JPS63100837U - - Google Patents

Info

Publication number
JPS63100837U
JPS63100837U JP19563186U JP19563186U JPS63100837U JP S63100837 U JPS63100837 U JP S63100837U JP 19563186 U JP19563186 U JP 19563186U JP 19563186 U JP19563186 U JP 19563186U JP S63100837 U JPS63100837 U JP S63100837U
Authority
JP
Japan
Prior art keywords
transistor
internal circuit
mos type
check
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19563186U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19563186U priority Critical patent/JPS63100837U/ja
Publication of JPS63100837U publication Critical patent/JPS63100837U/ja
Pending legal-status Critical Current

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Weting (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の第1の実施例の平面図、第2
図は本考案の第2の実施例の平面図、第3図は従
来のチエツクトランジスタの平面図である。 1……拡散領域、2……ゲート電極、3a〜3
f,4a,4b……ダミーゲート、5a〜5c…
…コンタクト、6a〜6c……電極パツド。
Figure 1 is a plan view of the first embodiment of the present invention;
This figure is a plan view of a second embodiment of the present invention, and FIG. 3 is a plan view of a conventional check transistor. 1... Diffusion region, 2... Gate electrode, 3a-3
f, 4a, 4b...dummy gate, 5a-5c...
...Contact, 6a to 6c...Electrode pad.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] MOS型の内部回路トランジスタと共に前記内
部回路トランジスタの特性検査用のチエツクトラ
ンジスタが同一基板上に形成されたMOS型半導
体装置において、前記チエツクトランジスタのゲ
ートパターンを前記内部回路トランジスタ列と同
等のゲートパターンならしめるようなダミーゲー
トパターンを前記チエツクトランジスタのゲート
の両側に配置したことを特徴とするMOS型半導
体装置。
In a MOS type semiconductor device in which a MOS type internal circuit transistor and a check transistor for testing the characteristics of the internal circuit transistor are formed on the same substrate, the gate pattern of the check transistor is the same as the gate pattern of the internal circuit transistor array. 1. A MOS type semiconductor device, wherein dummy gate patterns are arranged on both sides of the gate of the check transistor.
JP19563186U 1986-12-18 1986-12-18 Pending JPS63100837U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19563186U JPS63100837U (en) 1986-12-18 1986-12-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19563186U JPS63100837U (en) 1986-12-18 1986-12-18

Publications (1)

Publication Number Publication Date
JPS63100837U true JPS63100837U (en) 1988-06-30

Family

ID=31153692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19563186U Pending JPS63100837U (en) 1986-12-18 1986-12-18

Country Status (1)

Country Link
JP (1) JPS63100837U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005303089A (en) * 2004-04-13 2005-10-27 Nec Electronics Corp Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005303089A (en) * 2004-04-13 2005-10-27 Nec Electronics Corp Semiconductor device

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