JPS60114572A - Sintered hard alloy member having very hard coating layer - Google Patents

Sintered hard alloy member having very hard coating layer

Info

Publication number
JPS60114572A
JPS60114572A JP22180783A JP22180783A JPS60114572A JP S60114572 A JPS60114572 A JP S60114572A JP 22180783 A JP22180783 A JP 22180783A JP 22180783 A JP22180783 A JP 22180783A JP S60114572 A JPS60114572 A JP S60114572A
Authority
JP
Japan
Prior art keywords
hard alloy
sintered hard
alloy member
coating layer
sintered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22180783A
Other languages
Japanese (ja)
Other versions
JPS6324066B2 (en
Inventor
Akio Nishiyama
昭雄 西山
Noribumi Kikuchi
菊池 則文
Takayuki Shingyouchi
新行内 隆之
Hiroaki Yamashita
山下 博明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP22180783A priority Critical patent/JPS60114572A/en
Publication of JPS60114572A publication Critical patent/JPS60114572A/en
Publication of JPS6324066B2 publication Critical patent/JPS6324066B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • C23C16/278Diamond only doping or introduction of a secondary phase in the diamond
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide superior wear resistance to a sintered hard alloy member coated with a sintered hard alloy or one or more kinds of compounds selected among the carbides, nitrides and oxides of the IIIa, IVa, Va and VIa group metals by forming a very hard coating layer having diamond structure contg. a specified amount of Al or Ti on the surface of the sintered hard alloy member. CONSTITUTION:A sintered hard alloy member coated with a sintered hard alloy or one or more kinds of compounds selected among the carbides, nitrides and oxides of the IIIa, IVa, Va and VIa group metals is heated to 300-1,100 deg.C, and an activated gaseous mixture consisting of H2, CxHy and AlCl3 or TiCl3 is led to the surface of the member under reduced pressure. A carbon-base thin film of 0.2-10mum thickness having diamond structure contg. 0.02-10wt% Al or Ti is formed on the surface of the sintered hard alloy member.

Description

【発明の詳細な説明】 本発明はダイヤモンド構造を有する超硬質炭素基薄膜を
被覆した超硬合金部材に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cemented carbide member coated with an ultrahard carbon-based thin film having a diamond structure.

ダイヤモンドを超硬合金に被覆し、非常に耐摩耗性の高
い膜を作る試みはなされているが、工業的な規模では生
産性属すぐれかつ性能的に十分な耐摩耗性を発揮する製
品はいまだつくられていない。
Attempts have been made to coat diamond on cemented carbide to create a highly wear-resistant film, but on an industrial scale, there is still no product that exhibits excellent productivity and sufficient wear resistance in terms of performance. Not created.

この原因はダイヤモンドの低圧合成の条件範囲が非常に
狭い仁と、および高真空合成においては生産的でないな
どによっている。
The reason for this is that the range of conditions for low-pressure synthesis of diamond is very narrow, and that high-vacuum synthesis is not productive.

そこで、低圧合成の条件範囲を拡大し、安定化して工業
的に生産できる方法を研究し、従来の低圧合成法で用い
るH、−CχHY混合ガスのかわりに、鳩−czuy−
AICIs混合ガス、あるいはH,−C7Hy−TiC
14ガスと用いるとダイヤモンド構造物質の核形成が容
易に行われ、再現性よく緻密で均一なダイヤモンド膜を
合成できることがわかった。
Therefore, we expanded the range of conditions for low-pressure synthesis and researched a method that can be stabilized and industrially produced.
AICIs mixed gas or H, -C7Hy-TiC
It was found that when 14 gas is used, nucleation of the diamond structure material is easily performed, and a dense and uniform diamond film can be synthesized with good reproducibility.

