JPS63121050A - Photosensitive material treatment device for maintaining specified level of processing liquid stored in processing liquid tank - Google Patents
Photosensitive material treatment device for maintaining specified level of processing liquid stored in processing liquid tankInfo
- Publication number
- JPS63121050A JPS63121050A JP26729386A JP26729386A JPS63121050A JP S63121050 A JPS63121050 A JP S63121050A JP 26729386 A JP26729386 A JP 26729386A JP 26729386 A JP26729386 A JP 26729386A JP S63121050 A JPS63121050 A JP S63121050A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- tank
- processing liquid
- processing
- level
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 151
- 239000000463 material Substances 0.000 title claims description 14
- 238000000034 method Methods 0.000 claims abstract description 7
- 238000007599 discharging Methods 0.000 claims 1
- 230000007423 decrease Effects 0.000 abstract description 9
- 230000003247 decreasing effect Effects 0.000 abstract 3
- 238000005507 spraying Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
Landscapes
- Photographic Processing Devices Using Wet Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明は処理液槽に貯溜される処理液の液面を一定に
維持する感光材料処理装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a photosensitive material processing apparatus that maintains a constant level of processing liquid stored in a processing liquid tank.
（発明の背景）
感光材料処理装置として、例えば印刷版を処理するもの
とに比較的小型なディップ式がある。(Background of the Invention) As a photosensitive material processing apparatus, for example, there is a relatively small dip-type apparatus for processing printing plates.
このようなディップ式には、印刷版を現像液槽の現像液
中において搬送し、印刷版の非画像部の感光層を溶解剥
離させ、そしてこの現像処理された印刷版を、フィニッ
シャ−液槽に設けられた上下一対の液引きローラ間に搬
送させ、印刷版にフィニッシャ−液を塗布するものがあ
る。In such a dip method, the printing plate is transported in a developer in a developer tank, the photosensitive layer in the non-image area of the printing plate is dissolved and peeled off, and the developed printing plate is transferred to a finisher tank. There is one in which the finisher liquid is applied to the printing plate by conveying it between a pair of upper and lower liquid pulling rollers provided on the printing plate.
（発明が解決しようとする問題点）
ところで、このようなものでは、現像液槽の現像液の液
面が印刷版の処理によって低下すると、印刷版の現像時
間が異なってくるにもかかわらず液面の管理が行なわれ
ていない。また、フィニッシャ−液槽においても、下側
の液引きローラだけが液に浸っており、上側の液引きロ
ーラは下側の液引きローラから持ち上げられたフィニッ
シャ−液を塗布するため、処理により液面が低下すると
液の持ち上げが十分でない場合が生じる。(Problem to be Solved by the Invention) By the way, in such a device, when the liquid level of the developer in the developer tank decreases due to processing of the printing plate, the liquid level decreases even though the developing time of the printing plate is different. There is no surface management. In addition, in the finisher liquid tank, only the lower liquid pulling roller is immersed in liquid, and the upper liquid pulling roller applies the finisher liquid lifted from the lower liquid pulling roller, so the liquid is removed during processing. If the surface is lowered, the liquid may not be lifted up enough.
この発明はかかる背景に基づきなされたもので、処理液
槽の処理液の液面を常に一定ＩＵＪｔ、、安定した処理
を可能にする感光材料処理装置を提供することを目的と
している。The present invention has been made based on this background, and an object of the present invention is to provide a photosensitive material processing apparatus that enables stable processing with a constant level of processing liquid in a processing liquid tank at a constant IUJt.
（問題点を解決するための手段）
この発明は前記の問題点を解決するために、処理液を貯
溜した処理液槽を備え、感光材料を搬送しながら前記処
理Ｍ槽の処理液で処理する感光材料処理装置において、
前記処理液槽の処理液の液面が設定以上に上昇するとオ
ーバフローさせる液排出手段と、このオーバフローして
排出される処理液を一旦貯溜する液貯溜タンクと、この
液貯溜タンクの処理液を前記処理槽へ供給する液供給手
段とを備えることを特徴としている。(Means for Solving the Problems) In order to solve the above-mentioned problems, the present invention includes a processing liquid tank in which a processing liquid is stored, and processes the photosensitive material with the processing liquid in the processing tank M while conveying it. In photosensitive material processing equipment,
A liquid discharge means for overflowing the processing liquid when the liquid level of the processing liquid in the processing liquid tank rises above a set level; a liquid storage tank for temporarily storing the processing liquid discharged by overflow; The apparatus is characterized by comprising a liquid supply means for supplying the liquid to the processing tank.
