JPS63102335A - Ion implanting system - Google Patents
Ion implanting systemInfo
- Publication number
- JPS63102335A JPS63102335A JP61248786A JP24878686A JPS63102335A JP S63102335 A JPS63102335 A JP S63102335A JP 61248786 A JP61248786 A JP 61248786A JP 24878686 A JP24878686 A JP 24878686A JP S63102335 A JPS63102335 A JP S63102335A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- transport system
- carrier system
- detection
- abnormality
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002159 abnormal effect Effects 0.000 claims abstract description 9
- 238000001514 detection method Methods 0.000 claims description 69
- 238000012544 monitoring process Methods 0.000 claims description 44
- 238000005468 ion implantation Methods 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 20
- 230000032258 transport Effects 0.000 claims 10
- 230000005856 abnormality Effects 0.000 abstract description 19
- 238000000034 method Methods 0.000 abstract description 7
- 230000007257 malfunction Effects 0.000 abstract description 2
- 235000012431 wafers Nutrition 0.000 description 84
- 239000004065 semiconductor Substances 0.000 description 25
- 230000007246 mechanism Effects 0.000 description 20
- 238000012806 monitoring device Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 3
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000006063 cullet Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Safety Devices In Control Systems (AREA)
- Multi-Process Working Machines And Systems (AREA)
Abstract
Description
【発明の詳細な説明】
［発明の目的］
（産業上の利用分野）
本発明はイオン注入装置の基板搬送系監視装置に係り、
特に複数の基板搬送系監視機構を具備したイオン注入装
置に関する。[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention relates to a substrate transport system monitoring device for an ion implantation device,
In particular, the present invention relates to an ion implantation apparatus equipped with a plurality of substrate transport system monitoring mechanisms.
（従来の技術）
近年半導体ウェハ等の被処理基板に例えばＢ、Ｐ、ＡＳ
等の不純物原子を注入して半導体基板を処理するイオン
注入装置が広く普及している。(Prior art) In recent years, substrates to be processed such as semiconductor wafers are coated with B, P, and AS.
Ion implantation devices that process semiconductor substrates by implanting impurity atoms such as ion implanters are widely used.
このイオン注入装置では被処理基板例えば半導体ウェハ
の搬送は、半導体ウェハを大気中から予備真空室を介し
て真空処理室に搬入し、イオン注入処理後に半導体ウェ
ハを再び予備真空室を介して大気中に搬出するという構
造となっているので半導体ウェハを搬送するためのウェ
ハ搬送系が設けられている。In this ion implantation device, the substrate to be processed, such as a semiconductor wafer, is transported by transporting the semiconductor wafer from the atmosphere into the vacuum processing chamber via a preliminary vacuum chamber, and after the ion implantation process, the semiconductor wafer is returned to the atmosphere via the preliminary vacuum chamber. Since the structure is such that the semiconductor wafer is carried out, a wafer transfer system is provided to transfer the semiconductor wafer.
ところでこのウェハ搬送系においては、搬送開溝にトラ
ブルが発生した場合にこれをすみやかに検出し、後工程
に影響を与えることがないようにウェハ搬送系監視装置
か設けられている。このウェハ搬送系監視装置は搬送系
監視制御装置と、ウェハ搬送系内各所に設けられた多数
の検出装置から成る検出部とから構成されており、検出
部からの情報を搬送系監視装置に入力してウェハ搬送系
の動作・状態を常に監視している。By the way, in this wafer transport system, a wafer transport system monitoring device is provided to promptly detect any trouble that occurs in the transport groove and prevent it from affecting subsequent processes. This wafer transfer system monitoring device consists of a transfer system monitoring and control device and a detection section consisting of a number of detection devices installed at various locations within the wafer transfer system. Information from the detection section is input to the transfer system monitoring device. The operation and status of the wafer transport system are constantly monitored.
（発明が解決しようとする問題点）
しかしながら従来のウェハ搬送系監視装置はひとつのウ
ェハ搬送系に対してひとつしか設けられておらず、搬送
系監視制御装置に異常が発生した状態で検出部から次の
異常信号が入力されてもこれを見逃してしまうという問
題があり、イオン注入装置仝体の信頼性低下の原因とな
っていた。(Problems to be Solved by the Invention) However, conventional wafer transport system monitoring devices are only provided for one wafer transport system, and when an abnormality occurs in the transport system monitoring and control device, the detection unit There is a problem in that even if the next abnormal signal is input, it is overlooked, which causes a decrease in the reliability of the ion implantation apparatus.
