JPH0871519A - Substrate cleaning device - Google Patents

Abstract

PURPOSE: To provide a substrate cleaning device of simple constitution which is capable of cleaning both front and rear surface of a substrate satisfactorily. CONSTITUTION: A substrate W with a lower surface cleaned by a brush module 22 is supported horizontally from below, and then is transported to a spin module 23 in such a maintained position that a cleaning liquid is supplied to the upper surface of the substrate W. Consequently, the front and rear surfaces which are the upper and lower surfaces respectively of the substrate W can be continuously cleaned without interposing a mechanism for reversing the substrate W. In this case, the cleaning liquid is supplied to the substrate W in the brush module 22 and on the transport handle 5, so that the surface of the substrate W is prevented from becoming dry and a water stain residue is also prevented from forming on the surface of the substrate W.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus for cleaning various substrates such as semiconductor wafers, glass rectangular substrates for liquid crystals, photomask substrates, thermal head substrates, color filter substrates and printed circuit boards.

[0002]

2. Description of the Related Art Conventionally, as a cleaning apparatus as described above for cleaning the surface of a substrate (the surface on which a predetermined thin film is formed), the substrate is horizontally supported by a spin chuck from the back side of the substrate while rotating the substrate. A so-called spin scrubber that cleans the surface of a substrate by supplying a cleaning liquid to the surface and slidingly contacting the surface of the substrate with a brush, or by supplying a cleaning liquid to which ultrasonic vibration is applied to the surface of the substrate is known. ing.

[0003]

However, in such a spin scrubber, since the back surface of the substrate is supported by the vacuum suction or mechanical holding mechanism, only the front surface of the substrate can be cleaned and the back surface thereof is cleaned. Can not do it.

Here, in order to clean both the front and back surfaces of the substrate, two spin scrubbers as described above are installed side by side, and a device for inverting and transporting the substrate is arranged between them, and one spin scrubber is installed. It is conceivable that after cleaning the front surface of the substrate, the substrate is turned upside down and carried into the other spin scrubber to clean the back surface of the substrate.

However, in such a structure, since an apparatus for turning the substrate upside down is required, the overall apparatus structure becomes complicated and the apparatus becomes expensive, and when cleaning the back surface of the substrate. Since it comes into contact with and holds the surface, there is a problem that the surface of the substrate is soiled.

Therefore, the present invention is to provide a substrate cleaning apparatus capable of satisfactorily cleaning both the front surface and the back surface of a substrate and having a simple structure for that purpose.

[0007]

In order to solve the above-mentioned problems, a substrate cleaning apparatus according to a first aspect of the present invention is a substrate cleaning apparatus for cleaning a substrate, in which a substrate to be cleaned is supported from below with its surface side facing upward. A lower surface cleaning means for cleaning the lower surface of the substrate by supplying a cleaning liquid to the substrate and slidingly contacting the lower surface of the substrate with a brush, and supporting the substrate to be cleaned from below with the front surface side facing upward, on the upper surface of the substrate. An upper surface cleaning unit that supplies the cleaning liquid and rotates the substrate to clean the upper surface of the substrate, and a substrate whose lower surface is cleaned by the lower surface cleaning unit are supported horizontally from below, and the upper surface transfer unit supplies the cleaning liquid to the substrate. And a transporting means for transporting to.

According to a second aspect of the present invention, there is provided a substrate cleaning apparatus, wherein the lower surface cleaning means is arranged in parallel with each other and is rotated to support a plurality of transfer rollers for supporting the substrate mounted thereon and transferring the substrate in a horizontal direction. And a roll brush that is arranged in parallel with the transport roller and is in sliding contact with the lower surface of the substrate transported by the transport roller.

According to a third aspect of the present invention, there is provided the substrate cleaning apparatus, wherein the lower surface cleaning means further includes a brush for slidingly contacting the upper surface of the horizontally supported substrate to clean the upper surface of the substrate.

A substrate cleaning apparatus according to a fourth aspect of the present invention is characterized in that the lower surface cleaning means has a cleaning liquid spraying means for spraying a cleaning liquid from above the horizontally supported substrate toward the upper surface of the substrate.

In the substrate cleaning apparatus of the fifth aspect, the transfer means is
It is characterized in that it has a cleaning liquid supply means for diffusing and spraying the cleaning liquid from above the horizontally supported substrate toward the upper surface of the substrate.