（作用）
この発明では、液貯溜タンクの処理液を液供給手段で処
理液槽へ供給する。この処理液の供給で感光材料を処理
する処理液槽の処理液の液面が設定以上に上昇すると、
液排出手段で処理液がオーバフローして排出され、液面
が常に一定となる。(Function) In this invention, the processing liquid in the liquid storage tank is supplied to the processing liquid tank by the liquid supply means. When the liquid level of the processing liquid in the processing liquid tank that processes the photosensitive material by supplying this processing liquid rises above the setting,
The processing liquid overflows and is discharged by the liquid discharge means, so that the liquid level is always constant.
この液排出手段でオーバフローして排出される処理液は
前記液貯溜タンクに一旦貯溜され、処理液の減少は液貯
溜タンクに貯溜されている液で補償される。The processing liquid that overflows and is discharged by the liquid discharge means is temporarily stored in the liquid storage tank, and a decrease in the processing liquid is compensated for by the liquid stored in the liquid storage tank.
（実施例）
以下、この発明を印刷版の現像装置に適用した実施例を
添付図面に基づいて詳細に説明する。(Example) Hereinafter, an example in which the present invention is applied to a developing device for a printing plate will be described in detail based on the accompanying drawings.
第１図は現像装置の概略断面図で、符号１は現像液槽、
２はプレリンス液槽、３はフィニッシャ−液槽である。FIG. 1 is a schematic cross-sectional view of the developing device, where numeral 1 indicates a developer tank;
2 is a prerinse liquid tank, and 3 is a finisher liquid tank.
現像液槽１に取り付けられた挿入台ｌａ側には送りロー
ラ４が、他側にはスクイズローラ５がそれぞれ設けられ
、さらに現像液Ｎ！１の現像液中には搬送ガイド６が、
感光材料としての印刷版７を現像液に浸して搬送するよ
うに設けられている。印刷版フは現像液中を搬送される
とき、印刷版７の支持体であるアルミニウム板から非画
像部のジアゾ感光層が溶解する。搬送ガイド６の後端部
にはブラシ８．９及び吸引ノズル１０．１１が搬送路の
上下に配置されている。この上側及び下側のブラシ８．
９はそれぞれ印刷版７の幅方向に処理部全幅に渡り密に
植えられ、その先端部は搬送される印刷版７の溶解して
表面に漂っている感光層に面接触して強制的に剥離する
ようになっている。A feed roller 4 is provided on the side of the insertion table la attached to the developer tank 1, and a squeeze roller 5 is provided on the other side. A conveying guide 6 is placed in the developer 1.
It is provided so that a printing plate 7 as a photosensitive material is immersed in a developer and transported. When the printing plate 7 is transported through the developer, the diazo photosensitive layer in the non-image area is dissolved from the aluminum plate which is the support of the printing plate 7. At the rear end of the conveyance guide 6, brushes 8.9 and suction nozzles 10.11 are arranged above and below the conveyance path. This upper and lower brush 8.
9 are densely planted across the entire width of the processing area in the width direction of the printing plate 7, and their tips come into surface contact with the photosensitive layer that is melted and floating on the surface of the printing plate 7 being conveyed, and are forcibly peeled off. It is supposed to be done.
