JPS6280655A - フオトマスクブランクおよびフオトマスク - Google Patents

フオトマスクブランクおよびフオトマスク

Info

Publication number
JPS6280655A
JPS6280655A JP60221225A JP22122585A JPS6280655A JP S6280655 A JPS6280655 A JP S6280655A JP 60221225 A JP60221225 A JP 60221225A JP 22122585 A JP22122585 A JP 22122585A JP S6280655 A JPS6280655 A JP S6280655A
Authority
JP
Japan
Prior art keywords
light
photomask
thin film
film
transparent conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60221225A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0414339B2 (en:Method
Inventor
Takehiro Taihichi
対比地　武博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP60221225A priority Critical patent/JPS6280655A/ja
Publication of JPS6280655A publication Critical patent/JPS6280655A/ja
Publication of JPH0414339B2 publication Critical patent/JPH0414339B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60221225A 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク Granted JPS6280655A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60221225A JPS6280655A (ja) 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60221225A JPS6280655A (ja) 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク

Publications (2)

Publication Number Publication Date
JPS6280655A true JPS6280655A (ja) 1987-04-14
JPH0414339B2 JPH0414339B2 (en:Method) 1992-03-12

Family

ID=16763427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60221225A Granted JPS6280655A (ja) 1985-10-04 1985-10-04 フオトマスクブランクおよびフオトマスク

Country Status (1)

Country Link
JP (1) JPS6280655A (en:Method)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63299124A (ja) * 1987-05-29 1988-12-06 Hitachi Ltd Ｘ線露光マスクのパターン検査方法
JPH032756A (ja) * 1989-05-30 1991-01-09 Hoya Corp フォトマスクブランク及びフォトマスク
KR20130027440A (ko) * 2011-09-07 2013-03-15 호야 가부시키가이샤 마스크 블랭크, 전사용 마스크, 및 반도체 디바이스의 제조 방법
JP2015114356A (ja) * 2013-12-09 2015-06-22 Hoya株式会社 機能膜付き基板の製造方法、多層膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55161240A (en) * 1979-06-04 1980-12-15 Dainippon Printing Co Ltd Photomask
JPS57205342A (en) * 1981-06-15 1982-12-16 Seiko Epson Corp Glass photomask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55161240A (en) * 1979-06-04 1980-12-15 Dainippon Printing Co Ltd Photomask
JPS57205342A (en) * 1981-06-15 1982-12-16 Seiko Epson Corp Glass photomask

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63299124A (ja) * 1987-05-29 1988-12-06 Hitachi Ltd Ｘ線露光マスクのパターン検査方法
JPH032756A (ja) * 1989-05-30 1991-01-09 Hoya Corp フォトマスクブランク及びフォトマスク
KR20130027440A (ko) * 2011-09-07 2013-03-15 호야 가부시키가이샤 마스크 블랭크, 전사용 마스크, 및 반도체 디바이스의 제조 방법
JP2013068934A (ja) * 2011-09-07 2013-04-18 Hoya Corp マスクブランク、転写用マスク、および半導体デバイスの製造方法
JP2015114356A (ja) * 2013-12-09 2015-06-22 Hoya株式会社 機能膜付き基板の製造方法、多層膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法

Also Published As

Publication number Publication date
JPH0414339B2 (en:Method) 1992-03-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term