JP3682121B2

JP3682121B2 - Cleaning device

Info

Publication number: JP3682121B2
Application number: JP16791796A
Authority: JP
Inventors: 光明芳谷
Original assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Current assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Priority date: 1996-06-27
Filing date: 1996-06-27
Publication date: 2005-08-10
Anticipated expiration: 2016-06-27
Also published as: JPH105702A

Description

【０００１】
【発明の属する技術分野】
本発明は、例えば液晶表示器用ガラス基板やプリント基板などの基板類および半導体ウエハなどの板状部材の表面および裏面をそれぞれブラシなどで洗浄する洗浄装置に関するものである。
【０００２】
【従来の技術】
従来のブラシ洗浄装置は、図１０に示すようにディスクブラシ５１を上下に対向配設し、板状部材としてのガラス基板やプリント基板などの基板５２が、上下のディスクブラシ５１の間を水平姿勢で搬送されることにより、基板５２の表裏両面を同時に洗浄していた。また、これらのディスクブラシ５１の代わりに、図１１に示すような上下のロールブラシ５３を回転させると共に、上下のロールブラシ５３で基板５２の表裏両面を挾み込んで同時に洗浄していた。
【０００３】
また、例えば液晶表示器の製造工程において、基板にフォトリソグラフィ工程などの各種処理を施そうとする場合、かかる処理を施す面（以下、表面と称す）の方がその裏面よりもより高い洗浄度を要求される場合が多いのが現状である。このため、基板の表面側の方がその裏面側よりもブラシを多く配設していた。例えば、図１２に示すようなブラシ洗浄装置では、上側ディスクブラシ６１，６２を搬送方向Ａに対して所定距離置いて配設すると共に、これらの上側ディスクブラシ６１，６２の間に下側ディスクブラシ６３を配設し、かつ、上側ディスクブラシ６１，６２の下側にはそれぞれ対向するように全面支持ロール６４，６５がそれぞれ配設されている。これらの上側ディスクブラシ６１，６２と下側ディスクブラシ６３および全面支持ロール６４，６５との間を基板６６が表面側を上にして水平姿勢で搬送されることにより、基板６６の表面側の洗浄度が裏面側のそれよりもより高くなるように洗浄していた。
【０００４】
また、例えば、上記ディスクブラシの代わりにロールブラシを用いたブラシ洗浄装置としては、図１３に示すように、上側ロールブラシ７１，７２，７３を搬送方向Ａに対して所定距離置いてそれぞれ配設すると共に、これらの上側ロールブラシ７１，７２の間に下側ロールブラシ７４を、上側ロールブラシ７２，７３の間に下側ロールブラシ７５を配設し、かつ、上側ロールブラシ７１，７２，７３の下側にそれぞれ対向するように全面支持ロール７６，７７，７８がそれぞれ配設されている。これらの上側ロールブラシ７１，７２，７３と下側ロールブラシ７４，７５および全面支持ロール７６，７７，７８との間を基板６６が表面側を上にして水平姿勢で搬送されることにより、基板６６の表面側の洗浄度が裏面側のそれよりもより高くなるように洗浄していた。
【０００５】
【発明が解決しようとする課題】
上記従来の構成で、図１０および図１１のようにディスクブラシ５１またはロールブラシ５３などのブラシを対向配設した場合には、この部分での基板５１両面の支持は上下のブラシの押し込みバランスに頼っているため、鉛直方向での基板位置（以下、基板搬送基準面と称す）の調整が難しく、基板位置が上下することにより基板両面とブラシとの接触が不均一になりやすく基板両面の洗浄度が低下するという問題があった。また、例えば、基板５１の裏面を支持している下側のブラシにガタツキが発生したような場合には、基板５１の裏面に対しても下側のブラシが不均一な接触になると共に、基板５１の表面に対して上側のブラシも不均一な接触になって影響し、基板両面の洗浄度が低下するという問題があった。
【０００６】
また、このようなブラシで基板５１の表面の洗浄を行うような場合には、基板５１の表面に対してある程度、ブラシを基板５１側に押し込む必要があるため、基板５１が通過していない状態では上下のブラシが互いに接触することになり、このとき、ブラシ毛先端同志が擦れて摩耗し、これが発塵の原因になるという問題を有していた。このようなブラシ毛による発塵は、基板５１の表面に対するブラシの押し込み量が多いほど、また、基板５１が薄くなるほど、ブラシがロールブラシ５３の場合にブラシ回転数が高いほど顕著になる。特に、液晶表示器用ガラス基板ではその表面に高いクリーン度が要求されているため、発塵防止対策が重要な課題となっている。
【０００７】
次に、上記従来の構成で、図１２および図１３のように上側ディスクブラシ６１，６２または上側ロールブラシ７１，７２，７３などの上側ブラシの真下に全面支持ロール６４，６５または全面支持ロール７６〜７８がそれぞれ配設されている位置では、これらの全面支持ロール６４，６５または全面支持ロール７６〜７８上を基板６６がそれぞれ搬送されるので、基板６６や洗浄液の重量の他に上側ブラシの基板６６上面への加圧によっても基板６６が撓まず、基板６６が下方向に移動することがなく、基板搬送基準面が確定するので、上側ブラシの基板６６上面への接触も均一となっている。しかし、上記下側ディスクブラシ６３または下側ロールブラシ７４，７５などの位置では、それらの下側ブラシの基板６６の裏面への押し込み量によっては基板６６が上方向に移動し得るため、下側ブラシ部分での基板搬送基準面が確定せず、基板位置が上方向に移動して、基板裏面とブラシとの接触が不均一になりやすいという問題があった。
【０００８】
また、これらの全面支持ロール６４，６５または全面支持ロール７６〜７８の存在が逆に、基板６６の裏面を汚染してしまうという問題を有していた。つまり、最近では、基板の裏面の洗浄度も要求されるようになってきており、上記全面支持ロール６４，６５または全面支持ロール７６〜７８が基板６６の全裏面に亘って接触することで基板６６の裏面を汚染してしていた。
【０００９】
本発明は、上記問題を解決するもので、搬送基準面の調整が容易で板状部材両面の洗浄度をより高くすることができると共に、発塵をも抑制することができる洗浄装置を提供することを目的とする。
【００１０】
【課題を解決するための手段】
本発明の洗浄装置は、搬送中の板状部材の上面および下面をそれぞれ洗浄する洗浄装置において、搬送最上流側に、板状部材の下面を洗浄する洗浄部材と、この洗浄部材に対向する位置に配置され前記洗浄部材とで前記板状部材の両端部を挟持する押え部材とを備えるとともに、前記下面を洗浄する洗浄部材および前記押え部材の下流側に、板状部材の上面を洗浄する上面洗浄部材と、この上面洗浄部材に対向する位置に配置され前記上面洗浄部材とで前記板状部材を幅方向に亘って挟持する支持部材とを備えたことを特徴とするものである。
【００１１】
この構成により、押え部材の存在で板状部材が上方向に移動することがなく、基板搬送基準面の調整が容易で板状部材下面への洗浄部材の接触が不均一とならず、また、板状部材の上面を洗浄する上面洗浄部材に対して支持部材を設けたので、板状部材が下方向に移動することがなく、基板搬送基準面の調整が容易で板状部材上面への洗浄部材の接触が不均一とならないことから、板状部材両面の洗浄度がより高くなる。また、このように、搬送最上流側に下面洗浄用の洗浄部材が設けられているので、その後の搬送経路に板状部材の下方向搬送基準面規定用の支持部材が配置されたとしても、支持部材へ来る基板の下面はすでに清浄であり、支持部材が汚染されることはなく、板状部材下面の汚れが支持部材を介して板状部材下面に再付着するようなことはなく板状部材下面の洗浄度もより高くなる。さらに、洗浄部材が対向して配設されていないので、特に洗浄部材がブラシ洗浄部材の場合のように互いのブラシ毛の摩耗による発塵の問題は抑制されることになる。