前記上側及び下側の吸引ノズル１０．１１は印刷版７の
幅方向に配置され、吸引ノズル１０．１１の搬送路側に
は吸入口が所定ピッチで形成されている。この吸引ノズ
ル１０．１１は図示しない循環ポンプの駆動でブラシ８
，９ではき倍された感光層を現像液とともに吸引し、吐
出口１２から現像前半の搬送路付近に吐出するようにな
っている。The upper and lower suction nozzles 10.11 are arranged in the width direction of the printing plate 7, and suction ports are formed at a predetermined pitch on the transport path side of the suction nozzles 10.11. This suction nozzle 10.11 is driven by a circulation pump (not shown), and the brush 8
, 9 suck the multiplied photosensitive layer together with the developer, and discharge it from the discharge port 12 near the conveyance path in the first half of development.
面記プレリンス液ＭＩ２には送りローラ１３、液引きロ
ーラ１４及びプレリンス液を噴射するシャワーパイプ１
５が備えられ、またフィニッシャ−液Ｊ１１３にも送り
ローラ１６、液引きローラ１７及びフィニッシャ−液を
噴射するシャワーパイプ１８が備えられている。The pre-rinsing liquid MI2 includes a feed roller 13, a liquid pulling roller 14, and a shower pipe 1 for spraying the pre-rinsing liquid.
5, and the finisher liquid J113 is also provided with a feed roller 16, a liquid pulling roller 17, and a shower pipe 18 for spraying the finisher liquid.
前記現像液Ｍ１１には第２図に示すように、現像液Ｍ１
１より低い位置に液貯溜タンク１９が配置されている。As shown in FIG. 2, the developer M11 contains
A liquid storage tank 19 is arranged at a position lower than 1.
この液貯溜タンク１９は現像液Ｎ１１とパイプ２０で連
結され、このパイプ２０の液槽側端部２０ａは所定の位
置にあり、現像液Ｍｉ内の現像液の液面が設定以上に上
昇するとオーバフローさせる液排出手段となっている。This liquid storage tank 19 is connected to the developer N11 by a pipe 20, and the end 20a of the pipe 20 on the side of the liquid tank is at a predetermined position. This serves as a means for draining the liquid.
現像液は液貯溜タンク１９に一旦貯溜され、この液貯溜
タンク１９の現像液は循環ポンプ２１の駆動によって、
供給パイプ２２を介して現像液槽１へ供給される。循環
ポンプ２１は例えばベローズポンプが用いられ、この循
環ポンプ２１と供給バイブ２２とで液供給手段を構成し
ている。The developer is temporarily stored in a liquid storage tank 19, and the developer in this liquid storage tank 19 is pumped by the circulation pump 21.
It is supplied to the developer tank 1 via the supply pipe 22. For example, a bellows pump is used as the circulation pump 21, and the circulation pump 21 and the supply vibrator 22 constitute a liquid supply means.
従って、循環ポンプ２１を駆動すると、液貯溜タンク１
９の現像液が供給バイブ２２を介して、現像液槽ｌへ供
給される。これにより、現像液槽ｌの現像液の液面が設
定より上昇すると、その分バイブ２０の端部２０ａより
オーバフローして排出され、液貯溜タンク１９へ一旦貯
溜される。このため、印刷版７の現像処理で現像液が減
少すると、その減少分が液貯溜タンク１９内の現像液が
減少することにより補償され、現像液槽１の液面は低下
することがなく、常に一定の液面に維持される。従って
、印刷版７の現像時間が現像液の減少で変化することが
防止され、掌に安定した現像処理が可能となる。Therefore, when the circulation pump 21 is driven, the liquid storage tank 1
9 is supplied to the developer tank l via the supply vibrator 22. As a result, when the liquid level of the developer in the developer tank l rises above the set level, the developer overflows from the end 20a of the vibrator 20 and is discharged, and is temporarily stored in the liquid storage tank 19. Therefore, when the developer decreases during the development process of the printing plate 7, the decrease is compensated for by the decrease in the developer in the liquid storage tank 19, and the liquid level in the developer tank 1 does not drop. The liquid level is always maintained at a constant level. Therefore, the development time of the printing plate 7 is prevented from changing due to a decrease in developer, and stable development processing is possible.
第３図はこの発明をプレリンス液槽に適用したもので、
第２図の現像液槽に適用した構成と略同様であるが、供
給パイプ２２がシャワーパイプ１５と連結されている点
で異なフている。Figure 3 shows this invention applied to a pre-rinsing liquid tank.
