CA2188922A1 - Device and process for optimizing the intensity of radiation directed onto sewage and waste water - Google Patents
Device and process for optimizing the intensity of radiation directed onto sewage and waste waterInfo
- Publication number
- CA2188922A1 CA2188922A1 CA002188922A CA2188922A CA2188922A1 CA 2188922 A1 CA2188922 A1 CA 2188922A1 CA 002188922 A CA002188922 A CA 002188922A CA 2188922 A CA2188922 A CA 2188922A CA 2188922 A1 CA2188922 A1 CA 2188922A1
- Authority
- CA
- Canada
- Prior art keywords
- radiation
- liquid
- accordance
- radiators
- walls
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000002351 wastewater Substances 0.000 title claims abstract description 7
- 239000010865 sewage Substances 0.000 title abstract description 4
- 239000007788 liquid Substances 0.000 claims abstract description 30
- 239000007800 oxidant agent Substances 0.000 claims abstract description 3
- 239000010408 film Substances 0.000 claims description 15
- 239000011552 falling film Substances 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 239000010808 liquid waste Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 101100152865 Danio rerio thraa gene Proteins 0.000 description 1
- 101100316117 Rattus norvegicus Unc50 gene Proteins 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000001475 halogen functional group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- JCYWCSGERIELPG-UHFFFAOYSA-N imes Chemical class CC1=CC(C)=CC(C)=C1N1C=CN(C=2C(=CC(C)=CC=2C)C)[C]1 JCYWCSGERIELPG-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- KRTSDMXIXPKRQR-AATRIKPKSA-N monocrotophos Chemical compound CNC(=O)\C=C(/C)OP(=O)(OC)OC KRTSDMXIXPKRQR-AATRIKPKSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 101150014006 thrA gene Proteins 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 238000009279 wet oxidation reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/722—Oxidation by peroxides
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3227—Units with two or more lamps
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3228—Units having reflectors, e.g. coatings, baffles, plates, mirrors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Physical Water Treatments (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
A device and process for optimizing the intensity of radiation directed onto sewage or waste water has a radiation chamber (11) in which the liquid to be irradiated, which can be given oxidizing agents, is moved solely through the action of adhesive and gravitational forces, as a film, down two contoured, facing vertical walls (1), separated by variable but small intervals, past a removable radiation unit (5/6/9) which consists mainly of tube-shaped ultraviolet radiation emitters (9) and, arranged parallel to these, specially designed reflectors (7) by means of which virtually(depending on the reflectivity of the reflector surfaces) the entire radiation emitted is directed onto the liquid film to be irradiated.
Description
r 5 rM ~.~;OM -.h`.!~OB~E ~J~ART~ S ET Ai 10 160458 ~1081 P005ir~25 PCl~/EP94~01 1 07 2 1 889~
- WO 9~125400 TITLE~
DEVI~E AND PROCESS FOR OPTIMIZING T~E INTE~SITY OF ~DIATION
DIRECTEC) ONTO SEWAGE AND WAS~E \~VATER.
APPLICATION:
ThP inv~ntlon concern~ ~ df~vioR ~nd a process for optimi~ln~ th~? int~n.si~ ~f ultraviolet ~UV) radiation directed onto w~ste w~ter and liquid ~aste and is used mainly to carry out the decontamination-process of LlV-cat~ly~ed wet oxlda~ion.
BACKGROUND OF ~HE INVEN~ION.
Already at the beginning of this century UV-irradiation was use~d to sterilize rnilk.
Ister everal procos~e~ for th~ treatment of contamlnated liquids wer~ noticed in which UV-radiation in combination with oxidizing agents like oxygen or hydrogen peroxide sorne~imes in addition with catalysts and activates were used in different areas for exan~ple in waste ~ater treatment.
I tydrogen peroxide (or ozone ~tc.) as a me~stable subst;~nc~ is subject~d to a gradual decomposition. So in t~e process shortl~v~ng and highly reac~lve radicals e.g~
hydroxyl radicals are formedL The building o~ radTcals can be accelerated i~y the use of appropiate catalysts ~or example UV-radiation. The ~trong oxidation effect of the radicE~ls is used for oxidizin~ and ~liminating unwanted content~ of sewage or wastc water. As oxidation products of org;anic subst~nces there re~ult mainly car~on dioxide and water The organlc sulphide compounds are converted to sulphate and org~nic halogene comp~uncl~ ~r~ tran~form~d to halo~enlde ions.