本発明は上述した問題点を解決するために成されたもの
で、信頼性の高いイオン注入装置を提供することを目的
とする。The present invention was made to solve the above-mentioned problems, and an object of the present invention is to provide a highly reliable ion implantation device.
［発明の構成］
（問題点を解決するための手段）
本発明のイオン注入装置は、イオン注入位置と基板搬送
系の各部の動作・状態を監視する装置において、被処理
基板を搬送する基板搬送系の動作・状態を検出する少な
くとも一系統の検出手段と、この検出手段からの情報を
入力して上記基板搬送系の動作・状態を監視する少なく
とも二系統の搬送系監視手段と、これら搬送系監視手段
からの信号により上記基板搬送系の動作・状態を制御す
る搬送系監視手段とを備えたことを特徴とするものであ
る。[Structure of the Invention] (Means for Solving the Problems) The ion implantation apparatus of the present invention is an apparatus for monitoring the ion implantation position and the operation/state of each part of the substrate transport system. at least one system of detection means for detecting the operation/state of the substrate transport system; at least two transport system monitoring means for inputting information from the detection means to monitor the operation/state of the substrate transport system; The present invention is characterized by comprising a transport system monitoring means for controlling the operation and state of the substrate transport system based on signals from the monitoring means.
（作 用）
本発明では、ウェハ搬送系監視部を複数設け、これら複
数のウェハ搬送系監視部でウェハ搬送系の監視を行なう
ことにより、一方の監視部が動作不良になっても他方の
監視部で制御可能にできる信頼性の高いイオン注入作業
が行なえる。(Function) In the present invention, a plurality of wafer transport system monitoring units are provided, and by monitoring the wafer transport system with these multiple wafer transport system monitoring units, even if one monitoring unit malfunctions, the other monitoring unit can be monitored. Highly reliable ion implantation work that can be controlled locally.
（実施例）
以下本発明の一実施例について図を参照にして説明する
。(Example) An example of the present invention will be described below with reference to the drawings.
第１図は実施例のウェハ搬送系監視装置の構成を示すも
ので、第３図に示す半導体ウェハ２を真空室外に設けら
れたウェハカセット１から取出して真空室であるイオン
注入処理室へと搬送し、処理室でプラテンに装着してイ
オン注入作業終了後、再びウェハカセット１へと搬送帰
還するウェハ「Ｖ送糸が構成されている。この搬送系の
各要所には、多数の搬送系検出装置例えば真空室のウェ
ハ出入時に開閉するバルブ開閉状態を確認するための検
出機構１０ａ、半導体ウェハの搬送に際し半導体ウェハ
を保持するピックの昇降状態を検出するピック臂降検出
機構１０ｂ、各工程における半導体ウェハの搬送位置を
確認するための複数のウェハ位置検出機構１０ｃ等が設
けられて、ウェハ搬送系監視系の検出部１０が構成され
る。これら機構の具体例はホトカプラ、圧電センサ、ド
アスイッチ等を用いることができる。FIG. 1 shows the configuration of a wafer transport system monitoring device according to an embodiment. The semiconductor wafer 2 shown in FIG. The wafer is transported, mounted on a platen in the processing chamber, and returned to the wafer cassette 1 after the ion implantation process is completed. System detection device For example, a detection mechanism 10a for checking the opening/closing state of a valve that opens and closes when a wafer is taken in and out of a vacuum chamber, a pick lowering detection mechanism 10b for detecting the lifting and lowering state of a pick that holds a semiconductor wafer during transportation of a semiconductor wafer, and each process. A plurality of wafer position detection mechanisms 10c and the like for confirming the transfer position of semiconductor wafers are provided to constitute the detection unit 10 of the wafer transfer system monitoring system.Specific examples of these mechanisms include photocouplers, piezoelectric sensors, door sensors, etc. A switch or the like can be used.
この検出部１０で検出されたウェハ搬送系の動作状態検
出信号は搬送系監視制御部１１と補助搬送系監視制御部
１２へそれぞれ入力される。The operating state detection signal of the wafer transport system detected by the detection section 10 is inputted to a transport system monitoring and controlling section 11 and an auxiliary transport system monitoring and controlling section 12, respectively.