[0012]

According to the substrate cleaning apparatus of the first and second aspects,
The transfer unit horizontally supports the substrate whose lower surface (ie, the back surface of the substrate) has been cleaned by the lower surface cleaning unit from below, and supplies the cleaning liquid to the upper surface of the substrate (ie, the front surface of the substrate) and transfers it to the upper surface cleaning unit. Therefore, the upper and lower surfaces of the substrate, that is, both the front and back surfaces thereof, can be continuously washed without providing a mechanism for inverting the substrate. At this time, since the cleaning liquid is supplied to at least the upper surface of the substrate (that is, the surface of the substrate) by the transporting means, it is possible to prevent the surface of the substrate from being dried and to prevent water stain residue from forming on the surface of the substrate. Further, since the substrate is supported from below by the lower surface cleaning unit, the transfer means and the upper surface cleaning unit, the surface of the substrate on which the thin film is formed is not contaminated due to the support.

In the substrate cleaning apparatus of the third aspect, since the lower surface cleaning section has the brush capable of sliding contact with the upper surface of the horizontally supported substrate, the lower surface cleaning means once cleans the surface on which the thin film is to be formed. Since it can be cleaned by the upper surface cleaning means, the surface on which the thin film is to be formed can be cleaned more cleanly.

According to another aspect of the substrate cleaning apparatus of the present invention, the lower surface cleaning section has the cleaning liquid spraying means for spraying the cleaning liquid from above the horizontally supported substrate toward the upper surface of the substrate (that is, the surface of the substrate). The cleaning liquid can effectively prevent the surface of the substrate from being dried.

In the substrate cleaning apparatus of the fifth aspect, the transporting means has the cleaning liquid spraying means for diffusing and spraying the cleaning liquid from above the supported substrate to the upper surface of the substrate (that is, the surface of the substrate). It is possible to more effectively prevent the surface of the substrate from being dried while the substrate whose lower surface has been cleaned by the lower surface cleaning means is conveyed to the upper surface cleaning means.

[0016]

1 is a diagram showing the overall structure of an embodiment of a substrate cleaning apparatus according to the present invention. This substrate cleaning apparatus includes an indexer unit 1, a cleaning processing unit 2, and a substrate transfer device 3.

The indexer unit 1 is provided with a cassette mounting unit 11 for mounting a cassette 4 capable of storing a plurality of substrates, for example, 25 substrates. Therefore, when the cassettes 4 transported to the apparatus by an AGV (unmanned guided vehicle) (not shown) are transferred to the respective cassette mounting portions 11, the three cassettes 4 are aligned in the X direction in the indexer portion 1. Thus, it is possible to take out the substrate from the cassette 4 and store the substrate in the cassette 4 by the substrate transfer device 3.

The cleaning processing section 2 supplies the processing solution to the substrate without supplying the processing solution to the substrate (corresponding to the portion 21), and supplies the processing solution such as water to the substrate to perform the cleaning processing. And a wet processing unit (corresponding to the portions denoted by reference numerals 22 and 23) for carrying out, and arranged in parallel and opposed to the arrangement direction X of the cassette 4 in a state of being separated from the indexer unit 1 by a certain distance in the Y direction. In the UV module 21, which is the former dry processing unit, the surface of the substrate is irradiated with ultraviolet rays to burn and ash the organic substances on the surface of the substrate. The latter wet processing unit includes a brush module 22 and a brush module 22 arranged immediately below the UV module 21 (-Z direction).
In the brush module 22, the lower surface on the back surface side of the moving or swinging substrate is mainly subjected to a brush cleaning process.
In the spin module 23, the upper surface on the front surface side of the rotating substrate is brush-cleaned.

The transfer of the substrate from the brush module 21 to the spin module 22 is carried out by a transfer hand 5 which is a transfer means capable of reciprocating in the X direction and freely moving back and forth in the Y direction.

In the substrate cleaning apparatus thus constructed,
The substrate is washed, for example, as follows. First, the unprocessed substrate in the cassette 4 is U
It is carried into the V module 21 and subjected to a dry cleaning treatment with ozone under the irradiation of ultraviolet rays. Next, the substrate after the dry cleaning process in the UV module 21 is carried into the brush module 22 by the substrate transfer device 3, and here the lower surface which is the back surface of the substrate is mainly subjected to the wet cleaning process. Next, the substrate after the wet cleaning process in the brush module 22 is transferred by the hand 5
Then, it is carried into the spin module 23, where the upper surface, which is the surface of the substrate, is subjected to wet cleaning processing. Finally, the substrate after the wet processing in the spin module 23 is returned into the predetermined cassette 4 by the substrate transfer device 3.

FIG. 2 is a diagram for explaining the main part of the cleaning processing unit 2 of the apparatus shown in FIG. The substrate W carried in through the substrate carry-in port 32 is once lowered (downward in the −Z direction) by an elevating mechanism (not shown), and then is moved horizontally (in the X direction) by a plurality of transport rollers 42. While being kept, it is conveyed at a constant speed or is oscillated at a constant cycle. The transport rollers 42 are arranged in a line in a direction perpendicular to the rotation axes so that the rotation axes are parallel to each other. Although not shown, the transport roller 42 is
Stepped rollers are provided at both ends thereof, and the small wheels support both end portions of the substrate W from below, and the guide wheels guide the both end portions of the substrate W from the side to prevent the substrate from meandering.

