JP2002261445A - Wiring board - Google Patents

Wiring board

Info

Publication number
JP2002261445A
JP2002261445A JP2001052404A JP2001052404A JP2002261445A JP 2002261445 A JP2002261445 A JP 2002261445A JP 2001052404 A JP2001052404 A JP 2001052404A JP 2001052404 A JP2001052404 A JP 2001052404A JP 2002261445 A JP2002261445 A JP 2002261445A
Authority
JP
Japan
Prior art keywords
aln
conductor layer
wiring
weight
wiring conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001052404A
Other languages
Japanese (ja)
Other versions
JP4570263B2 (en
Inventor
Yasuhiro Sasaki
康博 佐々木
Tomohide Hasegawa
智英 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001052404A priority Critical patent/JP4570263B2/en
Publication of JP2002261445A publication Critical patent/JP2002261445A/en
Application granted granted Critical
Publication of JP4570263B2 publication Critical patent/JP4570263B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L24/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/20Structure, shape, material or disposition of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73267Layer and HDI connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18162Exposing the passive side of the semiconductor or solid-state body of a chip with build-up interconnect

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a wiring board which can solve the problem raised when wiring having a thickness of >=30 μm is formed by simultaneously baking the wiring with an insulating substrate that the substrate warps, the resistance of the substrate increases, and disconnection, etc., is caused by the cracking or peeling of the wiring. SOLUTION: This wiring board is provided with the insulating substrate 1 composed of an AlN sintered compact containing AlN as the main ingredient and sintering aids and a wiring conductor layer 4 having a thickness of >=30 μm on or in the substrate 1. The conductor layer 4 contains a metallic component composed mainly of at least one kind of metal selected out of molybdenum and tungsten and a ceramic component in an amount of 5-15 wt.% per 100 wt.% of the metallic component. The ceramic component contains AlN and sintering aids and the ratio of the content of the sintering aids to that of AlN in the wiring conductor layer 4 is made 3-6 times as high as that of the content of the sintering aids to that of the metallic component in the AlN sintered compact.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、各種配線基板や半
導体素子収納用パッケージ等に適用されるAlN質配線
基板に関するものであり、特にパワーモジュール基板
等、大電流を流すことが可能な配線導体層を具備し、且
つ放熱性に優れた配線基板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an AlN-type wiring board applied to various wiring boards and packages for housing semiconductor elements, and more particularly to a wiring conductor capable of flowing a large current, such as a power module board. The present invention relates to a wiring board having a layer and excellent heat dissipation.

【0002】[0002]

【従来技術】近年、半導体素子の高集積化に伴って、半
導体装置からの発生熱が増大する傾向にあり、これによ
って生じる半導体装置の誤動作をなくすために、放熱性
に優れた基板材料が求められている。さらに、パワーモ
ジュール基板等は、配線の大電流対応や、前記と同様
に、放熱性の優れた配線基板が求められている。
2. Description of the Related Art In recent years, heat generation from a semiconductor device has tended to increase with the increase in the degree of integration of semiconductor elements. In order to eliminate the malfunction of the semiconductor device caused by this, substrate materials having excellent heat dissipation properties have been required. Have been. Further, as for the power module substrate and the like, there is a demand for a wiring substrate capable of handling a large current of wiring and having excellent heat dissipation as described above.

【0003】各種絶縁基板や半導体素子収納用パッケー
ジには、従来よりアルミナ質焼結体が使用されている
が、その熱伝導率は約20W/m・K程度という低い値
であるために、これに代わって高熱伝導率のAlN質焼
結体が注目されている。
Conventionally, alumina-based sintered bodies have been used for various insulating substrates and packages for accommodating semiconductor elements. However, their thermal conductivity is as low as about 20 W / m · K. Instead, AlN sintered bodies having high thermal conductivity have been attracting attention.

【0004】このAlNは、単味の熱伝導率の理論値が
320W/m・Kという高い値を有するために、それに
近づけるための焼結体の研究開発が進められ、最近では
200W/m・Kの熱伝導率を有するAlN質焼結体の
製造できるようになった。
Since the theoretical thermal conductivity of this AlN has a high value of 320 W / m · K, research and development of a sintered body for approaching the theoretical value has been advanced, and recently 200 W / m · K has been promoted. An AlN sintered body having a thermal conductivity of K can be manufactured.

【0005】また、AlN質焼結体を絶縁基板とする配
線基板においては、配線導体層をWやMo等の高融点金
属によって形成し絶縁基板と同時焼成により形成するこ
とも行われている。
In a wiring substrate using an AlN sintered body as an insulating substrate, a wiring conductor layer is formed of a high melting point metal such as W or Mo, and is formed by simultaneous firing with the insulating substrate.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記の
ようにAlN質焼結体からなる絶縁基板と、同時焼成に
よって形成した通常の配線導体層の体積抵抗は3×10
-8Ω・cmと高いために、1A以上の大電流を流すため
の導体層には対応できないことから、配線導体層の厚み
を厚くすることが提案されている。
However, as described above, the volume resistivity of the insulating substrate made of the AlN sintered body and the ordinary wiring conductor layer formed by co-firing are 3 × 10 5
Since it is so high as −8 Ω · cm, it cannot cope with a conductor layer for flowing a large current of 1 A or more, and therefore, it has been proposed to increase the thickness of the wiring conductor layer.

