KR20030003572A - Wafer transferring apparatus with a sensor - Google Patents

Wafer transferring apparatus with a sensor Download PDF

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Publication number
KR20030003572A
KR20030003572A KR1020010039489A KR20010039489A KR20030003572A KR 20030003572 A KR20030003572 A KR 20030003572A KR 1020010039489 A KR1020010039489 A KR 1020010039489A KR 20010039489 A KR20010039489 A KR 20010039489A KR 20030003572 A KR20030003572 A KR 20030003572A
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South Korea
Prior art keywords
wafer
pick arm
sensor
detector
cassette
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KR1020010039489A
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Korean (ko)
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박영규
박래삼
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삼성전자 주식회사
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Priority to KR1020010039489A priority Critical patent/KR20030003572A/en
Publication of KR20030003572A publication Critical patent/KR20030003572A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE: A wafer transferring apparatus having a sensor is provided to prevent a damage of a wafer by detecting a contacting state between a pick arm and an upper face of a wafer in a wafer transferring process and performing a control operation according to the contacting state. CONSTITUTION: A sensor portion(40) detects a contacting state between a pick arm(32) and an upper face of a wafer(12b) in a wafer loading/unloading process. The sensor portion(40) includes a sensor(42) for detecting the contacting state between the pick arm(32) and the wafer(12b), an amplification portion(44) for amplifying a signal generated from the sensor(42), and a control portion(46) for controlling a wafer transferring apparatus including the pick arm(32) by using an amplified signal of the amplification portion(44). The control portion(46) controls operations of the wafer transferring apparatus according to the contacting state between the pick arm(32) and the wafer(12b).

Description

감지기를 구비한 웨이퍼 이송 장치{Wafer transferring apparatus with a sensor}Wafer transferring apparatus with a sensor

본 발명은 웨이퍼 이송 장치에 관한 것으로, 상세하게는 감지부, 증폭부 및 제어부를 포함하는 감지기가 구비된 웨이퍼 이송 장치에 관한 것이다.The present invention relates to a wafer transfer apparatus, and more particularly, to a wafer transfer apparatus equipped with a detector including a detector, an amplifier, and a controller.

일반적으로 반도체 제조 공정 중 웨이퍼의 이송에 필요한 웨이퍼 적재 수단으로는 다수의 웨이퍼를 적재할 수 있는 웨이퍼 카세트(wafer cassette)가 사용되며, 웨이퍼 카세트에서 웨이퍼를 로딩/언로딩하는 방식으로는 픽 암에 의한 방식이 사용되는데, 도 1에는 이러한 종래의 웨이퍼 이송 장치가 개략적으로 나타나 있다. 도 1에 나타낸 것처럼, 웨이퍼 이송 장치(20)는 웨이퍼 카세트(10)에서 웨이퍼(12)를 로딩/언로딩하는 픽 암(22)과, 픽 암(22)을 움직여주는 픽 암 구동부(26) 및 웨이퍼 카세트(10)의 한 적재홈(11)에 웨이퍼(12)가 로딩/언로딩된 후 다음 적재홈 (11)에 웨이퍼(12)를 로딩/언로딩하기 위해 웨이퍼 카세트(10)를 상하로 움직여주는 웨이퍼 카세트 승강 장치(28)를 포함한다.In general, a wafer cassette capable of stacking a plurality of wafers is used as a wafer stacking means for wafer transfer during a semiconductor manufacturing process, and a pick arm is loaded into or unloaded from a wafer cassette. By way of example, this conventional wafer transfer device is schematically shown. As shown in FIG. 1, the wafer transfer device 20 includes a pick arm 22 for loading / unloading the wafer 12 from the wafer cassette 10, and a pick arm driver 26 for moving the pick arm 22. And loading and unloading the wafer 12 into one loading groove 11 of the wafer cassette 10, and then moving the wafer cassette 10 up and down to load / unload the wafer 12 into the next loading groove 11. And a wafer cassette elevating device 28 which is moved to the.