The configuration is substantially the same as that applied to the developer tank shown in FIG. 2, but differs in that the supply pipe 22 is connected to the shower pipe 15.
従って、循環ポンプ２１の駆動で、液貯部タンク１９の
プレリンス液が供給パイプ２２からシャワーパイプ１５
に送られ、このシャワーバイブ１５から送りローラ１３
で搬送される印刷版７の上面に噴射される。一方、印刷
版７の下面には、プレリンス液に浸っている下側の液引
きローラ１４からプレリンス液が塗布される。このとき
プレリンス液槽２の液面が常に一定に維持され、下側の
液引きローラ１４は常に十分浸っているから、塗布ムラ
がなく安定した洗浄が可能になる。なお、この実施例は
前記フィニッシャ−液１ｔＩ３にも同様に適用される。Therefore, when the circulation pump 21 is driven, the pre-rinsing liquid in the liquid storage tank 19 is transferred from the supply pipe 22 to the shower pipe 15.
from this shower vibe 15 to the feed roller 13
The liquid is sprayed onto the upper surface of the printing plate 7 that is being conveyed. On the other hand, a pre-rinsing liquid is applied to the lower surface of the printing plate 7 from a lower liquid pulling roller 14 immersed in the pre-rinsing liquid. At this time, the liquid level in the pre-rinse liquid tank 2 is always maintained constant, and the lower liquid pulling roller 14 is always sufficiently immersed, so that stable cleaning is possible without uneven coating. Note that this embodiment is similarly applied to the finisher liquid 1tI3.
第４図はこの発明を現像液槽に適用した他の実施例を示
している。FIG. 4 shows another embodiment in which the present invention is applied to a developer tank.
この実施例は第２図に示すものと略同様に構成されてい
るが、液貯部タンク１９が現像液［１と略同位置に配置
され、バイブ２０の一端部２０ａは現像液Ｍ１の底部に
接続され、他端部２０ｂは液貯面タンク１９内に所定の
高さに突出している。This embodiment has a structure substantially similar to that shown in FIG. The other end portion 20b projects into the liquid storage surface tank 19 at a predetermined height.
従って、循環ポンプ２１を駆動すると、液貯部タンク１
９の現像液が供給パイプ２２から現像液Ｍ１１に供給さ
れる。これにより現像液槽１内の現像液の液面が設定以
上に上昇すると、現像液がパイプ２０の端部２０ｂを介
して液貯面タンク１９内にオーバーフローし、現像液槽
１の液面は液貯面タンク１９内のバイブ２０の端部２０
ｂの高さに維持される。Therefore, when the circulation pump 21 is driven, the liquid storage tank 1
9 is supplied from the supply pipe 22 to the developer M11. As a result, when the level of the developer in the developer tank 1 rises above the set level, the developer overflows into the liquid storage tank 19 through the end 20b of the pipe 20, and the level of the developer in the developer tank 1 rises. End 20 of the vibrator 20 in the liquid storage tank 19
It is maintained at a height of b.
第５図はこの発明をプレリンス液槽に適用した他の実施
例を示しており、この実施例の構成は第４図に示すもの
と同様になっている。また、この実施例はフィニッシャ
−液ＩｆＩ３に同社に適用できることは勿論である。FIG. 5 shows another embodiment in which the present invention is applied to a pre-rinsing liquid tank, and the configuration of this embodiment is similar to that shown in FIG. 4. Furthermore, it goes without saying that this embodiment can be applied to the finisher liquid IfI3 of the same company.