【００１２】
また、本発明の洗浄装置は、搬送中の板状部材の上面および下面をそれぞれ洗浄する洗浄装置において、搬送最下流側に、板状部材の下面を洗浄する洗浄部材と、この洗浄部材に対向する位置に配置され前記洗浄部材とで前記板状部材の両端部を挟持する押え部材とを備えるとともに、前記下面を洗浄する洗浄部材および前記押え部材の上流側に、板状部材の上面を洗浄する上面洗浄部材と、この上面洗浄部材に対向する位置に配置され前記上面洗浄部材とで前記板状部材を幅方向に亘って挟持する支持部材とを備えたことを特徴とするものである。
【００１３】
この構成により、押え部材の存在で板状部材が上方向に移動することがなく、基板搬送基準面の調整が容易で板状部材下面への洗浄部材の接触が不均一とならず、また、その上流側に板状部材の上面を洗浄する上面洗浄部材に対して支持部材が設けてあるので、板状部材が下方向に移動することがなく、基板搬送基準面の調整が容易で板状部材上面への洗浄部材の接触が不均一とならないことから、板状部材両面の洗浄度がより高くなる。また、このような板状部材の下方向搬送基準面規定用の支持部材が上流側に配置されたとしても、その後の搬送最下流側に板状部材下面洗浄用の洗浄部材が配設されているので、板状部材の搬送を支持する支持部材で板状部材の下面が汚染されたとしても最終的にその汚染を洗浄除去することが可能となる。さらに、洗浄部材が対向して配設されていないので、特に洗浄部材がブラシ洗浄部材の場合のように互いのブラシ毛の摩耗による発塵の問題は抑制されることになる。
【００１４】
さらに、本発明の洗浄装置は、搬送中の板状部材の上面および下面をそれぞれ洗浄する洗浄装置において、搬送最上流側に、板状部材の下面を洗浄する洗浄部材と、この洗浄部材に対向する位置に配置され前記洗浄部材とで前記板状部材の両端部を挟持する押え部材とを備え、搬送最下流側に、板状部材の下面を洗浄する洗浄部材と、この洗浄部材に対向する位置に配置され前記洗浄部材とで前記板状部材の両端部を挟持する押え部材とを備え、かつ、前記最上流側の洗浄部材と前記最下流側の洗浄部材との間に、板状部材の上面を洗浄する上面洗浄部材と、この上面洗浄部材に対向する位置に配置され前記上面洗浄部材とで前記板状部材を幅方向に亘って挟持する支持部材とを備えたことを特徴とするものである。
【００１５】
この構成により、押え部材で搬送基準面の調整が容易になり、また同様に、板状部材の上面を洗浄する上面洗浄部材に対して支持部材が設けてあるので、板状部材が下方向に移動することがなく、基板搬送基準面の調整が容易で、板状部材両面の洗浄度がより高くなる。また、このような板状部材の下方向の搬送基準面規定用の支持部材が配置されたとしても、搬送最上流側に下面洗浄用の洗浄部材が設けられているので、支持部材へ来る基板の下面はすでに清浄であり、支持部材が汚染されることはなく、板状部材下面の汚れが支持部材を介して板状部材下面に再付着することなく、また、万一、板状部材下面の汚れが残ったり、また、支持部材に汚染があったとしても、搬送最下流側に板状部材下面洗浄用の洗浄部材が配設されているので、最終的にその汚染を洗浄することが可能となる。さらに、従来のように洗浄部材が対向して配設されていないので、特に洗浄部材がブラシ洗浄部材の場合のように互いのブラシ毛の摩耗による発塵の問題は抑制されることになる。
【００１６】
さらに、好ましくは、本発明の洗浄装置における洗浄部材はブラシ洗浄部材で構成され、押え部材はローラ部材で構成されている。この構成により、本発明を容易に適応することが可能となる。
【００１７】
【発明の実施の形態】
以下、本発明に係る洗浄装置の実施形態について図面を参照して説明する。
（実施形態１）
図１は本発明の実施形態１における基板洗浄装置を含む基板洗浄システムの構成を示す平面図である。
【００１８】
図１において、この基板洗浄システムは、主に、基板供給部または基板排出部として機能するインデクサ装置１と、板状部材としてのガラス基板などの基板２の表面および裏面をそれぞれブラシ洗浄部材で洗浄する基板洗浄装置３と、インデクサ装置１と基板洗浄装置３の間で基板２を搬出入を行うロボット装置４とで構成されている。
【００１９】
このインデクサ装置１には、角形の基板２を複数枚収納可能なカセット５，６を載置する載置台７が設けられている。これらのカセット５，６は、例えば自動搬送ロボット（図示せず）により載置台７上の所定の位置に搬送されてくる。カセット５，６が載置台７上に設置された状態で、ロボット装置４によるカセット５からの基板２の取り出し、およびカセット６への洗浄処理後の基板２の収納が可能となる。
【００２０】
このように、ロボット装置４は、カセット５と基板洗浄装置３の搬入側との間および、カセット６と基板洗浄装置３の搬出側との間に移動自在であり、図示しない旋回、進退および上下移動可能なハンドによって基板２の周辺部を吸着支持した状態で、制御部からの指令に応じてハンドを基板２と共に移動させて、カセット５から基板洗浄装置３の搬入側に基板２の搬入を行うことができ、また、基板洗浄装置３の搬出側からカセット６に基板２の搬出を行うことができる。
【００２１】
図２は図１の基板洗浄装置の要部を示す部分側面図であり、図３は図１の基板洗浄装置の搬送ローラ、上乗せローラ、基板支持ロールおよびロールブラシの構成を詳しく示す断面図である。
【００２２】
図２および図３において、この基板洗浄装置３は、基板２の搬入側に前側コンベア部１１が配設され、ブラシ洗浄処理後の基板２の搬出側に後側コンベア部１２が配設され、これらの前側コンベア部１１と後側コンベア部１２との間にブラシ洗浄部１３が配設されている。
【００２３】
これらの前側コンベア部１１および後側コンベア部１２では、複数の搬送ローラ１４が互いに平行に搬送方向に配設されている。これらの各搬送ローラ１４の構成については後述するが、これらの各搬送ローラ１４は図示しない駆動部と連結されており、駆動部からの駆動力によって一定方向に回転して基板２を表面側を上にして水平に保持した状態で搬送方向Ａに搬送する構成となっている。
【００２４】
また、ブラシ洗浄部１３は、前側コンベア部１１と後側コンベア部１２との間の基板洗浄搬送経路に配設されており、基板２の表面および裏面にノズルＮから純水、洗剤などの洗浄液を供給しつつブラシによって洗浄するように構成されている。その経路上流側に、基板２の裏面を洗浄する下側ロールブラシ１７と、この下側ロールブラシ１７の上方に配設され下側ロールブラシ１７とで基板２の幅の両端部をそれぞれ挾持する基板押えロール１８とを、それらの軸心が上下平行になるようにそれぞれ配設しており、これらの下側ロールブラシ１７と各基板押えロール１８との間を基板２が搬送されるように構成されている。この場合、押え部材としての各基板押えロール１８は、基板２の裏面により均一にブラシが当接するように平面性を維持するため、下側ロールブラシ１７に対向するように前後に２個配設されているが、基板２に剛性があれば撓みにくく平面性を維持できるため、１個の基板押えロール１８でもよい。また、これらの各基板押えロール１８は、基板２の汚染や損傷などを防止するために、各基板押えロール１８が基板２の中央部に当接しないように基板２の両端縁部をそれぞれ押えるように構成されている。このように、下側ロールブラシ１７により基板２の下側からブラシで押圧する部位では、各基板押えロール１８で基板２の両端縁部をそれぞれ押えていれば、下側ロールブラシ１７の基板２の裏面への押し込み量が多くても、基板２自体が持つ剛性に加え、基板２の自重や基板２上に乗っている洗浄液の重量などがかかるため、基板２が上方向に移動したり撓んだりするようなこともない。さらに、下側ロールブラシ１７はその上方を通過する基板２の幅に亘って配設されており、各基板押えロール１８の存在により下側ロールブラシ１７の基板２の裏面への押し込み量が適度に調整可能であり、下側ロールブラシ１７の基板２の裏面への均一な接触を容易に得ることが可能である。
