JPH0373429U - - Google Patents
Info
- Publication number
- JPH0373429U JPH0373429U JP13523789U JP13523789U JPH0373429U JP H0373429 U JPH0373429 U JP H0373429U JP 13523789 U JP13523789 U JP 13523789U JP 13523789 U JP13523789 U JP 13523789U JP H0373429 U JPH0373429 U JP H0373429U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- internal reaction
- boat
- curved shape
- chemical vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 239000012808 vapor phase Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案装置の一実施例の構成を示す縦
断面図、第２図は従来装置の一例の構成を示す縦
断面図である。
１……内部（石英）反応管、１ａ……上部湾曲
形状、２……外部（石英）反応管、２ａ……上部
湾曲形状、３……（石英）ボート、４……ウエー
ハ、５……ガス注入口、６……（石英製）ガスフ
ロースムーザ、６ａ……上部湾曲形状、７……排
気孔。
FIG. 1 is a longitudinal sectional view showing the structure of an embodiment of the device of the present invention, and FIG. 2 is a longitudinal sectional view showing the structure of an example of the conventional device. DESCRIPTION OF SYMBOLS 1... Internal (quartz) reaction tube, 1a... Upper curved shape, 2... External (quartz) reaction tube, 2a... Upper curved shape, 3... (Quartz) boat, 4... Wafer, 5... Gas inlet, 6... (made of quartz) gas flow smoother, 6a... upper curved shape, 7... exhaust hole.
Claims (1)
枚のウエーハ４を並べて載置したボート３を挿設
し、下部のガス注入口５より反応ガスを注入し、
内部反応管１と外部反応管２との間より排気する
縦型低圧化学気相生成装置において、内部反応管
１の頂部に排気孔７を有する上部形状１ａを外部
反応管２の上部湾曲形状２ａに合せ、且つ、ボー
ト３の上部に、内部反応管１の上部湾曲形状１ａ
に合せたガスフロースムーザ６を設置せしめてな
る低圧化学気相生成装置。 A boat 3 on which a large number of wafers 4 are placed side by side is inserted into an internal reaction tube 1 having a double tube 1, 2 structure, and a reaction gas is injected from a gas injection port 5 at the bottom.
In a vertical low-pressure chemical vapor generation device that exhausts air from between an internal reaction tube 1 and an external reaction tube 2, the upper shape 1a having an exhaust hole 7 at the top of the internal reaction tube 1 is replaced by the upper curved shape 2a of the external reaction tube 2. In accordance with the above, and at the top of the boat 3, the upper curved shape 1a of the internal reaction tube 1 is
A low-pressure chemical vapor phase generation device that is equipped with a gas flow smoother 6 that matches the
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13523789U JP2500421Y2 (en) | 1989-11-20 | 1989-11-20 | Low pressure chemical vapor generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13523789U JP2500421Y2 (en) | 1989-11-20 | 1989-11-20 | Low pressure chemical vapor generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0373429U true JPH0373429U (en) | 1991-07-24 |
| JP2500421Y2 JP2500421Y2 (en) | 1996-06-05 |
Family
ID=31682517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13523789U Expired - Lifetime JP2500421Y2 (en) | 1989-11-20 | 1989-11-20 | Low pressure chemical vapor generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2500421Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002280310A (en) * | 2001-03-19 | 2002-09-27 | Tokyo Electron Ltd | Vertical heat treatment device |
-
1989
- 1989-11-20 JP JP13523789U patent/JP2500421Y2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002280310A (en) * | 2001-03-19 | 2002-09-27 | Tokyo Electron Ltd | Vertical heat treatment device |
| JP4593814B2 (en) * | 2001-03-19 | 2010-12-08 | 東京エレクトロン株式会社 | Vertical heat treatment equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2500421Y2 (en) | 1996-06-05 |