第６図はこの発明をプレリンス液槽に適用したさらに他
の実施例を示しており、この実施例では第１図に示すプ
レリンス液Ｊｆｉ２が液貯部タンク１９として機能し、
この液貯部タンク１９の中に小型のプレリンス液槽２３
が配置されている。このプレリンス液槽２３に満たされ
たプレリンス液に下側の液引きローラ１４が浸っており
、このプレリンス液ＷＩ２３はその側壁２３ａを低くし
て液排出手段となし、プレリンス液がオーバフローでき
るようになっている。FIG. 6 shows still another embodiment in which the present invention is applied to a pre-rinsing liquid tank, and in this embodiment, the pre-rinsing liquid Jfi2 shown in FIG. 1 functions as a liquid storage tank 19,
A small pre-rinse liquid tank 23 is inside this liquid storage tank 19.
is located. The lower liquid pulling roller 14 is immersed in the pre-rinse liquid filled in the pre-rinse liquid tank 23, and the side wall 23a of the pre-rinse liquid WI 23 is lowered to serve as a liquid discharge means, so that the pre-rinse liquid can overflow. ing.
従って、シャワーパイプ１５から噴射されるプレリンス
液の一部はプレリンス液槽２３に落下し、この側壁２３
ａからオーバフローする液は液貯面タンク１９内に落下
して貯溜される。Therefore, a part of the pre-rinsing liquid injected from the shower pipe 15 falls into the pre-rinsing liquid tank 23, and this side wall 23
The liquid overflowing from a falls into the liquid storage tank 19 and is stored therein.
このものは液貯面タンク１９内にプレリンス液槽２３が
配置されているため、配置スペースの確保が容易になる
。また、プレリンス液Ｍ１２３からプレリンス液がオー
バフローして落下し、液貯面タンク１９内に貯溜される
ため、パイプが不要となる。In this case, the pre-rinsing liquid tank 23 is arranged within the liquid storage tank 19, so that the arrangement space can be easily secured. Further, since the pre-rinsing liquid overflows and falls from the pre-rinsing liquid M123 and is stored in the liquid storage tank 19, a pipe becomes unnecessary.
なお、この実施例は両面に感光層を形成した印刷版７の
処理について説明したが、片面に感光層を形成したもの
でもよく、また印刷版７に限定されず、シート状の感光
材料であわば通用可能である。Although this example describes the processing of the printing plate 7 with photosensitive layers formed on both sides, it is also possible to use a printing plate 7 with a photosensitive layer formed on one side, and is not limited to the printing plate 7. It is generally applicable.
（発明の効果）
前記のように、この発明では、液貯部タンクの処理液を
液供給手段で処理液槽へ供給し、この処理液の供給で感
光材料を処理する処理液槽の処理液の液面が設定以上に
上昇すると、液排出手段で処理液をオーバフローして排
出し、この処理液を前記液貯部タンクに一旦貯溜するよ
うになしたから、処理液槽の処理液の減少は液貯部タン
クに貯溜されている液で補償されるため、処理液の液面
が常に一定に維持され、感光材料の安定した処理が可能
になる。(Effects of the Invention) As described above, in the present invention, the processing liquid in the liquid storage tank is supplied to the processing liquid tank by the liquid supply means, and the processing liquid in the processing liquid tank for processing the photosensitive material is supplied with the processing liquid. When the liquid level rises above a set level, the processing liquid overflows and is discharged by the liquid discharge means, and this processing liquid is temporarily stored in the liquid storage tank, thereby reducing the amount of processing liquid in the processing liquid tank. Since this is compensated for by the liquid stored in the liquid storage tank, the level of the processing liquid is always maintained constant, allowing stable processing of the photosensitive material.