【0007】しかし、配線導体層の厚くなると、配線導
体層自体が焼結不良を起こしやすく、また、絶縁基板の
厚みの大きい配線導体層の周囲も同様に焼結不良を来
し、これにより、配線導体層の高抵抗化や配線導体層と
絶縁基板の界面剥離によって断線が起きたり、さらに、
配線導体層と絶縁基板との収縮挙動が異なるため、配線
基板に反りが発生するという問題があった。
However, when the thickness of the wiring conductor layer is increased, the wiring conductor layer itself tends to cause poor sintering, and the periphery of the thick wiring conductor layer of the insulating substrate also suffers from poor sintering. Disconnection occurs due to the increase in resistance of the wiring conductor layer and the separation of the interface between the wiring conductor layer and the insulating substrate.
Since the shrinkage behaviors of the wiring conductor layer and the insulating substrate are different, there is a problem that the wiring substrate is warped.

【0008】従って、本発明は、配線導体層の厚みが3
0μm以上と厚い場合でも、絶縁基板との同時焼成で形
成することができ、焼結不良による上記課題が発生せ
ず、且つ、基板の反りが少ない、大電流に対応可能な配
線導体層を有するAlN質配線基板を提供するを目的と
するものである。
Therefore, according to the present invention, when the thickness of the wiring conductor layer is 3
Even when the thickness is as thick as 0 μm or more, it can be formed by co-firing with an insulating substrate, does not cause the above problems due to poor sintering, has a small warpage of the substrate, and has a wiring conductor layer capable of handling a large current. It is an object of the present invention to provide an AlN-based wiring board.

【0009】[0009]

【課題を解決するための手段】本発明者らは、上記の現
象について種々検討を重ねた結果、厚みの厚い配線導体
層の場合、絶対体積が大きいために焼結不良を来しやす
いこと、また、焼結初期に多孔質状態の配線導体層が、
周囲の絶縁基板中の焼結助剤を吸収してしまうために、
配線導体層の周囲で焼結体の焼結不良が発生したことを
突き止め、これを解消するには、配線導体層中に、絶縁
基板と同成分であるAlNを含有させるとともに、そこ
に配合する焼結助剤量をAlN質焼結体よりも格段に多
量に配合することによって上記の焼結不良が解消される
ことを見いだした。
The present inventors have conducted various studies on the above-mentioned phenomena. As a result, it has been found that in the case of a thick wiring conductor layer, sintering failure is likely to occur due to a large absolute volume. Also, in the initial stage of sintering, the wiring conductor layer in a porous state
In order to absorb the sintering aid in the surrounding insulating substrate,
In order to find out the occurrence of sintering failure of the sintered body around the wiring conductor layer and eliminate it, the wiring conductor layer contains AlN, which is the same component as that of the insulating substrate, and is added thereto. It has been found that the above sintering failure is eliminated by blending the sintering aid in a much larger amount than the AlN sintered body.

【0010】即ち、本発明の配線基板は、AlNからな
る主成分と、焼結助剤成分とを含むAlN質焼結体の絶
縁基板と、該絶縁基板の表面あるいは内部に厚さが30
μm以上の配線導体層を具備する配線基板であって、前
記配線導体層が、モリブデン、タングステンのうちの少
なくとも1種を主とする金属成分と、該金属成分100
重量部に対して、5〜15重量部のセラミック成分とを
含み、該セラミック成分が、AlNと、焼結助剤成分と
を含み、前記配線導体層中のAlNに対する前記焼結助
剤の含有量が、AlN質焼結体におけるAlNに対する
焼結助剤の含有量の3〜6倍であることを特徴とするも
のである。
That is, the wiring board of the present invention comprises an insulating substrate of an AlN sintered body containing a main component composed of AlN and a sintering aid component, and having a thickness of 30 mm on the surface or inside of the insulating substrate.
A wiring substrate comprising a wiring conductor layer having a thickness of at least one of molybdenum and tungsten.
5 to 15 parts by weight of a ceramic component with respect to parts by weight, wherein the ceramic component contains AlN and a sintering aid component, and contains the sintering aid with respect to AlN in the wiring conductor layer. The amount is 3 to 6 times the content of the sintering aid to AlN in the AlN sintered body.

【0011】なお、前記AlN質焼結体中の焼結助剤成
分として、Yを含む希土類元素のうち少なくとも1種お
よび/またはアルカリ土類元素のうち少なくとも1種を
酸化物換算による合計でAlN100重量部当たり2〜
20重量部の割合で含むことが望ましい。
[0011] As a sintering aid component in the AlN sintered body, at least one of Y-containing rare earth elements and / or at least one of alkaline earth elements are converted to oxides in total of AlN100. 2 per part by weight
Desirably, the content is 20 parts by weight.

【0012】また、配線導体層中の焼結助剤成分とし
て、Yを含む希土類元素のうち少なくとも1種および/
またはアルカリ土類元素のうち少なくとも1種を酸化物
換算による合計でAlN100重量部当たり10〜70
重量部の割合で含むことが望ましい。さらに、前記Al
N質焼結体中の焼結助剤成分として含まれる希土類元素
および/またはアルカリ土類元素と同じ元素を配線導体
層中に含むことが望ましい。
Further, as a sintering aid component in the wiring conductor layer, at least one of Y-containing rare earth elements and / or
Alternatively, at least one of the alkaline earth elements is 10 to 70 per 100 parts by weight of AlN in total in terms of oxide.
It is desirable to include them in parts by weight. Further, the Al
It is desirable that the same element as the rare earth element and / or the alkaline earth element contained as the sintering aid component in the N-type sintered body be contained in the wiring conductor layer.