本発明は上記の技術にもとづきなされたものであって、
超硬合金、あるいは3a、4a、5a、6a族金属の炭
化物、窒化物、酸化物の真っ以上を被覆した超硬合金部
材の外表面に0.02〜l0wt%のAlおよびまたは
Tiを含有したダイヤモンド膜あるいは少くとも部分的
にダイヤモンド構造を有する炭素基薄膜の厚み0.2〜
10μmを有する超硬合金部材である。
The present invention was made based on the above technology, and
Containing 0.02 to 10 wt% of Al and/or Ti on the outer surface of a cemented carbide member or a cemented carbide member coated with carbides, nitrides, and oxides of group 3a, 4a, 5a, and 6a metals. The thickness of the diamond film or the carbon-based thin film having at least a partially diamond structure is 0.2~
It is a cemented carbide member having a thickness of 10 μm.

a) A、IおよびまたはTiの含有量り゛イヤモンド
構造物質に含有されるAIやブタン原子がどのような結
合状態にあるかは明ら”かではt(〜・が、核発生に寄
与し、核の生長に伴って取りこまれていると考えられる
a) It is clear what kind of bonding state the AI and butane atoms contained in the diamond structure material have a large content of A, I and/or Ti. It is thought that it is incorporated as the nucleus grows.

こA1を分析した所、ダイヤモンド中に0・02wt%
AlCl、やrlcI4j4を多くするとダイヤモンド
構造物質がむしろ生成しなくなるため、本発明a> 6
q) pを0.02〜l0wt%トL?、=。
Analysis of this A1 revealed that it was 0.02wt% in diamond.
If the amount of AlCl or rlcI4j4 is increased, the diamond structure substance will not be generated, so the present invention a>6
q) Is p 0.02-10wt%? ,=.

1))膜厚 本発明の1への厚みは02〜10μmがよ(、0,2μ
m以「では耐摩耗性の向上が少なく、10μmを越える
と基本との熱膨張の違いのために付着張角をtIC持す
るのが9すかしく、かえって耐摩耗性が下がる。したが
って厚みは02〜lOpmが」、い。
1)) Film thickness The thickness of 1 of the present invention is preferably 0.2 to 10 μm (0.2 μm).
If the thickness exceeds 10 μm, the improvement in abrasion resistance will be small, and if the thickness exceeds 10 μm, it will be difficult to maintain the adhesion tension angle tIC by 9 μm due to the difference in thermal expansion from the base, and the abrasion resistance will decrease. 1Opm", yes.

本発明の実施は、低圧ダイヤモンド合成法によるが、こ
の方法は300℃〜1100℃に加熱した基体上に活性
化した反応ガスを送り込むもので、活性化方法としては
熱電子放射法、高周波プラズマ法、マイクロ波法ならび
に本発明者が発明したアーク法が力)る。本発明はいず
れの方法でも回部である。
The present invention is carried out by a low-pressure diamond synthesis method, in which an activated reaction gas is sent onto a substrate heated to 300°C to 1100°C, and activation methods include thermionic emission method and high-frequency plasma method. , the microwave method as well as the arc method invented by the present inventor). The present invention is applicable to either method.

合成したAIおよびまたはTi含有のダイヤモンド構造
物質の膜の物性を測定し、ダイヤモンドと比較するのは
非常に困難である。これは膜の性質が製造条件およびそ
れに伴なう膜構造によるため、一般的に知ら、ltてい
る物質固有の性質と大きく異なるためである。しかし、
耐摩耗性の評価は実用テストを通じて行うことが可能で
ある。本発明の膜は緻密であり、極度に硬い性質と基体
への高い付着力を与えるので実用上の耐摩耗性はテスト
的に合成された不純物を含まな(・ダイヤモンド膜より
はるかにすぐれるものであった。
It is very difficult to measure the physical properties of a synthesized film of an AI- and/or Ti-containing diamond structure material and compare it with that of diamond. This is because the properties of the film depend on the manufacturing conditions and the resulting film structure, and are therefore significantly different from the properties inherent to commonly known materials. but,
Abrasion resistance can be evaluated through practical tests. The film of the present invention is dense and provides extremely hard properties and high adhesion to the substrate, so its practical wear resistance is free from experimentally synthesized impurities (far superior to diamond films). Met.

実施例−1 垂直の石英チューブ中にタングステンコイルを置き、表
面温度が1,800℃以上になるように通電を置いた。
Example-1 A tungsten coil was placed in a vertical quartz tube, and electricity was applied so that the surface temperature was 1,800°C or higher.