【００２５】
また、基板洗浄搬送経路の下流側には、基板２の表面を洗浄する上側ロールブラシ１９と、この上側ロールブラシ１９の真下に配設され基板２の幅全体に亘って基板２を支持する支持部材としての基板支持ロール２０とを、それらの軸心が上下平行になるようにそれぞれ配設しており、これらの上側ロールブラシ１９と基板支持ロール２０との間を基板２が搬送されるように構成されている。この場合、基板支持ロール２０は、その上方を通過する基板２の幅全体に亘って支持するいわゆる全面支持ロールであり、基板支持ロール２０の存在により、基板２や洗浄液の自重に加えて上側ロールブラシ１９の加圧によっても基板２が下方向に撓むようなことはなくより均一に上側ロールブラシ１９を基板２の表面に当接させることが可能となる。また、上側ロールブラシ１９はその下方を通過する基板幅全体に亘って配設されており、各基板支持ロール２０の存在により上側ロールブラシ１９の基板２の表面への押し込み量が適度に調整されて上側ロールブラシ１９の基板２の表面への均一な接触を得ることが可能となる。
【００２６】
さらに、これらの下側ロールブラシ１７および上側ロールブラシ１９の前後位置にはそれぞれ、搬送ローラ２１〜２３が互いに平行に搬送方向Ａに沿って配設されている。ブラシ洗浄部１３におけるこれらの各搬送ローラ２１〜２３は、図３（ａ）に示すように、軸部１５と、この軸部１５の両端部に配設され基板２の両端縁をそれぞれ支持する支持軸部１６ａおよび、この支持軸部１６ａに連なるつば部１６ｂとを有している。この両端のつば部１６ｂと支持軸部１６ａとの間はテーパ部で構成されている。このテーパ部で基板２を案内しつつ両支持軸部１６ａ上に設置可能な構成になっている。また、これらの各搬送ローラ２１〜２３は駆動部と連結されており、駆動部からの駆動力によって一定方向に回転して基板２を水平に保持した状態で搬送方向Ａに搬送する構成となっている。
【００２７】
また、これらの各搬送ローラ２１〜２３上にはそれぞれ、基板２の両端縁２ａを挾持すべく上乗せローラ２４〜２６がそれぞれ配設されている。これらの上乗せローラ２４〜２６はそれぞれ、軸部２７と、この軸部２７の両端部に配設され基板２の両端縁２ａをそれぞれ転がりながら押える円形つば部２８とを有している。このように、図３（ａ）に示す上乗せローラ２６と、他の上乗せローラ２４，２５とは同様の構成であり、搬送ローラ２３は他の搬送ローラ２１，２２と同様の構成である。また、前側コンベア部１１、後側コンベア部１２における搬送ローラ１４は、上乗せローラと組み合わせられてはいないが、その構成は搬送ローラ２３と同様である。なお、搬送ローラ１４にも同様の上乗せローラを組み合わせてもよい。
【００２８】
上記構成により、インデクサ装置１の載置台７上に載置されたカセット５からロボット装置４のハンドにより基板２を吸着して取り出して基板洗浄装置３の搬入側の各搬送ローラ１４上に搬入する。このように、カセット５から各搬送ローラ１４上に搬送された基板２は、ブラシ洗浄部１３で基板２の表面および裏面がそれぞれ洗浄されることになる。
【００２９】
このとき、まず、基板洗浄搬送経路の上流側では、下側ロールブラシ１７と各基板押えロール１８との間隔が調整されており、各基板押えロール１８の存在で基板搬送基準面が確定するため、適度なブラシの押し込み量に容易に設定することができると共に、下側ロールブラシ１７の基板２の裏全面に対する均一接触を得ることができる。
【００３０】
次に、基板洗浄搬送経路の下流側では、上側ロールブラシ１９と基板支持ロール２０との間隔が調整されており、基板支持ロール２０の存在で、容易に基板搬送基準面が確定し、適度な上側ロールブラシ１９の押し込み量に設定することができると共に、上側ロールブラシ１９の基板２の表全面に対する均一接触を得ることができる。このようにして、ブラシ洗浄部１３で基板２の表面および裏面をそれぞれ洗浄することができる。
【００３１】
その後、ブラシ洗浄処理が終了した基板２は、基板洗浄装置３の搬出側における後側コンベア部１２の各搬送ローラ１４上からロボット装置４のハンドにより基板２を吸着して取り出してカセット６内に収納する。
【００３２】
このように、下側ロールブラシ１７の真上には各基板押えロール１８が存在し、また、上側ロールブラシ１９の真下には基板支持ロール２０が存在するため、基板搬送基準面が確定し、基板２の両面に対するブラシの均一接触のためのブラシ押し込み量調整を容易に行うことができて、基板２の安定搬送と共に安定洗浄を行うことができる。
【００３３】
また、基板２の裏面が汚れていると、その汚れが全面支持ロールである基板支持ロール２０に付着すると共に基板支持ロール２０から基板２の裏面に再付着して基板２の裏面が汚染されることが考えられるが、この実施形態１では、下側ロールブラシ１７を基板洗浄の搬送経路最上流側に配置して先に基板２の裏面を洗浄してしまっているので、次にくる基板支持ロール２０も汚染されずに済み、基板２の裏面の汚染も軽減されることになる。その後、搬送経路下流側で基板２の表面側を基板支持ロール２０に対して上側ロールブラシ１９で加圧しながら洗浄すれば、基板２の両面の洗浄度をより高くすることができる。
【００３４】
さらに、基板２が通過していない状態であっても、従来のように、下側ロールブラシ１７と上側ロールブラシ１９とが互いに接触するようなことがなく、ブラシ毛先端同志が擦れることによる発塵はなくなって発塵をより抑制させることができる。
【００３５】
（実施形態２）
上記実施形態１では基板搬送経路上流側で下側ロールブラシ１７を用い、基板搬送経路下流側で上側ロールブラシ１９を用いたが、本実施形態２では、更なる基板両面の洗浄度を向上させるべく、その後の少なくとも最終洗浄工程に上記実施形態１と同様の下側ロールブラシ１７を用いると共に、この下側ロールブラシ１７の真上に基板押えロール１８を用いる場合である。
【００３６】
図４は本発明の実施形態２における基板洗浄装置の要部を示す部分側面図であり、図２と同様の作用、効果を奏する部材には同様の符号を付してその説明を省略する。
【００３７】
図４において、図２のブラシ洗浄部１３の搬送経路後流側に、上側ロールブラシ１９および基板押えロール１８、さらに下側ロールブラシ１７および基板支持ロール２０と同様の部材を配設している。
【００３８】
この構成により、基板押えロール１８で基板２の上方向の搬送基準面の調整が容易になり、また、基板２の表面を洗浄する上側ロールブラシ１９に対して基板支持ロール２０を設けているので、基板２の下方向の搬送基準面の調整が容易で、基板２の両面の洗浄度をより高くすることができる。また、このような基板２の下方向の搬送基準面規定用の基板支持ロール２０が配置されたとしても、搬送最上流側に裏面洗浄用の下側ロールブラシ１７が設けられているので、基板２の裏面の汚れが下側ロールブラシ１７を介して基板２の裏面に再付着することなく、また、基板２の裏面の汚れが残ったとしても、搬送最下流側に基板２の裏面洗浄用の下側ロールブラシ１７が配設されているので、最終的にその汚染を洗浄することができる。さらに、従来のように上側ロールブラシ１９および下側ロールブラシ１７が対向して配設されていないので、互いのブラシ毛の摩耗による発塵の問題も抑制される。
【００３９】
（変形例）
上記実施形態１では、ブラシに下側ロールブラシ１７および上側ロールブラシ１９を用いたが、これらの下側ロールブラシ１７および上側ロールブラシ１９の代わりに、図５のように、下側ディスクブラシ４１および上側ディスクブラシ４２を用いてもよい。また、ロールブラシとディスクブラシが混在していてもよく、例えば図６のように、搬送経路上流側で下側ロールブラシ１７を用い、搬送経路下流側で上側ディスクブラシ４２を用いてもよく、または、搬送経路上流側で下側ディスクブラシ４１を用い、搬送経路下流側で上側ロールブラシ１９を用いてもよい。これらの場合にも、上記実施形態１と同様に、基板押えロール１８および基板支持ロール２０を用いることができる。また、基板支持ロール２０は上側ブラシの下方向に対向するように前後に２個以上配設してもよく、この場合には、より均一な平面度が得られる。