【0013】本発明によれば、30μm以上の配線導体
層中に含有するAlNを含むセラミック成分中の焼結助
剤量を絶縁基板を構成するAlN質焼結体における焼結
助剤量の3〜6倍とすることによって、焼結初期におい
て、配線導体層が周囲のAlN質成形体中の焼結助剤成
分を吸収することがなく、しかも配線導体層の焼結体性
を高めることができる結果、厚みの大きい配線導体層と
その周囲のAlN質焼結体をともに焼結させ、配線導体
層が高抵抗化、配線導体層と絶縁基板の界面剥離による
断線発生を防止するとともに、配線基板や配線導体層表
面の反りの発生を防止することができる。
According to the present invention, the amount of the sintering aid in the AlN-containing ceramic component contained in the wiring conductor layer having a size of 30 μm or more is 3 times the amount of the sintering aid in the AlN sintered body constituting the insulating substrate. By setting it to 6 times, at the initial stage of sintering, the wiring conductor layer does not absorb the sintering aid component in the surrounding AlN molded body, and the sinterability of the wiring conductor layer can be improved. As a result, the thick wiring conductor layer and the surrounding AlN sintered body are sintered together to increase the resistance of the wiring conductor layer, prevent disconnection due to separation of the interface between the wiring conductor layer and the insulating substrate, and reduce the wiring. The occurrence of warpage on the surface of the substrate or the wiring conductor layer can be prevented.

【0014】[0014]

【発明の実施の形態】(全体構造)以下に、本発明の配
線基板の一実施態様を示す概略断面図を基に説明する。
図1の配線基板は、AlN質焼結体からなる複数の絶縁
層1a、1b、1cが積層された絶縁基板1を具備し、
絶縁層1a、1b、1cの各表面には、厚さが30μm
未満の一般導体層2が設けられている。また、最表層で
ある絶縁層1aと、中間層である絶縁層1bに厚さが3
0μmの配線導体層4が設けられている。また、一般導
体層2同士、あるいは一般導体層2と配線導体層4間は
適宜、ビアホール導体3によって電気的に接続されてい
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS (Overall Structure) Hereinafter, a description will be given based on a schematic sectional view showing one embodiment of a wiring board of the present invention.
The wiring board of FIG. 1 includes an insulating substrate 1 on which a plurality of insulating layers 1a, 1b, and 1c made of an AlN sintered body are stacked.
Each surface of the insulating layers 1a, 1b, 1c has a thickness of 30 μm.
Less than the general conductor layer 2 is provided. Further, the insulating layer 1a as the outermost layer and the insulating layer 1b as the intermediate layer have a thickness of 3
The wiring conductor layer 4 having a thickness of 0 μm is provided. In addition, the general conductor layers 2 or between the general conductor layer 2 and the wiring conductor layer 4 are appropriately electrically connected by via-hole conductors 3.

【0015】最表層である絶縁層1aに設けられている
配線導体層4は、大電流用配線の他に、配線基板表面に
実装される実装部品が発する熱を放熱するヒートシンク
としての機能をも具備する。尚、上記の一般導体層2、
配線導体層4およびビアホール導体3は、いずれも、タ
ングステン(W)および/またはモリブデン(Mo)を
主成分とする導体からなるものであって、絶縁基板1と
同時焼成によって形成されたものである。
The wiring conductor layer 4 provided on the insulating layer 1a, which is the outermost layer, has a function as a heat sink for radiating heat generated by components mounted on the surface of the wiring board, in addition to the wiring for large current. Have. In addition, the above-mentioned general conductor layer 2,
Each of the wiring conductor layer 4 and the via-hole conductor 3 is made of a conductor containing tungsten (W) and / or molybdenum (Mo) as a main component, and is formed by simultaneous firing with the insulating substrate 1. .

【0016】本発明において、絶縁基板1を構成するA
lN質焼結体は、AlNを主成分とし、焼結助剤成分と
して、Yを含む希土類元素のうちの少なくとも1種およ
び/またはアルカリ土類元素のうち少なくとも1種を酸
化物換算による合計でAlN100重量部当たり2〜2
0重量部、特に5〜15重量部の割合で含むことが望ま
しい。
In the present invention, A which constitutes the insulating substrate 1
The 1N sintered body contains AlN as a main component, and as a sintering aid component, at least one of rare earth elements including Y and / or at least one of alkaline earth elements in total in terms of oxide. 2-2 per 100 parts by weight of AlN
It is desirably contained in an amount of 0 parts by weight, particularly 5 to 15 parts by weight.

【0017】これは、上記助剤量が2重量部よりも少な
いと、焼成温度が1900℃以上にしないと焼結でき
ず、その結果、配線導体層等を形成するタングステンや
モリブデンとの同時焼成が難しくなる。また、20重量
部よりも多いと、AlN質焼結体の長所である熱伝導性
が大幅に低下してしまう。
If the amount of the auxiliary agent is less than 2 parts by weight, sintering cannot be performed unless the sintering temperature is 1900 ° C. or more. Becomes difficult. If the amount is more than 20 parts by weight, the thermal conductivity, which is an advantage of the AlN-based sintered body, is significantly reduced.