These principles are now us~d commercially:
11)~25/96 FRI 12: 45 [TX/RX NO 6535]
3 l ~ TVM ~2Clt~ ~;NOEI~E, MARTENSI ET hT mo !6046814C~1 P006/025 PCo/tP94101107 2 1 ~8922 In 1991 the process of GOEMA Dr. G~tzelmann Gmbl 1, Vaihingen/Enz ~vas awarde~
with a prize. In this process lJV-low-pre~LJr~ cliving l~p~ ~nd hydr~n p~roxide were used in a sp~ci~l reactor to destroy for example cyanid and chlorinated hydrccarbon in wastc water In the meantime other companies like Ultra Systems inHeide~b~r~. NSW in Nordenham, Kera~nchel~ie GmbH in Siershahn, Wedeco in Herford, Roedi~er AnlagenbElu In Han~L~ off~r UV-reactors with Ji~f~r~nt technical dovic~ss. In all o~fered reactors thf~ UV-lamps ar~ im~crsed In the liquid which should be treated. This process is of no use in th~3 treatrnent of viscous liqulds, emulsions, suspensions and other liquids causing a coating Silm on the surface~s) o~ th~ UV-lamp(~) as by using this technique - th~? Ilqudid contact~ the surfac~e of the lJV-l~mps - or the UV-perm~able covering around the lamps -, by means of whlch the surfaceof the UV-lamp(s) ~covering~ is coated and in consequence the int~nsity of UV-radtation i5 dirninished extremly.
~his disadvantageous effects ~erc avoided by a new process for the treatment of contamlnated liqulds which was dev~loped at the Universi~ of stuttyan and whiLh wa~ honored in 1989 by the Oc~-van der Grlnten prize. In this process there is no contact betNeen th~ liquid to be treated and the UV-lamps. In a falling film reactor consisting ~f a vertical tube with concon~ric adju~ted low pr~3~sure UV~lamps a falling film is irradiated. Usually the contaminated liquid has to pass the reactor and the UV-radiators several times. The waste water is overflowing a ~eir ~hich is located on the upper ~nd of sald vertical tu~e. This apparatus is not used cnmrnercially but for research and development.
In the patent application DE 40 05 4~ (figure 2) ther~ is d~scribed a fallin~ film reactor, worklng with one UV-low pr~ssure radiator wTth only 40 Watt electri~ power, that means at the most 16 Watt UV-C power. This power Is so low, that the experienco in prac~lce show3 no considorable effe~ts.
~he UV~radi~tor is located in a one side closed tube, so that it Is impossible to avoid a heating up. If the surface temperature of the described low-pressure lJV-radi~tor increasss over q0 de~rees Celc;lus th~9 UV-C-intensl~y dccreases consTderably. The ~escrlption s~ys, that a build-up shade wh~ch runs parallel to the lJV-radiator, makes 10/25/96 FRI 12:45 [TX/R~ ~0 6535]
IPM F-~l X.'~^JBBE MAR~EN`, Elr AL Tû 1604c814081 ~001/02~
- WO 9~125400 TITLE~
DEVI~E AND PROCESS FOR OPTIMIZING T~E INTE~SITY OF ~DIATION
DIRECTEC) ONTO SEWAGE AND WAS~E \~VATER.
APPLICATION:
ThP inv~ntlon concern~ ~ df~vioR ~nd a process for optimi~ln~ th~? int~n.si~ ~f ultraviolet ~UV) radiation directed onto w~ste w~ter and liquid ~aste and is used mainly to carry out the decontamination-process of LlV-cat~ly~ed wet oxlda~ion.
BACKGROUND OF ~HE INVEN~ION.
Already at the beginning of this century UV-irradiation was use~d to sterilize rnilk.
Ister everal procos~e~ for th~ treatment of contamlnated liquids wer~ noticed in which UV-radiation in combination with oxidizing agents like oxygen or hydrogen peroxide sorne~imes in addition with catalysts and activates were used in different areas for exan~ple in waste ~ater treatment.
I tydrogen peroxide (or ozone ~tc.) as a me~stable subst;~nc~ is subject~d to a gradual decomposition. So in t~e process shortl~v~ng and highly reac~lve radicals e.g~
hydroxyl radicals are formedL The building o~ radTcals can be accelerated i~y the use of appropiate catalysts ~or example UV-radiation. The ~trong oxidation effect of the radicE~ls is used for oxidizin~ and ~liminating unwanted content~ of sewage or wastc water. As oxidation products of org;anic subst~nces there re~ult mainly car~on dioxide and water The organlc sulphide compounds are converted to sulphate and org~nic halogene comp~uncl~ ~r~ tran~form~d to halo~enlde ions.
These principles are now us~d commercially:
11)~25/96 FRI 12: 45 [TX/RX NO 6535]
3 l ~ TVM ~2Clt~ ~;NOEI~E, MARTENSI ET hT mo !6046814C~1 P006/025 PCo/tP94101107 2 1 ~8922 In 1991 the process of GOEMA Dr. G~tzelmann Gmbl 1, Vaihingen/Enz ~vas awarde~
with a prize. In this process lJV-low-pre~LJr~ cliving l~p~ ~nd hydr~n p~roxide were used in a sp~ci~l reactor to destroy for example cyanid and chlorinated hydrccarbon in wastc water In the meantime other companies like Ultra Systems inHeide~b~r~. NSW in Nordenham, Kera~nchel~ie GmbH in Siershahn, Wedeco in Herford, Roedi~er AnlagenbElu In Han~L~ off~r UV-reactors with Ji~f~r~nt technical dovic~ss. In all o~fered reactors thf~ UV-lamps ar~ im~crsed In the liquid which should be treated. This process is of no use in th~3 treatrnent of viscous liqulds, emulsions, suspensions and other liquids causing a coating Silm on the surface~s) o~ th~ UV-lamp(~) as by using this technique - th~? Ilqudid contact~ the surfac~e of the lJV-l~mps - or the UV-perm~able covering around the lamps -, by means of whlch the surfaceof the UV-lamp(s) ~covering~ is coated and in consequence the int~nsity of UV-radtation i5 dirninished extremly.
