JPS628017B2 - - Google Patents

Info

Publication number
JPS628017B2
JPS628017B2 JP55120965A JP12096580A JPS628017B2 JP S628017 B2 JPS628017 B2 JP S628017B2 JP 55120965 A JP55120965 A JP 55120965A JP 12096580 A JP12096580 A JP 12096580A JP S628017 B2 JPS628017 B2 JP S628017B2
Authority
JP
Japan
Prior art keywords
wafer
groove
processing
amount
grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55120965A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5745254A (en
Inventor
Eiichi Tsukada
Fumikazu Oohira
Yasushi Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP55120965A priority Critical patent/JPS5745254A/ja
Publication of JPS5745254A publication Critical patent/JPS5745254A/ja
Publication of JPS628017B2 publication Critical patent/JPS628017B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54493—Peripheral marks on wafers, e.g. orientation flats, notches, lot number
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Drying Of Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
JP55120965A 1980-09-01 1980-09-01 Automatic detector for amount of silicon wafer worked Granted JPS5745254A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55120965A JPS5745254A (en) 1980-09-01 1980-09-01 Automatic detector for amount of silicon wafer worked

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55120965A JPS5745254A (en) 1980-09-01 1980-09-01 Automatic detector for amount of silicon wafer worked

Publications (2)

Publication Number Publication Date
JPS5745254A JPS5745254A (en) 1982-03-15
JPS628017B2 true JPS628017B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-02-20

Family

ID=14799383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55120965A Granted JPS5745254A (en) 1980-09-01 1980-09-01 Automatic detector for amount of silicon wafer worked

Country Status (1)

Country Link
JP (1) JPS5745254A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3273475D1 (en) * 1982-10-14 1986-10-30 Ibm Deutschland Method to measure the thickness of eroded layers at subtractive work treatment processes
US4468857A (en) * 1983-06-27 1984-09-04 Teletype Corporation Method of manufacturing an integrated circuit device
US4472875A (en) * 1983-06-27 1984-09-25 Teletype Corporation Method for manufacturing an integrated circuit device
US4485553A (en) * 1983-06-27 1984-12-04 Teletype Corporation Method for manufacturing an integrated circuit device
JPS60149133U (ja) * 1984-03-13 1985-10-03 日本真空技術株式会社 エツチングモニタ−
JPS6178137A (ja) * 1984-09-26 1986-04-21 Oki Electric Ind Co Ltd 半導体装置
JPH0682636B2 (ja) * 1985-04-19 1994-10-19 株式会社日立製作所 ドライエッチング方法
JP2873314B2 (ja) * 1989-03-30 1999-03-24 住友シチックス株式会社 半導体基板の研磨方法及びその装置
JP3287798B2 (ja) 1997-12-17 2002-06-04 レンゴー株式会社 球状セルロース微粒子の製造方法
JP6977509B2 (ja) * 2017-11-29 2021-12-08 株式会社デンソー 半導体基板の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754730A (en) * 1972-05-01 1973-08-28 Refrigerating Specialties Co Pressure refrigerant regulator
JPS52125451U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1976-03-19 1977-09-24

Also Published As

Publication number Publication date
JPS5745254A (en) 1982-03-15

Similar Documents

Publication Publication Date Title
JPH043008A (ja) 投影露光方法およびその装置
JPH0812057B2 (ja) 光ビーム装置
JPS628017B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP2000009437A (ja) 薄膜の膜厚計測方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその製造装置
KR20230115348A (ko) 교정 도구
JP2002286507A (ja) 光学式エンコーダ装置
EP3789729B1 (en) Method of non-contact scanning of profiles of rotating objects and evaluation of their external dimensions
JPH0122977B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US20230258577A1 (en) Edge portion measuring apparatus and method for measuring edge portion
JP3180357B2 (ja) 円形基板の位置決め装置および方法
JPH06258064A (ja) 単結晶インゴットのオリエンテーションフラット 幅測定方法
KR0131526B1 (ko) 광학식 측정장치 및 그 측정방법
JPH0637180A (ja) 薄溝加工機のバックラッシュ測定方法及びバックラッシュ補正機能を有する薄溝加工機
JP2021167845A (ja) 表面異物検出装置およびそれを用いた表面異物検出方法
JPH065495A (ja) 位置検出方法及び装置
JPS6210361B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH047803B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH09199573A (ja) 位置決めステージ装置およびこれを用いた露光装置
KR102855085B1 (ko) 엣지 위치 검출 장치 및 엣지 위치 검출 방법
JPH06236837A (ja) 面位置検出方法及びそれを用いた投影露光装置
JPH03255951A (ja) 単結晶インゴットの結晶方位測定装置
JPS6352766B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH0829131A (ja) 光学式測定装置
JPS6256443B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR20250021176A (ko) 한 쌍의 센서를 이용한 웨이퍼 전영역 두께 측정 방법 및 장치