【0018】Yを含む希土類元素としては、Y、Er、
Yb、Lu、Sm、Luの群から選ばれる少なくとも1
種が好適に用いられる。また、アルカリ土類元素として
は、Ca、Ba、Srの群から選ばれる少なくとも1種
が好適に用いられる。
The rare earth elements containing Y include Y, Er,
At least one selected from the group consisting of Yb, Lu, Sm, and Lu
Seeds are preferably used. As the alkaline earth element, at least one selected from the group consisting of Ca, Ba, and Sr is suitably used.

【0019】また、さらに1700℃以下の低温での焼
結性を高めるために、上記のYを含む希土類元素と、ア
ルカリ土類元素とを併用することが望ましく、その場
合、Yを含む希土類元素を酸化物換算で2重量部以上、
特に4重量部以上、アルカリ土類元素を酸化物換算で
0.02重量部以上、特に0.05重量部以上の割合で
含むことが望ましい。
In order to further improve the sinterability at a low temperature of 1700 ° C. or less, it is desirable to use the rare earth element containing Y and the alkaline earth element together, in which case the rare earth element containing Y 2 parts by weight or more in terms of oxide,
In particular, it is desirable to contain 4 parts by weight or more and an alkaline earth element in a proportion of 0.02 parts by weight or more, particularly 0.05 parts by weight or more in terms of oxide.

【0020】また、上記AlN質焼結体のその他の特性
を改善する上で、周期律表でTiなどの4a族、Ta、
Crなどの5a族、W、Moなどの6a族、Mnなどの
7a族、Fe、Ni、Coなどの8a族の各族元素化合
物を酸化物換算で3重量部以下の比率で含有していても
よい。
In order to improve other characteristics of the AlN sintered body, a 4a group such as Ti, Ta,
Group 5a group element such as Cr, group 6a group such as W and Mo, group 7a group such as Mn, and group 8a group element such as Fe, Ni and Co are contained in a ratio of 3 parts by weight or less in terms of oxide. Is also good.

【0021】かかる絶縁基板1の高熱伝導性を達成する
上では、焼結助剤成分の含有量は少ない方が良く、また
相対密度は95%以上、特に97%以上の高緻密体から
構成されるものが望ましい。
In order to achieve the high thermal conductivity of the insulating substrate 1, it is preferable that the content of the sintering aid component is small, and the insulating substrate 1 is composed of a dense body having a relative density of 95% or more, particularly 97% or more. Is desirable.

【0022】さらに、AlN質焼結体の熱伝導率は理論
値に近いことが望ましいが、特に70W/m・K以上、
さらには100W/m・K以上、さらには120W/m
・K以上であることが望ましい。
Further, it is desirable that the thermal conductivity of the AlN sintered body is close to the theoretical value.
Further, it is 100 W / m · K or more, and further, 120 W / m.
-It is desirable to be K or more.

【0023】本発明によれば、配線基板に設けられた種
々の導体層のうち、大電流を流す配線導体層4において
は、厚みが厚いことから焼結不良等が発生し、配線基板
に反り等を発生させやすい。
According to the present invention, among the various conductor layers provided on the wiring board, the wiring conductor layer 4 through which a large current flows has a large thickness, so that sintering failure or the like occurs, and the wiring board is warped. And so on.

【0024】そこで、本発明によれば、この配線導体層
4は、モリブデン、タングステンのうちの少なくとも1
種を主たる金属成分とするものであるが、まず、該金属
成分100重量部に対して、AlNを含むセラミック成
分を5〜15重量部、特に5〜12重量部の割合で含む
ことが重要である。
Therefore, according to the present invention, the wiring conductor layer 4 is formed of at least one of molybdenum and tungsten.
The seed is used as the main metal component. First, it is important that the ceramic component containing AlN is contained in a proportion of 5 to 15 parts by weight, particularly 5 to 12 parts by weight, based on 100 parts by weight of the metal component. is there.

【0025】これは、配線導体層4の焼結不良を防ぎ、
絶縁基板1との同時焼結性を達成させるとともに、配線
基板の反りを低減させるためである。上記セラミック成
分の含有量が5重量部より少ないと、絶縁基板1との収
縮挙動の違いが大きくなり、配線基板の反りが増大す
る。また15重量部より多いと、配線導体層4の導通抵
抗が高くなってしまい大電流の印加に適さなくなってし
まう。
This prevents sintering failure of the wiring conductor layer 4,
This is for achieving simultaneous sintering with the insulating substrate 1 and reducing the warpage of the wiring substrate. If the content of the ceramic component is less than 5 parts by weight, the difference in the shrinkage behavior from the insulating substrate 1 becomes large, and the warpage of the wiring board increases. On the other hand, if the amount is more than 15 parts by weight, the conduction resistance of the wiring conductor layer 4 becomes high, which makes it unsuitable for applying a large current.