~his disadvantageous effects ~erc avoided by a new process for the treatment of contamlnated liqulds which was dev~loped at the Universi~ of stuttyan and whiLh wa~ honored in 1989 by the Oc~-van der Grlnten prize. In this process there is no contact betNeen th~ liquid to be treated and the UV-lamps. In a falling film reactor consisting ~f a vertical tube with concon~ric adju~ted low pr~3~sure UV~lamps a falling film is irradiated. Usually the contaminated liquid has to pass the reactor and the UV-radiators several times. The waste water is overflowing a ~eir ~hich is located on the upper ~nd of sald vertical tu~e. This apparatus is not used cnmrnercially but for research and development.
In the patent application DE 40 05 4~ (figure 2) ther~ is d~scribed a fallin~ film reactor, worklng with one UV-low pr~ssure radiator wTth only 40 Watt electri~ power, that means at the most 16 Watt UV-C power. This power Is so low, that the experienco in prac~lce show3 no considorable effe~ts.
~he UV~radi~tor is located in a one side closed tube, so that it Is impossible to avoid a heating up. If the surface temperature of the described low-pressure lJV-radi~tor increasss over q0 de~rees Celc;lus th~9 UV-C-intensl~y dccreases consTderably. The ~escrlption s~ys, that a build-up shade wh~ch runs parallel to the lJV-radiator, makes 10/25/96 FRI 12:45 [TX/R~ ~0 6535]
IPM F-~l X.'~^JBBE MAR~EN`, Elr AL Tû 1604c814081 ~001/02~
2 1 ~389~
. ~ PCTJEP94101107 - wo 9~/Z54~)0 the water to be treated run into the UV reactor with high pressure~ The pressurecauses a ~plashing o~ the waste wate~ from the sh~de to thra tub~ which i~ lo~ted around the UV-radiator and in consequence a coatin~ film on the tube, what meansthat Ihe UV-radia~ion will be absorbe~ by tlle coatin3 film on the tu~e.
5UMMARY OF ~HE INVENTION:
Th~ present invent~on is intended to provi~e an effective process and a simple cons~ructed, low cost apparatus in which IE~rge ~ur~ace9 of liquids can be irradiated spatial separat13d from the radiators and without contact to the racliators to exploitate as much as possible of the irradiated rays to carry out th~ UV~catalyzed wet oxi~ation process for effective waste water treatment and effe~tive elimination of problematic contents of waste ~vater, to en~ble an effective, pro-environmental, and with low cost pro~uced altern~tive to other sew~ge or waste ~ater ~reatments.
The irradiation of large surfaces is important in UV-catalized wet oxidation processe5 because wast~ water nearly always has a high absorption of UV-irradTation and the penetration of the UV~rays is very low esp~3cially when the liquid is turbid or when the conc~ntration of organic or inor~anic substances Is high whereas chemical rQactions initiated by UV~radiation m~inly t~ke placr~ (start) on radiat~?d ~ c~3s The draining of the falling film as well as the running of the falling hlm within the radiation cha~nber - especially while putting the falling fiirn into op~ration and whil~
treating large volumes - has to be carried out in s~ch a way to avoid liquid drip~
taking off the walls and reaching the UV-radiators. Liquid drips taking off the walls woulci o~use a coatjng film on th~ ~surfaces of the UV-radiators and therefore adiminished intensity of radiation on the ~alling film The intensity of radiation is improved in avoidin~ the adsorption of radiation of ~1ja~ent ldV-sol~rces and in :~v~iding Inng radlation distances to ~he film.
10/25/96 FRI 12:45 ITX/RX .~0 65351 '- F~ F?`,hh KNvBl~E,MhR~ENS,i~ AL TO lhO4681408 F`~08'025 PCT/EPg~/0~ 107 ~ 1 88 9 2 ~
- wo 94/25~00 BF~IEF DESCRIPTION OF ~HE DRAWINGS:
Fig. 1 shows the main components of the invented apparatus in perspective (non~
cylindrical form) Fig. 2 ~hows the main components of the invented appar~tus in cross~section Fig. 3 shows a pi~ce cut in cross-section with indicated UV-sources an~ reflectors DETAILED DESCRIPTION:
In the ~rawin~3 (Fig.1) there i~ ahown an apparatus with a radiation chamber consisting of UV-r~sistant material for exarnple stainless-steei (high-grade st~el~ and with the l~s t~o facing walls 1 which may be provided with surf~ces with catalytic effects.
