JPS6310401B2 - - Google Patents

Info

Publication number
JPS6310401B2
JPS6310401B2 JP58142566A JP14256683A JPS6310401B2 JP S6310401 B2 JPS6310401 B2 JP S6310401B2 JP 58142566 A JP58142566 A JP 58142566A JP 14256683 A JP14256683 A JP 14256683A JP S6310401 B2 JPS6310401 B2 JP S6310401B2
Authority
JP
Japan
Prior art keywords
organic polymer
polymer film
ion etching
photoresist
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58142566A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6033502A (ja
Inventor
Juzo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP58142566A priority Critical patent/JPS6033502A/ja
Publication of JPS6033502A publication Critical patent/JPS6033502A/ja
Publication of JPS6310401B2 publication Critical patent/JPS6310401B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • H10P50/00—

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Drying Of Semiconductors (AREA)
JP58142566A 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法 Granted JPS6033502A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58142566A JPS6033502A (ja) 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58142566A JPS6033502A (ja) 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法

Publications (2)

Publication Number Publication Date
JPS6033502A JPS6033502A (ja) 1985-02-20
JPS6310401B2 true JPS6310401B2 (Direct) 1988-03-07

Family

ID=15318301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58142566A Granted JPS6033502A (ja) 1983-08-05 1983-08-05 ブレ−ズド格子の製造方法

Country Status (1)

Country Link
JP (1) JPS6033502A (Direct)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2561197C1 (ru) * 2014-07-30 2015-08-27 Федеральное государственное бюджетное учреждение науки Казанский физико-технический институт им. Е.К. Завойского Казанского научного центра Российской Академии наук (КФТИ КазНЦ РАН) Дифракционная решетка на полимерной основе
US11119405B2 (en) * 2018-10-12 2021-09-14 Applied Materials, Inc. Techniques for forming angled structures

Also Published As

Publication number Publication date
JPS6033502A (ja) 1985-02-20

Similar Documents

Publication Publication Date Title
US4013465A (en) Reducing the reflectance of surfaces to radiation
EP0001030B1 (fr) Procédé de fabrication d'un masque selon une configuration donnée sur un support
EP0110184B1 (en) Process for fabricating integrated optics
US3945825A (en) Method for producing width-modulated surface relief patterns
US3944420A (en) Generation of permanent phase holograms and relief patterns in durable media by chemical etching
EP0513755A2 (en) A method for producing a diffraction grating
JPH0217002B2 (Direct)
JPH0435726B2 (Direct)
JPH0374362B2 (Direct)
JPS6033501A (ja) プレ−ズド格子の製造方法
JPS6310401B2 (Direct)
US4087281A (en) Method of producing optical image on chromium or aluminum film with high-energy light beam
JPH0217001B2 (Direct)
GB2079536A (en) Process for producing an optical network
JPH0740111B2 (ja) 微小光学素子の製造方法
JPS60230650A (ja) 微細パタ−ンの製作法
JPS6127505A (ja) プレ−ズ光学素子の製造方法
JPS6033505A (ja) 回折格子の製造方法
JPS5947282B2 (ja) エシエレツト格子の製造方法
JPS62231901A (ja) ブレ−ズド回折格子の製造方法
JP2506967B2 (ja) 光ディスク原盤の製造方法
JPS5983111A (ja) 光集積回路作製法
JPS59204877A (ja) ホログラムの製造方法
JPH0456284B2 (Direct)
JPS6242103A (ja) ブレ−ズ格子の製造方法