【0026】また、上記のセラミック成分は、AlN以
外に、Yを含む希土類元素および/またはアルカリ土類
元素の少なくとも1種の元素を含む化合物からなる焼結
助剤成分を含むものであるが、これらの焼結助剤成分の
AlNに対する含有量が、前記AlN質焼結体における
AlNに対する焼結助剤成分の含有量の3〜6倍、特に
3〜5倍であることが重要である。即ち、上記の含有量
が3倍よりも少ないと、配線導体層の焼結時に、絶縁基
板のAlN質成形体中の焼結助剤成分が配線導体層側に
移行、吸収され、配線導体層周辺の焼結体が焼結不良を
来してしまうために、絶縁基板との接合強度がなくな
り、剥離による断線等が発生する恐れがある。また、6
倍より多いと、配線導体層中のセラミック成分組成がA
lN質焼結体の組成比と大きく異なるために基板と配線
導体層との収縮挙動の違いが大きくなり、基板や配線導
体層が反るなどの問題がある。
The ceramic component includes a sintering aid component composed of a compound containing at least one of a rare earth element containing Y and / or an alkaline earth element in addition to AlN. It is important that the content of the sintering aid component with respect to AlN is 3 to 6 times, particularly 3 to 5 times, the content of the sintering aid component with respect to AlN in the AlN-based sintered body. That is, when the content is less than three times, the sintering aid component in the AlN molded body of the insulating substrate is transferred to and absorbed by the wiring conductor layer during sintering of the wiring conductor layer. Since the peripheral sintered body causes sintering failure, the bonding strength with the insulating substrate is lost, and there is a possibility that disconnection or the like due to peeling may occur. Also, 6
If it is more than twice, the ceramic component composition in the wiring conductor layer becomes A
Since the composition ratio is largely different from the composition ratio of the 1N sintered body, the difference in shrinkage behavior between the substrate and the wiring conductor layer becomes large, and there is a problem that the substrate and the wiring conductor layer warp.

【0027】なお、この配線導体層4中におけるYを含
む希土類元素のうち少なくとも1種および/またはアル
カリ土類元素のうち少なくとも1種は、上記の比率で酸
化物換算による合計でAlN100重量部当たり10〜
70重量部の割合で含むことが適当である。
It is to be noted that at least one of the rare earth elements containing Y and / or at least one of the alkaline earth elements in the wiring conductor layer 4 has a total of 100 parts by weight of AlN in terms of oxide in the above ratio. 10
Suitably, it is contained in a proportion of 70 parts by weight.

【0028】なお、配線導体層4の中には、W、Moの
粒子成長を調整したり、収縮を調整するために、Ni
O、Fe23などを含有する場合もある。但し、これら
の成分の含有量が多すぎると著しい粒子成長が起こり、
かえって高抵抗化を招く恐れがあるため含有量は2重量
部以下であることが望ましい。
The wiring conductor layer 4 contains Ni, in order to adjust the growth of W and Mo particles and to adjust the shrinkage.
O, Fe 2 O 3 and the like may be contained in some cases. However, if the content of these components is too large, significant particle growth occurs,
On the contrary, the content is desirably not more than 2 parts by weight because the resistance may be increased.

【0029】また、本発明の配線基板において、一般導
体層2やビアホール導体3は、厚みの大きい配線導体層
4に比較して焼結性が良好であるために、特に限定する
ものではないが、配線導体層4と同一組成の導体成分に
よって形成することが製造工程上望ましい。
Further, in the wiring board of the present invention, the general conductor layer 2 and the via-hole conductor 3 are not particularly limited since they have better sinterability than the thick wiring conductor layer 4. It is desirable in the manufacturing process that the wiring conductor layer 4 is formed of a conductor component having the same composition.

【0030】(製造方法)次に、本発明の配線基板の製
造方法を詳述する。まず、AlN粉末100重量部に対
して、Yを含む希土類元素のうちの少なくとも1種の化
合物や、アルカリ土類元素のうち少なくとも1種の化合
物を酸化物換算による合計量でAlN100重量部当た
り、2〜20重量部、特に5〜15重量部の割合で添加
する。さらに必要に応じて、Ti、V、Nb、W、M
o、Mn、Fe、Ni、Coなどの周期律表第4a、5
a、6a、7a、8a族のうちの少なくとも1種の金属
または化合物を酸化物換算で3重量部以下の割合で添加
する。
(Manufacturing Method) Next, a method for manufacturing the wiring board of the present invention will be described in detail. First, with respect to 100 parts by weight of AlN powder, at least one compound of the rare earth elements containing Y and at least one compound of the alkaline earth elements are expressed as oxides in a total amount of 100 parts by weight of AlN, It is added in a proportion of 2 to 20 parts by weight, especially 5 to 15 parts by weight. Further, if necessary, Ti, V, Nb, W, M
o, Mn, Fe, Ni, Co, etc.
At least one metal or compound of a, 6a, 7a, or 8a group is added at a ratio of 3 parts by weight or less in terms of oxide.

【0031】そして、上記混合物に、バインダー、有機
溶剤を用いてスラリーを調製し、このスラリーをドクタ
ーブレード法、カレンダーロール法、圧延法などの手法
によりシート化してグリーンシートを作製する。
A slurry is prepared from the above mixture using a binder and an organic solvent, and the slurry is formed into a sheet by a method such as a doctor blade method, a calender roll method, and a rolling method, to produce a green sheet.

