JPH0638114Y2 - Exhaust gas / liquid treatment device for vertical furnace - Google Patents

Description

[Detailed Description of the Invention] [Industrial field of application] The present invention installs a tubular furnace (heater) for heating vertically,
A vertical furnace used by inserting a reaction tube into this tubular furnace, for example, vertical diffusion used for semiconductor device manufacturing, vertical furnaces such as CVD equipment, and particularly for exhausting process gas and waste liquid used for semiconductor device manufacturing. Regarding a processing device.

[Conventional technology]

FIG. 2 is a vertical cross-sectional view showing the configuration of an example of a conventional apparatus. 1 is a tubular furnace installed vertically, 2 is a reaction tube inserted into the tubular furnace 1, and 4 is a large number of wafers 5. The boat mounted, 6 its cap, 7 the reaction gas inlet, 13 the gas inlet nozzle connected to it, 3 the nozzle formed between the inside of the reaction tube 2 and the reaction gas inlet 7 Is in communication with.

Reference numeral 8 denotes a support base of a vertical movement mechanism that supports the cap 6 at the bottom of the boat 4, and 10 denotes a vertical movement mechanism that moves the boat 4 up and down via the support base 8. Reference numeral 9 is a furnace port, 11 is a heat exhaust port in the cap 6, and 12 is a heater base for supporting the tubular furnace 1. Reference numeral 14 is a closed cap provided between the lower end of the cap 6 and its support base 8, and 18 is an exhaust port provided in the reaction tube 2, through which the gas in the reaction tube 2 is exhausted. Reference numeral 17 is an exhaust pipe connected to the exhaust port 18 via a pipe joint 15, and 16 is a dustproof cover.

In such a conventional apparatus, the process gas (reaction gas) introduced from the gas introduction nozzle 13 to the reaction gas introduction port 7
Is introduced into the upper portion of the reaction tube 2 through the nozzle 3, passes between the boat 4 on which a large number of wafers 5 are mounted and the reaction tube 2, and is exhausted through the exhaust pipe 17 from the lower exhaust port 18. It

The process gas introduced into the reaction tube 2 forms a formed film on the surfaces of a large number of wafers 5, and at the same time water vapor and the like are generated due to the reaction of different process gases.

[Problems to be solved by the device]

However, in the above-mentioned conventional apparatus, since the exhaust pipe 17 is made of stainless steel, when the process gas for exhausting water vapor or forming the formed film is exhausted, the process gas (HCl, etc.) causes dew condensation of water vapor. As a result, the heat of the tubular furnace 1 is further transferred to the exhaust pipe 17 and easily oxidized, so that the exhaust pipe 17 made of stainless steel is corroded and not only lacks in durability, but the weight of the exhaust pipe 17 is made of stainless steel. However, there is a problem in that it becomes heavy, it is difficult to attach and detach in the device, and the maintainability is poor.

Further, there is also a problem that foreign matters are generated on a large number of wafers 5 mounted on the boat 4 in the reaction tube 2 due to water remaining in the exhaust tube 17 or corroded stainless steel, and the device characteristics are deteriorated. It was

[Means for Solving the Problems]

In order to solve the above-mentioned problems, the device of the present invention installs a tubular furnace 1 for heating vertically as shown in the first drawing, inserts a reaction tube 2 in the tubular furnace 1, and inserts it in the reaction tube 2. A boat 4 on which a wafer 5 is placed is carried in, a reaction gas is introduced from a reaction gas inlet 7 and a gas in the reaction tube 2 is exhausted from an exhaust port 18 to form a formed film on the surface of the wafer 5. In a vertical furnace, an exhaust pipe 17 for exhausting gas and a liquid discharge pipe 20 for discharging a liquid are connected to an exhaust port 18 through a pipe joint 19, and a waste liquid container 21 for storing the liquid is connected to the liquid discharge pipe 20. The sealing exhaust pipe 17, the pipe joint 19, the liquid discharge pipe 20, and the waste liquid container 21 are made of resin such as tetrafluoroethylene or quartz.

[Action]

As described above, since the exhaust pipe 17, the pipe joint 19, the liquid discharge pipe 20 and the waste liquid container 21 are made of heat-resistant and corrosion-resistant resin or quartz, when discharging water vapor or forming a generated film. When exhausting the process gas, the process gas and water vapor condense, and the heat transfer from the tubular furnace 1 corrodes the exhaust pipe 17, the pipe joint 19, the liquid discharge pipe 20 and the waste liquid container 21. The risk of

Further, by-products mainly containing water due to the liquid or process gas adhered to the inside of the reaction tube 2 and the inner surface of the pipe joint 19 due to the dew condensation of the steam generated at the same time as the exhaust of the process gas pass through the pipe joint 19 and the liquid discharge pipe 20. Then, they will be stocked in the waste liquid container 21. Therefore, no foreign matter is generated on the large number of wafers 5 placed on the boat 4 in the reaction tube 2.

