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Priority to JP1984064217UpriorityCriticalpatent/JPS60176244U/ja
Publication of JPS60176244UpublicationCriticalpatent/JPS60176244U/ja
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Publication of JPS6310817Y2publicationCriticalpatent/JPS6310817Y2/ja
Processo para o tratamento de camadas fotossensiveis,contendo compostos diazoicos,que trabalham positivamente,expostas a luz e reveladas,durante a producao de moldes de impressao"offset"