JPH0238468U - - Google Patents
Info
- Publication number
- JPH0238468U JPH0238468U JP11555088U JP11555088U JPH0238468U JP H0238468 U JPH0238468 U JP H0238468U JP 11555088 U JP11555088 U JP 11555088U JP 11555088 U JP11555088 U JP 11555088U JP H0238468 U JPH0238468 U JP H0238468U
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- gas
- pipe
- exhaust
- reaction tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 10
- 239000002699 waste material Substances 0.000 claims description 3
- 239000012495 reaction gas Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 3
- 230000007797 corrosion Effects 0.000 claims 1
- 238000005260 corrosion Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
Description
第１図は本考案装置の一実施例の構成を示す縦
断面図、第２図は従来装置の一例の構成を示す縦
断面図である。
１……管状炉、２……反応管、４……ボート、
５……ウエーハ、７……反応ガス導入口、１７…
…排気管、１８……排気口、１９……（Ｔ形）管
継手、２０……液体排出管、２１……廃液容器。
FIG. 1 is a longitudinal sectional view showing the structure of an embodiment of the device of the present invention, and FIG. 2 is a longitudinal sectional view showing the structure of an example of the conventional device. 1...Tubular furnace, 2...Reaction tube, 4...Boat,
5...Wafer, 7...Reaction gas inlet, 17...
...Exhaust pipe, 18...Exhaust port, 19...(T type) pipe joint, 20...Liquid discharge pipe, 21...Waste liquid container.
Claims (1)
１内に反応管２を挿設し、この反応管２内にウエ
ーハ５を載置したボート４を搬入すると共に、反
応ガスを反応ガス導入口７より導入し、反応管２
内のガスを排気口１８より排気することによりウ
エーハ５の表面に生成膜を生成する縦形炉におい
て、排気口１８に管継手１９を介してガスを排気
する排気管１７と液体を排出する液体排出管２０
を連結し、この液体排出管２０に液体を溜めてお
く廃液容器２１を連結せしめ排気管１７、管継手
１９、液体排出管２０及び廃液容器２１を耐熱、
耐腐食性樹脂製や石英製などで構成した縦形炉の
排気ガス・液体処理装置。 A heating tubular furnace 1 is installed vertically, a reaction tube 2 is inserted into the tubular furnace 1, a boat 4 carrying a wafer 5 is carried into the reaction tube 2, and the reaction gas is Introduced from the inlet 7 and into the reaction tube 2.
In a vertical furnace that generates a film on the surface of the wafer 5 by exhausting the gas from the exhaust port 18, the exhaust port 18 is connected to an exhaust pipe 17 for exhausting gas through a pipe fitting 19, and a liquid discharge for discharging liquid. tube 20
A waste liquid container 21 for storing liquid is connected to the liquid discharge pipe 20, and the exhaust pipe 17, the pipe fitting 19, the liquid discharge pipe 20, and the waste liquid container 21 are heat-resistant.
Exhaust gas and liquid processing equipment for vertical furnaces made of corrosion-resistant resin or quartz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11555088U JPH0638114Y2 (en) | 1988-08-31 | 1988-08-31 | Exhaust gas / liquid treatment device for vertical furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11555088U JPH0638114Y2 (en) | 1988-08-31 | 1988-08-31 | Exhaust gas / liquid treatment device for vertical furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0238468U true JPH0238468U (en) | 1990-03-14 |
| JPH0638114Y2 JPH0638114Y2 (en) | 1994-10-05 |
Family
ID=31357311
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11555088U Expired - Lifetime JPH0638114Y2 (en) | 1988-08-31 | 1988-08-31 | Exhaust gas / liquid treatment device for vertical furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0638114Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03229414A (en) * | 1990-02-05 | 1991-10-11 | Tokyo Electron Sagami Ltd | Thermal treatment apparatus |
| JPH0417324A (en) * | 1990-05-10 | 1992-01-22 | Shin Etsu Handotai Co Ltd | Semiconductor wafer processor |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000349027A (en) * | 1999-05-27 | 2000-12-15 | Applied Materials Inc | Semiconductor manufacture device |
-
1988
- 1988-08-31 JP JP11555088U patent/JPH0638114Y2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03229414A (en) * | 1990-02-05 | 1991-10-11 | Tokyo Electron Sagami Ltd | Thermal treatment apparatus |
| JPH0417324A (en) * | 1990-05-10 | 1992-01-22 | Shin Etsu Handotai Co Ltd | Semiconductor wafer processor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0638114Y2 (en) | 1994-10-05 |
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