On the facin~ walls 1 - which are ~rranged vertical or dipped in comparison with the vertical - there is developed a well-balanced liquid film by th~ liquid overflowing a special constructed weir 2. The rnedium can be enriched by oxidTzing agents likeoxygen, t1ydrogene peroxlde or others, for example ozone Becaus~ of the different compositi~n of the liquids therl3 ar~ diffelerlt effects in the layer be~veen the surface of the weir or the wall and the liquid film. Under disandvantageous conditions a heterogeneous ~4etting and overtlowing or a d;~mming on the surface of the w~ir or the wall can occure. Tt~i~ effects can cause a seperation of flow. While putting the ~alling film into ~peration ~nd before the liquid is overflowing the ~veir a facility for distribut7ng (3) the liquid Is arranged by mechanic~l, pneLJmatical or electromagnetical drive to ~ suîtable position ~t the weir so that the seperation of flow what means th~ foulin~ on the surfac~ of radiators and r~flectors gr7 o~ the fouliny on the surface of thE~ quartz gla~s tubes 6 are pr~v~nt~d~
After the film is formed the facllity for distributTng the liquid is driv~n back 50 tha~ the contact between dislributor and liquid is removed.
10/Z5/96 FRT 12: 45 [TX/RX NO 65351 r~i F~ûM ~`i'10~3~ ~h?~TENS ET AL ~C 16~,~6~!4081 POO9~îi25 PC~r~P94/01 1 07 ~ ~ O f1 ~
~o 9~125~00 c I O O :7 G2 S
For generating a turbulent flow and to rlse up the volume of the irra~iated liquid on the falling film passing the irradiation ch~rnber or for the ~3nlargement of the radiated surf~ces the walls 1 can be equipped with an appropriate profile ~ween the ~alls a rernovable radiation unit 5/7/9 which is fastened on a ~uide rail (Inspection and exchange of the larnps are done easTly) is installed. Tha radiatinn unit consists of hor~zontal or vertlcal arranged larnps (for example UV-lamps) and speci~l constructed r~flector-~ which are ~nstall~3d at th~ most all over the lengTh (hight) of the reactor in such a way, that one diagonal of the cross sectional ar~a of the reflector mainly is Iying on the a~is ~el~oon the rnidpoint of the cross sectional area of t~o adjacent UV-lamps. The cross section of the reflector(s) 7 is square or r~ctangular or rhornboid or elliptic-shaped or circular or polygonal. So a direct reciprocal irradiation of two adjacent radiators and a rereflection into the radiators whi~h rneans an absorption of the emitted radiation is avoided by the ~pecial arran~ernent of radiators and reflectors an~ by described geometry of the reflectors~
With th~ ~scribed reflectors th~ ~ngl~ of Incidence ot radiation onto The llquid film is enl~rged, long distances between r~diators (larnps) and liquid film are avoided, what means the way of the rays is shor~ened by diversion. Thi~ causes an extremely in~reased radiation intensity on the 6UI-falCO of th~ falling fil~n what means incr~ased radiation energy on the surface of the mediurn or in the rnedium itsslf.
It is known that polished aluminium or on a glass surfaces evaporat~d, mirror-polish~d electrical oxidized aluminium has good reflection c~p~citi~ss for U\~-radiation (about 90 percent). The Influence of corrosive atmosphere would cause a loss of r~fl~ction capacity ~f the reflec~ors To avoid Ih~ loss Df reflectlon capacity the reflectors 7 are installed inside of ev~u~t~d UV-permeable tubes or in UV-permeable tubes fil~ed with nitrogen, whereas the tubes around the reflector~ are con5tructe~ in ~ucll a wayl that it is impo~5ible to r~rrange them diff~r0nt to the abov~3 descri~ed arrangement.
To ~et the ma~timurn of UV-output from the radiator~ ~lamps) the temperature on the surface of the UV-lamp~ must have an optirnal l~vel This is r~ ed by installing the 10/25/96 FRl 12:45 [T~/R~ ~-0 6535]
M ~?~,~ Kl~iûEBE,MARTFNS, El` AL 1U 16046&14C~1 P!lln~O25 - w094/25~00 8~922 radlator~s) concentrically in the rniddle of a quartz-tube, so that she cooling air is led throu~h the cireled gap Around the radi~tor.
The supply of cooling mediun~ can be carried out by a central chamber into whichthe both sld~s open quart~ glass tubes lead. The cooling of the UV-lamps is supported consid~rably by the reflectors because they are also reflectin~ the infra-red radition which is led away with the talling film.
Whun the falling film is striking against the outl~t of th~ radiation chan~ a splashing ~hich can cause a fouling on the sur~ace of some lamps i5 possible To retain splashes a special profile 8 is inst~ ted ~nder the irradiation apparatus over it~ whole lenghth The dlstance between the profile and the falling film i~ adjust~ble.
A second profile 4 Is in~talled above the irradiation apparatus to avoid that liquid drips which might bc seper~ted from the ~alling fllrn in the area of the weir drlp on the upper part of the lamps.