【0032】また、配線導体層4用の導体ペーストとし
て、有機成分以外の固形成分を基準として、モリブデン
またはタングステンを主たる金属成分とし、この金属成
分100重量部に対して、AlNと、Yを含む希土類元
素のうちの少なくとも1種の化合物や、アルカリ土類元
素のうち少なくとも1種の化合物とを含むセラミック成
分を5〜15重量部の割合で添加する。また、この時の
AlNに対する焼結助剤成分の含有量が、AlN質成形
体中におけるAlNに対する焼結助剤成分の含有量の3
〜6倍となるように調合する。
As the conductor paste for the wiring conductor layer 4, molybdenum or tungsten is used as a main metal component based on a solid component other than the organic component, and AlN and Y are contained with respect to 100 parts by weight of the metal component. A ceramic component containing at least one compound of the rare earth elements and at least one compound of the alkaline earth elements is added at a ratio of 5 to 15 parts by weight. At this time, the content of the sintering aid component with respect to AlN is 3% of the content of the sintering aid component with respect to AlN in the AlN molded body.
Mix up to 6 times.

【0033】上記において用いられるYを含む希土類元
素化合物、アルカリ土類元素化合物は、酸化物の他、あ
るいは焼成によって酸化物を形成することのできる炭酸
塩、硝酸塩、酢酸塩であってもよい。
The rare earth element compound and the alkaline earth element compound containing Y used in the above may be oxides or carbonates, nitrates and acetates capable of forming oxides by firing.

【0034】そして、上記導体ペーストを前記AlN質
グリーンシート上に、スクリーン印刷法でパターン状に
塗布する。また、配線導体層4を形成する場合、グリー
ンシートに金型プレスによる打ち抜きや、レーザ加工で
所定形状の配線導体層用の空隙を形成した後、この空隙
部に上記導体ペーストを印刷法やディスペンサで充填す
る。この時、空隙を形成するグリーンシートの厚みを変
えることにより、配線導体層の厚みを自在に変えること
ができる。つまり、配線の許容する電流値や電子部品の
発熱量などを考慮し、配線導体層の形状や厚みを任意に
変えることで対応することができる。
Then, the conductor paste is applied on the AlN green sheet in a pattern by screen printing. When the wiring conductor layer 4 is formed, a green sheet is punched by a die press, or a gap for the wiring conductor layer having a predetermined shape is formed by laser processing, and then the conductor paste is filled in the gap with a printing method or a dispenser. Fill with. At this time, the thickness of the wiring conductor layer can be freely changed by changing the thickness of the green sheet forming the void. That is, it can be dealt with by arbitrarily changing the shape and thickness of the wiring conductor layer in consideration of the current value allowed by the wiring and the heat generation amount of the electronic component.

【0035】なお、ビアホール導体3を形成する場合に
は、グリーンシートに、マイクロドリル、レーザ等によ
り直径が50μm〜250μmのビアホールを形成した
後、このビアホール内に上記の導体ペーストを充填す
る。この後、導体ペーストを印刷塗布したグリーンシー
トを位置合わせして積層圧着した後、この積層体を水素
窒素混合雰囲気などの非酸化性雰囲気中で1600〜1
800℃の温度で焼成して、前記絶縁基板1と配線導体
層4、一般導体層2およびビアホール導体3とを同時焼
成によって形成することができる。
When the via-hole conductor 3 is formed, a via hole having a diameter of 50 μm to 250 μm is formed on the green sheet by a microdrill, a laser, or the like, and the via paste is filled in the via hole. Thereafter, the green sheets on which the conductive paste is applied by printing are aligned and pressure-bonded by lamination, and the laminated body is placed in a non-oxidizing atmosphere such as a hydrogen-nitrogen mixed atmosphere at 1600 to 1400.
By baking at a temperature of 800 ° C., the insulating substrate 1 and the wiring conductor layer 4, the general conductor layer 2, and the via-hole conductor 3 can be formed by simultaneous baking.

【0036】[0036]

【実施例】高温焼成用として、AlN100重量部に対
して、酸化エルビウム8.0重量部の比率で混合し、こ
れにアクリル系樹脂をバインダーとして添加混合し、こ
れをドクターブレード法により成形し、AlN質グリー
ンシートを作製した。
EXAMPLE For sintering at high temperature, 100 parts by weight of AlN were mixed at a ratio of 8.0 parts by weight of erbium oxide, and an acrylic resin was added and mixed as a binder, and the mixture was molded by a doctor blade method. An AlN green sheet was produced.

【0037】また、低温焼成用として、上記組成に、酸
化ストロンチウム1.0重量部、酸化アルミニウム1.
0重量部添加して、上記同様にドクターブレード法によ
りAlN質グリーンシートを作製した。
For low-temperature sintering, 1.0 parts by weight of strontium oxide and 1.0 part by weight of aluminum oxide were added to the above composition.
After adding 0 parts by weight, an AlN green sheet was prepared by the doctor blade method in the same manner as described above.

【0038】次に、高温焼成用のグリーンシートに対し
て、表1に示す組成になるようにタングステン(W)も
しくはモリブデン(Mo)と、AlN、各焼結助剤成分
を混合し、この混合粉末に対してセルロース系樹脂をバ
インダーとして添加し、さらにフタル酸系有機溶剤を混
合分散させて、高温焼成基板用導体ペーストを作製し
た。
Next, tungsten (W) or molybdenum (Mo), AlN, and various sintering aid components were mixed with the green sheet for high-temperature sintering so that the composition shown in Table 1 was obtained. A cellulosic resin was added as a binder to the powder, and a phthalic acid-based organic solvent was mixed and dispersed to prepare a conductor paste for a high-temperature fired substrate.