補助搬送系監視制御部１２では、検出部１０から入力さ
れた検出信号によりウェハ搬送系の動作状態を監視し、
信号が入力された場合は、検出部異常信号を搬送系監視
制御部１１へと出力例えば異常信号を出力した検出部情
報と共に出力し表示する。一方搬送系監視制御部１１に
も検出部１０から各検出部からの検出信号が供給されて
おり、動作状態を監視することは勿論異常信号の内容に
応じて、当該異常部の搬送を停止制御する。すなわち２
系統で監視する。また、ウェハ処理終了時にウェハ処理
終了信号を出力してウェハ処理数表示部１３にウェハ処
理終了枚数を表示させる。ウェハ処理数表示部１３とし
ては、例えばウェハ処理枚数をひとつずつＬＥＤ表示す
るパネルを設けてこれに点灯表示させてもよい。The auxiliary transport system monitoring control unit 12 monitors the operating state of the wafer transport system based on the detection signal input from the detection unit 10,
When a signal is input, a detection unit abnormality signal is output to the transport system monitoring control unit 11, for example, together with information on the detection unit that outputs the abnormality signal and displayed. On the other hand, the detection signal from each detection unit is also supplied to the transport system monitoring control unit 11 from the detection unit 10, and it not only monitors the operating state but also controls to stop the transport of the abnormal part according to the content of the abnormal signal. do. That is, 2
Monitor by system. Further, at the end of wafer processing, a wafer processing end signal is output to cause the processed wafer number display section 13 to display the number of wafers processed. As the wafer processing number display section 13, for example, a panel may be provided to display the number of wafers processed one by one using LEDs, and the panel may be lit to display the number of wafers processed one by one.
また、上記搬送系監視制御部１１は、上記検出部１０か
ら入力された検出信号によりウェハ搬送系の動作状態を
監視し、検出部１０からの異常信号はもちろんのこと走
行位置、正常走行等の情報を補助搬送系監視制御部１２
から搬送系監視制御部１１へ出力する。そして異常信号
が入力されると、搬送系異常信号を出力してウェハ搬送
系の異常を知らせる。例えば異常を出力した検出部から
異常箇所および異常を表示する。ざらに、同時に異常内
容に応じて少なくとも当該部の搬送操作を停止する如く
制御する。Further, the transfer system monitoring control section 11 monitors the operating state of the wafer transfer system based on the detection signal inputted from the detection section 10, and detects not only abnormal signals from the detection section 10 but also the running position, normal running, etc. Information is sent to the auxiliary transport system monitoring control unit 12
The data is outputted to the conveyance system monitoring control section 11 from there. When the abnormality signal is input, a transport system abnormality signal is output to notify the abnormality of the wafer transport system. For example, the abnormal location and abnormality are displayed from the detection unit that outputs the abnormality. Roughly speaking, at the same time, control is performed to at least stop the transport operation of the relevant section depending on the nature of the abnormality.
このように搬送系監視制御部を複数系統例えば２系統と
すれば一方の監視制御部の搬送系監視制御部１１に障害
が発生してウェハ搬送系の異常を見逃しても補助搬送系
監視制御部１２で発見し制御する・ことができ、装置全
体の信頼性が向上する。In this way, if there are multiple systems, for example two systems, of the transport system monitoring and controlling section, even if a failure occurs in the transport system monitoring and controlling section 11 of one of the monitoring and controlling sections and an abnormality in the wafer transport system is overlooked, the auxiliary transport system monitoring and controlling section can 12 can be discovered and controlled, improving the reliability of the entire device.
上記実施例では、一系統の検出部１０からの検出信号を
２系統に分けてそれぞれ搬送系監視制御部に入力したが
、本発明はこれに限定されるものではなく、夫々搬送系
監視制御部ごとにそれぞれ独立した検出部から検出信号
を入力するような構成としてもよい。In the above embodiment, the detection signal from one system of the detection unit 10 is divided into two systems and inputted to the transport system monitoring and control unit respectively. A configuration may be adopted in which detection signals are input from independent detection units for each of the detection units.