The describ~d apparatus can be combined with a UV-resistant storage tank manuf~ctur~d for exampt~ out ~f high-grad~ steel. In action the medium t~ be treat~d is pu~ped from the storag~ tank onto the radiation chamber, over the weir and flows in free incline down the walls 1 to run in a draina~e channel with optim~l current and aft~rwards back in thc stor~ge tank.
Following operations are possible:
- Batch process; At the beginnig of the treatment the storage tank is filled~ The volume of the storage tank is pumped in continuous flow one or s~veral times into tl~e irradiation chamber Al'ter treatment the storag~ tank is drained.
- C;ontinuous flow process; ~n continuous flow the s~orage ~nk Is teeded wllh untreated waste water and treated waste water leaves the strorage tank with the same flow like the feed. At the sams time the irradiation chamber is feeded with the waste water from the storag~ tank in circul~ting continuous flow.
The dr~wing out of reaction gases take place over th~s ~rradiation chamber or the stora~e tank.
10/2~/~36 FRI 12: 45 [TX/RX NO 6535 l h~ F~ r h;NvEBE~MA~iTENS ET AT lo ~6046& 4C~1 ~011/n25 PC~/EP9~/01107 ~ ¦ 8 8 g ~ 2 - wo 94/25400 REI~TIONSHIP OF TI IE ~IUMBERS:
- wall Z - weir
. ~ PCTJEP94101107 - wo 9~/Z54~)0 the water to be treated run into the UV reactor with high pressure~ The pressurecauses a ~plashing o~ the waste wate~ from the sh~de to thra tub~ which i~ lo~ted around the UV-radiator and in consequence a coatin~ film on the tube, what meansthat Ihe UV-radia~ion will be absorbe~ by tlle coatin3 film on the tu~e.
5UMMARY OF ~HE INVENTION:
Th~ present invent~on is intended to provi~e an effective process and a simple cons~ructed, low cost apparatus in which IE~rge ~ur~ace9 of liquids can be irradiated spatial separat13d from the radiators and without contact to the racliators to exploitate as much as possible of the irradiated rays to carry out th~ UV~catalyzed wet oxi~ation process for effective waste water treatment and effe~tive elimination of problematic contents of waste ~vater, to en~ble an effective, pro-environmental, and with low cost pro~uced altern~tive to other sew~ge or waste ~ater ~reatments.
The irradiation of large surfaces is important in UV-catalized wet oxidation processe5 because wast~ water nearly always has a high absorption of UV-irradTation and the penetration of the UV~rays is very low esp~3cially when the liquid is turbid or when the conc~ntration of organic or inor~anic substances Is high whereas chemical rQactions initiated by UV~radiation m~inly t~ke placr~ (start) on radiat~?d ~ c~3s The draining of the falling film as well as the running of the falling hlm within the radiation cha~nber - especially while putting the falling fiirn into op~ration and whil~
treating large volumes - has to be carried out in s~ch a way to avoid liquid drip~
taking off the walls and reaching the UV-radiators. Liquid drips taking off the walls woulci o~use a coatjng film on th~ ~surfaces of the UV-radiators and therefore adiminished intensity of radiation on the ~alling film The intensity of radiation is improved in avoidin~ the adsorption of radiation of ~1ja~ent ldV-sol~rces and in :~v~iding Inng radlation distances to ~he film.
10/25/96 FRI 12:45 ITX/RX .~0 65351 '- F~ F?`,hh KNvBl~E,MhR~ENS,i~ AL TO lhO4681408 F`~08'025 PCT/EPg~/0~ 107 ~ 1 88 9 2 ~
- wo 94/25~00 BF~IEF DESCRIPTION OF ~HE DRAWINGS:
Fig. 1 shows the main components of the invented apparatus in perspective (non~
cylindrical form) Fig. 2 ~hows the main components of the invented appar~tus in cross~section Fig. 3 shows a pi~ce cut in cross-section with indicated UV-sources an~ reflectors DETAILED DESCRIPTION:
In the ~rawin~3 (Fig.1) there i~ ahown an apparatus with a radiation chamber consisting of UV-r~sistant material for exarnple stainless-steei (high-grade st~el~ and with the l~s t~o facing walls 1 which may be provided with surf~ces with catalytic effects.
On the facin~ walls 1 - which are ~rranged vertical or dipped in comparison with the vertical - there is developed a well-balanced liquid film by th~ liquid overflowing a special constructed weir 2. The rnedium can be enriched by oxidTzing agents likeoxygen, t1ydrogene peroxlde or others, for example ozone Becaus~ of the different compositi~n of the liquids therl3 ar~ diffelerlt effects in the layer be~veen the surface of the weir or the wall and the liquid film. Under disandvantageous conditions a heterogeneous ~4etting and overtlowing or a d;~mming on the surface of the w~ir or the wall can occure. Tt~i~ effects can cause a seperation of flow. While putting the ~alling film into ~peration ~nd before the liquid is overflowing the ~veir a facility for distribut7ng (3) the liquid Is arranged by mechanic~l, pneLJmatical or electromagnetical drive to ~ suîtable position ~t the weir so that the seperation of flow what means th~ foulin~ on the surfac~ of radiators and r~flectors gr7 o~ the fouliny on the surface of thE~ quartz gla~s tubes 6 are pr~v~nt~d~
After the film is formed the facllity for distributTng the liquid is driv~n back 50 tha~ the contact between dislributor and liquid is removed.