第１図はこの発明が適用される現像装置の概略断面図、
第２図は現像液槽に適用した断面図、第３図はプレリン
ス液槽に適用した断面図、第４図は現像液槽に適用した
他の実施例の断面図、第５図はプレリンス液槽に適用し
た他の実施例の断面図、第６図はプレリンス液槽に適用
したさらに他の実施例の断面図である。
１・−現像液槽
２．２３−プレリンス液槽
３・・・フィニッシャ−液槽
１９・１液貯溜タンク
２０・軸バイブ
２１−循環ポンプ
２２・−供給バイブ
第２図FIG. 1 is a schematic sectional view of a developing device to which this invention is applied;
Fig. 2 is a sectional view of the application to a developer tank, Fig. 3 is a sectional view of the application to a pre-rinse tank, Fig. 4 is a sectional view of another embodiment applied to a developer tank, and Fig. 5 is a sectional view of the pre-rinse solution. A sectional view of another embodiment applied to a tank, and FIG. 6 is a sectional view of still another embodiment applied to a pre-rinsing liquid tank. 1.-Developer tank 2.23-Pre-rinse tank 3...Finisher tank 19.1 liquid storage tank 20.Shaft vibrator 21-Circulation pump 22.-Supply vibrator Fig. 2
Claims (1)
がら前記処理液槽の処理液で処理する感光材料処理装置
において、前記処理液槽の処理液の液面が設定以上に上
昇するとオーバフローさせる液排出手段と、このオーバ
フローして排出される処理液を一旦貯溜する液貯溜タン
クと、この液貯溜タンクの処理液を前記処理槽へ供給す
る液供給手段とを備える感光材料処理装置。In a photosensitive material processing apparatus that is equipped with a processing liquid tank that stores a processing liquid and processes the photosensitive material with the processing liquid in the processing liquid tank while transporting the photosensitive material, overflow occurs when the liquid level of the processing liquid in the processing liquid tank rises above a set value. A photosensitive material processing apparatus comprising: a liquid discharge means for discharging a liquid; a liquid storage tank for temporarily storing the overflowing and discharged processing liquid; and a liquid supply means for supplying the processing liquid in the liquid storage tank to the processing tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26729386A JPS63121050A (en) | 1986-11-10 | 1986-11-10 | Photosensitive material treatment device for maintaining specified level of processing liquid stored in processing liquid tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26729386A JPS63121050A (en) | 1986-11-10 | 1986-11-10 | Photosensitive material treatment device for maintaining specified level of processing liquid stored in processing liquid tank |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63121050A true JPS63121050A (en) | 1988-05-25 |
| JPH0429054B2 JPH0429054B2 (en) | 1992-05-15 |
Family
ID=17442814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26729386A Granted JPS63121050A (en) | 1986-11-10 | 1986-11-10 | Photosensitive material treatment device for maintaining specified level of processing liquid stored in processing liquid tank |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63121050A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5140356A (en) * | 1989-08-31 | 1992-08-18 | Fuji Photo Film Co., Ltd. | Light-sensitive material processing apparatus |
| JP2003021916A (en) * | 2001-06-21 | 2003-01-24 | Agfa Gevaert Nv | Method for developing lithographic printing plate precursor |
| WO2009119687A1 (en) * | 2008-03-25 | 2009-10-01 | 富士フイルム株式会社 | Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate |
| JP2010054959A (en) * | 2008-08-29 | 2010-03-11 | Fujifilm Corp | Method for preparing lithographic printing plate |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5765339U (en) * | 1980-10-07 | 1982-04-19 | ||
| JPS59164557A (en) * | 1983-03-08 | 1984-09-17 | Dainippon Screen Mfg Co Ltd | Device for processing photosensitive material |
-
1986
- 1986-11-10 JP JP26729386A patent/JPS63121050A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5765339U (en) * | 1980-10-07 | 1982-04-19 | ||
| JPS59164557A (en) * | 1983-03-08 | 1984-09-17 | Dainippon Screen Mfg Co Ltd | Device for processing photosensitive material |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5140356A (en) * | 1989-08-31 | 1992-08-18 | Fuji Photo Film Co., Ltd. | Light-sensitive material processing apparatus |
| JP2003021916A (en) * | 2001-06-21 | 2003-01-24 | Agfa Gevaert Nv | Method for developing lithographic printing plate precursor |
| WO2009119687A1 (en) * | 2008-03-25 | 2009-10-01 | 富士フイルム株式会社 | Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate |
| JP2009236971A (en) * | 2008-03-25 | 2009-10-15 | Fujifilm Corp | Immersion automatic development apparatus for planographic printing plate and method thereof |
| JP2010054959A (en) * | 2008-08-29 | 2010-03-11 | Fujifilm Corp | Method for preparing lithographic printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0429054B2 (en) | 1992-05-15 |
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