도 2 및 도 3은 웨이퍼 이송 장치(20)에 의해 웨이퍼가 웨이퍼 카세트로 로딩되는 과정을 보여주는 도로서, 이를 참조하여 웨이퍼 로딩 과정을 설명하면, 웨이퍼 로딩 과정은 픽 암(22)에 의해 웨이퍼(12a)가 웨이퍼 카세트(10)의 적재홈 (11)으로 삽입되는 단계와, 픽 암(22)이 웨이퍼(12a)로부터 분리된 후 웨이퍼 카세트(10)의 외부로 이동하는 단계로 이루어져 있다. 픽 암(22)이 웨이퍼(12a)로부터 분리된 후 웨이퍼 카세트(10)의 외부로 이동하는 단계에서 픽 암(22)이 웨이퍼 (12a)로부터 분리되는 과정은 웨이퍼 카세트 승강 장치(28)가 웨이퍼 카세트(10)를 소정의 거리 만큼 상승시키거나, 또는, 픽 암(22)이 상하로 구동될 수 있도록 픽 암 구동부(26)를 구성하고, 그것에 의해 픽 암(22)을 아래로 하강시킴으로써 이루어질 수 있다. 한편, 픽 암(22)의 언로딩 과정은 앞서 기술한 로딩 과정과 반대의 과정으로 이루어지기 때문에, 여기서 상세한 설명은 생략한다.2 and 3 illustrate a process in which a wafer is loaded into a wafer cassette by the wafer transfer device 20. Referring to the wafer loading process, the wafer loading process is performed by the pick arm 22. 12a) is inserted into the loading groove 11 of the wafer cassette 10, and the pick arm 22 is separated from the wafer 12a and then moved to the outside of the wafer cassette 10. After the pick arm 22 is separated from the wafer 12a and the pick arm 22 is moved out of the wafer cassette 10, the pick arm 22 is separated from the wafer 12a. By raising the cassette 10 by a predetermined distance or by configuring the pick arm driver 26 so that the pick arm 22 can be driven up and down, thereby lowering the pick arm 22 downwards. Can be. On the other hand, since the unloading process of the pick arm 22 is made of a process opposite to the above-described loading process, a detailed description thereof will be omitted.

그런데, 픽 암(22)의 이동에 있어서, 웨이퍼 카세트 승강 장치(28)와의 동작 상 부조화가 발생하거나, 틀어짐, 마모, 이탈 등과 같은 기계적 결함 또는, 픽 암 구동부(26)나 웨이퍼 카세트 승강 장치(28)의 구동 제어 프로그램 상에 오류가 발생한다면, 그로 인해, 픽 암(22)이 웨이퍼(12a)로부터 분리될 때, 그 아래에 위치한 웨이퍼(12b)의 상부면에 접촉될 수 있고, 픽 암(22)이 그 상태 그대로 웨이퍼 카세트(10) 외부로 이동함으로써 웨이퍼(12b)의 상부면이 긁히는 불량이 발생될 수 있다. 하지만, 더욱 문제가 되는 점은 종래 기술에 따른 웨이퍼 이송 장치(20)에 있어서 이러한 픽 암(22)과 웨이퍼(12b) 상부면과의 접촉 여부를 감지할 수 있는 수단이 구비되어 있지 않음으로 해서, 픽 암(22)과 웨이퍼(12b) 사이에 접촉이 발생되더라도 계속적으로 웨이퍼 이송 장치(20)는 동작하게 되고, 그로 인해 상기한 불량이 다량으로 발생할 수 있다는 것이다.By the way, in the movement of the pick arm 22, a mechanical defect such as misalignment occurs in the operation with the wafer cassette lifting device 28, distortion, abrasion, separation, or the like, or the pick arm drive unit 26 or the wafer cassette lifting device ( If an error occurs on the drive control program of 28, as a result, when the pick arm 22 is detached from the wafer 12a, it may contact the upper surface of the wafer 12b located below it, and the pick arm As the 22 moves to the outside of the wafer cassette 10 as it is, a defect in which the upper surface of the wafer 12b is scratched may occur. However, a further problem is that in the wafer transfer device 20 according to the prior art, there is no means for detecting whether the pick arm 22 is in contact with the upper surface of the wafer 12b. Even if a contact occurs between the pick arm 22 and the wafer 12b, the wafer transfer device 20 continues to operate, thereby causing a large amount of the above defects.

따라서, 본 발명의 목적은 웨이퍼 이송 과정 중 웨이퍼를 이송하는 픽 암과 웨이퍼 상부면과의 접촉시 이를 감지하여 웨이퍼 이송 장치를 제어함으로써, 다량으로 발생할 수 있는 웨이퍼 손상을 방지하는 것이다.Accordingly, it is an object of the present invention to prevent wafer damage that may occur in large amounts by controlling the wafer transfer device by detecting a contact between the pick arm for transferring the wafer and the upper surface of the wafer during the wafer transfer process.

