JPS63119237U - - Google Patents
Info
- Publication number
- JPS63119237U JPS63119237U JP1104887U JP1104887U JPS63119237U JP S63119237 U JPS63119237 U JP S63119237U JP 1104887 U JP1104887 U JP 1104887U JP 1104887 U JP1104887 U JP 1104887U JP S63119237 U JPS63119237 U JP S63119237U
- Authority
- JP
- Japan
- Prior art keywords
- process tube
- introduced gas
- introduction pipe
- gas introduction
- exhaust pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
Description
第１図は本考案のプロセスチユーブの縦断面図
、第２図は第１図のＡ―Ａ線断面図、第３図は実
施例２の縦断面図、第４図は従来のプロセスチユ
ーブの縦断面図である。
１……プロセスチユーブ（２重構造）、２……
ガス導入管、３……排気管、４……仕切板、５…
…吹出穴（ガス導入管部）、６……吹出し穴（内
側チユーブ部）、７……排気穴（内側チユーブ部
）、８……排気穴（排気管部）、９……圧力セン
サー、１０……排気量調整部、１１……ウエーハ
、１２……ボート、１３……ヒーター、１４……
フタ、１５……プロセスチユーブ（従来）、１６
……ガス導入管（従来）。
Fig. 1 is a longitudinal sectional view of the process tube of the present invention, Fig. 2 is a sectional view taken along the line A-A in Fig. 1, Fig. 3 is a longitudinal sectional view of the second embodiment, and Fig. 4 is a longitudinal sectional view of the conventional process tube. FIG. 1...Process tube (double structure), 2...
Gas introduction pipe, 3... Exhaust pipe, 4... Partition plate, 5...
...Blowout hole (gas introduction pipe part), 6...Blowout hole (inner tube part), 7...Exhaust hole (inner tube part), 8...Exhaust hole (exhaust pipe part), 9...Pressure sensor, 10 ... Displacement adjustment section, 11 ... Wafer, 12 ... Boat, 13 ... Heater, 14 ...
Lid, 15...Process tube (conventional), 16
...Gas introduction pipe (conventional).
Claims (1)
ツチ内ウエーハに均一な状態で導入ガスを接触さ
せる目的のため、二重構造のプロセスチユーブの
内側に穴を有し、かつ専用のガス導入管、排気管
を有する半導体素子製造装置のプロセスチユーブ
。 In order to guide the introduced gas into the process tube and bring the introduced gas into contact with the wafers in the same batch in a uniform state, there are holes inside the double-structured process tube, and a dedicated gas introduction pipe and exhaust pipe. A process tube for semiconductor device manufacturing equipment having
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1104887U JPS63119237U (en) | 1987-01-27 | 1987-01-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1104887U JPS63119237U (en) | 1987-01-27 | 1987-01-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63119237U true JPS63119237U (en) | 1988-08-02 |
Family
ID=30797913
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1104887U Pending JPS63119237U (en) | 1987-01-27 | 1987-01-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63119237U (en) |
-
1987
- 1987-01-27 JP JP1104887U patent/JPS63119237U/ja active Pending