以下本発明の他の実施例として複数の独立した検出部か
らそれぞれ搬送系監視制御部に検出信号を入力するよう
にしたものについて第２図を参照にして説明する。検出
部１０と独立して設けられた補助検出部１４から出力さ
れた検出信号は、補助搬送系監視制御部１２へ入力され
るようになっており、ここで補助検出部１４からの検出
信号をもとにウェハ搬送系が正常に作動しているか否か
を判断する。補助検出部１４を構成する多数の検出機構
は、検出部１０を構成する検出機構とは異なった検出機
構例えばウェハカレット近傍に設置されピックが半導体
ウェハを保持したか否かを検出するためのカセット内ウ
ェハ検出機構１４ａヤウエハ搬送中における半導体ウェ
ハの落下音ヤウエハの割れによる破損音などを検出する
音検出機＠１４ｂ等から構成されている。Referring to FIG. 2, a description will be given below of another embodiment of the present invention in which detection signals are input from a plurality of independent detection sections to the transport system monitoring control section. The detection signal output from the auxiliary detection section 14, which is provided independently of the detection section 10, is input to the auxiliary transport system monitoring control section 12, where the detection signal from the auxiliary detection section 14 is input. Based on this, it is determined whether the wafer transport system is operating normally. A large number of detection mechanisms constituting the auxiliary detection section 14 are different detection mechanisms from the detection mechanisms constituting the detection section 10, for example, a cassette installed near the wafer cullet and used to detect whether or not a pick holds a semiconductor wafer. The inner wafer detection mechanism 14a is composed of a sound detector @14b, etc., which detects the falling sound of semiconductor wafers during wafer transportation, the sound of damage caused by cracking of wafers, and the like.
この検出部１４を構成する検出機構の具体的な一例とし
てカセット内ウェハ検出装置１４ａを例にとり第３図を
参照にして説明する。下面に開口部を有する箱体のウェ
ハカセット１内には多数の半導体ウェハ２が収納されて
おり、ウェハカセット１下部に配置されたしゃもじ状の
ウェハ搬送用ピック３を図中矢印Ｙで示す如く上昇させ
てこのピック３上端部に設けられた弧状溝３ａ部で半導
体ウェハ２を保持しなからウェハカセット１上部にある
図示を省略したイオン注入処理室へと垂直に１枚ずつ搬
送する。A specific example of the detection mechanism constituting the detection section 14 will be described with reference to FIG. 3, taking the cassette wafer detection device 14a as an example. A large number of semiconductor wafers 2 are stored in a box-like wafer cassette 1 having an opening on the bottom surface, and a rice scoop-shaped wafer transfer pick 3 placed at the bottom of the wafer cassette 1 is placed as shown by arrow Y in the figure. The semiconductor wafers 2 are raised and held in an arcuate groove 3a provided at the upper end of the pick 3, and then vertically conveyed one by one to an ion implantation processing chamber (not shown) located above the wafer cassette 1.
ウェハカセット１は図示を省略したウェハカセット駆動
機構により図中矢印Ｘ方向へと歩進するようになってお
り、ウェハカセット１を順次歩進させて次処理の半導体
ウェハをピック３上に配置させる。The wafer cassette 1 is moved in the direction of the arrow X in the figure by a wafer cassette drive mechanism (not shown), and the wafer cassette 1 is sequentially moved to place the next semiconductor wafer on the pick 3. .
ピック３と半導体ウェハ２との接触部近傍には横り字状
のフォトセンサタイプつセット内ウェハ検出機構１４ａ
が設けられており、ピック３上に半導体ウェハ２がある
か否かを検知することができる。カセット内ウェハ検出
機構１４ａはウェハカセット駆動機構固定台４上に取付
けられたカセット内ウェハ検出機構固定用マウント５に
位置調整可能に取付られている。なおりセット内ウェハ
検出装置１４ａは本例ではフＡトセンサタイプのものを
使用しているが特にこれに限定されるものではない。Near the contact area between the pick 3 and the semiconductor wafer 2, there is a horizontally shaped photosensor type wafer detection mechanism 14a in the set.
is provided, and it is possible to detect whether or not there is a semiconductor wafer 2 on the pick 3. The in-cassette wafer detection mechanism 14a is mounted on a cassette-in-cassette wafer detection mechanism fixing mount 5 mounted on the wafer cassette drive mechanism fixing base 4 so that its position can be adjusted. In this example, a photo sensor type is used as the in-set wafer detection device 14a, but the present invention is not limited thereto.
このような構成のウェハ搬送系監視系では、ピック３上
にウェハ２が保持されているにもかかわらず検出部１０
のウェハ載置検出機構１０ｃの故障により半導体ウェハ
２がピック３上に無いという信号即ちウェハ搬送系に半
導体ウェハ２が無いという信号が搬送系監視制御部１１
へ入力された場合でも、カセット内ウェハ検出ｔ４４Ｍ
１４ ａかウェハカセット１内に半導体ウェハ２が無
いという信号即ちウェハ搬送系に半導体ウェハ２がある
という信号が補助搬送系監視制御部１２へ入力されるの
でこれら二つの信号の矛盾により補助搬送系監視制御部
１２ではウェハ搬送系の異常と判断して異常信号を搬送
系監視制御部１１へ出力し、異常の、検出ができる。ま
た補助検出部１４に音検出機構１４ｂを設ければ、検出
部１０では検出ができない半導体ウェハの割れを発見す
ることができる。In the wafer transport system monitoring system having such a configuration, even though the wafer 2 is held on the pick 3, the detection unit 10
Due to a failure of the wafer placement detection mechanism 10c, a signal indicating that the semiconductor wafer 2 is not on the pick 3, that is, a signal indicating that there is no semiconductor wafer 2 in the wafer transfer system, is sent to the transfer system monitoring control unit 11.