【0039】また、低温焼成基板用も上記と同様に、表
2に示す組成になるように混合し、バインダーと有機溶
剤を添加して低温焼成基板用導体ペーストを作製した。
In the same manner as above, a low-temperature fired substrate was mixed so as to have the composition shown in Table 2, and a binder and an organic solvent were added to prepare a low-temperature fired substrate conductor paste.

【0040】次に、厚み30〜300μmのグリーンシ
ートの所定箇所を金型打ち抜きで幅5mm、長さ30m
mの空隙部を形成後、片面だけグリーンシートを積層圧
着した。そして、この空隙部に、上記導体ペーストを1
65メッシュのスクリーン印刷で充填した。その後、N
2とH2との雰囲気中で、高温焼成基板用は表1、低温焼
成基板用は表2の焼成温度で焼成し、表に示す厚みの配
線導体層を有するAlN基板を作製した。
Next, a predetermined portion of the green sheet having a thickness of 30 to 300 μm was punched out by a die to a width of 5 mm and a length of 30 m.
After the formation of the voids of m, the green sheets were laminated and pressed on one side only. Then, the above-mentioned conductor paste is filled with 1
Filled by 65 mesh screen printing. Then N
In an atmosphere of 2 and H 2 , firing was performed at the firing temperature shown in Table 1 for a high-temperature fired substrate and Table 2 for a low-temperature fired substrate to produce an AlN substrate having a wiring conductor layer having the thickness shown in the table.

【0041】なお、高温焼成によって作製されたAlN
質焼結体の熱伝導率は170W/m・K、低温焼成によ
って作製されたAlN質焼結体の熱伝導率は120W/
m・Kであった。
It should be noted that AlN produced by high-temperature firing was used.
The thermal conductivity of the porous sintered body was 170 W / m · K, and the thermal conductivity of the AlN sintered body produced by low-temperature firing was 120 W / m · K.
m · K.

【0042】かくして得られたAlN質配線基板におい
て、レーザによる形状測定機で、配線導体層表面の反り
を測定した。さらに、X線透過分析と、基板を切断し
て、配線導体層のSEM分析を行い、配線導体層の焼結
状態、クラックの有無、磁器界面の剥離の有無を確認し
た。また、4端子法により、配線導体層の電気抵抗を測
定した。
With respect to the AlN-based wiring board thus obtained, the surface warpage of the wiring conductor layer was measured by a shape measuring machine using a laser. Further, X-ray transmission analysis and cutting of the substrate, and SEM analysis of the wiring conductor layer were performed to confirm the sintering state of the wiring conductor layer, the presence or absence of cracks, and the presence or absence of peeling at the porcelain interface. Further, the electric resistance of the wiring conductor layer was measured by a four-terminal method.

【0043】[0043]

【表1】 [Table 1]

【0044】[0044]

【表2】 [Table 2]

【0045】表1、2の結果によれば、試料No.10
のように、配線導体層におけるAlNを含むセラミック
成分の含有量が5重量部より少ないと基板の反りが増大
し、逆に試料No.14のように15重量部より多すぎ
ると電気抵抗が高くなった。また、試料No.1、7、
17、23、29、35、41のように、焼結助剤成分
量がAlN質焼結体中の助剤成分量の3倍よりも少ない
と、配線導体層や配線導体層周辺の焼結体が焼結不良を
来し、配線導体層の電気抵抗が高くなったり、配線導体
層のクラックや剥離が発生した。また、試料No.6、
16、22、28、34、40、46のように、焼結助
剤成分量がAlN質焼結体中の助剤成分量の6倍よりも
多いと、基板の反りが大きく、電子部品等の実装に影響
を及ぼすものであった。
According to the results of Tables 1 and 2, Sample No. 10
When the content of the ceramic component including AlN in the wiring conductor layer is less than 5 parts by weight, the warpage of the substrate increases. When the amount was more than 15 parts by weight as in 14, the electric resistance was increased. In addition, the sample No. 1, 7,
When the amount of the sintering aid component is less than three times the amount of the auxiliary component in the AlN sintered body as in 17, 23, 29, 35, and 41, the sintering around the wiring conductor layer and the wiring conductor layer is suppressed. Poor sintering of the body resulted in an increase in the electrical resistance of the wiring conductor layer and cracking and peeling of the wiring conductor layer. In addition, the sample No. 6,
When the amount of the sintering aid component is more than 6 times the amount of the auxiliaries component in the AlN sintered body as in 16, 22, 28, 34, 40, and 46, the warpage of the substrate is large, and electronic components and the like are generated. Had an effect on the implementation of