도 1은 종래의 웨이퍼 이송 장치(wafer transferring apparatus)를 개략적으로 나타낸 사시도,1 is a perspective view schematically showing a conventional wafer transferring apparatus;

도 2는 웨이퍼(wafer)가 종래의 웨이퍼 이송 장치의 픽 암(pick arm)에 의해 웨이퍼 카세트(wafer cassette)로 로딩(loading)되는 상태를 보여주는 도,2 is a view showing a state in which a wafer is loaded into a wafer cassette by a pick arm of a conventional wafer transfer apparatus;

도 3은 도 2의 픽 암이 웨이퍼로부터 분리된 상태를 보여주는 도,3 is a view illustrating a state in which the pick arm of FIG. 2 is separated from a wafer;

도 4는 도 2의 픽 암이 웨이퍼로부터 분리되는 과정에서 웨이퍼 상부면과 접촉된 상태를 보여주는 도,4 is a view illustrating a state in which the pick arm of FIG. 2 is in contact with a top surface of a wafer while being separated from the wafer;

도 5는 웨이퍼가 본 발명의 실시예에 따른 웨이퍼 이송 장치의 픽 암에 의해 웨이퍼 카세트로 로딩되는 상태를 보여주는 도,5 is a view showing a state in which a wafer is loaded into a wafer cassette by a pick arm of a wafer transfer device according to an embodiment of the present invention;

도 6은 도 5의 픽 암이 웨이퍼로부터 분리된 상태를 보여주는 도,6 is a view illustrating a state in which the pick arm of FIG. 5 is separated from a wafer;

도 7은 도 5의 픽 암이 웨이퍼로부터 분리되는 과정에서 웨이퍼 상부면과 접촉된 상태를 보여주는 도이다.FIG. 7 is a view illustrating a state in which the pick arm of FIG. 5 is in contact with the upper surface of the wafer while being separated from the wafer.

* 도면의 주요 부분에 대한 설명 *Description of the main parts of the drawing

10 : 웨이퍼 카세트 11 : 적재 홈10: wafer cassette 11: loading groove

12, 12a, 12b : 웨이퍼 20 : 웨이퍼 이송 장치12, 12a, 12b: wafer 20: wafer transfer device

22, 32 : 픽 암 26 : 픽 암 구동부22, 32: pick arm 26: pick arm drive unit

28 : 웨이퍼 카세트 승강 장치 40 : 감지기28: wafer cassette lifting device 40: detector

42 : 감지부 44 : 증폭부42: detector 44: amplifier

46 : 제어부46: control unit

이러한 목적을 달성하기 위하여, 웨이퍼 카세트에서 웨이퍼를 로딩/언로딩하는 픽 암과, 픽 암에 연결되어 픽 암을 움직여주는 픽 암 구동부 및 웨이퍼 카세트의 한 적재홈에 웨이퍼가 로딩/언로딩된 후 다음 적재홈에 웨이퍼를 로딩/언로딩하기 위해 웨이퍼 카세트를 상하로 움직여주는 웨이퍼 카세트 승강 장치를 포함하며, 픽 암과 웨이퍼 상부면과의 접촉 여부를 감지하는 감지부와, 감지부로부터의 신호를 증폭시켜주는 증폭부 및 증폭부로부터의 증폭된 신호에 의해 제어를 수행하는 제어부로 구성된 감지기를 더 포함하는 것을 특징으로 하는 웨이퍼 이송 장치를 제공한다.To achieve this purpose, a pick arm for loading / unloading a wafer from a wafer cassette, a pick arm drive connected to the pick arm to move the pick arm, and a wafer being loaded / unloaded into a loading groove of the wafer cassette. And a wafer cassette lifting device for moving the wafer cassette up and down to load / unload the wafer into the loading groove, and detecting a contact between the pick arm and the upper surface of the wafer, and detecting a signal from the detector. It provides a wafer transfer device further comprises a detector consisting of amplifying unit for amplifying and a control unit for performing control by the amplified signal from the amplifying unit.

이하, 첨부된 도면을 참조하여 본 발명을 보다 상세하게 설명한다.Hereinafter, with reference to the accompanying drawings will be described in detail the present invention.