〔Example〕

 An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is a vertical cross-sectional view showing the construction of an embodiment of the device of the present invention. Components having the same functions as those of the conventional example of FIG. 2 are designated by the same reference numerals, and the description thereof will be omitted.

In FIG. 1, 22 is a gas exhaust nozzle made of quartz (which may be made of resin such as tetrafluoroethylene) connected to the exhaust port 18, and 19 is a T-shaped pipe joint made of resin such as tetrafluoroethylene connected to the nozzle 22. Is. An exhaust pipe 17 made of a resin such as tetrafluoroethylene and a liquid discharge pipe 20 made of a resin such as tetrafluoroethylene are movably connected to the T-shaped pipe joint 19. 21 is this liquid discharge pipe 20
A waste liquid container made of quartz (which may be made of resin such as tetrafluoroethylene) connected to the waste liquid container.

In the above configuration, the formation of the formed film on the surface of the large number of wafers 5 and the generation of water vapor and the like due to the reaction of different process gases are the same as those in the above-mentioned conventional example, and therefore the description thereof is omitted. Wafer 5
The process gas used for producing the produced film on the surface passes through the quartz gas exhaust nozzle 22 from the exhaust port 18, passes through the resin T-shaped pipe joint 19 such as tetrafluoroethylene,
Exhaust is made to the outside of the apparatus through an exhaust pipe 17 made of resin such as tetrafluoroethylene.

In this case, since the gas exhaust nozzle 22 is made of quartz and the T-shaped pipe joint 19 and the exhaust pipe 17 are made of resin such as tetrafluoroethylene, heat resistance and oxidation resistance are improved, and corrosion resistance and durability are improved. Will increase.

Further, by-products mainly containing water due to water and process gas adhering to the inside of the reaction tube 2 and the inner surfaces of the gas exhaust nozzle 22 and the T-shaped pipe joint 19 due to the condensation of water vapor at the same time as the exhaust of the process gas are T-shaped tubes. It will be accumulated in the waste liquid container 21 from the joint 19 through the liquid discharge pipe 20 made of resin such as tetrafluoroethylene. Therefore, no foreign matter is generated on the large number of wafers 5 placed on the boat 4 in the reaction tube 2 and the surrounding metal material is not corroded.

The exhaust pipe 17 and the liquid discharge pipe 20 are made of resin and lightweight, and are connected to the T-shaped joint 19 so that they can move freely.
Maintainability will also be improved.

[Effect of device]

As described above, according to the present invention, since the exhaust pipe 17, the pipe joint 19, the liquid discharge pipe 20 and the waste liquid container 21 are made of resin such as tetrafluoroethylene or quartz, it is possible to discharge water vapor or generate it. At the time of exhausting the process gas for forming the film, the exhaust gas 17, the pipe joint 19, the liquid discharge pipe 20 and the waste liquid are generated due to the condensation of the steam due to the process gas and the heat conduction from the tubular furnace 1. Not only can the container 21 be prevented from being corroded and durability can be improved, but also the weight can be reduced and the device 21 can be easily attached and detached in the device, so that the maintainability can be improved.

Further, by-products mainly containing water due to the liquid or process gas adhered to the inside of the reaction tube 2 and the inner surface of the pipe joint 19 due to the dew condensation of the steam generated at the same time as the exhaust of the process gas pass through the pipe joint 19 and the liquid discharge pipe 20. Then, it is accumulated in the waste liquid container 21, so that foreign substances are not generated on the large number of wafers 5 placed on the boat 4 in the reaction tube 2, so that the device characteristics are improved. You can

[Brief description of drawings]

FIG. 1 is a longitudinal sectional view showing the construction of an embodiment of the device of the present invention,
FIG. 2 is a vertical sectional view showing the configuration of an example of a conventional device. 1 ... Tube furnace, 2 ... Reaction tube, 4 ... Boat, 5 ... Wafer, 7 ... Reaction gas inlet, 17 ... Exhaust pipe, 18 ...
Exhaust port, 19 …… (T type) pipe joint, 20 …… Liquid discharge pipe, 21
…… Waste liquid container.

Claims (1)

[Scope of utility model registration request] 1. A tubular furnace (1) for heating is installed vertically, a reaction tube (2) is inserted in the tubular furnace (1), and a wafer (5) is placed in the reaction tube (2). While the loaded boat (4) is carried in, the reaction gas is introduced from the reaction gas introduction port (7), and the gas in the reaction tube (2) is exhausted from the exhaust port (18) to remove the wafer (5). In a vertical furnace that produces a product film on the surface, an exhaust pipe (17) for exhausting gas and a liquid exhaust pipe (20) for ejecting liquid are connected to an exhaust port (18) through a pipe joint (19). The waste liquid container (21) for storing the liquid is connected to the liquid discharge pipe (20), and the exhaust pipe (17), the pipe joint (19), the liquid discharge pipe (20) and the waste liquid container (21) are made of tetrafluoroethylene or the like. Exhaust gas / liquid treatment device for vertical furnaces made of resin or quartz.