JPS6310943Y2 - - Google Patents
Info
- Publication number
- JPS6310943Y2 JPS6310943Y2 JP13929483U JP13929483U JPS6310943Y2 JP S6310943 Y2 JPS6310943 Y2 JP S6310943Y2 JP 13929483 U JP13929483 U JP 13929483U JP 13929483 U JP13929483 U JP 13929483U JP S6310943 Y2 JPS6310943 Y2 JP S6310943Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- clean bench
- reflect light
- work
- clean
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 21
- 239000003973 paint Substances 0.000 claims description 3
- 239000002344 surface layer Substances 0.000 claims 2
- 230000007547 defect Effects 0.000 description 12
- 238000001514 detection method Methods 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- MUJOIMFVNIBMKC-UHFFFAOYSA-N fludioxonil Chemical compound C=12OC(F)(F)OC2=CC=CC=1C1=CNC=C1C#N MUJOIMFVNIBMKC-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011045 prefiltration Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Workshop Equipment, Work Benches, Supports, Or Storage Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13929483U JPS6045682U (ja) | 1983-09-08 | 1983-09-08 | クリ−ンベンチ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13929483U JPS6045682U (ja) | 1983-09-08 | 1983-09-08 | クリ−ンベンチ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6045682U JPS6045682U (ja) | 1985-03-30 |
| JPS6310943Y2 true JPS6310943Y2 (cg-RX-API-DMAC7.html) | 1988-03-31 |
Family
ID=30312257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13929483U Granted JPS6045682U (ja) | 1983-09-08 | 1983-09-08 | クリ−ンベンチ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6045682U (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3402636A1 (de) * | 1984-01-26 | 1985-08-01 | Kaltenbach & Voigt Gmbh & Co, 7950 Biberach | Arbeitsplatz zur bearbeitung insbesondere zahntechnischer werkstuecke |
-
1983
- 1983-09-08 JP JP13929483U patent/JPS6045682U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6045682U (ja) | 1985-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6135507B2 (cg-RX-API-DMAC7.html) | ||
| US4377340A (en) | Method and apparatus for detecting particles on a material | |
| JP5288568B2 (ja) | マスクブランク用基板の製造方法、マスクブランクの製造方法、露光用マスクの製造方法、並びに半導体装置の製造方法 | |
| JP2009532671A (ja) | ハニカムフィルタの欠陥検出方法および装置 | |
| JPS6310943Y2 (cg-RX-API-DMAC7.html) | ||
| JPH04104038A (ja) | バグフィルタ式集塵機における濾布の破損状況検知方法および装置 | |
| JP2000019135A (ja) | 被検査体の表面性状検査装置 | |
| DE3931213C2 (cg-RX-API-DMAC7.html) | ||
| KR870001703B1 (ko) | 투명 시이트재의 검사방법 및 장치 | |
| US6490032B1 (en) | Method and apparatus for improving a dark field inspection environment | |
| JPH05273137A (ja) | 表面欠陥検査装置 | |
| JPS63103951A (ja) | ゴミ検査装置 | |
| JP3402746B2 (ja) | フォトマスク検査方法及びその装置 | |
| JP2811094B2 (ja) | カラーフィルタの検査方法 | |
| CN207488182U (zh) | 一种检测骨料含水率的红外检测系统 | |
| US20250028239A1 (en) | Baseplate for supporting a reticle and related systems and methods | |
| Shiba et al. | Automatic inspection of contaminants on reticles | |
| JPH10308426A5 (ja) | 基板検査装置 | |
| JPWO2018177747A5 (cg-RX-API-DMAC7.html) | ||
| JP2544663B2 (ja) | ガラス基板検査装置の筐体 | |
| JPS58158920A (ja) | 透明体の欠陥検査装置 | |
| JPH07229843A (ja) | 真空中表面異物検査装置 | |
| JP3552399B2 (ja) | レーザ回折式粒度分布測定装置 | |
| JP2001264262A (ja) | 表面異物検査方法および表面異物検査装置 | |
| JPH04320951A (ja) | ガラス板の表面欠陥検査方法および検査装置 |