JPS6273728A - Cleaning unit for semiconductor substrate containing box - Google Patents
Cleaning unit for semiconductor substrate containing boxInfo
- Publication number
- JPS6273728A JPS6273728A JP21426185A JP21426185A JPS6273728A JP S6273728 A JPS6273728 A JP S6273728A JP 21426185 A JP21426185 A JP 21426185A JP 21426185 A JP21426185 A JP 21426185A JP S6273728 A JPS6273728 A JP S6273728A
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- brush
- clean
- wall
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体集積回路製造工程において、半導体基板
を収納する半導体基板収納箱(以下キャリアと称する)
の洗浄を行う洗浄装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a semiconductor substrate storage box (hereinafter referred to as a carrier) for storing semiconductor substrates in a semiconductor integrated circuit manufacturing process.
The present invention relates to a cleaning device for cleaning.
キャリアlは第2図に示すように対向する側壁に縦溝1
cLを有し、半導体基板を縦溝ICLに嵌合保持してこ
れを垂直姿勢に収納するもので、半導体基板はキャリア
1に複数枚収納されて半導体集積回路製造工程内に搬送
される。The carrier l has vertical grooves 1 on opposite side walls as shown in Figure 2.
cL, and a semiconductor substrate is fitted and held in a vertical groove ICL to be stored in a vertical position. A plurality of semiconductor substrates are stored in a carrier 1 and transported into a semiconductor integrated circuit manufacturing process.
キャリアlは製造工程内で種々の雰囲気を通過して汚れ
るため、定期的に洗浄する必要がある。The carrier I passes through various atmospheres during the manufacturing process and becomes dirty, so it needs to be cleaned periodically.
従来、キャリア1の洗浄は第2図に示すようンこキャリ
アlの内周面に沿ってブラ/、1を上下動させて壁面の
洗浄を行っていた。Conventionally, the carrier 1 was cleaned by moving the brush 1 up and down along the inner peripheral surface of the carrier 1 as shown in FIG. 2 to clean the wall surface.
このため、キャリアの外周面の洗浄は曲の装置を必要と
し、別工程で行う必要があり、ギヤリアの洗浄効果及び
洗浄スピードの向上のさまたげ:二なるという欠点があ
った。Therefore, cleaning the outer circumferential surface of the carrier requires a curved device and must be carried out in a separate process, which has the disadvantage of hindering the improvement of the cleaning effect and cleaning speed of the gear rear.
本発明は前記問題点を解消し、ギヤリアの洗浄スピード
を迅速化する洗浄装置を提供するものである。The present invention solves the above problems and provides a cleaning device that speeds up the cleaning speed of the gear rear.
本発明は半導体基板をその両側縁で支えこれを垂直姿勢
に収納する収納箱をブラシで洗浄する洗浄装置において
、収納箱の内周面に沿って移動し壁面を洗浄する内ブラ
シと、該内ブラシに連動して外周面に沿って移動し壁面
を洗浄する外ブラシとを有することを特徴とする半導体
基板収納箱の洗浄装置である。The present invention provides a cleaning device that uses a brush to clean a storage box that supports semiconductor substrates on both sides thereof and stores them in a vertical position. This cleaning device for a semiconductor substrate storage box is characterized by having an outer brush that moves along the outer peripheral surface in conjunction with the brush to clean the wall surface.
以下、本発明の一実施例を図により説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.
第1図において、本発明はギヤリア1の内周面に沿い上
下往復動することにより壁面を洗浄する内ブラシ2を設
け、さらに内ブラシ20両サイドに、内プラン2に連動
して外周面に沿い上下往復動することにより壁面を洗浄
する外ブラシ3,3を設けたものである。In FIG. 1, the present invention provides an inner brush 2 that cleans the wall surface by reciprocating up and down along the inner circumferential surface of the gear rear 1, and furthermore, on both sides of the inner brush 20, in conjunction with the inner plan 2, the inner brush 2 cleans the outer circumferential surface. It is provided with outer brushes 3, 3 that clean the wall surface by reciprocating up and down along the wall.
実施例において、内ブラシ2と外ブラシ3とを同期して
キャリア1の内外両局面に沿い同一タイミングで上下往
復動する。これにより、キャリアlの内外両壁面が同時
に一工程において洗浄される。In the embodiment, the inner brush 2 and the outer brush 3 are synchronized and reciprocated up and down along both the inner and outer surfaces of the carrier 1 at the same timing. As a result, both the inner and outer wall surfaces of the carrier I are simultaneously cleaned in one step.
なお、本実施例では円形ブラシを使用t、りが、ブラシ
の形状、材質、動作取付場所は変更可能である。Although a circular brush is used in this embodiment, the shape, material, and location of the brush can be changed.
以上説明したように本発明は内ブラシと外ブラシとでキ
ャリアの内外両壁面を同一タイミングにて洗浄すること
により、キャリアの内外両面を同時に迅速に洗浄を行う
ことができ、キャリア洗浄の能力を向上でき、キャリア
の汚染による製品の不良を防ぐことができる効果を有す
るものである。As explained above, the present invention uses the inner and outer brushes to clean both the inner and outer walls of the carrier at the same timing, thereby quickly cleaning both the inner and outer surfaces of the carrier at the same time, thereby increasing the carrier cleaning ability. This has the effect of preventing product defects due to carrier contamination.
第1図は本発明の一実施例を示す斜視図、第2図は従来
例を示す構成図である。FIG. 1 is a perspective view showing an embodiment of the present invention, and FIG. 2 is a configuration diagram showing a conventional example.
Claims (1)
収納する収納箱をブラシで洗浄する洗浄装置において、
収納箱の内周面に沿つて壁面を洗浄する内ブラシと、該
内ブラシに連動して外周面に沿つて壁面を洗浄する外ブ
ラシとを有することを特徴とする半導体基板収納箱の洗
浄装置。(1) In a cleaning device that uses a brush to clean a storage box that supports semiconductor substrates on both sides and stores them in a vertical position,
A cleaning device for a semiconductor substrate storage box, comprising an inner brush that cleans the wall surface along the inner peripheral surface of the storage box, and an outer brush that cleans the wall surface along the outer peripheral surface in conjunction with the inner brush. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21426185A JPS6273728A (en) | 1985-09-27 | 1985-09-27 | Cleaning unit for semiconductor substrate containing box |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21426185A JPS6273728A (en) | 1985-09-27 | 1985-09-27 | Cleaning unit for semiconductor substrate containing box |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6273728A true JPS6273728A (en) | 1987-04-04 |
Family
ID=16652818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21426185A Pending JPS6273728A (en) | 1985-09-27 | 1985-09-27 | Cleaning unit for semiconductor substrate containing box |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6273728A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0817771A (en) * | 1994-07-04 | 1996-01-19 | Shin Etsu Handotai Co Ltd | Brush washing device and work-washing system |
-
1985
- 1985-09-27 JP JP21426185A patent/JPS6273728A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0817771A (en) * | 1994-07-04 | 1996-01-19 | Shin Etsu Handotai Co Ltd | Brush washing device and work-washing system |
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