JPH0557508A - Vapor-phase synthetic diamond coated cutting tool - Google Patents

Vapor-phase synthetic diamond coated cutting tool

Info

Publication number
JPH0557508A
JPH0557508A JP24055291A JP24055291A JPH0557508A JP H0557508 A JPH0557508 A JP H0557508A JP 24055291 A JP24055291 A JP 24055291A JP 24055291 A JP24055291 A JP 24055291A JP H0557508 A JPH0557508 A JP H0557508A
Authority
JP
Japan
Prior art keywords
diamond
coated
layer
cutting tool
coating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP24055291A
Other languages
Japanese (ja)
Inventor
Toshihiko Okamura
寿彦 岡村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP24055291A priority Critical patent/JPH0557508A/en
Publication of JPH0557508A publication Critical patent/JPH0557508A/en
Withdrawn legal-status Critical Current

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  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To provide a vapor-phase synthetic diamond coated cutting tool that has a long life and is excellent in separation resistance. CONSTITUTION:A vapor-phase synthetic diamond coated cutting tool is made up of a base body and a double diamond coated layer consisting of a first diamond layer whose crystal face formed on the surface of the base body is mainly made up of (100) or (110) and a second diamond layer which is coated on the first diamond layer and whose crystal face is mainly made up of (111).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、耐剥離性に優れた気
相合成ダイヤモンド被覆切削工具に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor phase synthetic diamond coated cutting tool which is excellent in peel resistance.

【0002】[0002]

【従来の技術】近年、Coを結合相形成成分として含有
する通常の炭化タングステン(以下、WCという)基超
硬合金基体、サーメット、窒化珪素、サイアロンなどの
表面に、気相合成法によりダイヤモンド被覆層を形成し
た気相合成ダイヤモンド被覆切削工具が提供されてお
り、このダイヤモンド被覆切削工具は、主としてAlま
たはAl合金などの切削に用いられている。
2. Description of the Related Art In recent years, the surfaces of ordinary tungsten carbide (hereinafter referred to as WC) -based cemented carbide substrates containing Co as a binder phase forming component, cermet, silicon nitride, sialon, etc. are coated with diamond by a vapor phase synthesis method. A layered vapor-phase synthetic diamond-coated cutting tool is provided, and the diamond-coated cutting tool is mainly used for cutting Al or Al alloy.

【0003】このダイヤモンド被覆切削工具の表面に形
成される気相合成ダイヤモンド被覆層は、主に(10
0)、(110)および(111)結晶面からなること
が知られているが、上記(111)結晶面ダイヤモンド
被覆層は基体との密着性が悪く剥離しやすい。そのため
に、例えば、特開昭62−107068号公報では、基
体の表面に50%以上の面積が(100)結晶面または
(110)結晶面からなるダイヤモンド層を被覆した気
相合成ダイヤモンド被覆切削工具が提供されている。
The vapor-phase synthetic diamond coating layer formed on the surface of this diamond-coated cutting tool is mainly composed of (10
It is known that it is composed of 0), (110) and (111) crystal faces, but the above (111) crystal face diamond coating layer has poor adhesion to the substrate and is easily peeled off. Therefore, for example, in Japanese Patent Laid-Open No. 62-107068, a vapor-phase synthetic diamond-coated cutting tool in which a surface of a substrate is coated with a diamond layer having an area of 50% or more of (100) crystal faces or (110) crystal faces Is provided.

【0004】[0004]

【発明が解決しようとする課題】しかし、上記(10
0)結晶面ダイヤモンドおよび(110)結晶面ダイヤ
モンドは、(111)結晶面ダイヤモンドに比べて硬度
が低く、上記(100)結晶面ダイヤモンドまたは(1
10)結晶面ダイヤモンドが50%以上を有する気相合
成ダイヤモンド被覆層は、基体との密着性が優れている
ものの、硬さが十分でないために磨耗が早く、したがっ
て、工具寿命が十分でないという課題があった。
However, the above (10)
The 0) crystal face diamond and the (110) crystal face diamond have lower hardness than the (111) crystal face diamond, and the (100) crystal face diamond or (1)
10) The vapor-phase synthetic diamond coating layer having a crystal plane diamond of 50% or more has excellent adhesion to the substrate, but has insufficient hardness and therefore wears quickly, thus resulting in insufficient tool life. was there.

