JPS6291439U

JPS6291439U -

Info

Publication number: JPS6291439U
Application number: JP18342785U
Authority: JP
Priority date: 1985-11-27
Filing date: 1985-11-27
Publication date: 1987-06-11

Description

[Brief explanation of the drawing]

図面はいずれも本考案の実施例を示すものであ
つて、第１図及び第３図は処理室内へ被処理物を
装入する前のＣＶＤ処理装置の概略断面図、第２
図及び第６図は処理室内に被処理物が装入された
状態でのＣＶＤ処理装置の概略断面図、第４図は
第３図の―線矢視断面図、第５図は第４図の
―線矢視拡大断面図である。なお、図面に示された符号に於いて、１……移
送装置、２……アーム、３……フオーク、１０…
…昇降台、１１……処理室、１２……反応管、１
２ａ，５０ｃ……ガス導入管、５０ｄ……ガス排
気管、１３……埋設ヒータ、１４……処理室の周
壁、１５……処理室の天蓋、１８……台板、１９
……装入孔（開口部）、２０，２０―２，２０―
３……半導体ウエハカートリツジ、２１，２１―
２……半導体ウエハ、２６……底蓋、２７……挿
入部、２９……ブラケツト、３１……昇降装置（
移動手段）、３１ａ……柱体、３１ｂ……ガイド
、４１，１４１……気密室、４２，１４２……気
密室の側壁、４２ａ，１４２ａ……気密室の開口
、４２ｃ……不活性ガス導入管、４２ｄ……不活
性ガス排気管、４３，１４３……扉（開閉手段）
である。 The drawings all show embodiments of the present invention, and FIGS. 1 and 3 are schematic cross-sectional views of the CVD processing apparatus before loading the workpiece into the processing chamber, and FIG.
6 and 6 are schematic cross-sectional views of the CVD processing apparatus with objects to be processed loaded into the processing chamber, FIG. 4 is a cross-sectional view taken along the line - - of FIG. 3, and FIG. FIG. In addition, in the symbols shown in the drawings, 1... transfer device, 2... arm, 3... fork, 10...
... Lifting platform, 11 ... Processing chamber, 12 ... Reaction tube, 1
2a, 50c...Gas introduction pipe, 50d...Gas exhaust pipe, 13...Embedded heater, 14...Peripheral wall of the processing chamber, 15...Canopy of the processing chamber, 18...Bed plate, 19
...Charging hole (opening), 20,20-2,20-
3...Semiconductor wafer cartridge, 21, 21-
2... Semiconductor wafer, 26... Bottom cover, 27... Insertion section, 29... Bracket, 31... Lifting device (
transportation means), 31a... Column, 31b... Guide, 41, 141... Airtight chamber, 42, 142... Side wall of airtight chamber, 42a, 142a... Opening of airtight chamber, 42c... Inert gas introduction Pipe, 42d...Inert gas exhaust pipe, 43,143...Door (opening/closing means)
It is.

Claims

[Scope of utility model registration request]

a processing chamber having an opening for charging the material to be processed and discharging the material to be processed; a moving means for charging the material to be processed and discharging the material; A processing device comprising: an airtight chamber connected to the processing chamber via a section; and an opening/closing means for appropriately opening the airtight chamber to the outside.