石英チューブの外側からニクロム線ヒーターによって加
熱し、基体温度を710℃とした。ガス組成がH,; 
95%、CTI、 ; 4.9%、T1Cl、 ; 0
.1%の混合ガスを上部より石英チューブに流入させ、
真空ポンプで減圧にしl0Torrとした。タングステ
ンコイル部分を通過させることによって熱電子放射によ
るガスの活性化を行い、基体上に導入した。反 。
The quartz tube was heated from the outside using a nichrome wire heater to bring the substrate temperature to 710°C. Gas composition is H;
95%, CTI; 4.9%, T1Cl, ; 0
.. 1% mixed gas flows into the quartz tube from the top,
The pressure was reduced to 10 Torr using a vacuum pump. The gas was activated by thermionic radiation by passing through the tungsten coil portion and introduced onto the substrate. Against.

応待間を4時間とし、KIOチップの上に3μのダ ]
イヤモンド構造膜を材色した。
The waiting period is 4 hours, and a 3 μm diameter is placed on the KIO chip.]
Diamond structure membrane material color.

とれを用いてアルミ合金の切削を行った。切削条件は、 被削旧 ′百−6AI−4V (0200の丸棒)切削
速度y= 200m/min 切込み七二Imm tt
 $d%送 リf = 0.2 ntm/ rev 切
削油 な し より01被覆のな〜・KIOのチップの
寿命は10分であった ゛が、本発明品は70分の寿命
時間を示した。
Aluminum alloy was cut using a forge. The cutting conditions are as follows: Workpiece old '100-6AI-4V (0200 round bar) Cutting speed y = 200m/min Depth of cut 72Imm tt
$d% feed rate = 0.2 ntm/rev Cutting oil None 01 coating - KIO's tip had a lifespan of 10 minutes, but the product of the present invention had a lifespan of 70 minutes. .

実施例−2 垂直の石英チューブの中の基体支持部にTicを2μ被
覆したl5OKO5の超硬合金チップを置き、そつ上部
にタングステン電極対を置き、この電極間に2KVの高
電圧を半波整流で印加し、電極間に狡電を行なわせる。
Example-2 A 15OKO5 cemented carbide chip coated with 2μ of Tic was placed on the substrate support in a vertical quartz tube, a pair of tungsten electrodes was placed on top, and a high voltage of 2KV was half-wave rectified between the electrodes. voltage is applied to generate electric current between the electrodes.

石英チューブの外側より加熱して基体を750℃とした
。反応がスは鴇;96%、 CH4; 3.9%、T1
Cl、 ;0.1%に用い、石英チューブの上部より流
入させ、真空ぎンプで減圧にし4 Torrとした。
The substrate was heated to 750° C. from the outside of the quartz tube. Reaction gas: 96%, CH4; 3.9%, T1
Cl was used at 0.1%, was introduced from the top of the quartz tube, and the pressure was reduced to 4 Torr using a vacuum pump.

反応時間を4時間とし、比較にTlC14を含まな?用
いて両者の間での生成物の比較と切削テストに行った。
The reaction time was 4 hours, and TIC14 was not included in the comparison. Comparison of products between the two and cutting tests were carried out.

その比較を表−21/(示す。The comparison is shown in Table 21.

表−2 切削テスト条件 被削材 Al−6%i9i合金 丸棒0200切削速度
 V= 350m/min 送り/ =: 0.3mm
/rev切込み t = 2 mm 寿命基準逃げ面摩
耗中0.2 im実施例−3 実施例−1と同一の装置を用いて、温度、圧力、ガス組
成を種々かえ、また基体となる超硬合金の組成も種々か
えたもので、表−3の本発明品l〜IOを作った。比較
として、ダイヤモンド被覆層のないもの11〜13およ
びTiあるいはAIを含まないダイヤモンド被覆層を有
するもの14〜15を用いて超硬合金板焼結体の外周加
工を行い、その耐摩耗性を比較した。
Table-2 Cutting test conditions Work material Al-6% i9i alloy Round bar 0200 Cutting speed V = 350 m/min Feed / =: 0.3 mm
/rev depth of cut t = 2 mm Life standard Flank wear 0.2 im Example-3 Using the same equipment as Example-1, temperature, pressure, and gas composition were varied, and cemented carbide as a base material was used. Inventive products 1 to IO shown in Table 3 were made with various compositions. For comparison, we processed the outer periphery of a sintered cemented carbide plate using 11 to 13 without a diamond coating layer and 14 to 15 with a diamond coating layer that does not contain Ti or AI, and compared their wear resistance. did.

