component to the binder component is weight - [ratio of 8
The ratio was set to 0:20.
(3)印刷
1而述のように作成したAILNグリーンシートにL記
ペーストを10P厚に印刷し、熱圧着した。(3) Printing The L paste was printed to a thickness of 10P on the AILN green sheet prepared as described in 1 and bonded under heat.
(4)焼成
窒素と水素との5:1混合ガス中で常温〜700℃の範
囲の温度において脱バインダし、さらに1800℃で2
時間焼成した。(4) Burning: Debinding in a 5:1 mixed gas of nitrogen and hydrogen at a temperature in the range of room temperature to 700°C, and further at 1800°C for 2
Baked for an hour.
このようにして表1の試料101〜136(本発明)、
および試料201〜205(比較)を作成した。In this way, samples 101 to 136 (invention) in Table 1,
and Samples 201 to 205 (comparison) were created.
これらの試料についての特性を表1に示す。The properties of these samples are shown in Table 1.
特性の測定はF記のとおりである。The characteristics were measured as described in F.
(1)熱伝導率 メタライズド基板について室温にて測定した。(1) Thermal conductivity Measurements were made on the metallized substrate at room temperature.
(2)電気抵抗率
AIN基板については、両面にAgペースト電極設は測
定した。(2) Electrical resistivity Regarding the AIN substrate, the Ag paste electrode setting was measured on both sides.
また、金属については10crnのパターンとし測定し
た。Further, for metal, a pattern of 10 crn was used for measurement.
(3)引張り強度試験
試料に211I11×2■の大きさのスズメッキ+Vを
3〜5個等間隔に形成し、そのメッキ部分にリード線を
接着し、このリード線をスズメッキに対しIC直方向に
2にgの力で引張り、引張り強度を測定した。(3) Form 3 to 5 tin plating +V of 211I11 x 2 cm size on the tensile strength test sample at equal intervals, glue the lead wire to the plated part, and run the lead wire in the IC direction perpendicular to the tin plating. The tensile strength was measured by pulling with a force of 2 g.
表1より、本発明の効果は明らかである。From Table 1, the effects of the present invention are clear.
実施例2
実施例!で作成した本発明の各試料の組成を用いて多層
セラミック基板を作成した。 すなわち、5 X 5
ctnA It Nグリーンシートに導体を印刷し、5
層積層後、実施例1と同様に焼成した。Example 2 Example! A multilayer ceramic substrate was created using the composition of each sample of the present invention created in . That is, 5 x 5
Print the conductor on the ctnA It N green sheet and
After laminating the layers, firing was performed in the same manner as in Example 1.
これにより、最大8個のLSIを搭載できるきわめて良
好な多層配線基板が実現した。As a result, an extremely good multilayer wiring board that can mount up to eight LSIs has been realized.
Claims (6)
を80〜99.5重量%、ならびに残部Ca、Ca化合
物、YおよびY化合物のうちの少なくとも1種以上を含
む組成物をAlN系基材に金属化したことを特徴とする
セラミック構造体。(1) A composition containing 80 to 99.5% by weight of at least one of W, Mo, and Ta, and the balance containing at least one of Ca, Ca compound, Y, and Y compound, A ceramic structure characterized by metalized material.
特許請求の範囲第1項記載のセラミック構造体。(2) The ceramic structure according to claim 1, wherein a metalized AlN base material is laminated.
る特許請求の範囲第1項または第2項に記載のセラミッ
ク構造体。(3) The ceramic structure according to claim 1 or 2, wherein AlN and the composition are co-fired during metallization.
を80〜99.5重量%、ならびに残部Ca、Ca化合
物、YおよびY化合物のうちの少なくとも1種以上を含
む混合物100重量部に対して、Al_2O_3、Al
N、Al_4C_3、MnおよびNiのうちの少なくと
も1種以上を30重量%以下含有する組成物をAlN系
基材に金属化したことを特徴とするセラミック構造体。(4) Based on 100 parts by weight of a mixture containing 80 to 99.5% by weight of at least one of W, Mo, and Ta, and the balance containing at least one of Ca, Ca compound, Y, and Y compound. , Al_2O_3, Al
A ceramic structure comprising an AlN-based base material metallized with a composition containing 30% by weight or less of at least one of N, Al_4C_3, Mn, and Ni.
特許請求の範囲第4項に記載のセラミック構造体。(5) The ceramic structure according to claim 4, wherein a metallized AlN base material is laminated.
る特許請求の範囲第3項または第4項に記載のセラミッ
ク構造体。(6) The ceramic structure according to claim 3 or 4, wherein AlN and the composition are co-fired during metallization.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27629986A JPS63129086A (en) | 1986-11-19 | 1986-11-19 | Ceramic structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27629986A JPS63129086A (en) | 1986-11-19 | 1986-11-19 | Ceramic structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63129086A true JPS63129086A (en) | 1988-06-01 |
Family
ID=17567513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27629986A Pending JPS63129086A (en) | 1986-11-19 | 1986-11-19 | Ceramic structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63129086A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6483586A (en) * | 1987-09-28 | 1989-03-29 | Kyocera Corp | Method for metallizing aluminum nitride substrate |
JPH03146488A (en) * | 1989-10-30 | 1991-06-21 | Sumitomo Electric Ind Ltd | Production of aluminum nitride sintered body with metallizing layer |
JP2002261445A (en) * | 2001-02-27 | 2002-09-13 | Kyocera Corp | Wiring board |
-
1986
- 1986-11-19 JP JP27629986A patent/JPS63129086A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6483586A (en) * | 1987-09-28 | 1989-03-29 | Kyocera Corp | Method for metallizing aluminum nitride substrate |
JPH03146488A (en) * | 1989-10-30 | 1991-06-21 | Sumitomo Electric Ind Ltd | Production of aluminum nitride sintered body with metallizing layer |
JPH0544434B2 (en) * | 1989-10-30 | 1993-07-06 | Sumitomo Electric Industries | |
JP2002261445A (en) * | 2001-02-27 | 2002-09-13 | Kyocera Corp | Wiring board |
JP4570263B2 (en) * | 2001-02-27 | 2010-10-27 | 京セラ株式会社 | Wiring board |
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