【００４０】
また、上記実施形態２では、ブラシに下側ロールブラシ１７、上側ロールブラシ１９、上側ロールブラシ１９さらに下側ロールブラシ１７を用いたが、これらの下側ロールブラシ１７および上側ロールブラシ１９の代わりに、図７のように、下側ディスクブラシ４１、上側ディスクブラシ４２、上側ディスクブラシ４２さらに下側ディスクブラシ４１を用いてもよい。また、ロールブラシとディスクブラシが混在していてもよく、例えば図８のように、搬送経路上流側で下側ロールブラシ１７さらに上側ディスクブラシ４２を用い、搬送経路下流側で上側ディスクブラシ４２さらに下側ロールブラシ１７を用いてもよく、または、搬送経路上流側で下側ディスクブラシ４１さらに上側ロールブラシ１９を用い、搬送経路下流側で上側ロールブラシ１９さらに下側ディスクブラシ４１を用いてもよい。これらの場合にも、上記実施形態１と同様に、基板押えロール１８および基板支持ロール２０を用いることができる。
【００４１】
さらに、上記実施形態２では、下側ロールブラシ１７、上側ロールブラシ１９、上側ロールブラシ１９さらに下側ロールブラシ１７の順に配設したが、搬送最上流側および搬送最下流側に下側ロールブラシ１７および基板押えロール１８をそれぞれ配設すればよく、搬送最上流側と搬送最下流側との間には上側ロールブラシ１９および基板支持ロール２０の組みが少なくとも１組みあればよく、この間に下側ロールブラシ１７および基板押えロール１８の組みが含まれていてもよい。
【００４２】
さらに、ブラシ洗浄部がディスクブラシで構成され、特に、図９に示すように、円形のディスクブラシ４３が基板２の幅方向に沿って複数個配設される場合には、各ディスクブラシ４３間に隙間ができないように千鳥形状に配設して洗浄する。このように、ディスクブラシ４３を千鳥形状に配設すると、配設スペースの面積が増える。
【００４３】
さらに、上記実施形態１，２では、下側ロールブラシ１７および上側ロールブラシ１９による基板２の洗浄時に、洗浄液は、下側ロールブラシ１７および上側ロールブラシ１９の若干上流側の両側方より供給するようにしているが、これらの下側ロールブラシ１７および上側ロールブラシ１９自体の中央部からそれぞれ供給するような構成であってもよい。なお、以上の変形例の説明では、ノズルＮの図示は省略している。
【００４４】
【発明の効果】
以上のように本発明によれば、下側の洗浄部材の上方に対向して押え部材を設けたため、板状部材下面への洗浄部材の接触が不均一とならず、また、板状部材の上面を洗浄する上面洗浄部材に対して支持部材を設けたので、板状部材上面への洗浄部材の接触も不均一とならず、板状部材両面の洗浄度をより高くすることができる、また、このような支持部材が板状部材下面側に配置されたとしても、搬送最上流側に下面洗浄用の洗浄部材が設けられているため、板状部材下面の汚れが支持部材を介して板状部材下面に再付着するようなことなく板状部材下面の洗浄度もより高くなる。さらに、洗浄部材が対向配設ではないため、従来のような発塵をも抑制することができる。
【００４５】
また、上側の上面洗浄部材の下方に対向して支持部材を設けたとしても、搬送最下流側に板状部材下面洗浄用の洗浄部材が配設されているため、その支持部材で板状部材の下面が汚染されたとしても最終的にその汚染を洗浄することで板状部材下面の洗浄度をより高くすることができる。
【００４６】
さらに、上側の上面洗浄部材の下方に対向して支持部材を設けたとしても、搬送最上流側に下面洗浄用の洗浄部材が設けられているため、板状部材下面の汚れが支持部材を介して板状部材下面に再付着することなく、また、板状部材下面の汚れが残ったとしても、搬送最下流側に板状部材下面洗浄用の洗浄部材が配設されているため、最終的にその汚染を洗浄することができて、板状部材下面の洗浄度をより高くすることができる。
【図面の簡単な説明】
【図１】本発明の実施形態１における基板洗浄装置を含む基板洗浄システムの構成を示す平面図である。
【図２】図１の基板洗浄装置の要部を示す部分側面図である。
【図３】図１の基板洗浄装置の搬送ローラ、上乗せローラ、基板支持ロールおよびロールブラシの構成を詳しく示す断面図である。
【図４】本発明の実施形態２における基板洗浄装置の要部を示す部分側面図である。
【図５】図２の基板洗浄装置の要部の変形例を模式的に示す部分側面図である。
【図６】図２の基板洗浄装置の要部の他の変形例を模式的に示す部分側面図である。
【図７】図４の基板洗浄装置の要部の変形例を模式的に示す部分側面図である。
【図８】図４の基板洗浄装置の要部の他の変形例を模式的に示す部分側面図である。
【図９】基板の幅方向に沿って複数の円形ディスクブラシを配設した場合の従来の洗浄ブラシのレイアウトを模式的に示す平面図である。
【図１０】ディスクブラシを対向配設した場合の従来のブラシ洗浄装置の要部を模式的に示す部分側面図である。
【図１１】ロールブラシを対向配設した場合の従来のブラシ洗浄装置の要部を模式的に示す部分側面図である。
【図１２】基板表面側により多くのディスクブラシを配設した場合の従来のブラシ洗浄装置の要部を模式的に示す部分側面図である。
【図１３】基板表面側により多くのロールブラシを配設した場合の従来のブラシ洗浄装置の要部を模式的に示す部分側面図である。
【符号の説明】
２基板
３基板洗浄装置
１３ブラシ洗浄部
１７下側ロールブラシ（洗浄部材）
１８基板押えロール（押え部材）
１９上側ロールブラシ
２０基板支持ロール
４１下側ディスクブラシ
４２上側ディスクブラシ
４３円形ディスクブラシ[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a cleaning apparatus that cleans the front and back surfaces of substrates such as glass substrates for liquid crystal displays and printed boards and plate-like members such as semiconductor wafers with a brush or the like.
[0002]
[Prior art]
As shown in FIG. 10, the conventional brush cleaning apparatus has a disk brush 51 disposed vertically opposite to each other, and a substrate 52 such as a glass substrate or a printed circuit board serving as a plate member is horizontally positioned between the upper and lower disk brushes 51. The front and back surfaces of the substrate 52 were cleaned at the same time. Further, instead of these disc brushes 51, the upper and lower roll brushes 53 as shown in FIG. 11 are rotated, and the upper and lower roll brushes 53 squeeze the front and back surfaces of the substrate 52 and simultaneously wash them.
