JPS6310881B2 - - Google Patents
Info
- Publication number
- JPS6310881B2 JPS6310881B2 JP56113934A JP11393481A JPS6310881B2 JP S6310881 B2 JPS6310881 B2 JP S6310881B2 JP 56113934 A JP56113934 A JP 56113934A JP 11393481 A JP11393481 A JP 11393481A JP S6310881 B2 JPS6310881 B2 JP S6310881B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film resistor
- resistor element
- silicon nitride
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 43
- 239000010408 film Substances 0.000 claims description 37
- 238000002161 passivation Methods 0.000 claims description 16
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 15
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 238000009966 trimming Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 5
- 238000005530 etching Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229910017855 NH 4 F Inorganic materials 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910019819 Cr—Si Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000003832 thermite Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Details Of Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Non-Adjustable Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56113934A JPS5815203A (ja) | 1981-07-20 | 1981-07-20 | 薄膜抵抗体素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56113934A JPS5815203A (ja) | 1981-07-20 | 1981-07-20 | 薄膜抵抗体素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5815203A JPS5815203A (ja) | 1983-01-28 |
| JPS6310881B2 true JPS6310881B2 (OSRAM) | 1988-03-10 |
Family
ID=14624852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56113934A Granted JPS5815203A (ja) | 1981-07-20 | 1981-07-20 | 薄膜抵抗体素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5815203A (OSRAM) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6054967B2 (ja) * | 1982-04-09 | 1985-12-03 | 福田金属箔粉工業株式会社 | 導電性プラスチツクの製造方法 |
| JPS61195458A (ja) * | 1985-02-25 | 1986-08-29 | Fujitsu Ltd | 電文送受信制御装置 |
-
1981
- 1981-07-20 JP JP56113934A patent/JPS5815203A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5815203A (ja) | 1983-01-28 |
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