JPS6297166U - - Google Patents
Info
- Publication number
- JPS6297166U JPS6297166U JP18713985U JP18713985U JPS6297166U JP S6297166 U JPS6297166 U JP S6297166U JP 18713985 U JP18713985 U JP 18713985U JP 18713985 U JP18713985 U JP 18713985U JP S6297166 U JPS6297166 U JP S6297166U
- Authority
- JP
- Japan
- Prior art keywords
- thickness adjustment
- film
- substrate surface
- evaporation source
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は、蒸着装置の側面概略図、第２図は、
真空蒸着室の要部拡大図、第３図は、膜厚調整マ
スクの平面図、第４図は、従来の蒸着装置を示す
側面概略図である。
尚図中１は、蒸着装置、２は真空蒸着室、５は
基板面、６は蒸発源、７はシヤツター、８は膜厚
調整マスク、９は開口である。
Figure 1 is a schematic side view of the vapor deposition apparatus, Figure 2 is
FIG. 3 is a plan view of a film thickness adjustment mask, and FIG. 4 is a schematic side view of a conventional vapor deposition apparatus. In the figure, 1 is a vapor deposition apparatus, 2 is a vacuum vapor deposition chamber, 5 is a substrate surface, 6 is an evaporation source, 7 is a shutter, 8 is a film thickness adjustment mask, and 9 is an opening.
Claims (1)
着させるものであつて、該蒸発源と該基板面間に
は膜厚調整マスクを配備した蒸着膜の膜厚調整装
置。 (2) 前記膜厚調整マスクには略〓状の開口を設
けたことを特徴とする実用新案登録請求の範囲第
１項記載の蒸着膜の膜厚調整装置。[Claims for Utility Model Registration] (1) A vapor deposition film in which a metal substance vaporized from an evaporation source is deposited on a substrate surface, and a film thickness adjustment mask is provided between the evaporation source and the substrate surface. Thickness adjustment device. (2) The apparatus for adjusting the thickness of a deposited film according to claim 1, wherein the film thickness adjustment mask is provided with a substantially square-shaped opening.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18713985U JPS6297166U (en) | 1985-12-04 | 1985-12-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18713985U JPS6297166U (en) | 1985-12-04 | 1985-12-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6297166U true JPS6297166U (en) | 1987-06-20 |
Family
ID=31137336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18713985U Pending JPS6297166U (en) | 1985-12-04 | 1985-12-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6297166U (en) |
-
1985
- 1985-12-04 JP JP18713985U patent/JPS6297166U/ja active Pending
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