【0005】[0005]

【課題を解決するための手段】そこで、本発明者は、ダ
イヤモンド自体として最も硬い結晶面が(111)ダイ
ヤモンド層を基体の表面に強固に付着せしめた気相合成
ダイヤモンド被覆切削工具は、従来よりも一層使用寿命
が長くなるという予測のもとに研究を行った結果、基体
の表面に最も密着性の優れた(100)または(11
0)結晶面を主体とする第1ダイヤモンド層を被覆し、
上記第1ダイヤモンド層の上に硬さの優れた(111)
結晶面を主体とする第2ダイヤモンド層を被覆すると、
(111)結晶面を主体とする第2ダイヤモンド層を基
体の表面に強固に付着せしめることができ、したがっ
て、従来よりも一層工具寿命の長いダイヤモンド被覆切
削工具を得ることができるという知見を得たのである。
Therefore, the present inventor has proposed that a vapor-phase synthetic diamond-coated cutting tool in which a diamond layer having the hardest crystal plane of diamond itself (111) is firmly attached to the surface of a substrate is As a result of conducting research based on the prediction that the service life will be even longer, (100) or (11) which has the best adhesion to the surface of the substrate.
0) coating the first diamond layer mainly composed of crystal planes,
Excellent hardness (111) on the first diamond layer
When the second diamond layer mainly composed of crystal planes is coated,
It has been found that the second diamond layer mainly composed of the (111) crystal plane can be firmly adhered to the surface of the substrate, and therefore a diamond-coated cutting tool having a longer tool life than the conventional one can be obtained. Of.

【0006】この発明は、かかる知見に基づいて成され
たものであって、基体と、上記基体の表面に形成された
結晶面が(100)または(110)を主体とする第1
ダイヤモンド層および上記第1ダイヤモンド層の上に被
覆された結晶面が(111)を主体とする第2ダイヤモ
ンド層とで構成された2重ダイヤモンド被覆層と、から
なる気相合成ダイヤモンド被覆切削工具に特徴を有する
ものである。
The present invention has been made based on the above findings, and is a first structure in which the substrate and the crystal plane formed on the surface of the substrate are mainly (100) or (110).
A vapor-phase synthetic diamond-coated cutting tool comprising: a double diamond coating layer comprising a diamond layer and a second diamond layer having a crystal plane coated on the first diamond layer and having (111) as a main component. It has characteristics.

【0007】この発明において、結晶面が(100)を
主体とする第1ダイヤモンド層とは(100)結晶面ダ
イヤモンドがX線回折で最も強くピークの出るダイヤモ
ンド層であり、結晶面が(110)を主体とする第1ダ
イヤモンド層とは(110)結晶面ダイヤモンドがX線
回折で最も強くピークの出るダイヤモンド層であり、さ
らに、結晶面が(111)を主体とする第2ダイヤモン
ド層とは、(111)結晶面ダイヤモンドがX線回折で
最も強くピークの出るダイヤモンド層である。
In the present invention, the first diamond layer whose crystal plane is mainly composed of (100) is a diamond layer in which (100) crystal plane diamond has the strongest peak in X-ray diffraction, and the crystal plane is (110). The first diamond layer mainly composed of (110) is a diamond layer in which a (110) crystal plane diamond has the strongest peak in X-ray diffraction, and the second diamond layer mainly composed of (111) crystal planes is The (111) crystal plane diamond is a diamond layer having the strongest peak in X-ray diffraction.