【0046】これに対して、本発明の試料は、いずれも
良好な焼結性を示し、配線導体層の表面の反りも小さ
く、且つ電気抵抗も小さく、絶縁基板に対して剥離やク
ラックなどが発生することも防止できた。
On the other hand, all of the samples of the present invention show good sinterability, have a small surface warpage of the wiring conductor layer, a small electric resistance, and are free from peeling and cracks on the insulating substrate. It could be prevented from occurring.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のAlN質配線基板の一例の概略断面図
である。
FIG. 1 is a schematic sectional view of an example of an AlN-based wiring board of the present invention.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 一般導体層 3 ビアホール導体 4 配線導体層 DESCRIPTION OF SYMBOLS 1 Insulating board 2 General conductor layer 3 Via hole conductor 4 Wiring conductor layer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】AlNからなる主成分と、焼結助剤成分と
を含むAlN質焼結体の絶縁基板と、該絶縁基板の表面
あるいは内部に厚さが30μm以上の配線導体層を具備
する配線基板であって、前記配線導体層が、モリブデ
ン、タングステンのうちの少なくとも1種を主とする金
属成分と、該金属成分100重量部に対して、5〜15
重量部のセラミック成分とを含み、該セラミック成分
が、AlNと、焼結助剤成分とを含み、前記配線導体層
中のAlNに対する焼結助剤成分の含有量が、AlN質
焼結体におけるAlNに対する焼結助剤成分の含有量の
3〜6倍であることを特徴とする配線基板。
1. An insulating substrate of an AlN sintered body containing a main component composed of AlN and a sintering aid component, and a wiring conductor layer having a thickness of 30 μm or more on the surface or inside of the insulating substrate. A wiring substrate, wherein the wiring conductor layer is formed of a metal component mainly composed of at least one of molybdenum and tungsten, and 5 to 15 parts by weight based on 100 parts by weight of the metal component.
Parts by weight of a ceramic component, wherein the ceramic component includes AlN and a sintering aid component, and the content of the sintering aid component with respect to AlN in the wiring conductor layer is an AlN sintered body. A wiring substrate, wherein the content of the sintering aid component is 3 to 6 times the content of AlN.
【請求項2】前記AlN質焼結体中の焼結助剤成分とし
て、Yを含む希土類元素のうち少なくとも1種および/
またはアルカリ土類元素のうち少なくとも1種を酸化物
換算による合計でAlN100重量部当たり2〜20重
量部の割合で含むことを特徴とする請求項1記載の配線
基板。
2. The sintering aid component in the AlN sintered body includes at least one of Y-containing rare earth elements and / or
2. The wiring board according to claim 1, wherein at least one of the alkaline earth elements is contained in a ratio of 2 to 20 parts by weight per 100 parts by weight of AlN in terms of oxide.
【請求項3】配線導体層中の焼結助剤成分として、Yを
含む希土類元素のうち少なくとも1種および/またはア
ルカリ土類元素のうち少なくとも1種を酸化物換算によ
る合計でAlN100重量部当たり10〜70重量部の
割合で含むことを特徴とする請求項1または請求項2記
載の配線基板。
3. A sintering aid component in a wiring conductor layer, wherein at least one of Y-containing rare earth elements and / or at least one of alkaline earth elements are converted to oxides in total per 100 parts by weight of AlN. The wiring board according to claim 1, wherein the wiring board is contained in an amount of 10 to 70 parts by weight.
【請求項4】前記AlN質焼結体中の焼結助剤成分とし
て含まれる希土類元素および/またはアルカリ土類元素
と同じ元素を配線導体層中に含むことを特徴とする請求
項2または請求項3記載の配線基板。
4. A wiring conductor layer containing the same element as a rare earth element and / or an alkaline earth element contained as a sintering aid component in the AlN sintered body. Item 3. The wiring board according to Item 3.
JP2001052404A 2001-02-27 2001-02-27 Wiring board Expired - Fee Related JP4570263B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009158549A (en) * 2007-12-25 2009-07-16 Panasonic Electric Works Co Ltd Aluminum nitride-based base material for three-dimensional circuit board, manufacturing method thereof and three-dimensional circuit board
JP2011060826A (en) * 2009-09-07 2011-03-24 Ngk Spark Plug Co Ltd Electrostatic chuck and method of manufacturing the same
JP7491829B2 (en) 2020-12-17 2024-05-28 日本特殊陶業株式会社 Wiring Board

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63129086A (en) * 1986-11-19 1988-06-01 ティーディーケイ株式会社 Ceramic structure
JPS63195183A (en) * 1987-02-06 1988-08-12 住友電気工業株式会社 Aln sintered body with metallized surface and manufacture
JPH01308893A (en) * 1988-06-08 1989-12-13 Murata Mfg Co Ltd Tungsten paste
JPH01313365A (en) * 1988-06-10 1989-12-18 Sumitomo Electric Ind Ltd Sintered body of metallized aln having high thermal conductivity and high-thermally conductive substrate
JPH10194875A (en) * 1996-12-27 1998-07-28 Kyocera Corp Metallized aluminum nitride substrate and its production

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63129086A (en) * 1986-11-19 1988-06-01 ティーディーケイ株式会社 Ceramic structure
JPS63195183A (en) * 1987-02-06 1988-08-12 住友電気工業株式会社 Aln sintered body with metallized surface and manufacture
JPH01308893A (en) * 1988-06-08 1989-12-13 Murata Mfg Co Ltd Tungsten paste
JPH01313365A (en) * 1988-06-10 1989-12-18 Sumitomo Electric Ind Ltd Sintered body of metallized aln having high thermal conductivity and high-thermally conductive substrate
JPH10194875A (en) * 1996-12-27 1998-07-28 Kyocera Corp Metallized aluminum nitride substrate and its production

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009158549A (en) * 2007-12-25 2009-07-16 Panasonic Electric Works Co Ltd Aluminum nitride-based base material for three-dimensional circuit board, manufacturing method thereof and three-dimensional circuit board
JP2011060826A (en) * 2009-09-07 2011-03-24 Ngk Spark Plug Co Ltd Electrostatic chuck and method of manufacturing the same
JP7491829B2 (en) 2020-12-17 2024-05-28 日本特殊陶業株式会社 Wiring Board

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