[0003]
In addition, for example, in the manufacturing process of a liquid crystal display, when a substrate is subjected to various processes such as a photolithography process, the surface subjected to such a process (hereinafter referred to as the front surface) has a higher degree of cleaning than the back surface. It is the present situation that there are many cases that are required. For this reason, more brushes are provided on the front side of the substrate than on the back side. For example, in the brush cleaning apparatus as shown in FIG. 12, the upper disk brushes 61 and 62 are disposed at a predetermined distance with respect to the conveying direction A, and the lower disk brush is interposed between the upper disk brushes 61 and 62. 63, and full-surface support rolls 64 and 65 are respectively disposed below the upper disk brushes 61 and 62 so as to face each other. The substrate 66 is transported in a horizontal posture between the upper disk brushes 61 and 62, the lower disk brush 63, and the entire surface support rolls 64 and 65, so that the surface side of the substrate 66 is cleaned. Washing was performed so that the degree was higher than that on the back side.
[0004]
Further, for example, as a brush cleaning device using a roll brush instead of the disc brush, upper roll brushes 71, 72, 73 are arranged at predetermined distances in the transport direction A as shown in FIG. In addition, a lower roll brush 74 is disposed between the upper roll brushes 71, 72, a lower roll brush 75 is disposed between the upper roll brushes 72, 73, and the upper roll brushes 71, 72, 73 are disposed. Full surface support rolls 76, 77, and 78 are respectively arranged so as to face the lower side of each. The substrate 66 is conveyed in a horizontal posture between the upper roll brushes 71, 72, 73 and the lower roll brushes 74, 75 and the entire surface support rolls 76, 77, 78, with the front side facing up, whereby the substrate Cleaning was performed so that the cleaning degree on the front surface side of 66 was higher than that on the back surface side.
[0005]
[Problems to be solved by the invention]
10 and 11, when a brush such as a disc brush 51 or a roll brush 53 is disposed oppositely, the support on both surfaces of the substrate 51 at this portion is to balance the pressing of the upper and lower brushes. Therefore, it is difficult to adjust the position of the substrate in the vertical direction (hereinafter referred to as the substrate transfer reference surface), and the contact between the both surfaces of the substrate and the brush is likely to be uneven due to the substrate position moving up and down. There was a problem that the degree decreased. Further, for example, when the lower brush supporting the back surface of the substrate 51 is rattled, the lower brush is in non-uniform contact with the back surface of the substrate 51, and the substrate The upper brush is also affected by uneven contact with the surface of 51, and there is a problem that the degree of cleaning on both sides of the substrate is lowered.
[0006]
Further, when cleaning the surface of the substrate 51 with such a brush, it is necessary to push the brush to the substrate 51 side to some extent with respect to the surface of the substrate 51, so that the substrate 51 has not passed through. Then, the upper and lower brushes come into contact with each other. At this time, the brush bristle tips rub and wear, and this causes a problem of dust generation. Such dust generation due to the bristle becomes more conspicuous as the amount of pressing of the brush against the surface of the substrate 51 is larger, as the substrate 51 is thinner, and when the brush is the roll brush 53, the higher the brush rotation speed is. In particular, since a glass substrate for a liquid crystal display requires a high degree of cleanness on its surface, measures to prevent dust generation have become an important issue.
[0007]
Next, in the above-described conventional configuration, as shown in FIGS. 12 and 13, the full support rolls 64 and 65 or the full support roll 76 are directly below the upper brushes such as the upper disc brushes 61 and 62 or the upper roll brushes 71, 72, and 73. ˜78 are respectively disposed on the entire surface support rolls 64, 65 or the entire surface support rolls 76-78. Therefore, in addition to the weight of the substrate 66 and the cleaning liquid, Even when pressure is applied to the upper surface of the substrate 66, the substrate 66 does not bend and the substrate 66 does not move downward, and the substrate transport reference surface is determined. Therefore, the contact of the upper brush with the upper surface of the substrate 66 becomes uniform. Yes. However, at the position of the lower disk brush 63 or the lower roll brushes 74 and 75, the substrate 66 can move upward depending on the amount of the lower brush pushed into the back surface of the substrate 66. There is a problem that the substrate conveyance reference plane at the brush portion is not fixed, the substrate position moves upward, and the contact between the back surface of the substrate and the brush tends to be non-uniform.
[0008]
Further, the presence of these full-scale support rolls 64 and 65 or full-scale support rolls 76 to 78 conversely has a problem that the back surface of the substrate 66 is contaminated. In other words, recently, the degree of cleaning of the back surface of the substrate is also required, and the full-surface support rolls 64 and 65 or the full-surface support rolls 76 to 78 come into contact with the entire back surface of the substrate 66 so that the substrate is touched. The back of 66 was contaminated.
[0009]
The present invention solves the above-described problem, and provides a cleaning apparatus that can easily adjust the conveyance reference surface, increase the degree of cleaning on both sides of the plate-like member, and suppress dust generation. For the purpose.
[0010]
[Means for Solving the Problems]
The cleaning device of the present invention is a cleaning device that cleans the upper surface and the lower surface of a plate-like member that is being transported, a cleaning member that cleans the lower surface of the plate-like member on the most upstream side of the transport, and a position facing the cleaning member Arranged in the cleaning member and the plate-like member Both A presser member that clamps the end The upper surface cleaning member for cleaning the upper surface of the plate-like member and the upper surface cleaning member disposed at a position facing the upper surface cleaning member on the downstream side of the cleaning member for cleaning the lower surface and the pressing member And a support member for holding the plate-like member across the width direction. It is characterized by that.
[0011]
With this configuration, the plate member does not move upward due to the presence of the pressing member, the adjustment of the substrate transport reference surface is easy, and the contact of the cleaning member to the lower surface of the plate member is not uneven. Clean the top surface of the plate member Top Provide a support member for the cleaning member Because Since the plate member does not move downward, the adjustment of the substrate conveyance reference surface is easy, and the contact of the cleaning member with the upper surface of the plate member does not become uneven. Get higher. Further, as described above, since the cleaning member for cleaning the lower surface is provided on the most upstream side of the transfer, even if the support member for defining the lower transfer reference plane of the plate-like member is arranged in the subsequent transfer path, The bottom surface of the substrate coming to the support member is already clean, the support member is not contaminated, and the bottom surface of the plate-like member is not adhered to the bottom surface of the plate-like member via the support member. The degree of cleaning of the lower surface of the member is also increased. Further, since the cleaning members are not arranged to face each other, the problem of dust generation due to the wear of the brush hairs is suppressed as in the case where the cleaning member is a brush cleaning member.
[0012]
Further, the cleaning device of the present invention is a cleaning device for cleaning the upper surface and the lower surface of the plate-like member being transported, and the cleaning member for cleaning the lower surface of the plate-like member is disposed on the most downstream side of the transport, and is opposed to the cleaning member. The plate-like member arranged with the cleaning member Both A presser member that clamps the end The upper surface cleaning member for cleaning the upper surface of the plate-like member and the upper surface cleaning member disposed at a position facing the upper surface cleaning member are disposed upstream of the cleaning member for cleaning the lower surface and the pressing member. And a support member for holding the plate-like member across the width direction. It is characterized by that.
[0013]
With this configuration, the plate member does not move upward due to the presence of the pressing member, the adjustment of the substrate transport reference surface is easy, and the contact of the cleaning member to the lower surface of the plate member is not uneven. On the upstream side Clean the top surface of the plate member Top Support member for cleaning member But Establishment Because Since the plate member does not move downward, the adjustment of the substrate conveyance reference surface is easy, and the contact of the cleaning member with the upper surface of the plate member does not become uneven. Get higher. In addition, a support member for defining the downward conveyance reference surface of such a plate-like member is provided. Upstream Even if it is arranged, since the cleaning member for cleaning the lower surface of the plate-like member is arranged on the downstream side of the subsequent conveyance, the lower surface of the plate-like member is contaminated by the support member that supports the conveyance of the plate-like member. In the end, it becomes possible to clean and remove the contamination. Further, since the cleaning members are not arranged to face each other, the problem of dust generation due to the wear of the brush hairs is suppressed as in the case where the cleaning member is a brush cleaning member.