도 5는 웨이퍼(12a)가 본 발명에 따른 웨이퍼 이송 장치의 픽 암(32)에 의해 웨이퍼 카세트로 로딩되는 상태를 보여주는 도면이고, 도 6은 도 5의 픽 암(32)이 웨이퍼(12a)로부터 분리된 상태를 보여주는 도면이다. 도 5 및 도 6에서 나타낸 것처럼, 본 발명에 따른 웨이퍼 이송 장치에는 웨이퍼(12a)의 로딩/언로딩 시 발생될 수 있는 픽 암(32)과 웨이퍼(12b) 상부면과의 접촉 여부를 감지할 수 있는 감지기(40)를 더 포함한다. 감지기(40)는 픽 암(32)과 웨이퍼(12b) 상부면과의 접촉여부를 감지하는 감지부(42)와, 감지부(42)로부터 발생된 신호를 증폭하는 증폭부(44) 및 증폭부(44)에 의해 증폭된 신호를 이용하여 픽 암(32)을 포함한 웨이퍼 이송 장치의 제어를 수행하는 제어부(46)를 포함하며, 감지 방식은 진동 감지 방식, 접촉 정전 용량 검출 방식, 정전기 대전열 검출 방식, 접촉 저항 검출 방식, 근접 스위치 방식 등 여러 다양한 방식이 적용될 수 있다. 본 발명에 적용되는 감지기(40)를 구성하는 감지부(42), 증폭부(44) 및 제어부(46)는 설치 위치가 웨이퍼 이송 장치의 구조에 따라 각각 다른 위치일 수 있으며, 특히 감지부(42)는 사용되는 감지 방식에 따라 픽 암(32)에서도 그 설치 위치가 다른 위치일 수 있다. 예를 들어, 진동 감지 방식일 경우, 도 5 내지 도 7에서 나타낸 것과 같이, 픽 암(32)의 하부면에 설치될 수도 있으며, 픽 암(32)의 내부에 설치될 수도 있다.5 is a view showing a state in which the wafer 12a is loaded into the wafer cassette by the pick arm 32 of the wafer transfer device according to the present invention, and FIG. 6 shows that the pick arm 32 of FIG. Figure showing the state separated from. As shown in FIGS. 5 and 6, the wafer transfer apparatus according to the present invention can detect whether the pick arm 32 and the upper surface of the wafer 12b may be generated when loading / unloading the wafer 12a. It further comprises a detector 40 that can be. The detector 40 includes a detector 42 for detecting contact between the pick arm 32 and the upper surface of the wafer 12b, an amplifier 44 for amplifying a signal generated from the detector 42, and amplification. And a control unit 46 for controlling the wafer transfer device including the pick arm 32 using the signal amplified by the unit 44, wherein the sensing method includes a vibration sensing method, a contact capacitance detecting method, and an electrostatic charging method. Various methods such as a heat detection method, a contact resistance detection method, and a proximity switch method may be applied. The detector 42, the amplifier 44, and the controller 46 constituting the detector 40 according to the present invention may have different installation positions depending on the structure of the wafer transfer device, and particularly, a detector ( 42 may be a different position in the pick arm 32 depending on the sensing scheme used. For example, in the case of a vibration sensing method, as shown in Figures 5 to 7, may be installed on the lower surface of the pick arm 32, may be installed inside the pick arm 32.

감지부(42)는 픽 암(32)과 웨이퍼(12b) 상부면과의 접촉시 이를 감지하여 신호를 발생시키고, 그 신호는 증폭부(44)를 거쳐 제어부(46)로 전송되며, 신호를 받은 제어부(46)는 웨이퍼 이송 장치의 동작을 일시적으로 정지시키고, 웨이퍼 이송 장치에 이상이 발생하였음을 관계자에게 시각적/청각적 수단 및 기타 알림 수단을 이용하여 알린다. 만약, 픽 암(32)의 위치까지 측정할 수 있는 감지 방식의 감지부가 사용되고, 검출된 신호를 이용하여 픽 암(32)의 위치를 자동으로 보정할 수 있도록 웨이퍼 이송 장치가 구성되어 있다면, 이 과정에서 관계자에게 웨이퍼 이송 장치의 이상 발생 여부를 알림과 동시에 픽 암(32)의 위치를 자동으로 보정할 수도 있다.The detector 42 detects the pick arm 32 and the upper surface of the wafer 12b and generates a signal. The signal is transmitted to the controller 46 through the amplifier 44. The received control section 46 temporarily stops the operation of the wafer transfer device, and informs the relevant parties of the abnormality in the wafer transfer device using visual / acoustic means and other notification means. If a sensing unit of a sensing method capable of measuring the position of the pick arm 32 is used, and the wafer transfer device is configured to automatically correct the position of the pick arm 32 using the detected signal, In the process, the person who is notified of the abnormality of the wafer transfer device may be notified, and the position of the pick arm 32 may be automatically corrected.