Wafer detection in cassette t44M
14a Since the signal indicating that there is no semiconductor wafer 2 in the wafer cassette 1, that is, the signal indicating that the semiconductor wafer 2 is present in the wafer transfer system, is input to the auxiliary transfer system monitoring control unit 12, the auxiliary transfer system is The monitoring control unit 12 determines that there is an abnormality in the wafer transport system and outputs an abnormality signal to the transport system monitoring and control unit 11, thereby allowing detection of the abnormality. Furthermore, if the auxiliary detection section 14 is provided with the sound detection mechanism 14b, it is possible to discover cracks in the semiconductor wafer that cannot be detected by the detection section 10.
本発明のざらに他の実施例として第２図に示すように補
助検出部１４を構成する検出機構を検出部１０を構成す
る検出′ａ構と同等のもの例えばバルブ開閉検出機構１
０ａやピック賃降検出機横１ｏｂ等として検出部に対し
二重の安全性を図る構成としてもよい。As another embodiment of the present invention, as shown in FIG.
0a or 1ob next to the pick-up/down detector may be configured to provide double safety for the detection unit.
このように搬送系監視制御部を複数設けることでともら
か一方の搬送系監視制御部に障害が発生しても異常を検
出することができ、信頼性が大幅に向上する。さらに本
例のようにウェハ処理数表示部１３を設けておけば、河
枚目までの半導体ウェハが処理演でおるか作業者が容易
に知ることができる。By providing a plurality of transport system monitoring and control sections in this way, even if a failure occurs in one of the transport system monitoring and control sections, the abnormality can be detected, and reliability is greatly improved. Furthermore, if the wafer processing number display section 13 is provided as in this example, the operator can easily know whether the first semiconductor wafer has been processed or not.
し発明の効果］
以上説明したように本発明のイオン注入装置によれば、
基板搬送系監視系の信頼性を大幅に向上させることが可
能となる。[Effects of the Invention] As explained above, according to the ion implantation apparatus of the present invention,
It becomes possible to significantly improve the reliability of the substrate transport system monitoring system.
第１図は本発明による一実施例のイオン注入装置のウェ
ハ搬送系監視系の構成を示す図、第２図は他の実施例の
構成を示す図、第３図はカセット内ウェハ検出機構の取
付は位置の一例を示す斜視図である。
２・・・・・・半導体ウェハ、３・・・・・・ピック、
１０・・・・・・検出部、１１・・・・・・搬送系監視
制御部、１２・・・・・・補助搬送系監視制御部、１３
・・・・・・ウェハ処理数表示部、１４・・・・・・補
助検出部、１４ａ・・・・・・カセット内ウェハ検出機
構、１４ｂ・・・・・・音検出機構。
出願人 東京エレクトロン株式会社代理人
弁理士 須 山 佐 −
一一 １ ■
第 ２図FIG. 1 is a diagram showing the configuration of a wafer transport system monitoring system of an ion implanter according to one embodiment of the present invention, FIG. 2 is a diagram showing the configuration of another embodiment, and FIG. 3 is a diagram showing the configuration of a wafer detection mechanism in a cassette. The attachment is a perspective view showing an example of the position. 2... Semiconductor wafer, 3... Pick,
10...Detection unit, 11...Transportation system monitoring control unit, 12...Auxiliary transport system monitoring and control unit, 13
... Wafer processing number display section, 14 ... Auxiliary detection section, 14a ... Wafer detection mechanism in the cassette, 14b ... Sound detection mechanism. Applicant Tokyo Electron Co., Ltd. Agent
Patent Attorney Suyama Sa - Kazuichi 1 ■ Figure 2
Claims (5)
を監視する装置において、 被処理基板を搬送する基板搬送系の動作・状態を検出す
る少なくとも一系統の検出手段と、この検出手段からの
情報を入力して前記基板搬送系の動作・状態を監視する
少なくとも二系統の搬送系監視手段と、これら搬送系監
視手段からの信号により前記基板搬送系の動作・状態を
制御する搬送系監視手段とを備えたことを特徴とするイ
オン注入装置。(1) In an apparatus for monitoring the ion implantation position and the operation/state of each part of the substrate transport system, at least one system of detection means for detecting the operation/state of the substrate transport system that transports the substrate to be processed, and from this detection means. at least two systems of transport system monitoring means for inputting information to monitor the operation and state of the substrate transport system; and a transport system monitor for controlling the operation and state of the substrate transport system by signals from these transport system monitoring means. An ion implantation device characterized by comprising: means.