10/Z5/96 FRT 12: 45 [TX/RX NO 65351 r~i F~ûM ~`i'10~3~ ~h?~TENS ET AL ~C 16~,~6~!4081 POO9~îi25 PC~r~P94/01 1 07 ~ ~ O f1 ~
~o 9~125~00 c I O O :7 G2 S
For generating a turbulent flow and to rlse up the volume of the irra~iated liquid on the falling film passing the irradiation ch~rnber or for the ~3nlargement of the radiated surf~ces the walls 1 can be equipped with an appropriate profile ~ween the ~alls a rernovable radiation unit 5/7/9 which is fastened on a ~uide rail (Inspection and exchange of the larnps are done easTly) is installed. Tha radiatinn unit consists of hor~zontal or vertlcal arranged larnps (for example UV-lamps) and speci~l constructed r~flector-~ which are ~nstall~3d at th~ most all over the lengTh (hight) of the reactor in such a way, that one diagonal of the cross sectional ar~a of the reflector mainly is Iying on the a~is ~el~oon the rnidpoint of the cross sectional area of t~o adjacent UV-lamps. The cross section of the reflector(s) 7 is square or r~ctangular or rhornboid or elliptic-shaped or circular or polygonal. So a direct reciprocal irradiation of two adjacent radiators and a rereflection into the radiators whi~h rneans an absorption of the emitted radiation is avoided by the ~pecial arran~ernent of radiators and reflectors an~ by described geometry of the reflectors~
With th~ ~scribed reflectors th~ ~ngl~ of Incidence ot radiation onto The llquid film is enl~rged, long distances between r~diators (larnps) and liquid film are avoided, what means the way of the rays is shor~ened by diversion. Thi~ causes an extremely in~reased radiation intensity on the 6UI-falCO of th~ falling fil~n what means incr~ased radiation energy on the surface of the mediurn or in the rnedium itsslf.
It is known that polished aluminium or on a glass surfaces evaporat~d, mirror-polish~d electrical oxidized aluminium has good reflection c~p~citi~ss for U\~-radiation (about 90 percent). The Influence of corrosive atmosphere would cause a loss of r~fl~ction capacity ~f the reflec~ors To avoid Ih~ loss Df reflectlon capacity the reflectors 7 are installed inside of ev~u~t~d UV-permeable tubes or in UV-permeable tubes fil~ed with nitrogen, whereas the tubes around the reflector~ are con5tructe~ in ~ucll a wayl that it is impo~5ible to r~rrange them diff~r0nt to the abov~3 descri~ed arrangement.
To ~et the ma~timurn of UV-output from the radiator~ ~lamps) the temperature on the surface of the UV-lamp~ must have an optirnal l~vel This is r~ ed by installing the 10/25/96 FRl 12:45 [T~/R~ ~-0 6535]
M ~?~,~ Kl~iûEBE,MARTFNS, El` AL 1U 16046&14C~1 P!lln~O25 - w094/25~00 8~922 radlator~s) concentrically in the rniddle of a quartz-tube, so that she cooling air is led throu~h the cireled gap Around the radi~tor.
The supply of cooling mediun~ can be carried out by a central chamber into whichthe both sld~s open quart~ glass tubes lead. The cooling of the UV-lamps is supported consid~rably by the reflectors because they are also reflectin~ the infra-red radition which is led away with the talling film.
Whun the falling film is striking against the outl~t of th~ radiation chan~ a splashing ~hich can cause a fouling on the sur~ace of some lamps i5 possible To retain splashes a special profile 8 is inst~ ted ~nder the irradiation apparatus over it~ whole lenghth The dlstance between the profile and the falling film i~ adjust~ble.
A second profile 4 Is in~talled above the irradiation apparatus to avoid that liquid drips which might bc seper~ted from the ~alling fllrn in the area of the weir drlp on the upper part of the lamps.
The describ~d apparatus can be combined with a UV-resistant storage tank manuf~ctur~d for exampt~ out ~f high-grad~ steel. In action the medium t~ be treat~d is pu~ped from the storag~ tank onto the radiation chamber, over the weir and flows in free incline down the walls 1 to run in a draina~e channel with optim~l current and aft~rwards back in thc stor~ge tank.
Following operations are possible:
- Batch process; At the beginnig of the treatment the storage tank is filled~ The volume of the storage tank is pumped in continuous flow one or s~veral times into tl~e irradiation chamber Al'ter treatment the storag~ tank is drained.
