JPS6370143U - - Google Patents
Info
- Publication number
- JPS6370143U JPS6370143U JP16517286U JP16517286U JPS6370143U JP S6370143 U JPS6370143 U JP S6370143U JP 16517286 U JP16517286 U JP 16517286U JP 16517286 U JP16517286 U JP 16517286U JP S6370143 U JPS6370143 U JP S6370143U
- Authority
- JP
- Japan
- Prior art keywords
- tube
- inner tube
- semiconductor wafers
- gas
- outer tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 235000012431 wafers Nutrition 0.000 claims 2
Description
第１図は本考案の一実施例におけるプロセスチ
ユーブを示す概略断面図、第２図ないし第４図は
それぞれ他の実施例における内管を示す概略断面
図、第５図は従来の熱処理炉を示す概略断面図、
第６図は従来の他の熱処理炉におけるプロセスチ
ユーブを示す概略断面図である。
８……治具、１０……ウエハ、２０……外管、
２２……ガス導入口、２４，２６……ガス排出口
、３０，３０ａ，３０ｂ，３０ｃ……内管、３６
―１〜３６―５……ガス導入口、４０―１〜４０
―３……ガス排出口。
FIG. 1 is a schematic sectional view showing a process tube in one embodiment of the present invention, FIGS. 2 to 4 are schematic sectional views showing inner tubes in other embodiments, and FIG. 5 is a schematic sectional view showing a process tube in an embodiment of the present invention. A schematic cross-sectional view showing,
FIG. 6 is a schematic sectional view showing a process tube in another conventional heat treatment furnace. 8... jig, 10... wafer, 20... outer tube,
22... Gas inlet, 24, 26... Gas outlet, 30, 30a, 30b, 30c... Inner pipe, 36
-1~36-5...Gas inlet, 40-1~40
-3...Gas exhaust port.
Claims (1)
二重管構造とし、前記外管には上部中央部にガス
導入口を設け、上部両端部にガス排出口を設け、
前記内管には軸方向に複数個のガス導入口を設け
、前記内管には治具により垂直方向に立てて並べ
られた半導体ウエハを保持する半導体ウエハの熱
処理炉。 The process tube has a horizontal double-tube structure with an inner tube inside an outer tube, and the outer tube has a gas inlet at the center of the upper part and gas exhaust ports at both ends of the upper part,
A heat treatment furnace for semiconductor wafers, wherein the inner tube is provided with a plurality of gas inlets in the axial direction, and the inner tube holds semiconductor wafers arranged vertically using a jig.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16517286U JPS6370143U (en) | 1986-10-27 | 1986-10-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16517286U JPS6370143U (en) | 1986-10-27 | 1986-10-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6370143U true JPS6370143U (en) | 1988-05-11 |
Family
ID=31094962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16517286U Pending JPS6370143U (en) | 1986-10-27 | 1986-10-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6370143U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS551130A (en) * | 1978-06-19 | 1980-01-07 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Furnace core pipe for manufacturing semiconductor |
| JPS58154227A (en) * | 1982-03-09 | 1983-09-13 | Matsushita Electronics Corp | Method of subjecting semiconductor substrate to diffusion process |
-
1986
- 1986-10-27 JP JP16517286U patent/JPS6370143U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS551130A (en) * | 1978-06-19 | 1980-01-07 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Furnace core pipe for manufacturing semiconductor |
| JPS58154227A (en) * | 1982-03-09 | 1983-09-13 | Matsushita Electronics Corp | Method of subjecting semiconductor substrate to diffusion process |