【0008】ダイヤモンド層は、公知のCVDおよびP
VD法により製造することができるが、CVD法により
形成することが好ましく、通常の炭化水素ガスと水素ガ
スとの混合ガスを反応容器に導入し、熱フィラメント、
高周波、マイクロ波などによって上記混合ガスを励起さ
せ、基体上にダイヤモンド層を形成することができる。
上記結晶面が(111)を主体とする第2ダイヤモンド
被覆層は、加熱温度を850℃以下に保持することによ
り形成することができ、一方、結晶面が(110)を主
体とする第1ダイヤモンド被覆層は加熱温度を950℃
〜1050℃に保持することにより形成することがで
き、さらに、結晶面が(100)を主体とする第1ダイ
ヤモンド被覆層は加熱温度を1050℃超〜1200℃
に保持することにより形成することができる。
The diamond layer is formed by the known CVD and P
Although it can be manufactured by the VD method, it is preferably formed by the CVD method, and a mixed gas of a normal hydrocarbon gas and hydrogen gas is introduced into a reaction vessel to form a hot filament,
A diamond layer can be formed on the substrate by exciting the mixed gas with high frequency, microwave, or the like.
The second diamond coating layer whose crystal plane is mainly (111) can be formed by maintaining the heating temperature at 850 ° C. or lower, while the first diamond whose crystal plane is mainly (110). The coating layer has a heating temperature of 950 ° C.
It can be formed by holding at 1050 ° C, and the first diamond coating layer whose crystal plane is mainly (100) has a heating temperature higher than 1050 ° C to 1200 ° C.
It can be formed by holding.

【0009】上記第1ダイヤモンド被覆層および第2ダ
イヤモンド被覆層の合計層厚は、2〜100μm、好ま
しくは、5〜50μmの範囲内にあることが必要であ
る。また、上記基体は、Co:4〜20重量%を含有
し、さらに必要に応じて、Wを除く周期律表の4a、5
a,6a族金属の炭化物、またはこれら炭化物とWCと
の固溶体:0.5〜30重量%を含有し、残りがWCお
よび不可避不純物からなる組成のWC基超硬合金である
ことが好ましいが、しかしこれに限定されるものではな
く、サーメット、窒化珪素、サイアロンなどを基体とし
て用いることもできる。
The total layer thickness of the first diamond coating layer and the second diamond coating layer must be in the range of 2 to 100 μm, preferably 5 to 50 μm. Further, the above-mentioned substrate contains Co: 4 to 20% by weight and, if necessary, further contains 4a and 5 of the periodic table excluding W.
Carbides of a and 6a group metals, or a solid solution of these carbides and WC: 0.5 to 30% by weight, and the balance is preferably a WC-based cemented carbide having a composition of WC and inevitable impurities. However, the material is not limited to this, and cermet, silicon nitride, sialon, or the like can be used as the substrate.

【0010】[0010]

【実施例】つぎに、この発明の気相合成ダイヤモンド被
覆切削工具を実施例に基づいて具体的に説明する。
EXAMPLES Next, the vapor phase synthetic diamond-coated cutting tool of the present invention will be specifically described based on examples.

【0011】実施例1 原料粉末としていずれも平均粒径:0.8μmのWC粉
末、TiC粉末、TaC粉末、(Ti、W)C粉末およ
びCo粉末を用意し、これら原料粉末をTiC粉末:4
重量%、TaC粉末:1重量%、(Ti、W)C粉末:
1重量%、残部:WC粉末となるように配合し、この配
合粉末をボールミルで72時間湿式混合し、乾燥したの
ち、1.5ton/cm2 の圧力で圧粉体にプレス成形
し、この圧粉体を通常の条件で焼結し、上記配合組成と
ほぼ同一の成分組成をもつ焼結体を製造した。
Example 1 As raw material powders, WC powder, TiC powder, TaC powder, (Ti, W) C powder and Co powder each having an average particle diameter of 0.8 μm were prepared, and these raw material powders were TiC powder: 4
% By weight, TaC powder: 1% by weight, (Ti, W) C powder:
1% by weight, balance: WC powder was blended, the blended powder was wet mixed in a ball mill for 72 hours, dried, and then pressed into a green compact at a pressure of 1.5 ton / cm 2 , and this pressure was applied. The powder was sintered under normal conditions to produce a sintered body having a composition substantially the same as the above composition.