[0014]
Furthermore, the cleaning device of the present invention is a cleaning device for cleaning the upper surface and the lower surface of the plate-like member being transported, the cleaning member for cleaning the lower surface of the plate-like member on the most upstream side of the transport, and the cleaning member The plate-like member arranged with the cleaning member Both A presser member for clamping the end With The plate-like member is arranged on the most downstream side of the conveyance with the washing member for washing the lower surface of the plate-like member and the washing member arranged at a position facing the washing member Both A presser member for clamping the end And an upper surface cleaning member for cleaning the upper surface of the plate-like member between the most upstream side cleaning member and the most downstream side cleaning member, and disposed at a position facing the upper surface cleaning member. A support member for clamping the plate-like member across the width direction with the upper surface cleaning member. Preparation I got It is characterized by this.
[0015]
With this configuration, it becomes easy to adjust the conveyance reference surface with the pressing member, and similarly, the upper surface of the plate-like member is cleaned. Top Support member for cleaning member But Establishment Because The plate-like member does not move downward, the adjustment of the substrate transport reference surface is easy, and the degree of cleaning on both sides of the plate-like member is higher. Further, even if such a support member for defining the conveyance reference surface in the downward direction is disposed, since the cleaning member for cleaning the lower surface is provided on the most upstream side of the conveyance, the substrate coming to the support member The lower surface of the plate member is already clean, the support member is not contaminated, and the stain on the lower surface of the plate member does not reattach to the lower surface of the plate member through the support member. Even if the dirt remains or the support member is contaminated, since the cleaning member for cleaning the lower surface of the plate-like member is disposed on the most downstream side of the conveyance, the contamination can be finally cleaned. It becomes possible. Further, since the cleaning members are not arranged to face each other as in the prior art, the problem of dust generation due to the wear of the brush hairs is suppressed as in the case where the cleaning member is a brush cleaning member.
[0016]
Further preferably, the cleaning member in the cleaning device of the present invention is configured by a brush cleaning member, and the pressing member is configured by a roller member. With this configuration, the present invention can be easily applied.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of a cleaning apparatus according to the present invention will be described with reference to the drawings.
(Embodiment 1)
FIG. 1 is a plan view showing a configuration of a substrate cleaning system including a substrate cleaning apparatus according to Embodiment 1 of the present invention.
[0018]
In FIG. 1, the substrate cleaning system mainly cleans the front and back surfaces of an indexer device 1 that functions as a substrate supply unit or a substrate discharge unit and a substrate 2 such as a glass substrate as a plate-like member by a brush cleaning member. And the robot apparatus 4 that carries the substrate 2 in and out between the indexer apparatus 1 and the substrate cleaning apparatus 3.
[0019]
The indexer device 1 is provided with a mounting table 7 on which cassettes 5 and 6 capable of storing a plurality of rectangular substrates 2 are mounted. These cassettes 5 and 6 are transported to a predetermined position on the mounting table 7 by, for example, an automatic transport robot (not shown). In a state where the cassettes 5 and 6 are installed on the mounting table 7, the robot 2 can take out the substrate 2 from the cassette 5 and store the substrate 2 after the cleaning process into the cassette 6.
[0020]
As described above, the robot apparatus 4 is movable between the cassette 5 and the carry-in side of the substrate cleaning apparatus 3 and between the cassette 6 and the carry-out side of the substrate cleaning apparatus 3, and turns, moves back and forth and moves up and down (not shown). In a state where the peripheral portion of the substrate 2 is sucked and supported by a movable hand, the hand is moved together with the substrate 2 in accordance with a command from the control unit, and the substrate 2 is loaded from the cassette 5 to the loading side of the substrate cleaning apparatus 3. In addition, the substrate 2 can be unloaded from the unloading side of the substrate cleaning apparatus 3 to the cassette 6.
[0021]
2 is a partial side view showing the main part of the substrate cleaning apparatus of FIG. 1, and FIG. 3 is a sectional view showing in detail the configuration of the transport roller, the loading roller, the substrate support roll and the roll brush of the substrate cleaning apparatus of FIG. is there.
[0022]
2 and 3, the substrate cleaning apparatus 3 includes a front conveyor unit 11 on the carry-in side of the substrate 2, and a rear conveyor unit 12 on the carry-out side of the substrate 2 after the brush cleaning process. A brush cleaning unit 13 is disposed between the front conveyor unit 11 and the rear conveyor unit 12.
[0023]
In the front conveyor unit 11 and the rear conveyor unit 12, a plurality of conveyance rollers 14 are arranged in parallel in the conveyance direction. Although the configuration of each of these transport rollers 14 will be described later, each of these transport rollers 14 is connected to a drive unit (not shown), and rotates in a certain direction by the drive force from the drive unit to move the substrate 2 over the surface side. It is configured to carry in the carrying direction A in a state where it is held upward and horizontally.
[0024]
The brush cleaning unit 13 is disposed in a substrate cleaning / conveying path between the front conveyor unit 11 and the rear conveyor unit 12, and cleaning liquid such as pure water and detergent is provided from the nozzle N to the front and back surfaces of the substrate 2. It is comprised so that it may wash | clean with a brush, supplying. On the upstream side of the path, the lower roll brush 17 for cleaning the back surface of the substrate 2 and the lower roll brush 17 disposed above the lower roll brush 17 hold both ends of the width of the substrate 2 respectively. The substrate pressing rolls 18 are arranged so that their axes are parallel in the vertical direction, and the substrate 2 is conveyed between the lower roll brush 17 and each substrate pressing roll 18. It is configured. In this case, two substrate pressing rolls 18 as pressing members are arranged in the front and rear so as to face the lower roll brush 17 in order to maintain the flatness so that the brush contacts the back surface of the substrate 2 uniformly. However, if the substrate 2 has rigidity, it is difficult to bend and can maintain flatness. Further, each of the substrate pressing rolls 18 presses both edge portions of the substrate 2 so that the substrate pressing rolls 18 do not come into contact with the central portion of the substrate 2 in order to prevent the substrate 2 from being contaminated or damaged. It is configured as follows. In this way, at the portion pressed by the lower roll brush 17 from the lower side of the substrate 2, the substrate 2 of the lower roll brush 17 can be obtained by pressing both end edges of the substrate 2 with each substrate pressing roll 18. Even if the amount of pushing into the back surface of the substrate 2 is large, in addition to the rigidity of the substrate 2 itself, the weight of the substrate 2 and the weight of the cleaning liquid on the substrate 2 are applied. There's no such thing as going crazy. Further, the lower roll brush 17 is arranged over the width of the substrate 2 passing above, and the presence of each substrate pressing roll 18 allows the lower roll brush 17 to be pushed into the back surface of the substrate 2 appropriately. Therefore, uniform contact of the lower roll brush 17 with the back surface of the substrate 2 can be easily obtained.
[0025]
Further, on the downstream side of the substrate cleaning transport path, an upper roll brush 19 that cleans the surface of the substrate 2 and a support that is arranged directly below the upper roll brush 19 and supports the substrate 2 over the entire width of the substrate 2. Substrate support rolls 20 as members are arranged so that their axes are parallel to each other so that the substrate 2 is conveyed between the upper roll brush 19 and the substrate support roll 20. It is configured. In this case, the substrate support roll 20 is a so-called full-scale support roll that supports the entire width of the substrate 2 that passes above, and the upper roll in addition to the weight of the substrate 2 and the cleaning liquid due to the presence of the substrate support roll 20. Even when the brush 19 is pressed, the substrate 2 is not bent downward, and the upper roll brush 19 can be brought into contact with the surface of the substrate 2 more uniformly. Further, the upper roll brush 19 is disposed over the entire width of the substrate passing therebelow, and the presence of each substrate support roll 20 adjusts the amount of pushing of the upper roll brush 19 onto the surface of the substrate 2 appropriately. Thus, uniform contact of the upper roll brush 19 with the surface of the substrate 2 can be obtained.