- C;ontinuous flow process; ~n continuous flow the s~orage ~nk Is teeded wllh untreated waste water and treated waste water leaves the strorage tank with the same flow like the feed. At the sams time the irradiation chamber is feeded with the waste water from the storag~ tank in circul~ting continuous flow.
The dr~wing out of reaction gases take place over th~s ~rradiation chamber or the stora~e tank.
10/2~/~36 FRI 12: 45 [TX/RX NO 6535 l h~ F~ r h;NvEBE~MA~iTENS ET AT lo ~6046& 4C~1 ~011/n25 PC~/EP9~/01107 ~ ¦ 8 8 g ~ 2 - wo 94/25400 REI~TIONSHIP OF TI IE ~IUMBERS:
- wall Z - weir
3 - facility for distributin~
4 - upper profile
5 - rornovabl~ ~uide rail - UV-permeable tube 7 - reflector 8 - base profile 9 - radiator (lamp) 10 ~ outlet 11 - radiation chamber 12 - U~/-permeable cover for the reflectors 13- head room igure 1: main components of the invented apparatus in perspec~ive with a rectangle cross-section fi~urc 2: cross-section without reflectors ~gure 3: plece cut in cross-sectlon with radiators, reflector6, UV-permea~le covers 10/25/96 FRI 12:45 [TX/RX ~-0 6535]
Claims (10)
1. Falling film reactor for the treatment of liquid waste, especially waste water, with the following characteristics:
- at least one radiation chamber (11) consisting of UV-resistant material, con-sisting at least two facing walls (1) which are arranged vertical or sloping, - with a removable radiation unit (5/7/9) between the walls which consist of - horizontal or vertical arranged UV-radiators (9) - and reflector(s) (7) by means of which - UV-radiators (9) and reflectors are arranged in such a way, that the UV-rays are directed on to the liquid film and a facing radiation of the ultraviolet lamps is virtually impossible.
- at least one radiation chamber (11) consisting of UV-resistant material, con-sisting at least two facing walls (1) which are arranged vertical or sloping, - with a removable radiation unit (5/7/9) between the walls which consist of - horizontal or vertical arranged UV-radiators (9) - and reflector(s) (7) by means of which - UV-radiators (9) and reflectors are arranged in such a way, that the UV-rays are directed on to the liquid film and a facing radiation of the ultraviolet lamps is virtually impossible.
2. A device in accordance with claim 1 in which the UV-radiator(s) (9) (is) are arranged concentrically into (a) UV-permeable tube(s) (6) to allow a cooling of the lamp(s) by leading through air.
3. A device in accordance with claim 1 in which said reflector(s) (7) is (are) installed gastight in a UV-permeable cover (12).
4. A device in accordance with previous claims in which the liquid runs over a weir or a baffle-plate (2) installed at the upper end of the corresponding wall before the liquid is floating over the wall.
5. A device in accordance with claim 1 in which said walls (1) of the chamber are structurized.
6. A device in accordance with claim 1 in which said walls (1) of the chamber are provided with a surface which act as catalyst.
7. A device in accordance with claim 1 and 3 in which the cross-section of said reflector(s) is (are) circular or square or rectangular or polygonal or rhomboid or elliptic-shaped.
8. A device in accordance with previous claims in which on the top of and above of said removable radiation unit (5/7/9) a protection buffle (4/8) against spraying is installed.
9. Process for optimizing the intensity of radiation directed onto liquids, in which the falling film reactor according to claim 1 to 8 is used with - the liquid which is passing at least in one radiation chamber with vertical orsloping walls (1) spatial separated from a removable radiation unit (5/7/9) which consists of - ultraviolet radiators (9) and reflectors (7), whereas - radiators and reflectors are installed in such a manner, that virtually the entire emitted radiation is directed onto the liquid film (medium) and that a facing radiation of two adjacent radiators is impossible.