【0012】この焼結体の表面を研削加工し、その形状
をISO規格SPGN120308(K種)のチップに
成形し、このチップを金属Wフィラメントを備えた石英
製反応容器に装入し、上記石英製反応容器内を下記の条
件に保持することにより平均層厚:3μmの(100)
結晶面を主体とする第1ダイヤモンド被覆層を形成し、
続いて上記(100)結晶面を主体とする第1ダイヤモ
ンド被覆層の上に下記の条件で平均層厚:2μmの(1
11)結晶面を主体とする第2ダイヤモンド被覆層を形
成することにより本発明ダイヤモンド被覆チップ1を作
製した。
The surface of this sintered body was ground, the shape thereof was molded into a chip of ISO standard SPGN120308 (K type), and this chip was placed in a quartz reaction vessel equipped with a metal W filament, and the above quartz was used. By keeping the inside of the reaction vessel under the following conditions, the average layer thickness: 3 μm (100)
Forming a first diamond coating layer mainly composed of crystal planes,
Then, on the first diamond coating layer mainly composed of the (100) crystal plane, the average layer thickness: 2 μm (1
11) The diamond-coated chip 1 of the present invention was produced by forming the second diamond-coated layer mainly composed of crystal planes.

【0013】実施例2 さらに、実施例1で用意した上記チップを金属Wフィラ
メントを備えた石英製反応容器に装入し、上記石英製反
応容器内を下記の条件に保持することにより平均層厚:
3μmの(110)結晶面を主体とする第1ダイヤモン
ド被覆層を形成し、続いて上記(110)結晶面を主体
とする第1ダイヤモンド被覆層の上に実施例1と同じ条
件で平均層厚:2μmの(111)結晶面を主体とする
第2ダイヤモンド被覆層を形成することにより本発明ダ
イヤモンド被覆チップ2を作製した。
Example 2 Furthermore, the above chip prepared in Example 1 was placed in a quartz reaction vessel equipped with a metal W filament, and the inside of the quartz reaction vessel was maintained under the following conditions to obtain an average layer thickness. :
A first diamond coating layer mainly composed of (110) crystal planes of 3 μm was formed, and then an average layer thickness was formed on the first diamond coating layer mainly composed of (110) crystal planes under the same conditions as in Example 1. A diamond-coated chip 2 of the present invention was produced by forming a second diamond-coated layer having a (111) crystal plane of 2 μm as a main component.

【0014】(100)結晶面を主体とするダイヤモン
ド層形成条件: 雰囲気圧力:30Torr、 基体温度:1100℃、 反応ガス:メタンガス濃度:1容量%のメタンガスおよ
び水素ガスからなる混合ガス、 ガス流量:1リットル/秒、
Conditions for forming diamond layer mainly composed of (100) crystal plane: Atmospheric pressure: 30 Torr, substrate temperature: 1100 ° C., reaction gas: methane gas concentration: mixed gas consisting of methane gas and hydrogen gas at 1% by volume, gas flow rate: 1 liter / second,

【0015】(110)結晶面を主体とするダイヤモン
ド層形成条件: 雰囲気圧力:30Torr、 基体温度:1050℃、 反応ガス:メタンガス濃度:1容量%のメタンガスおよ
び水素ガスからなる混合ガス、 ガス流量:1リットル/秒、
Conditions for forming a diamond layer mainly composed of a (110) crystal plane: atmosphere pressure: 30 Torr, substrate temperature: 1050 ° C., reaction gas: methane gas concentration: mixed gas of methane gas and hydrogen gas of 1% by volume, gas flow rate: 1 liter / second,