본 발명에 적용되는 감지기의 실시예로서 진동 감지 방식에 의한 감지기를제안하고자 하는데, 진동 감지 방식에 의한 감지기는 픽 암을 포함한 웨이퍼 이송 장치의 정상 작동시의 정상 진동 주파수와, 픽 암과 웨이퍼 상부면과의 접촉시 발생되는 이상 진동 주파수를 비교함으로써, 이상 유무를 검출한다.As an embodiment of a sensor applied to the present invention, a sensor by a vibration sensing method is proposed, wherein the sensor by the vibration sensing method includes a normal vibration frequency during normal operation of a wafer transfer device including a pick arm, The presence or absence of an abnormality is detected by comparing the abnormal vibration frequency generated upon contact with the surface.

본 발명은 위에서 설명한 실시예에만 한정되지 않고, 웨이퍼와 픽 암과의 접촉 여부를 감지할 수 있다면 감지 방식이나 설치 위치에 관계없이 본 발명에 적용할 수 있다.The present invention is not limited to the above-described embodiment, and can be applied to the present invention regardless of the sensing method or the installation position as long as it can detect whether the wafer is in contact with the pick arm.

이상과 같은, 본 발명에 의한 감지기를 구비한 웨이퍼 이송 장치의 구조에 따르면, 픽 암이 웨이퍼의 상부면에 접촉될 경우, 감지기가 그것을 감지하여 픽 암을 포함한 웨이퍼 이송 장치를 제어함으로써, 웨이퍼 이송 장치의 계속된 오동작으로 인해 다량으로 발생할 수 있는 웨이퍼 손상을 방지하는 효과가 있다.According to the structure of the wafer transfer apparatus with a sensor according to the present invention as described above, when the pick arm contacts the upper surface of the wafer, the detector detects it and controls the wafer transfer apparatus including the pick arm, thereby transferring the wafer. There is an effect to prevent wafer damage that can occur in large quantities due to continued malfunction of the device.

Claims (2)

웨이퍼 카세트(wafer cassette)에서 웨이퍼를 로딩/언로딩(loading/unload ing)하는 픽 암(pick arm);과,A pick arm for loading / unloading wafers in a wafer cassette; and 상기 픽 암에 연결되어 상기 픽 암을 움직여주는 픽 암 구동부; 및A pick arm driver connected to the pick arm to move the pick arm; And 상기 웨이퍼 카세트의 특정 적재홈에 웨이퍼가 로딩/언로딩된 후 다음 적재홈에 웨이퍼를 로딩/언로딩하기 위해 상기 웨이퍼 카세트를 상하로 움직여주는 웨이퍼 카세트 승강 장치;A wafer cassette lifting device which moves the wafer cassette up and down to load / unload the wafer into the next loading groove after the wafer is loaded / unloaded into a specific loading groove of the wafer cassette; 를 포함하는 웨이퍼 이송 장치(wafer transferring apparatus)에 있어서,In the wafer transferring apparatus (wafer transferring apparatus) comprising: 상기 픽 암에 구성되는 감지부와A sensing unit configured in the pick arm 상기 감지부로부터의 신호를 증폭시켜주는 증폭부 및An amplifier for amplifying the signal from the detector; 상기 증폭부로부터의 증폭된 신호에 의해 픽 암을 포함한 웨이퍼 이송 장치를 제어하는 제어부가 포함된 감지기;A detector including a controller configured to control a wafer transfer device including a pick arm by the amplified signal from the amplifier; 를 더 포함하는 것을 특징으로 하는 웨이퍼 이송 장치.Wafer transfer apparatus further comprises a. 제 1항에 있어서, 상기 감지기는 진동 감지 방식인 것을 특징으로 하는 웨이퍼 이송 장치.The wafer transfer apparatus of claim 1, wherein the detector is a vibration sensing method.
KR1020010039489A 2001-07-03 2001-07-03 Wafer transferring apparatus with a sensor KR20030003572A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117316814A (en) * 2023-08-25 2023-12-29 北京子牛亦东科技有限公司 Method and system for detecting wafer scratch by mechanical arm and semiconductor processing equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117316814A (en) * 2023-08-25 2023-12-29 北京子牛亦东科技有限公司 Method and system for detecting wafer scratch by mechanical arm and semiconductor processing equipment

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