[0026]
Further, transport rollers 21 to 23 are arranged along the transport direction A in parallel with each other at the front and rear positions of the lower roll brush 17 and the upper roll brush 19, respectively. Each of these transport rollers 21 to 23 in the brush cleaning unit 13 is disposed at both ends of the shaft 15 and the both ends of the shaft 15 as shown in FIG. It has the support shaft part 16a and the collar part 16b which continues to this support shaft part 16a. A tapered portion is formed between the flange portion 16b and the support shaft portion 16a at both ends. The taper portion can be installed on both support shaft portions 16 a while guiding the substrate 2. Each of these transport rollers 21 to 23 is connected to a drive unit, and is configured to transport in the transport direction A while rotating the substrate 2 in a certain direction by the driving force from the drive unit and holding the substrate 2 horizontally. ing.
[0027]
Further, on the respective conveying rollers 21 to 23, the upper rollers 24 to 26 are respectively disposed so as to hold the both end edges 2a of the substrate 2. Each of the upper rollers 24 to 26 has a shaft portion 27 and circular collar portions 28 that are disposed at both ends of the shaft portion 27 and press both end edges 2a of the substrate 2 while rolling. Thus, the addition roller 26 and the other addition rollers 24 and 25 shown in FIG. 3A have the same configuration, and the conveyance roller 23 has the same configuration as the other conveyance rollers 21 and 22. In addition, the transport roller 14 in the front conveyor unit 11 and the rear conveyor unit 12 is not combined with an additional roller, but the configuration is the same as the transport roller 23. The transport roller 14 may be combined with a similar addition roller.
[0028]
With the above configuration, the substrate 2 is sucked and taken out from the cassette 5 placed on the placing table 7 of the indexer device 1 by the hand of the robot device 4 and carried onto the carrying rollers 14 on the carry-in side of the substrate cleaning device 3. . As described above, the substrate 2 transported from the cassette 5 onto the transport rollers 14 is cleaned by the brush cleaning unit 13 on the front surface and the back surface of the substrate 2.
[0029]
At this time, first, the distance between the lower roll brush 17 and each substrate presser roll 18 is adjusted on the upstream side of the substrate cleaning transport path, and the substrate transport reference plane is determined by the presence of each substrate presser roll 18. In addition, it is possible to easily set an appropriate amount of brush pressing, and to obtain uniform contact of the lower roll brush 17 with the entire back surface of the substrate 2.
[0030]
Next, on the downstream side of the substrate cleaning transport path, the distance between the upper roll brush 19 and the substrate support roll 20 is adjusted, and the presence of the substrate support roll 20 makes it easy to determine the substrate transport reference plane, The amount of pressing of the upper roll brush 19 can be set, and uniform contact of the upper roll brush 19 with the entire surface of the substrate 2 can be obtained. In this way, the front and back surfaces of the substrate 2 can be cleaned by the brush cleaning unit 13.
[0031]
Thereafter, the substrate 2 that has been subjected to the brush cleaning process is adsorbed and taken out by the hand of the robot device 4 from the respective transport rollers 14 of the rear conveyor section 12 on the carry-out side of the substrate cleaning device 3 and is put into the cassette 6. Store.
[0032]
Thus, each substrate pressing roll 18 exists directly above the lower roll brush 17, and since the substrate support roll 20 exists directly below the upper roll brush 19, the substrate transport reference plane is determined, The amount of brush pressing for uniform contact of the brush with both surfaces of the substrate 2 can be easily adjusted, and stable cleaning can be performed along with stable conveyance of the substrate 2.
[0033]
Further, when the back surface of the substrate 2 is dirty, the stain adheres to the substrate support roll 20 which is a full support roll, and is reattached from the substrate support roll 20 to the back surface of the substrate 2 to contaminate the back surface of the substrate 2. However, in the first embodiment, since the lower roll brush 17 is arranged on the most upstream side of the substrate cleaning conveyance path and the back surface of the substrate 2 is cleaned first, the next substrate support is provided. The roll 20 is not contaminated, and the contamination of the back surface of the substrate 2 is reduced. Thereafter, if the surface side of the substrate 2 is cleaned while being pressed against the substrate support roll 20 by the upper roll brush 19 on the downstream side of the transport path, the degree of cleaning of both surfaces of the substrate 2 can be further increased.
[0034]
Further, even when the substrate 2 is not passing, the lower roll brush 17 and the upper roll brush 19 do not come into contact with each other as in the prior art, and the brush bristle tips are rubbed together. Dust disappears and dust generation can be further suppressed.
[0035]
(Embodiment 2)
In the first embodiment, the lower roll brush 17 is used on the upstream side of the substrate conveyance path, and the upper roll brush 19 is used on the downstream side of the substrate conveyance path. However, in the second embodiment, the degree of cleaning on both sides of the substrate is further improved. Accordingly, the lower roll brush 17 similar to that of the first embodiment is used for at least the final cleaning step thereafter, and the substrate pressing roll 18 is used directly above the lower roll brush 17.
[0036]
FIG. 4 is a partial side view showing the main part of the substrate cleaning apparatus according to Embodiment 2 of the present invention, and members having the same functions and effects as those in FIG.
[0037]
In FIG. 4, members similar to the upper roll brush 19 and the substrate pressing roll 18, and the lower roll brush 17 and the substrate support roll 20 are disposed on the downstream side of the conveyance path of the brush cleaning unit 13 in FIG. .
[0038]
With this configuration, it is easy to adjust the upper conveyance reference surface of the substrate 2 with the substrate pressing roll 18, and the substrate support roll 20 is provided for the upper roll brush 19 that cleans the surface of the substrate 2. The adjustment of the lower conveyance reference surface of the substrate 2 is easy, and the degree of cleaning of both surfaces of the substrate 2 can be further increased. Further, even when the substrate support roll 20 for defining the conveyance reference surface in the downward direction of the substrate 2 is disposed, the lower roll brush 17 for back surface cleaning is provided on the most upstream side of the conveyance. For cleaning the back surface of the substrate 2 on the most downstream side of the conveyance, even if the back surface of the substrate 2 does not reattach to the back surface of the substrate 2 via the lower roll brush 17 and the back surface of the substrate 2 remains dirty. Since the lower roll brush 17 is disposed, the contamination can be finally cleaned. Furthermore, since the upper roll brush 19 and the lower roll brush 17 are not arranged to face each other as in the prior art, the problem of dust generation due to the wear of the brush hairs is also suppressed.
[0039]
(Modification)
In the first embodiment, the lower roll brush 17 and the upper roll brush 19 are used as the brush. However, instead of the lower roll brush 17 and the upper roll brush 19, the lower disk brush 41 is used as shown in FIG. Alternatively, the upper disk brush 42 may be used. Further, a roll brush and a disk brush may be mixed, for example, as shown in FIG. 6, the lower roll brush 17 may be used on the upstream side of the transport path, and the upper disk brush 42 may be used on the downstream side of the transport path. Alternatively, the lower disk brush 41 may be used on the upstream side of the transport path, and the upper roll brush 19 may be used on the downstream side of the transport path. Also in these cases, the substrate pressing roll 18 and the substrate supporting roll 20 can be used as in the first embodiment. In addition, two or more substrate support rolls 20 may be arranged in the front and rear so as to face the lower direction of the upper brush. In this case, more uniform flatness is obtained.
[0040]
In the second embodiment, the lower roll brush 17, the upper roll brush 19, the upper roll brush 19, and the lower roll brush 17 are used as brushes. Instead of the lower roll brush 17 and the upper roll brush 19, In addition, as shown in FIG. 7, a lower disk brush 41, an upper disk brush 42, an upper disk brush 42, and a lower disk brush 41 may be used. Further, for example, as shown in FIG. 8, the lower roll brush 17 and the upper disk brush 42 are used on the upstream side of the conveyance path, and the upper disk brush 42 is further arranged on the downstream side of the conveyance path. The lower roll brush 17 may be used, or the lower disk brush 41 and the upper roll brush 19 may be used on the upstream side of the transport path, and the upper roll brush 19 and the lower disk brush 41 may be used on the downstream side of the transport path. Good. Also in these cases, the substrate pressing roll 18 and the substrate supporting roll 20 can be used as in the first embodiment.
[0041]
Further, in the second embodiment, the lower roll brush 17, the upper roll brush 19, the upper roll brush 19, and the lower roll brush 17 are disposed in this order, but the lower roll brush is disposed on the most upstream side and the most downstream side of the conveyance. 17 and the substrate pressing roll 18 may be disposed, and at least one set of the upper roll brush 19 and the substrate support roll 20 may be provided between the most upstream side and the most downstream side. A set of the side roll brush 17 and the substrate pressing roll 18 may be included.
[0042]
Further, the brush cleaning section is constituted by a disc brush, and in particular, when a plurality of circular disc brushes 43 are arranged along the width direction of the substrate 2 as shown in FIG. It is arranged in a staggered pattern so that no gaps are left in it. As described above, when the disk brushes 43 are arranged in a zigzag shape, the area of the arrangement space increases.
[0043]
Further, in the first and second embodiments, when the substrate 2 is cleaned by the lower roll brush 17 and the upper roll brush 19, the cleaning liquid is supplied from both sides slightly upstream of the lower roll brush 17 and the upper roll brush 19. However, the structure may be such that the lower roll brush 17 and the upper roll brush 19 are supplied from the central portion of each. In the description of the above modification, the nozzle N is not shown.
[0044]
【The invention's effect】
As described above, according to the present invention, since the pressing member is provided above the lower cleaning member, the contact of the cleaning member with the lower surface of the plate member does not become uneven, and the plate member Clean the top surface Top Provide a support member for the cleaning member Because The contact of the cleaning member with the upper surface of the plate-like member is not uneven, and the degree of cleaning on both sides of the plate-like member can be further increased, and such a support member is disposed on the lower surface side of the plate-like member. However, since the cleaning member for cleaning the lower surface is provided on the most upstream side of the conveyance, the dirt on the lower surface of the plate member does not reattach to the lower surface of the plate member via the support member. The degree of cleaning becomes higher. Furthermore, since the cleaning member is not opposed, dust generation as in the prior art can be suppressed.
[0045]
Also, the upper side Top Even if a support member is provided facing the lower side of the cleaning member, since the cleaning member for cleaning the lower surface of the plate member is disposed on the most downstream side of the conveyance, the lower surface of the plate member is contaminated by the support member. Even so, the degree of cleaning of the lower surface of the plate-like member can be further increased by finally cleaning the contamination.
[0046]
Furthermore, the upper side Top Even if the support member is provided facing the lower side of the cleaning member, the cleaning member for cleaning the lower surface is provided on the most upstream side of the conveyance, so that the dirt on the lower surface of the plate member is contaminated via the support member. Even if dirt on the lower surface of the plate-shaped member remains, the cleaning member for cleaning the lower surface of the plate-shaped member is disposed on the most downstream side of the conveyance, so that the contamination is finally cleaned. And the degree of cleaning of the lower surface of the plate-like member can be further increased.
[Brief description of the drawings]
FIG. 1 is a plan view showing a configuration of a substrate cleaning system including a substrate cleaning apparatus in Embodiment 1 of the present invention.
FIG. 2 is a partial side view showing a main part of the substrate cleaning apparatus of FIG. 1;
3 is a cross-sectional view showing in detail the configuration of a conveyance roller, an addition roller, a substrate support roll, and a roll brush of the substrate cleaning apparatus of FIG. 1;
FIG. 4 is a partial side view showing a main part of a substrate cleaning apparatus in Embodiment 2 of the present invention.
FIG. 5 is a partial side view schematically showing a modification of the main part of the substrate cleaning apparatus of FIG. 2;
6 is a partial side view schematically showing another modification of the main part of the substrate cleaning apparatus of FIG. 2. FIG.
7 is a partial side view schematically showing a modification of the main part of the substrate cleaning apparatus of FIG. 4. FIG.
8 is a partial side view schematically showing another modification of the main part of the substrate cleaning apparatus of FIG. 4;
FIG. 9 is a plan view schematically showing a layout of a conventional cleaning brush when a plurality of circular disc brushes are arranged along the width direction of a substrate.
FIG. 10 is a partial side view schematically showing a main part of a conventional brush cleaning apparatus when disk brushes are arranged to face each other.
FIG. 11 is a partial side view schematically showing a main part of a conventional brush cleaning device when roll brushes are arranged to face each other.
FIG. 12 is a partial side view schematically showing a main part of a conventional brush cleaning apparatus when more disk brushes are arranged on the substrate surface side.
FIG. 13 is a partial side view schematically showing a main part of a conventional brush cleaning apparatus when more roll brushes are arranged on the substrate surface side.
[Explanation of symbols]
2 Substrate
3 Substrate cleaning equipment
13 Brush cleaning section
17 Lower roll brush (cleaning member)
18 Substrate presser roll (presser member)
19 Upper roll brush
20 Substrate support roll
41 Lower disc brush
42 Upper disc brush
43 Circular disc brush

Claims

In the cleaning apparatus for cleaning the upper surface and the lower surface of the plate-like member being transported, the cleaning member for cleaning the lower surface of the plate-like member on the most upstream side of the transport, and the cleaning member disposed at a position facing the cleaning member, in Rutotomoni and a pressing member for holding the both ends of the plate-like member, on the downstream side of the cleaning member and the pressing member for cleaning the bottom surface, a top surface cleaning member for cleaning the upper surface of the plate-shaped member, the A cleaning apparatus comprising: a support member that is disposed at a position facing the upper surface cleaning member and sandwiches the plate member across the width direction with the upper surface cleaning member .

In the cleaning apparatus for cleaning the upper surface and the lower surface of the plate-like member being transported, the cleaning member for cleaning the lower surface of the plate-like member on the most downstream side of the transport, and the cleaning member disposed at a position facing the cleaning member, in Rutotomoni and a pressing member for holding the both ends of the plate-like member, on the upstream side of the cleaning member and the pressing member for cleaning the bottom surface, a top surface cleaning member for cleaning the upper surface of the plate-shaped member, the A cleaning apparatus comprising: a support member that is disposed at a position facing the upper surface cleaning member and sandwiches the plate member across the width direction with the upper surface cleaning member .

In the cleaning apparatus for cleaning the upper surface and the lower surface of the plate-like member being transported, the cleaning member for cleaning the lower surface of the plate-like member on the most upstream side of the transport, and the cleaning member disposed at a position facing the cleaning member, in a pressing member for holding the both ends of the plate-like member, the conveyance downstream side, and the cleaning member for cleaning the underside of the plate-like member, and said cleaning member is disposed in a position facing the cleaning member in a pressing member for holding the both ends of the plate-like member, and the between the most upstream side cleaning member of the cleaning member and the most downstream side of the upper surface washing to clean the upper surface of the plate-like member member and the cleaning device being characterized in that example Bei and a support member for clamping over the plate-like member and the top surface cleaning member is disposed in a position facing the upper surface cleaning member in the width direction.

The cleaning apparatus according to claim 1, wherein the cleaning member is configured by a brush cleaning member, and the pressing member is configured by a roller member.