【0016】(111)結晶面を主体とするダイヤモン
ド層形成条件: 雰囲気圧力:30Torr、 基体温度:800℃、 反応ガス:メタンガス濃度:1容量%のメタンガスおよ
び水素ガスからなる混合ガス、 ガス流量:1リットル/秒、
Conditions for forming diamond layer mainly composed of (111) crystal plane: Atmospheric pressure: 30 Torr, substrate temperature: 800 ° C., reaction gas: methane gas concentration: mixed gas consisting of methane gas and hydrogen gas of 1% by volume, gas flow rate: 1 liter / second,

【0017】なお、本発明ダイヤモンド被覆チップ1に
形成された第1ダイヤモンド被覆層および第2ダイヤモ
ンド被覆層の結晶面は、本発明ダイヤモンド被覆チップ
1または本発明ダイヤモンド被覆チップ2の基体を化学
的に溶解することにより表面に形成された第1ダイヤモ
ンド被覆層および第2ダイヤモンド被覆層からなる2重
ダイヤモンド被覆層を取り出し、表面および裏面をX線
回折することにより同定した。
The crystal planes of the first diamond coating layer and the second diamond coating layer formed on the diamond-coated chip 1 of the present invention chemically change the substrate of the diamond-coated chip 1 of the present invention or the diamond-coated chip 2 of the present invention. The double diamond coating layer composed of the first diamond coating layer and the second diamond coating layer formed on the surface by melting was taken out, and the front surface and the back surface were identified by X-ray diffraction.

【0018】比較例1 実施例1で用意したチップを金属Wフィラメントを備え
た石英製反応容器に装入し、実施例1の第1ダイヤモン
ド被覆層形成条件と同一条件で平均層厚:5μmの(1
00)結晶面を主体とする第1ダイヤモンド被覆層を形
成し、比較ダイヤモンド被覆チップ1を作製した。
Comparative Example 1 The chip prepared in Example 1 was placed in a quartz reaction vessel equipped with a metal W filament, and the average layer thickness was 5 μm under the same conditions as those for forming the first diamond coating layer in Example 1. (1
00) A first diamond coating layer having a crystal plane as a main component was formed to prepare a comparative diamond-coated chip 1.

【0019】比較例2 実施例1で用意したチップを金属Wフィラメントを備え
た石英製反応容器に装入し、上記石英製反応容器内を実
施例2で示される条件で平均層厚:5μmの(110)
結晶面を主体とするダイヤモンド被覆層を形成し、比較
ダイヤモンド被覆チップ2を作製した。
Comparative Example 2 The chip prepared in Example 1 was placed in a quartz reaction vessel equipped with a metal W filament, and the inside of the quartz reaction vessel under the conditions shown in Example 2 had an average layer thickness of 5 μm. (110)
A comparative diamond-coated chip 2 was produced by forming a diamond-coated layer mainly composed of crystal planes.

【0020】比較例3 実施例1で用意したチップを金属Wフィラメントを備え
た石英製反応容器に装入し、実施例1の第1ダイヤモン
ド被覆層形成条件と同一条件で平均層厚:5μmの(1
11)結晶面を主体とするダイヤモンド被覆層を形成
し、比較ダイヤモンド被覆チップ3を作製した。
Comparative Example 3 The chip prepared in Example 1 was placed in a quartz reaction vessel equipped with a metal W filament, and the average layer thickness was 5 μm under the same conditions as those for forming the first diamond coating layer in Example 1. (1
11) A diamond coating layer mainly composed of crystal planes was formed, and a comparative diamond coating chip 3 was produced.