10. Process in accordance with claim 9, in which the liquid is brought together with oxidizing agents.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4317939A DE4317939C2 (en) | 1993-04-27 | 1993-04-27 | Device for optimizing the intensity of the radiation aimed at liquid waste and waste water to be irradiated |
| DEP4317939.8 | 1993-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2188922A1 true CA2188922A1 (en) | 1994-11-10 |
Family
ID=6489220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002188922A Abandoned CA2188922A1 (en) | 1993-04-27 | 1994-04-10 | Device and process for optimizing the intensity of radiation directed onto sewage and waste water |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0705220B1 (en) |
| AT (1) | ATE150737T1 (en) |
| AU (1) | AU6677194A (en) |
| CA (1) | CA2188922A1 (en) |
| DE (1) | DE4317939C2 (en) |
| WO (1) | WO1994025400A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7892404B2 (en) | 2004-05-21 | 2011-02-22 | Mitsubishi Gas Chemical Company, Inc. | Method for oxidizing substance and oxidation apparatus therefor |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4430231A1 (en) * | 1994-08-25 | 1996-02-29 | Ultralight Ag | Process and device for cleaning gases and liquids |
| DE4447035A1 (en) * | 1994-12-28 | 1996-07-11 | Eva Gotthold | Method and apparatus for reducing the nitrate content of water |
| DE19653083B4 (en) * | 1996-12-19 | 2005-09-08 | Wedeco Ag Water Technology | Streamlined UV disinfection device |
| AU2001234172A1 (en) * | 2000-02-25 | 2001-09-03 | Ebara Corporation | Method and apparatus for electromagnetic irradiation of liquid |
| DE10045220A1 (en) * | 2000-09-13 | 2002-04-18 | Rag Ag | Device for treating water used in mining and tunnel construction as a primary stage for producing a water-oil emulsion to be used as hydraulic fluid comprises a container with a water inlet and a water outlet arranged in a fresh water pipe |
| EP1702678A1 (en) | 2005-03-16 | 2006-09-20 | Glatt Systemtechnik GmbH | Apparatus for treatment of liquid with energetic radiation |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT65833B (en) * | 1909-11-05 | 1914-07-25 | Victor Henri | Device for sterilizing liquids by means of ultraviolet rays. |
| AT54709B (en) * | 1910-05-27 | 1912-08-10 | Victor Henri | Device for treating liquids by means of ultraviolet rays. |
| DE964824C (en) * | 1950-04-06 | 1957-05-29 | Siemens Ag | Device for irradiating, in particular disinfecting liquids with ultraviolet rays |
| ES379250A2 (en) * | 1970-04-30 | 1972-11-01 | Explotaciones Marisqueras S A | Procedure, with your device, for seafood industrial depuration. (Machine-translation by Google Translate, not legally binding) |
| SU411885A1 (en) * | 1970-06-15 | 1974-01-25 | ||
| US4028246A (en) * | 1975-11-20 | 1977-06-07 | Lund Norman S | Liquid purification system |
| US4048490A (en) * | 1976-06-11 | 1977-09-13 | Union Carbide Corporation | Apparatus for delivering relatively cold UV to a substrate |
| CA1048733A (en) * | 1977-02-02 | 1979-02-20 | Anthony J. Last | Ozone/ultraviolet water purifier |
| US4273660A (en) * | 1979-02-21 | 1981-06-16 | Beitzel Stuart W | Purification of water through the use of ozone and ultraviolet light |
| SU981238A1 (en) * | 1980-12-10 | 1982-12-15 | Предприятие П/Я Г-4857 | Apparatus for sterilizing liquid flow with ultraviolet radiation |
| FR2588548A1 (en) * | 1985-10-11 | 1987-04-17 | Bernard Michel Louis | Water purification and reoxygenation process |
| DE8815485U1 (en) * | 1988-12-13 | 1990-05-17 | Dr. K. Hönle GmbH, 8033 Martinsried | Device for disinfecting liquids with ultraviolet radiation |
| DE4000369A1 (en) * | 1990-01-09 | 1991-07-11 | Layer & Knoedler Abwassertechn | METHOD AND DEVICE FOR WATER TREATMENT |
| DE4005488A1 (en) * | 1990-02-21 | 1991-08-22 | Wabner Dietrich | METHOD AND DEVICE FOR WATER DETOXIFICATION |
| US5227140A (en) * | 1990-04-13 | 1993-07-13 | Peroxidation Systems, Inc. | Modular self-cleaning oxidation chamber |
| DE4033792A1 (en) * | 1990-10-24 | 1992-04-30 | Peter Ueberall | Device for sterilising liquids using radiation - in which liquid flows in layer of uniform thickness through annular spaces surrounding central UV-light sources in number of parallel tubes |
| DE4136949A1 (en) * | 1991-11-11 | 1993-05-13 | Roswitha Niedermeier | Photoactive purificn. of water contg. organic impurities - by passing thin film of water over UV light source which contains wavelengths suitable for formation of ozone molecules and hydroxyl radical |
-
1993
- 1993-04-27 DE DE4317939A patent/DE4317939C2/en not_active Expired - Fee Related
-
1994
- 1994-04-10 AT AT94914356T patent/ATE150737T1/en not_active IP Right Cessation
- 1994-04-10 WO PCT/EP1994/001107 patent/WO1994025400A1/en active IP Right Grant
- 1994-04-10 AU AU66771/94A patent/AU6677194A/en not_active Abandoned
- 1994-04-10 CA CA002188922A patent/CA2188922A1/en not_active Abandoned
- 1994-04-10 EP EP94914356A patent/EP0705220B1/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7892404B2 (en) | 2004-05-21 | 2011-02-22 | Mitsubishi Gas Chemical Company, Inc. | Method for oxidizing substance and oxidation apparatus therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1994025400A1 (en) | 1994-11-10 |
| EP0705220A1 (en) | 1996-04-10 |
| ATE150737T1 (en) | 1997-04-15 |
| DE4317939A1 (en) | 1994-11-03 |
| AU6677194A (en) | 1994-11-21 |
| EP0705220B1 (en) | 1997-03-26 |
| DE4317939C2 (en) | 1995-09-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |