JPS627267B2 - - Google Patents
Info
- Publication number
- JPS627267B2 JPS627267B2 JP57009372A JP937282A JPS627267B2 JP S627267 B2 JPS627267 B2 JP S627267B2 JP 57009372 A JP57009372 A JP 57009372A JP 937282 A JP937282 A JP 937282A JP S627267 B2 JPS627267 B2 JP S627267B2
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- cemented carbide
- coated
- base material
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910003460 diamond Inorganic materials 0.000 claims description 27
- 239000010432 diamond Substances 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 150000001247 metal acetylides Chemical class 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 229910052681 coesite Inorganic materials 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 229910052906 cristobalite Inorganic materials 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 229910052682 stishovite Inorganic materials 0.000 claims description 2
- 229910052905 tridymite Inorganic materials 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005491 wire drawing Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 238000007737 ion beam deposition Methods 0.000 description 2
- -1 iron group metals Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Description
本発明はダイヤモンドを被覆した超硬合金工具
に関する。
1種以上の炭化物を含み鉄族金属を主体とする
結合相を有する超硬合金は切削工具、耐摩工具等
巾広い用途に利用されているが、近年この超硬合
金の表面にTiC、Al2O3等の硬質物質を被覆した
いわゆるコーチング工具が急速に普及しつつあ
る。
特に硬い材料を加工する場合には工具自体の硬
さは重要な性質であり、最も硬い物質であるダイ
ヤモンドはその意味では現在も貴重な材料であ
る。このダイヤモンド工具としては単結晶や焼結
体として、あるいは金属、他の無機化合物、有機
物で固めたものが多く用いられているが、これ等
はダイヤモンド自体の原料が高価であり、これよ
り硬いものが無いため難加工性であるため製造コ
ストも高く、また形状的にも制約されている。
発明者らはダイヤモンドの持つ硬い性質を最大
限に生かす工具を検討して本発明に至つたもので
ある。複雑な形状のものや大型の部品にダイヤモ
ンドの硬度を活用するには気相から被覆すること
が最も適している。この場合母材の性質として弾
性率が高い方が被覆膜の破損を少くする上で望ま
しい。従つて高弾性母材として1種以上の炭化物
及び/又は窒化物を主成分とする超硬合金が最も
適している。
この超硬合金の表面に気相よりダイヤモンドを
被覆しようとした場合、本来ダイヤモンドを合成
する際の触媒となるべき物質が存在すると合成し
にくくなるばかりでなく、例え被覆できたとして
も高温で使用した場合にダイヤモンド膜が変態を
起してグラフアイト化してしまい本来の高硬度を
利用することができない。従つてCoやNiを含む
超硬合金に直接被覆するのは好ましくない。そこ
で安定したダイヤモンド被覆膜を得るために超硬
合金とダイヤモンドの間に中間層を介した被覆超
硬合金を提案するものである。
中間層としては、Fe、Co、Ni等の金属を含ま
ないことが必要であり、またこれらの金属の拡散
が少い物質が望ましい。この中間層の物質として
種々検討した結果、コーチング物質として工業的
に安定して利用できるものは、周期律表a、
a、a族元素の炭化物、窒化物、酸化物、硼化
物及びこれらの混合物、化合物、更にAl2O3、
AlN、B4C、Si3N4、SiC、SiO2であることが判明
した。これらの中で接着強度の点では炭化物が最
も望ましいが他の物質でも中間層としてこのよう
にダイヤモンドを被覆した場合、上記に述べたダ
イヤモンド膜の不安定性は解決される。
超硬合金を母材とする被覆の厚みは中間層も外
層のダイヤモンド膜も0.1μm以下ではその効果
をほとんど示さないが10μm以上では強度が著し
く低下して工具として適さない。
また気相からの被覆法としてはCVD法(化学
蒸着)、PVD(物理的気相法)いずれの場合でも
効果は変らない。
なお、ダイヤモンドの被覆方法としては水素と
炭化水素の混合気流をWフイラメントを2000℃程
度の高温に加熱することによつて励起するWフイ
ラメント法、高周波、マイクロ波を印加して励起
するプラズマ法などのいわゆるCVD法が良く知
られている。又、炭素イオンのイオンビームによ
るイオンビームデボジシヨン法なども好ましい。
次に実施例によつて詳しく説明する。
実施例 1
ISO K10超硬合金によつて0.5mmφから0.35mm
φに伸線加工する線引ダイスを作成し、この表面
にCVD法でTiCを1μm被覆した後、CVD法で
母材を850℃に加熱してダイヤモンドを1μm被
覆した。
これを実際の線引加工に使用した結果、本発明
品は28Kgの鋼線が可能であつたのに対し、従来の
ISO K10超硬合金ダイスでは12Kgしか線引がで
きなかつた。
実施例 2
ISO M10超硬合金によつてSNG432の工具を作
成し、CVD法でTiCとダイヤモンドを第1表に示
す膜厚で被覆し、次の条件で切削試験を行つた。
切削条件:
被削材:Al合金(AA−4032)
速 度:800m/min
切り込み:1.0〜7.0mm
送 り:0.5mm/rev
The present invention relates to a diamond coated cemented carbide tool. Cemented carbide, which has a binder phase mainly composed of iron group metals and contains one or more carbides, is used in a wide range of applications such as cutting tools and wear-resistant tools . So-called coaching tools coated with a hard material such as O 3 are rapidly becoming popular. Especially when processing hard materials, the hardness of the tool itself is an important property, and diamond, the hardest substance, is still a valuable material in that sense. Diamond tools are often used in the form of single crystals, sintered bodies, or solidified with metal, other inorganic compounds, or organic materials, but the raw material of diamond itself is expensive, and diamond tools that are harder than these are often used. Since there is no porosity, it is difficult to process, resulting in high manufacturing costs and is also limited in shape. The inventors studied a tool that makes the most of the hard properties of diamond, and arrived at the present invention. To take advantage of diamond's hardness for complex-shaped or large parts, coating from the gas phase is most suitable. In this case, it is desirable for the base material to have a high modulus of elasticity in order to reduce damage to the coating film. Therefore, a cemented carbide whose main component is one or more carbides and/or nitrides is most suitable as a highly elastic base material. If you try to coat the surface of this cemented carbide with diamond using a vapor phase, the presence of a substance that should normally act as a catalyst when synthesizing diamond will not only make it difficult to synthesize diamond, but even if it can be coated, it will be used at high temperatures. In this case, the diamond film undergoes transformation and becomes graphite, making it impossible to utilize its original high hardness. Therefore, it is not preferable to directly coat cemented carbide containing Co or Ni. Therefore, in order to obtain a stable diamond coating film, we propose a coated cemented carbide with an intermediate layer interposed between the cemented carbide and diamond. The intermediate layer must not contain metals such as Fe, Co, and Ni, and it is desirable to use a material that allows these metals to diffuse less. As a result of various studies on the materials for this intermediate layer, we found that the ones that can be stably used industrially as coating materials are those from the periodic table a,
a, carbides, nitrides, oxides, borides, and mixtures and compounds of group a elements, as well as Al 2 O 3 ,
It turned out to be AlN, B4C , Si3N4 , SiC, and SiO2 . Among these, carbide is the most desirable in terms of adhesive strength, but if diamond is coated with other materials as an intermediate layer in this manner, the above-mentioned instability of the diamond film can be solved. If the thickness of the coating made of cemented carbide as a base material is 0.1 μm or less for both the intermediate layer and the diamond film of the outer layer, it will hardly exhibit any effect, but if it exceeds 10 μm, the strength will drop significantly and it will not be suitable as a tool. Furthermore, the effect remains the same whether the coating method is from the gas phase, CVD (chemical vapor deposition) or PVD (physical vapor deposition). Methods for coating diamond include the W filament method, in which a mixed gas flow of hydrogen and hydrocarbon is excited by heating the W filament to a high temperature of approximately 2000°C, and the plasma method, in which it is excited by applying radio frequency or microwave. The so-called CVD method is well known. Also preferred is an ion beam deposition method using an ion beam of carbon ions. Next, a detailed explanation will be given with reference to examples. Example 1 ISO K10 cemented carbide from 0.5mmφ to 0.35mm
A wire drawing die for wire drawing to φ was prepared, and its surface was coated with TiC to a thickness of 1 μm using the CVD method, and then the base material was heated to 850° C. using the CVD method and coated with diamond to a thickness of 1 μm. As a result of using this in actual wire drawing processing, the product of the present invention was able to produce a 28 kg steel wire, whereas the conventional product
The ISO K10 cemented carbide die could only draw 12 kg. Example 2 A SNG432 tool was made from ISO M10 cemented carbide, coated with TiC and diamond at the film thickness shown in Table 1 using the CVD method, and subjected to a cutting test under the following conditions. Cutting conditions: Work material: Al alloy (AA-4032) Speed: 800m/min Depth of cut: 1.0 to 7.0mm Feed: 0.5mm/rev
【表】
第1表でみられるようにTiCの中間層を介して
ダイヤモンド膜を被覆することによつて切削工具
としての寿命が飛躍的に向上し、TiC層のみの被
覆超硬合金よりも改善されることがわかる。また
被覆層の厚みが中間層としてもダイヤモンド膜と
しても10μm以上になると却つて強度が低下して
いる。
実施例 3
WC−15%Co超硬合金に第2表に示す物質をイ
オンプレーテイング法にて各2μm被覆し、さら
に母材を750℃に加熱してその上に2μmのダイ
ヤモンドをイオンビームデポジツシヨン法にて被
覆した被覆超硬合金を作成し、この表面にAl2O3
焼結体を10Kg/mm2の圧力で押し当て150m/min
の速度で摩耗テストを60分行い表面の摩耗深さを
測定した。その結果を第2表に示す。
表に示す通り、中間層を介することにより本発
明のダイヤモンド被覆超硬合金はいずれの場合も
耐摩耗性が向上することがわかる。[Table] As shown in Table 1, by coating a diamond film through an intermediate layer of TiC, the life of a cutting tool is dramatically improved, which is an improvement over cemented carbide coated with only a TiC layer. I know it will happen. Moreover, when the thickness of the coating layer is 10 μm or more, whether it is an intermediate layer or a diamond film, the strength is rather reduced. Example 3 WC-15%Co cemented carbide was coated with the substances shown in Table 2 to a thickness of 2 μm each using the ion plating method, the base material was further heated to 750°C, and 2 μm of diamond was deposited on top of it by ion beam deposition. A coated cemented carbide coated using a dispensing method is prepared, and Al 2 O 3 is applied to the surface of the coated cemented carbide.
Press the sintered body at a pressure of 10Kg/mm 2 at 150m/min
A wear test was conducted at a speed of 60 minutes to measure the depth of wear on the surface. The results are shown in Table 2. As shown in the table, it can be seen that the wear resistance of the diamond-coated cemented carbide of the present invention is improved in all cases by interposing the intermediate layer.
【表】【table】
【表】
上記の実施例ではWC−Co超硬合金を母材とす
る例を示したが、WC−TiC−Co、WC−TiC−
TiN−Co系超硬合金を母材としても同様の効果が
得られ、ダイヤモンドの高硬度、耐摩耗性を最大
限に発揮できる安定な強度の高い被覆超硬合金と
して切削工具、ダイス、ローラー等の耐摩工具と
して工業的価値が高いものである。[Table] In the above example, an example was shown in which WC-Co cemented carbide was used as the base material, but WC-TiC-Co, WC-TiC-
The same effect can be obtained using TiN-Co based cemented carbide as a base material, and it is a stable and strong coated cemented carbide that can maximize the hardness and wear resistance of diamond, such as cutting tools, dies, rollers, etc. It has high industrial value as a wear-resistant tool.
Claims (1)
超硬合金を母材とする被覆超硬合金において、該
母材に隣接する内層が、a、a、a族元素
の炭化物、窒化物、硼化物、酸化物及びこれらの
化合物、混合物並びにAl2O3、AlN、B4C、
Si3N4、SiO2から選ばれた1種以上より成り、外
層はダイヤモンドより成ることを特徴とするダイ
ヤモンド被覆超硬合金工具。 2 特許請求の範囲第1項において、内層の厚み
が0.1〜10μmであり、外層の厚みが0.1〜10μm
であることを特徴とするダイヤモンド被覆超硬合
金工具。[Scope of Claims] 1. A coated cemented carbide whose base material is a cemented carbide containing one or more types of carbide or/and nitride, in which the inner layer adjacent to the base material contains a group a, a, group a element. Carbides, nitrides, borides, oxides and their compounds, mixtures, Al2O3, AlN, B4C,
A diamond-coated cemented carbide tool made of one or more selected from Si3N4 and SiO2, and characterized in that the outer layer is made of diamond. 2 In claim 1, the inner layer has a thickness of 0.1 to 10 μm, and the outer layer has a thickness of 0.1 to 10 μm.
A diamond-coated cemented carbide tool characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP937282A JPS58126972A (en) | 1982-01-22 | 1982-01-22 | Diamond coated sintered hard alloy tool |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP937282A JPS58126972A (en) | 1982-01-22 | 1982-01-22 | Diamond coated sintered hard alloy tool |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58126972A JPS58126972A (en) | 1983-07-28 |
JPS627267B2 true JPS627267B2 (en) | 1987-02-16 |
Family
ID=11718632
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP937282A Granted JPS58126972A (en) | 1982-01-22 | 1982-01-22 | Diamond coated sintered hard alloy tool |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58126972A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0379220A1 (en) * | 1989-01-20 | 1990-07-25 | Idemitsu Petrochemical Co. Ltd. | Diamond coated sintered body |
EP0627498A1 (en) | 1993-05-25 | 1994-12-07 | Ngk Spark Plug Co., Ltd | Ceramic-based substrate, and methods for producing same |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59166402A (en) * | 1983-03-10 | 1984-09-19 | Mitsubishi Metal Corp | Surface covering sintered hard alloy member for cutting tool and abrasion-resistant tool |
JPS59166672A (en) * | 1983-03-11 | 1984-09-20 | Mitsubishi Metal Corp | Surface-coated tool member excellent in wear resistance |
JPS60114572A (en) * | 1983-11-25 | 1985-06-21 | Mitsubishi Metal Corp | Sintered hard alloy member having very hard coating layer |
JPS60152676A (en) * | 1984-01-18 | 1985-08-10 | Hitachi Choko Kk | Surface-coated sintered hard member |
JPS60208473A (en) * | 1984-03-30 | 1985-10-21 | Mitsubishi Metal Corp | Artificial diamond-coated tool member |
SE453474B (en) * | 1984-06-27 | 1988-02-08 | Santrade Ltd | COMPOUND BODY COATED WITH LAYERS OF POLYCristalline DIAMANT |
JPS6152363A (en) * | 1984-08-21 | 1986-03-15 | Mitsubishi Metal Corp | Method for depositing and forming artificial diamond film on surface of cermet member |
JPS6187870A (en) * | 1984-10-05 | 1986-05-06 | Nippon Telegr & Teleph Corp <Ntt> | Coating film and its formation |
JPS61104078A (en) * | 1984-10-26 | 1986-05-22 | Toshiba Tungaloy Co Ltd | Hard coated sintered alloy and its manufacture |
JPS61109628A (en) * | 1984-10-29 | 1986-05-28 | Toshiba Tungaloy Co Ltd | Diamond coated tool |
JPS61106494A (en) * | 1984-10-29 | 1986-05-24 | Kyocera Corp | Member coated with diamond and its production |
JPS6286161A (en) * | 1985-10-11 | 1987-04-20 | Mitsubishi Metal Corp | Formation of artificial diamond film at high deposition forming rate |
JPH0713298B2 (en) * | 1985-10-31 | 1995-02-15 | 京セラ株式会社 | Diamond coated cutting tools |
JPH0643280B2 (en) * | 1986-03-27 | 1994-06-08 | 東芝タンガロイ株式会社 | Vapor phase synthesis of film diamond |
KR920000801B1 (en) * | 1988-02-04 | 1992-01-23 | 이데미쯔세끼유가가꾸 가부시기가이샤 | Method of producing sintered hard metal with diamond film |
JP2564627B2 (en) * | 1988-10-11 | 1996-12-18 | 株式会社半導体エネルギー研究所 | Member covered with carbon film and manufacturing method thereof |
DE68916207T3 (en) * | 1988-12-21 | 1999-11-25 | Mitsubishi Materials Corp | Diamond coated tool, substrates therefor and process for its manufacture. |
CA2029873A1 (en) * | 1989-03-10 | 1990-09-11 | Toshimichi Ito | Diamond-coated member and process for the preparation thereof |
JP2995705B2 (en) * | 1989-10-31 | 1999-12-27 | 株式会社島津製作所 | Hard carbon film forming method |
US5334453A (en) * | 1989-12-28 | 1994-08-02 | Ngk Spark Plug Company Limited | Diamond-coated bodies and process for preparation thereof |
CA2061944C (en) * | 1991-03-08 | 1999-01-26 | Naoya Omori | A diamond and/or diamond-like carbon-coated hard material |
KR0134942B1 (en) * | 1993-06-11 | 1998-06-15 | 이다가끼 유끼오 | Method for deposition of amorphous hard carbon films |
JPH10310494A (en) * | 1996-05-31 | 1998-11-24 | Ngk Spark Plug Co Ltd | Production of cemented carbide member with diamond coating film |
EP0828015A3 (en) | 1996-09-06 | 1998-07-15 | SANYO ELECTRIC Co., Ltd. | Hard carbon film-coated substrate and method for fabricating the same |
CN109750291A (en) * | 2017-11-07 | 2019-05-14 | 深圳先进技术研究院 | A kind of boron-doped diamond electrode and preparation method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS566920A (en) * | 1979-06-28 | 1981-01-24 | Philips Nv | Dry lubricating bearing |
JPS5641372A (en) * | 1979-09-10 | 1981-04-18 | Mitsubishi Metal Corp | Surface covered ultra hard alloy member for cutting tool |
JPS56108876A (en) * | 1980-02-04 | 1981-08-28 | Citizen Watch Co Ltd | Silver plated exterior decorative parts for watch and their manufacture |
-
1982
- 1982-01-22 JP JP937282A patent/JPS58126972A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS566920A (en) * | 1979-06-28 | 1981-01-24 | Philips Nv | Dry lubricating bearing |
JPS5641372A (en) * | 1979-09-10 | 1981-04-18 | Mitsubishi Metal Corp | Surface covered ultra hard alloy member for cutting tool |
JPS56108876A (en) * | 1980-02-04 | 1981-08-28 | Citizen Watch Co Ltd | Silver plated exterior decorative parts for watch and their manufacture |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0379220A1 (en) * | 1989-01-20 | 1990-07-25 | Idemitsu Petrochemical Co. Ltd. | Diamond coated sintered body |
EP0627498A1 (en) | 1993-05-25 | 1994-12-07 | Ngk Spark Plug Co., Ltd | Ceramic-based substrate, and methods for producing same |
Also Published As
Publication number | Publication date |
---|---|
JPS58126972A (en) | 1983-07-28 |
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