A pair of roll brushes 52, 5 for cleaning the lower surface of the substrate W which slides on the lower surface of the substrate W (the back surface on which no thin film or the like is formed) and which cleans the lower surface of the substrate W moving on the transport rollers 42.
2 are independently provided so as to be rotatable forward and backward.
It should be noted that nozzles 62 for the lower surface for supplying a cleaning liquid (for example, pure water) to the roll brush 52 are arranged near both sides of each roll brush 52.

On the upper side of the substrate W transported on the transport roller 42, a roll brush 72 which is in sliding contact with the upper surface of the substrate W (the surface on which a thin film or the like is formed) and assists in cleaning the upper surface, rotates in the forward and reverse directions. It is provided freely. A plurality of upper surface nozzles 82 arranged at equal intervals are arranged above the substrate W and the roll brush 72, and the cleaning liquid is sprayed (that is, sprayed while being diffused) toward the substrate W, thereby The surface of W is prevented from drying and water stains are prevented.

The substrate W whose bottom surface has been cleaned by the roll brush 52 is conveyed in the horizontal direction (X direction) to the right end of the module without the roll brush 52 while maintaining its posture, and is moved upward by an elevator mechanism (not shown). After being raised in the (Z direction), it is transferred to the transfer hand 5 standing by on the substrate outlet 42 of the brush module 22.

The transfer hand 5 moves from the brush module 22 to the spin module 23 while keeping the posture of the substrate W which has been subjected to the wet cleaning processing by the brush module 22.
Transport it to the top. A plurality of nozzles 25 are disposed above the transport hand 5 to prevent the surface of the substrate W from being dried by spray-supplying the cleaning liquid to the substrate W and to prevent water stain on the surface of the substrate W. ing.

The substrate W transported to above the spin module 23 is transferred to the ascending spin chuck 33. The outer edge of the substrate W transferred onto the spin chuck 33 has a chuck pin 3 which is erected on the spin chuck 33.
3a is engaged. This is to prevent the horizontal displacement of the substrate W on the spin chuck 33. The substrate W supported by the spin chuck 33 is
Along with that, it descends to the processing position. In the wet cleaning process here, the disk brush 43 is moved onto the substrate W and brought into contact with the upper surface of the substrate W. After that, the cleaning liquid is supplied from the nozzle 53 above the disc brush 43 while rotating (rotating) the disc brush 43. At this time, the spin chuck 33 is rotated while rotating (revolving) the arm to which the disk brush 43 is attached so that the disk brush 43 slides on the entire surface of the substrate W supported on the spin chuck 33. . When the cleaning of the surface of the substrate W is completed,
The supply of the cleaning liquid from the nozzle 53 to the substrate W is stopped and the disc brush 43 is retracted from the surface of the substrate. After that, the spin chuck 33 is rotated at a high speed, and the cleaning liquid adhering to the substrate W supported on the spin chuck 33 is shaken off by the centrifugal force to dry the substrate. The dried substrate W is carried into the predetermined cassette 4 arranged in the indexer unit 1 by the substrate transfer device 3.

In the spin module 23, the substrate W
On the other hand, in addition to the cleaning process by the disc brush, the ultrasonic cleaning process and the cleaning liquid are supplied to the substrate surface by applying the cleaning liquid to which ultrasonic vibration is applied according to the film quality of the surface of the substrate W, the presence or absence of the pattern, the degree of contamination, Various cleaning treatments such as a high-pressure cleaning treatment for supplying the substrate surface at a high pressure and a pure water rinsing treatment for supplying pure water to the substrate surface may be appropriately selectively performed, or a combination of these cleaning treatments may be applied. .

As described above, according to the substrate cleaning apparatus of the above-described embodiment, the transfer hand 5 horizontally supports the substrate W whose lower surface is cleaned by the brush module 22 from below, and the cleaning liquid is applied to the upper surface of the substrate W. It is conveyed to the spin module 23 while maintaining its posture while being supplied. Therefore, the front and back surfaces of the upper and lower surfaces of the substrate W can be continuously cleaned without interposing a mechanism for reversing the substrate W. At this time, since the cleaning liquid is supplied to the upper surface of the substrate W in the brush module 22 and on the transfer hand 5, it is possible to prevent the surface of the substrate W from being dried and prevent the water stain residue from being formed on the surface of the substrate W. You can Furthermore, since the substrate W is supported from below by the brush module 22, the spin module 23, and the transfer hand 5, and only the roll brush 72 and the disc brush 43 contact the surface side of the upper surface of the substrate W, the surface of the substrate W is Not easily polluted.