【0021】比較例4 実施例1で用意したチップを金属Wフィラメントを備え
た石英製反応容器に装入し、実施例1の第1ダイヤモン
ド被覆層形成条件と同一条件で平均層厚:3μmの(1
00)結晶面を主体とする第1ダイヤモンド被覆層を形
成し、続いて上記(100)結晶面を主体とする第1ダ
イヤモンド被覆層の上に比較例2と同じ条件で平均層
厚:2μmの(110)結晶面を主体とする第2ダイヤ
モンド被覆層を形成することにより比較ダイヤモンド被
覆チップ4を作製した。
Comparative Example 4 The chip prepared in Example 1 was placed in a quartz reaction vessel equipped with a metal W filament, and the average layer thickness was 3 μm under the same conditions as those for forming the first diamond coating layer in Example 1. (1
(00) A first diamond coating layer mainly composed of crystal planes was formed, and then an average layer thickness of 2 μm was formed on the first diamond coating layer mainly composed of (100) crystal planes under the same conditions as in Comparative Example 2. A comparative diamond-coated chip 4 was prepared by forming a second diamond-coated layer mainly composed of a (110) crystal plane.

【0022】これら本発明ダイヤモンド被覆チップ1〜
2および比較ダイヤモンド被覆チップ1〜4のダイヤモ
ンド被覆層の構成をまとめると表1に示す通りになる。
These diamond-coated chips 1 to 1 of the present invention
Table 1 summarizes the configurations of the diamond coating layers of 2 and comparative diamond coated chips 1 to 4.

【0023】[0023]

【表1】 [Table 1]

【0024】これら本発明ダイヤモンド被覆チップ1〜
2および比較ダイヤモンド被覆チップ1〜4を用いて、 被削材:Al−18%Si、 切削速度V:300m/min、 切込みd:1mm、 送りSz:0.2mm/rev、 の条件にて湿式連続切削試験を行い、チップのダイヤモ
ンド被覆層が無くなるまでの連続切削時間を測定し、そ
の測定結果を表2に示した。
These diamond-coated chips 1 to 1 of the present invention
2 and comparative diamond coated chips 1 to 4, work material: Al-18% Si, cutting speed V: 300 m / min, depth d: 1 mm, feed Sz: 0.2 mm / rev, wet condition A continuous cutting test was conducted to measure the continuous cutting time until the diamond coating layer of the chip disappeared, and the measurement results are shown in Table 2.

【0025】さらに、上記本発明ダイヤモンド被覆チッ
プ1〜2および比較ダイヤモンド被覆チップ1〜4をそ
れぞれ10個用いて、 被削材:Al−18%Si 切削速度V:200m/min、 切込みd:1mm、 送りSz:0.3mm/tooth、 の条件にて、湿式フライス切削試験を行い、30分後の
チップのダイヤモンド被覆層が剥離したチップの個数を
測定し、その測定結果も表2に示した。
Further, 10 pieces of each of the diamond-coated chips 1 and 2 of the present invention and 10 pieces of the comparative diamond-coated chips 1 to 4 were used, and a work material: Al-18% Si, a cutting speed V: 200 m / min, and a cut d: 1 mm. Feed Sz: 0.3 mm / tooth, a wet milling cutting test was performed, and after 30 minutes, the number of chips from which the diamond coating layer of the chips had peeled off was measured. The measurement results are also shown in Table 2. ..