示する基板処理枚数表示手段を備えたことを特徴とする
特許請求の範囲第１項記載のイオン注入装置。(2) The ion implantation apparatus according to claim 1, wherein the transport system monitoring means includes a substrate processing number display means for displaying the number of substrates that have been subjected to ion implantation processing.
ことを特徴とする特許請求の範囲第１項記載のイオン注
入装置。(3) The ion implantation apparatus according to claim 1, wherein the transport system monitoring means includes an independent detection means.
存在を検出する検出手段を備えていることを特徴とする
特許請求の範囲第１項記載のイオン注入装置。(4) The ion implantation apparatus according to claim 1, wherein the detection means includes a detection means for detecting the presence of a substrate to be processed in a substrate to be processed container.
出する音検出手段を備えていることを特徴とする特許請
求の範囲第１項記載のイオン注入装置。(5) The ion implantation apparatus according to claim 1, wherein the detection means includes a sound detection means for detecting abnormal noise during transportation of the substrate to be processed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61248786A JPH0693477B2 (en) | 1986-10-20 | 1986-10-20 | Ion implanter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61248786A JPH0693477B2 (en) | 1986-10-20 | 1986-10-20 | Ion implanter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63102335A true JPS63102335A (en) | 1988-05-07 |
| JPH0693477B2 JPH0693477B2 (en) | 1994-11-16 |
Family
ID=17183374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61248786A Expired - Lifetime JPH0693477B2 (en) | 1986-10-20 | 1986-10-20 | Ion implanter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0693477B2 (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52126862A (en) * | 1976-04-15 | 1977-10-25 | Fuji Electric Co Ltd | Monitor and control system for conveying line |
| JPS5813498A (en) * | 1981-07-16 | 1983-01-25 | Fusajiro Matsuoka | Control device for operation of automatic machine |
| JPS5950859A (en) * | 1982-09-16 | 1984-03-24 | 株式会社東芝 | Train operation controller |
| JPS6067055A (en) * | 1983-09-19 | 1985-04-17 | ダビツド リンドクビスト | Method and device for operation in flow process type production system |
| JPS60167814A (en) * | 1984-02-10 | 1985-08-31 | Tsubakimoto Chain Co | Control device of conveyor system |
| JPS60232855A (en) * | 1984-05-04 | 1985-11-19 | Asics Corp | Management system of production process containing conveyor line |
| JPS61125674A (en) * | 1984-11-22 | 1986-06-13 | Fujitsu Ltd | Conveying control system of article |
| JPS61192458A (en) * | 1985-02-21 | 1986-08-27 | Toshiba Corp | Production line system |
-
1986
- 1986-10-20 JP JP61248786A patent/JPH0693477B2/en not_active Expired - Lifetime
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52126862A (en) * | 1976-04-15 | 1977-10-25 | Fuji Electric Co Ltd | Monitor and control system for conveying line |
| JPS5813498A (en) * | 1981-07-16 | 1983-01-25 | Fusajiro Matsuoka | Control device for operation of automatic machine |
| JPS5950859A (en) * | 1982-09-16 | 1984-03-24 | 株式会社東芝 | Train operation controller |
| JPS6067055A (en) * | 1983-09-19 | 1985-04-17 | ダビツド リンドクビスト | Method and device for operation in flow process type production system |
| JPS60167814A (en) * | 1984-02-10 | 1985-08-31 | Tsubakimoto Chain Co | Control device of conveyor system |
| JPS60232855A (en) * | 1984-05-04 | 1985-11-19 | Asics Corp | Management system of production process containing conveyor line |
| JPS61125674A (en) * | 1984-11-22 | 1986-06-13 | Fujitsu Ltd | Conveying control system of article |
| JPS61192458A (en) * | 1985-02-21 | 1986-08-27 | Toshiba Corp | Production line system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0693477B2 (en) | 1994-11-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |