JPH0338358U - - Google Patents
Info
- Publication number
- JPH0338358U JPH0338358U JP9689789U JP9689789U JPH0338358U JP H0338358 U JPH0338358 U JP H0338358U JP 9689789 U JP9689789 U JP 9689789U JP 9689789 U JP9689789 U JP 9689789U JP H0338358 U JPH0338358 U JP H0338358U
- Authority
- JP
- Japan
- Prior art keywords
- ring
- reaction vessel
- teflon material
- double
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 238000010574 gas phase reaction Methods 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案にかかる減圧反応容器の斜視図
、第２図は第１図のＡＡ断面図である。
図において、１……反応容器、２……外側のＯ
リング、３……テフロン材からなる内側のＯリン
グ、４……つば部、５……蓋、６……ガス導入口
、７……排気口、９……つば部のガス導入口、３
１……中空Ｏリング（内側のＯリング）、３２…
…内密Ｏリング（内側のＯリング）、を示してい
る。
FIG. 1 is a perspective view of a reduced pressure reaction vessel according to the present invention, and FIG. 2 is a cross-sectional view taken along line AA in FIG. In the figure, 1...reaction vessel, 2...outer O
Ring, 3...Inner O-ring made of Teflon material, 4...Brim, 5...Lid, 6...Gas inlet, 7...Exhaust port, 9...Gas inlet in the brim, 3
1...Hollow O-ring (inner O-ring), 32...
...Indicates a secret O-ring (inner O-ring).
Claims (1)
ングを設けて、内側のＯリングは少なくとも表面
がテフロン材からなることを特徴とする減圧気相
反応装置。 1. A reduced-pressure gas-phase reaction device characterized in that a double O-ring, an outer and an inner O-ring, is provided in a sealing part of a reaction vessel, and at least the surface of the inner O-ring is made of Teflon material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9689789U JPH0338358U (en) | 1989-08-19 | 1989-08-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9689789U JPH0338358U (en) | 1989-08-19 | 1989-08-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0338358U true JPH0338358U (en) | 1991-04-12 |
Family
ID=31646070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9689789U Pending JPH0338358U (en) | 1989-08-19 | 1989-08-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0338358U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005296345A (en) * | 2004-04-12 | 2005-10-27 | Newgin Corp | Game machine |
| JP2005296346A (en) * | 2004-04-12 | 2005-10-27 | Newgin Corp | Transparent plate unit for game machine |
| JP2009176822A (en) * | 2008-01-22 | 2009-08-06 | Tokyo Electron Ltd | Sealing mechanism, sealing groove, sealing member, and substrate processing apparatus |
| JP2009253161A (en) * | 2008-04-09 | 2009-10-29 | Tokyo Electron Ltd | Plasma processing container and plasma processor |
| JP2019145655A (en) * | 2018-02-20 | 2019-08-29 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | Substrate processing apparatus, semiconductor device manufacturing method, and program |
-
1989
- 1989-08-19 JP JP9689789U patent/JPH0338358U/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005296345A (en) * | 2004-04-12 | 2005-10-27 | Newgin Corp | Game machine |
| JP2005296346A (en) * | 2004-04-12 | 2005-10-27 | Newgin Corp | Transparent plate unit for game machine |
| JP4526858B2 (en) * | 2004-04-12 | 2010-08-18 | 株式会社ニューギン | Transparent board unit for gaming machines |
| JP4531434B2 (en) * | 2004-04-12 | 2010-08-25 | 株式会社ニューギン | Game machine |
| JP2009176822A (en) * | 2008-01-22 | 2009-08-06 | Tokyo Electron Ltd | Sealing mechanism, sealing groove, sealing member, and substrate processing apparatus |
| JP2009253161A (en) * | 2008-04-09 | 2009-10-29 | Tokyo Electron Ltd | Plasma processing container and plasma processor |
| JP2019145655A (en) * | 2018-02-20 | 2019-08-29 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | Substrate processing apparatus, semiconductor device manufacturing method, and program |
| US11124872B2 (en) | 2018-02-20 | 2021-09-21 | Kokusai Electric Corporation | Substrate processing apparatus |