JPS629213B2 - - Google Patents
Info
- Publication number
- JPS629213B2 JPS629213B2 JP56162712A JP16271281A JPS629213B2 JP S629213 B2 JPS629213 B2 JP S629213B2 JP 56162712 A JP56162712 A JP 56162712A JP 16271281 A JP16271281 A JP 16271281A JP S629213 B2 JPS629213 B2 JP S629213B2
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- control signal
- film
- processing chamber
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16271281A JPS5864021A (ja) | 1981-10-14 | 1981-10-14 | 連続製膜装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16271281A JPS5864021A (ja) | 1981-10-14 | 1981-10-14 | 連続製膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5864021A JPS5864021A (ja) | 1983-04-16 |
JPS629213B2 true JPS629213B2 (enrdf_load_stackoverflow) | 1987-02-27 |
Family
ID=15759852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16271281A Granted JPS5864021A (ja) | 1981-10-14 | 1981-10-14 | 連続製膜装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5864021A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0428601U (enrdf_load_stackoverflow) * | 1990-07-04 | 1992-03-06 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50125451U (enrdf_load_stackoverflow) * | 1974-03-29 | 1975-10-15 | ||
JPS5120356A (en) * | 1974-08-08 | 1976-02-18 | Mitsubishi Heavy Ind Ltd | Fuookurifutono tentoboshisochi |
JPS5314439A (en) * | 1976-06-30 | 1978-02-09 | Hitachi Heating Appliance Co Ltd | Power supply of microwave oven |
JPS53153039U (enrdf_load_stackoverflow) * | 1977-05-09 | 1978-12-01 |
-
1981
- 1981-10-14 JP JP16271281A patent/JPS5864021A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0428601U (enrdf_load_stackoverflow) * | 1990-07-04 | 1992-03-06 |
Also Published As
Publication number | Publication date |
---|---|
JPS5864021A (ja) | 1983-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI465597B (zh) | 薄膜形成裝置、膜厚測定方法、膜厚感測器 | |
CA2186587A1 (en) | Pcvd process and device for coating domed substrates | |
JPH0645256A (ja) | ガスパルスの供給方法およびこれを用いた成膜方法 | |
US4897281A (en) | Process for the formation of a functional deposited film by way of microwave plasma CVD method | |
GB2125171A (en) | A method of sensing the amount of a thin film deposited during an ion plating process | |
JPS629213B2 (enrdf_load_stackoverflow) | ||
JPS5910339A (ja) | 連続成膜装置 | |
JP2000008164A (ja) | 薄膜付基材の製造方法および製造装置 | |
US4710395A (en) | Method and apparatus for through hole substrate printing | |
JP3288201B2 (ja) | 粉体供給装置 | |
JPH02124406A (ja) | 半導体製造装置 | |
JPH04136165A (ja) | 反応性ガス導入型成膜装置 | |
JPH10251844A (ja) | 薄膜付き基材の製造方法および製造装置ならびに薄膜付き基材 | |
JPS57166033A (en) | Applying device for resist with adjusting mechanism for quantity of exhaust gas | |
JPS62228482A (ja) | 低温プラズマ処理装置 | |
JP3630871B2 (ja) | スパッタリング方法 | |
JPS5985864A (ja) | スパツタ装置 | |
JPH03267372A (ja) | 連続成膜方法 | |
JPH02171605A (ja) | 金属薄膜成長時の膜厚測定方法 | |
JPH0643176Y2 (ja) | インライン式成膜装置 | |
JPS6227569A (ja) | 薄膜製造装置 | |
JP2003332239A (ja) | 重量測定器付き成膜装置 | |
JP7100098B2 (ja) | 成膜装置及び成膜方法 | |
JP3021026B2 (ja) | インライン成膜装置 | |
JPH062136A (ja) | 枚葉式成膜装置 |