Although the present invention has been described with reference to the embodiments, the present invention is not limited to the above embodiments.
For example, in the wet cleaning process of the first stage, the upper and lower roll brushes 52, 8 provided in the brush module 22 of the embodiment.
Instead of 2, a disk brush may be provided to carry out wet cleaning processing on the upper and lower surfaces of the substrate W. Since the back surface of the substrate W is in the state of a raw glass on which no uneven pattern is formed like the front surface, there is no problem even if it is brought into sliding contact with a brush such as a roll brush or a disc brush.

The spin module 23, which performs the wet cleaning process in the subsequent stage, uses only the disk brush 43 for the substrate W.
The surface may be washed.

[0031]

As described above, according to the substrate cleaning apparatus of the first and second aspects, the transporting means horizontally supports the substrate whose lower surface is cleaned by the lower surface cleaning section from below and cleans the upper surface. Since it is transported to a part, the upper and lower surfaces of the substrate, that is, both the front and back surfaces thereof, can be continuously cleaned without providing a mechanism for inverting the substrate. At this time, since the cleaning liquid is supplied to the upper surface of the substrate by at least the transfer means, it is possible to prevent the surface of the substrate from being dried, and it is possible to prevent water stain residue from forming on the surface of the substrate. Furthermore, since the substrate is supported from below by the lower surface cleaning section, the transfer means, and the upper surface cleaning section,
The situation in which the surface of the substrate is contaminated for supporting does not occur.

In the substrate cleaning apparatus of the third aspect, since the lower surface cleaning section has the brush capable of sliding contact with the upper surface of the horizontally supported substrate, the surface of the substrate can be preliminarily cleaned. Can be washed more cleanly in advance.

In the substrate cleaning apparatus of the fourth aspect, since the lower surface cleaning section has the cleaning liquid spraying means for diffusing and spraying the cleaning liquid from above the horizontally supported substrate toward the upper surface of the substrate, it is possible to further dry the surface of the substrate. It can be effectively prevented.

In the substrate cleaning apparatus of the fifth aspect, the transport means has the cleaning liquid spraying means for diffusing and spraying the cleaning liquid from above the supported substrate to the upper surface of the substrate, so that the surface of the substrate is more effectively dried. Can be prevented.

[Brief description of drawings]

FIG. 1 is a perspective view showing a substrate cleaning apparatus according to a first embodiment.

FIG. 2 is a front view of a main part of the substrate cleaning apparatus of FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Indexer part 2 Cleaning part 3 Substrate transfer device 5 Transfer hand 21 UV module 22 Brush module 23 Spin module 25 Nozzle 42 Transfer roller 43 Disc brush 52, 72 Roll brush 53 Nozzle 62 Lower surface nozzle 82 Upper surface nozzle

Claims (5)

[Claims] 1. In a substrate cleaning apparatus for cleaning a substrate, a substrate to be cleaned is supported from below with its front side facing upward, and while supplying a cleaning liquid to the substrate, the lower surface of the substrate is slidably contacted by a brush to form a lower surface of the substrate. A lower surface cleaning means for cleaning the upper surface of the substrate to be cleaned, an upper surface cleaning means for supporting the upper surface of the substrate from above and supplying a cleaning liquid to the upper surface of the substrate and rotating the substrate to clean the upper surface of the substrate. A substrate cleaning apparatus comprising: a substrate, the substrate whose lower surface is cleaned by the lower surface cleaning device, is horizontally supported from below, and is transported to the upper surface transportation device while supplying a cleaning liquid to the substrate. 2. The lower surface cleaning means is arranged in parallel with each other and is rotated to support a plurality of transfer rollers that support a substrate placed thereon and transfer in the horizontal direction, and are arranged in parallel with the transfer rollers. The substrate cleaning apparatus according to claim 1, further comprising a roll brush that is in sliding contact with a lower surface of the substrate that is transported by the transport roller. 3. The substrate cleaning apparatus according to claim 1, wherein the lower surface cleaning means further includes a brush that slidably contacts the upper surface of the horizontally supported substrate to clean the upper surface of the substrate. 4. The lower surface cleaning means has a cleaning liquid spraying means for diffusing and spraying a cleaning liquid from above a horizontally supported substrate toward the upper surface of the substrate. The substrate cleaning apparatus according to. 5. The transporting means has a cleaning liquid supply means for diffusing and spraying a cleaning liquid from above a horizontally supported substrate toward the upper surface of the substrate, as claimed in any one of claims 1 to 4. The substrate cleaning apparatus described.