JPS627433Y2 - - Google Patents
Info
- Publication number
- JPS627433Y2 JPS627433Y2 JP4013481U JP4013481U JPS627433Y2 JP S627433 Y2 JPS627433 Y2 JP S627433Y2 JP 4013481 U JP4013481 U JP 4013481U JP 4013481 U JP4013481 U JP 4013481U JP S627433 Y2 JPS627433 Y2 JP S627433Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- air
- tube
- pipe
- purge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning In General (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4013481U JPS627433Y2 (enrdf_load_stackoverflow) | 1981-03-20 | 1981-03-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4013481U JPS627433Y2 (enrdf_load_stackoverflow) | 1981-03-20 | 1981-03-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57154144U JPS57154144U (enrdf_load_stackoverflow) | 1982-09-28 |
JPS627433Y2 true JPS627433Y2 (enrdf_load_stackoverflow) | 1987-02-20 |
Family
ID=29837244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4013481U Expired JPS627433Y2 (enrdf_load_stackoverflow) | 1981-03-20 | 1981-03-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS627433Y2 (enrdf_load_stackoverflow) |
-
1981
- 1981-03-20 JP JP4013481U patent/JPS627433Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS57154144U (enrdf_load_stackoverflow) | 1982-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4303824A (en) | Method and apparatus protecting a lens from airborne particulates | |
JP2002158202A (ja) | ウエハ洗浄装置 | |
US5392989A (en) | Nozzle assembly for dispensing liquid | |
JPS627433Y2 (enrdf_load_stackoverflow) | ||
TW201906671A (zh) | 基板處理裝置 | |
JPH0487335A (ja) | 半導体ウエハ洗浄装置 | |
JP7506920B2 (ja) | 吸引ノズル | |
KR100475016B1 (ko) | 확산로의반응튜브 | |
JP2658653B2 (ja) | 洗浄装置および洗浄装置における排気の制御方法 | |
JP3338544B2 (ja) | 乾燥方法及び乾燥装置 | |
JPH03126909A (ja) | ダイシングマシン | |
JPH0676276B2 (ja) | 化学気相成長装置 | |
JP2001226756A (ja) | 溶射ヘッドの待機支持装置 | |
JPH06177107A (ja) | 角型基板用回転式洗浄処理装置 | |
CN119170519A (zh) | 衬底处理装置 | |
JPS5978526A (ja) | 半導体気相反応装置 | |
JPH04239132A (ja) | 洗浄装置 | |
JPS618828A (ja) | シヤドウマスクのつまり除去装置 | |
JPH1012522A (ja) | 加熱処理装置 | |
JPS6136221B2 (enrdf_load_stackoverflow) | ||
JP3209670B2 (ja) | 陰極線管の製造工程におけるガスの供給方法 | |
KR20080011529A (ko) | 반도체 제조설비의 돔 온도 조절장치 | |
JPH0353525A (ja) | 半導体基板表面の清浄化方法 | |
JPH0555137A (ja) | 半導体基板処理装置 | |
JPH04287341A (ja) | ウェーハのハンドリング装置 |