JPS617566U - Multilayer film forming equipment - Google Patents
Multilayer film forming equipmentInfo
- Publication number
- JPS617566U JPS617566U JP9157584U JP9157584U JPS617566U JP S617566 U JPS617566 U JP S617566U JP 9157584 U JP9157584 U JP 9157584U JP 9157584 U JP9157584 U JP 9157584U JP S617566 U JPS617566 U JP S617566U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mask
- multilayer film
- film forming
- forming equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は本考案の実施例の截断側面図、第2図はその■
−■線部分の拡大図、第3図は第2図の■一■線部分の
断面図第4図は要部の拡大断面図である。
1・・・真空槽、2・・・基板、3・・・蒸発源、4・
・・マズク、5・・・透孔、6・・・マスクホルタ、7
・・・マスク昇降部材。Figure 1 is a cutaway side view of the embodiment of the present invention, and Figure 2 is its
FIG. 3 is an enlarged sectional view of the section lined ``-■'' in FIG. 2; FIG. 4 is an enlarged sectional view of the main part. 1... Vacuum chamber, 2... Substrate, 3... Evaporation source, 4...
...Mazuku, 5...Through hole, 6...Mask holster, 7
...Mask lifting member.
Claims (1)
2の表面にパターン形成用のマスク4を施してその表面
に蒸発物質のパターンを形成する式のものに於いて、該
真空槽1内に複数個の蒸発源3を用意し、該基板2の前
方へ進出自在にマスク4を挿着した複数個の透孔5を有
するマスクホルダ6を設け、該基板2のマスクホルタ6
を介しての対向側に該マスク4を基板2に当接させるマ
スク昇降部材7を設けて成る多層膜形成装置。In a type in which an evaporation source 3 is provided in a vacuum chamber 1 facing a substrate 2, and a pattern-forming mask 4 is applied to the surface of the substrate 2 to form a pattern of evaporated material on the surface. A plurality of evaporation sources 3 are prepared in a vacuum chamber 1, a mask holder 6 having a plurality of through holes 5 into which masks 4 are inserted so as to be able to advance forward of the substrate 2 is provided, and a mask holder 6 of the substrate 2 is provided.
A multilayer film forming apparatus comprising a mask lifting member 7 for bringing the mask 4 into contact with the substrate 2 on the opposite side thereof.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9157584U JPS617566U (en) | 1984-06-21 | 1984-06-21 | Multilayer film forming equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9157584U JPS617566U (en) | 1984-06-21 | 1984-06-21 | Multilayer film forming equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS617566U true JPS617566U (en) | 1986-01-17 |
JPH0238921Y2 JPH0238921Y2 (en) | 1990-10-19 |
Family
ID=30647585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9157584U Granted JPS617566U (en) | 1984-06-21 | 1984-06-21 | Multilayer film forming equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS617566U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0338177U (en) * | 1989-08-26 | 1991-04-12 |
-
1984
- 1984-06-21 JP JP9157584U patent/JPS617566U/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0338177U (en) * | 1989-08-26 | 1991-04-12 | ||
JPH0541806Y2 (en) * | 1989-08-26 | 1993-10-21 |
Also Published As
Publication number | Publication date |
---|---|
JPH0238921Y2 (en) | 1990-10-19 |
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