【0026】[0026]

【表2】 [Table 2]

【0027】[0027]

【発明の効果】上記本発明ダイヤモンド被覆チップ1〜
2および比較ダイヤモンド被覆チップ1〜4のダイヤモ
ンド被覆層全体の層厚はいずれも5μmであるが、本発
明ダイヤモンド被覆チップ1〜2は、比較ダイヤモンド
被覆チップ1〜4よりもダイヤモンド被覆層が連続切削
により摩耗して無くなる時間が長く、また30分フライ
ス切削してもダイヤモンド被覆層が剥離せず、使用寿命
が長いことがわかる。したがって、この発明の気相合成
ダイヤモンド被覆切削工具を用いることによりコストを
下げることができ、産業上優れた効果を奏するものであ
る。
[Effects of the Invention] The diamond-coated chip 1 to 1 of the present invention described above.
2 and the comparative diamond-coated chips 1 to 4 all have a diamond coating layer thickness of 5 μm, but the diamond-coated chips 1 and 2 of the present invention have a diamond coating layer that is continuously cut more than the comparative diamond-coated chips 1 to 4. It can be seen that the diamond coating layer does not peel off even after milling for 30 minutes, and the service life is long. Therefore, by using the vapor phase synthetic diamond-coated cutting tool of the present invention, the cost can be reduced and the industrially excellent effect can be obtained.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基体と、上記基体の表面に形成された結
晶面が(100)を主体とする第1ダイヤモンド層およ
び上記第1ダイヤモンド層の上に被覆された結晶面が
(111)を主体とする第2ダイヤモンド層とで構成さ
れた2重ダイヤモンド被覆層と、からなることを特徴と
する気相合成ダイヤモンド被覆切削工具。
1. A substrate, a first diamond layer whose crystal face formed on the surface of the substrate is (100) as a main component, and a crystal face coated on the first diamond layer is (111) as a main component. And a double diamond coating layer composed of a second diamond layer and a cutting tool coated with vapor phase synthetic diamond.
【請求項2】 基体と、上記基体の表面に形成された結
晶面が(110)を主体とする第1ダイヤモンド層およ
び上記第1ダイヤモンド層の上に被覆された結晶面が
(111)を主体とする第2ダイヤモンド層とで構成さ
れた2重ダイヤモンド被覆層と、からなることを特徴と
する気相合成ダイヤモンド被覆切削工具。
2. A substrate, a first diamond layer whose crystal plane formed on the surface of the substrate is mainly (110), and a crystal plane coated on the first diamond layer is mainly (111). And a double diamond coating layer composed of a second diamond layer and a cutting tool coated with vapor phase synthetic diamond.
JP24055291A 1991-08-27 1991-08-27 Vapor-phase synthetic diamond coated cutting tool Withdrawn JPH0557508A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24055291A JPH0557508A (en) 1991-08-27 1991-08-27 Vapor-phase synthetic diamond coated cutting tool

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24055291A JPH0557508A (en) 1991-08-27 1991-08-27 Vapor-phase synthetic diamond coated cutting tool

Publications (1)

Publication Number Publication Date
JPH0557508A true JPH0557508A (en) 1993-03-09

Family

ID=17061228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24055291A Withdrawn JPH0557508A (en) 1991-08-27 1991-08-27 Vapor-phase synthetic diamond coated cutting tool

Country Status (1)

Country Link
JP (1) JPH0557508A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5705271A (en) * 1994-04-01 1998-01-06 Ngk Spark Plug Co., Ltd. Method for producing diamond coated member
US6447843B1 (en) * 1997-03-27 2002-09-10 Saint-Gobain Industrial Ceramics, Inc. Synthetic diamond wear component and method
WO2005118909A1 (en) * 2004-06-02 2005-12-15 Boehlerit Gmbh & Co.Kg. Diamond-coated hard metal indexable insert

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5705271A (en) * 1994-04-01 1998-01-06 Ngk Spark Plug Co., Ltd. Method for producing diamond coated member
US5863606A (en) * 1994-04-01 1999-01-26 Ngk Spark Plug Co., Ltd. Method for producing diamond coated member
US6447843B1 (en) * 1997-03-27 2002-09-10 Saint-Gobain Industrial Ceramics, Inc. Synthetic diamond wear component and method
WO2005118909A1 (en) * 2004-06-02 2005-12-15 Boehlerit Gmbh & Co.Kg. Diamond-coated hard metal indexable insert

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