−J−続ネ山jJE占(方式) 昭和59年3月22【コ 特x’+庁長官 若 杉 和 夫 p l、事件の表示 特願昭58−221807 号 2、発明の名称 超硬質被覆層を有1ろ超硬合金部材 3、補11−をする者 事1’lとの関係 特f[出頼人 東6F部下代111区大手町−丁目5番2号(62fi
l 三や金属株式会社 代 表 者 水 野 健 5、?+n正指令の11付 昭和5+1年2 r128 H b 、?+n +Iの対重 昭f1巨8年11月25「■提出の特;「願の明細古σ
)発明の名称の―(1)明細書の発明の名称に記載誤り
がありまj5たのでド記のとおり訂正致しまず。
-J-ZokuneyamajJE divination (method) March 22, 1980 [Co-special Relationship with personnel 1'l who handle layer 1 and cemented carbide members 3 and 11-
l Sanya Metal Co., Ltd. Representative Ken Mizuno 5, ? +n Positive Directive 11 Showa 5+1 2 r128 H b,? +n
) Title of the invention - (1) There was an error in the title of the invention in the specification, so I will not correct it as indicated.

記 「超硬披82層を有する超硬合金部材」とあるな「超硬
質被覆層を有するN硬合金部材1と31正1.まず、以
 十
``Cemented carbide member having 82 layers of cemented carbide'' and ``N hard metal member 1 and 31 having a superhard coating layer''.

Claims (1)

【特許請求の範囲】 1)超硬合金あるいは3a、4a、5a、6a。 族金属の炭化物、窒化物、酸化物のiつ以上を被覆した
超硬合金部材の外表面K O,02〜10wt%のAI
および“土たはTiを含有したダイヤモンド構造を有す
る炭素基薄膜を02〜IOμmの厚さに被覆したことを
特徴とする超硬質被覆層を有する超硬合金部材。
[Claims] 1) Cemented carbide or 3a, 4a, 5a, 6a. The outer surface of a cemented carbide member coated with i or more carbides, nitrides, and oxides of group metals K O, 02 to 10 wt% AI
and "A cemented carbide member having a superhard coating layer, characterized in that it is coated with a carbon-based thin film having a diamond structure containing soil or Ti to a thickness of 02 to 10 μm.
JP22180783A 1983-11-25 1983-11-25 Sintered hard alloy member having very hard coating layer Granted JPS60114572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22180783A JPS60114572A (en) 1983-11-25 1983-11-25 Sintered hard alloy member having very hard coating layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22180783A JPS60114572A (en) 1983-11-25 1983-11-25 Sintered hard alloy member having very hard coating layer

Publications (2)

Publication Number Publication Date
JPS60114572A true JPS60114572A (en) 1985-06-21
JPS6324066B2 JPS6324066B2 (en) 1988-05-19

Family

ID=16772502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22180783A Granted JPS60114572A (en) 1983-11-25 1983-11-25 Sintered hard alloy member having very hard coating layer

Country Status (1)

Country Link
JP (1) JPS60114572A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297677A (en) * 1988-06-13 1990-04-10 Sandvik Ab Cover body of substrate capable of being decarburized in coating method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56108876A (en) * 1980-02-04 1981-08-28 Citizen Watch Co Ltd Silver plated exterior decorative parts for watch and their manufacture
JPS56166370A (en) * 1980-05-27 1981-12-21 Mitsubishi Metal Corp Surface coated tool member of superior abrasion resistance and corrosion resistance
JPS58126972A (en) * 1982-01-22 1983-07-28 Sumitomo Electric Ind Ltd Diamond coated sintered hard alloy tool

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56108876A (en) * 1980-02-04 1981-08-28 Citizen Watch Co Ltd Silver plated exterior decorative parts for watch and their manufacture
JPS56166370A (en) * 1980-05-27 1981-12-21 Mitsubishi Metal Corp Surface coated tool member of superior abrasion resistance and corrosion resistance
JPS58126972A (en) * 1982-01-22 1983-07-28 Sumitomo Electric Ind Ltd Diamond coated sintered hard alloy tool

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297677A (en) * 1988-06-13 1990-04-10 Sandvik Ab Cover body of substrate capable of being decarburized in coating method

Also Published As

Publication number Publication date
JPS6324066B2 (en) 1988-05-19

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